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公开(公告)号：US07408655B2
公开(公告)日：2008-08-05
申请号：US11822633
申请日：2007-07-09
Applicant: Erik Roelof Loopstra , Leon Martin Levasier , Rene Oesterholt
Inventor： Erik Roelof Loopstra , Leon Martin Levasier , Rene Oesterholt
IPC: G01B11/14
CPC classification number: G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
Abstract: Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. 3 or more of the at least 3 optical encoders being connected to the substrate table at different locations in the 3 dimensional coordinate system. The motion control system is arranged to calculate the position of the substrate table in the 3 dimensional coordinate system from a subset of at least 3 of the 6 position values and to calculate an orientation of the substrate table with respect to the coordinate system from another subset of at least 3 of the 6 position values. Further, a method for calibrating the position detectors is described.
Abstract translation: 光刻设备包括用于控制衬底台的移动的衬底台和运动控制系统。 运动控制系统包括构造用于检测衬底台的位置的至少3个位置检测器。 为了测量衬底台的位置和取向，每个位置检测器包括一维或多维类型的光学编码器，光学编码器被布置为一起提供至少6个位置值，为每个位置值提供至少一个位置值 的三维。 所述至少3个光学编码器中的3个或更多个在所述三维坐标系中的不同位置连接到所述基板台。 运动控制系统被布置为从6个位置值中的至少3个的子集计算三维坐标系中的衬底台的位置，并且从另一个子集计算相对于坐标系的衬底台的取向 至少6个位置值中的3个。 此外，描述了用于校准位置检测器的方法。
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公开(公告)号：US07292312B2
公开(公告)日：2007-11-06
申请号：US11179665
申请日：2005-07-13
Applicant: Erik Roelof Loopstra , Leon Martin Levasier , Rene Oesterholt
Inventor： Erik Roelof Loopstra , Leon Martin Levasier , Rene Oesterholt
CPC classification number: G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
Abstract: Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. Some of the optical encoders may be connected to the substrate table at different locations in the 3 dimensional coordinate system. The motion control system is arranged to calculate the position of the substrate table in the 3 dimensional coordinate system from a subset of at least 3 of the 6 position values and to calculate an orientation of the substrate table with respect to the coordinate system from another subset of at least 3 of the 6 position values. Further, a method for calibrating the position detectors is presented.
Abstract translation: 光刻设备包括用于控制衬底台的移动的衬底台和运动控制系统。 运动控制系统包括构造用于检测衬底台的位置的至少3个位置检测器。 为了测量衬底台的位置和取向，每个位置检测器包括一维或多维类型的光学编码器，光学编码器被布置为一起提供至少6个位置值，为每个位置值提供至少一个位置值 的三维。 一些光学编码器可以在三维坐标系中的不同位置处连接到基板台。 运动控制系统被布置为从6个位置值中的至少3个的子集计算三维坐标系中的衬底台的位置，并且从另一个子集计算相对于坐标系的衬底台的取向 至少6个位置值中的3个。 此外，提出了一种用于校准位置检测器的方法。
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公开(公告)号：US07256871B2
公开(公告)日：2007-08-14
申请号：US10899295
申请日：2004-07-27
Applicant: Erik Roelof Loopstra , Leon Martin Levasier , Rene Oesterholt
Inventor： Erik Roelof Loopstra , Leon Martin Levasier , Rene Oesterholt
CPC classification number: G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
Abstract: Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. 3 or more of the at least 3 optical encoders being connected to the substrate table at different locations in the 3 dimensional coordinate system. The motion control system is arranged to calculate the position of the substrate table in the 3 dimensional coordinate system from a subset of at least 3 of the 6 position values and to calculate an orientation of the substrate table with respect to the coordinate system from another subset of at least 3 of the 6 position values. Further, a method for calibrating the position detectors is described.
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24.发明授权Using unflatness information of the substrate table or mask table for decreasing overlay 有权使用衬底表或掩模台的不平坦信息减少重叠公开(公告)号：US07239368B2
公开(公告)日：2007-07-03
申请号：US10998179
申请日：2004-11-29
Applicant: Rene Oesterholt , Ralph Brinkhof , Tjarko Adriaan Rudolf Van Empel , Leon Martin Levasier , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Koenraad Stephan Silvester Salden
Inventor： Rene Oesterholt , Ralph Brinkhof , Tjarko Adriaan Rudolf Van Empel , Leon Martin Levasier , Joost Jeroen Ottens , Koen Jacobus Johannes Maria Zaal , Koenraad Stephan Silvester Salden
CPC classification number: G03F7/70783 , G03F7/707
Abstract: A lithographic system includes an illumination system for providing a projection beam of radiation, a mask table for supporting a mask, the mask serving to impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. The system also comprises a processor arranged to calculate overlay corrections using a reference height map representing a surface of the substrate table or the mask table. Feed forward correction of non-flatness induced wafer grid distortion is allowed during alignment and during exposure, thereby reducing overlay errors caused by differences in flatness characteristics. It provides an indirect qualification method for overlay accuracy related to exposure chuck flatness based on height map information.
Abstract translation: 光刻系统包括用于提供投射辐射束的照明系统，用于支撑掩模的掩模台，用于使投影光束在其横截面上赋予图案的掩模，用于保持基板的基板台，以及 投影系统，用于将图案化的光束投影到基板的目标部分上。 该系统还包括处理器，其被布置为使用表示衬底台或掩模台的表面的参考高度图计算覆盖校正。 在对准和曝光期间允许非平坦度引起的晶片网格变形的前馈校正，从而减少由平坦度特性的差异引起的重叠误差。 它提供了基于高度图信息的与曝光卡盘平坦度相关的