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21.发明授权Method of measuring asymmetry in a scatterometer, a method of measuring an overlay error in a substrate and a metrology apparatus 有权测量散射仪中的不对称的方法，测量衬底中的重叠误差的方法和测量装置公开(公告)号：US07656518B2
公开(公告)日：2010-02-02
申请号：US11729962
申请日：2007-03-30
IPC分类号： G01N21/00
CPC分类号： G01N21/4785 , G03F7/70516 , G03F7/70616 , G03F7/70633
摘要： In a method of measuring asymmetry in a scatterometer, a target portion is illuminated twice, first with 0° of substrate rotation and secondly with 180° of substrate rotation. One of those images is rotated and then that rotated image is subtracted from the other image. In this way, asymmetry of the scatterometer can be corrected.
摘要翻译： 在测量散射仪中的不对称性的方法中，目标部分被照射两次，首先是基板旋转的0°，其次是基板旋转180°。 其中一个图像被旋转，然后从另一个图像中减去旋转的图像。 以这种方式，可以校正散射仪的不对称性。
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公开(公告)号：US07023525B2
公开(公告)日：2006-04-04
申请号：US10883791
申请日：2004-07-06
申请人： Arno Jan Bleeker , Pieter Willem Herman De Jager , Jason Douglas Hintersteiner , Borgert Kruizinga , Matthew Eugene McCarthy , Mark Oskotsky , Lev Ryzhikov , Lev Sakin , Stanislav Smirnov , Bart Snijders , Karel Diederick Van Der Mast , Huibert Visser
发明人： Arno Jan Bleeker , Pieter Willem Herman De Jager , Jason Douglas Hintersteiner , Borgert Kruizinga , Matthew Eugene McCarthy , Mark Oskotsky , Lev Ryzhikov , Lev Sakin , Stanislav Smirnov , Bart Snijders , Karel Diederick Van Der Mast , Huibert Visser
CPC分类号： G03F7/70283 , G03F7/70291
摘要： An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub-element being configured to generate a patterned sub-beam. At least one of the separate patterning sub-elements is configured to generate a patterned sub-beam whose cross-section contains regions of different intensities. The imaging apparatus also includes a combining structure configured to combine the plurality of patterned sub-beams into a single patterned image, and a projection system configured to project the patterned image onto a target portion of a substrate.
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公开(公告)号：US06778257B2
公开(公告)日：2004-08-17
申请号：US10200577
申请日：2002-07-23
申请人： Arno Jan Bleeker , Pieter Willem Herman De Jager , Jason Douglas Hintersteiner , Borgert Kruizinga , Matthew Eugene McCarthy , Mark Oskotsky , Lev Ryzhikov , Lev Sakin , Stanislav Smirnov , Bart Snijders , Karel Diederick Van Der Mast , Huibert Visser
发明人： Arno Jan Bleeker , Pieter Willem Herman De Jager , Jason Douglas Hintersteiner , Borgert Kruizinga , Matthew Eugene McCarthy , Mark Oskotsky , Lev Ryzhikov , Lev Sakin , Stanislav Smirnov , Bart Snijders , Karel Diederick Van Der Mast , Huibert Visser
IPC分类号： G03B2754
CPC分类号： G03F7/70283 , G03F7/70291
摘要： An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub-element being configured to generate a patterned sub-beam. At least one of the separate patterning sub-elements is configured to generate a patterned sub-beam whose cross-section contains regions of different intensities. The imaging apparatus also includes a combining structure configured to combine the plurality of patterned sub-beams into a single patterned image, and a projection system configured to project the patterned image onto a target portion of a substrate.
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24.发明授权公开(公告)号：US08848195B2
公开(公告)日：2014-09-30
申请号：US13123613
申请日：2009-10-22
申请人： Christian Marinus Leewis , Marcus Adrianus Van De Kerkhof , Karel Diederick Van Der Mast , Peter Clement Paul Vanoppen , Ruben Alvarez Sanchez
发明人： Christian Marinus Leewis , Marcus Adrianus Van De Kerkhof , Karel Diederick Van Der Mast , Peter Clement Paul Vanoppen , Ruben Alvarez Sanchez
CPC分类号： G03F7/70625
摘要： In a method for determining one or more properties of a substrate, scatterometry spectra can be measured from one or more targets on the substrate. Reconstructions of each of said spectra can be performed to derive one or more values for the property of the substrate, by comparing representations of each of the measured spectra with one or more modeled representations of spectra calculated using variable parameter values. At least one parameter in the reconstruction for each spectrum can be linked to the value of the parameter used in the reconstruction for a different spectrum.
摘要翻译： 在确定衬底的一个或多个特性的方法中，可以从衬底上的一个或多个靶测量散射光谱。 可以通过将每个测量光谱的表示与使用可变参数值计算的光谱的一个或多个建模表示进行比较，来执行每个所述光谱的重建以导出衬底性质的一个或多个值。 每个频谱的重建中至少有一个参数可以链接到在不同频谱的重构中使用的参数的值。
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25.发明授权Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate 有权计量工具，包括光刻设备和计量工具的系统以及用于确定衬底参数的方法公开(公告)号：US07961309B2
公开(公告)日：2011-06-14
申请号：US12536301
申请日：2009-08-05
IPC分类号： G01N21/00
CPC分类号： G03F7/70758 , G03F7/70766
摘要： A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table, a sensor, a displacement system, a balance mass, and a bearing. The substrate table is constructed and arranged to hold the substrate. The sensor is constructed and arranged to measure a parameter of the substrate. The displacement system is configured to displace the substrate table or the sensor with respect to the other in a first direction. The bearing is configured to movably support the first balance mass so as to be substantially free to translate in a direction opposite of the first direction in order to counteract a displacement of the substrate table or sensor in the first direction.
摘要翻译： 计量工具被布置成测量在光刻设备中已经设置有图案的衬底的参数。 测量工具包括底架，底座台，传感器，排量系统，平衡块和轴承。 衬底台被构造和布置成保持衬底。 传感器被构造和布置以测量衬底的参数。 位移系统构造成在第一方向相对于另一个移动衬底台或传感器。 轴承构造成可移动地支撑第一平衡块，以便在与第一方向相反的方向上基本上自由地平移，以抵消基板台或传感器在第一方向上的位移。
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公开(公告)号：US07517211B2
公开(公告)日：2009-04-14
申请号：US11312659
申请日：2005-12-21
申请人： Yvonne Wendela Kruijt-Stegeman , Raymond Jacobus Knaapen , Johan Frederik Dijksman , Krassimir Todorov Krastev , Sander Frederik Wuister , Aleksey Yurievich Kolesnychenko , Karel Diederick Van Der Mast , Klaus Simon
发明人： Yvonne Wendela Kruijt-Stegeman , Raymond Jacobus Knaapen , Johan Frederik Dijksman , Krassimir Todorov Krastev , Sander Frederik Wuister , Aleksey Yurievich Kolesnychenko , Karel Diederick Van Der Mast , Klaus Simon
IPC分类号： B29C59/00
CPC分类号： B29C59/02 , B29C35/0888 , B29C59/022 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
摘要翻译： 公开了一种压印光刻设备，其具有模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的基板的衬底台，其中模板保持器的第一阵列布置成保持压印阵列 可用于将第一阵列图案印刷到基底上的模板，并且第二阵列的模板支架被布置成保持压印模板阵列，其可用于将第二阵列阵列印刷到基底上，所述图案由 第二阵列散布在由第一阵列印刷的图案之间。
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27.发明授权Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate 有权计量工具，包括光刻设备和计量工具的系统以及用于确定衬底参数的方法公开(公告)号：US07502103B2
公开(公告)日：2009-03-10
申请号：US11443452
申请日：2006-05-31
IPC分类号： G01N21/00
CPC分类号： G03F7/70758 , G03F7/70766
摘要： A metrology tool is arranged to measure a parameter of a substrate that has been provided with a pattern in a lithographic apparatus. The metrology tool includes a base frame, a substrate table constructed and arranged to hold the substrate, at least one sensor constructed and arranged to measure a parameter of the substrate, a displacement system to displace one of the substrate table and sensor with respect to the other one of the substrate table and sensor in at least a first direction, a first balance mass, and a first bearing which movably supports the first balance mass so as to be substantially free to translate in the opposite direction of the first direction in order to counteract a displacement of the one of the substrate table and sensor in the first direction.
摘要翻译： 计量工具被布置成测量在光刻设备中已经设置有图案的衬底的参数。 该测量工具包括底架，构造和布置成保持基板的基板台，至少一个构造和布置以测量基板的参数的传感器，相对于基板移位基板台和传感器之一的位移系统 至少第一方向上的基板台和传感器中的另一个，第一平衡块和第一轴承，其可移动地支撑第一平衡块，以便在与第一方向相反的方向基本上自由地平移，以便 抵消基板台和传感器中的一个在第一方向上的位移。
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公开(公告)号：US06930755B2
公开(公告)日：2005-08-16
申请号：US10305390
申请日：2002-11-27
IPC分类号： G03F7/20 , H01L21/027 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70283 , G03F7/70291
摘要： Grayscales are formed by simultaneously projecting two or more patterned projection beams onto the substrate, each of which has a different pattern and a different intensity.
摘要翻译： 灰度通过同时将两个或更多个图案化的投影光束投影到基板上而形成，每个基板具有不同的图案和不同的强度。
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公开(公告)号：US4095104A
公开(公告)日：1978-06-13
申请号：US717193
申请日：1976-08-24
IPC分类号： H01J37/147 , H01J37/153 , H01J37/21 , H01J37/26
CPC分类号： H01J37/265 , H01J37/1478 , H01J37/153 , H01J37/21
摘要： In an electron microscope having a comparatively high resolution, a tilting motion about a point in an object to be imaged is imparted to the illuminating electron beam in order to adjust the coherence of the exposure of an object. For the exposure aperture, the aperture given by the degree of deflection then takes the place of the very small aperture of the illuminating electron beam. A preferred embodiment includes a correction device for the non-axial passage of the electron beam through a subsequent lens in the electron microscope. Operation with a conical exposure involving a present apex is also feasible.
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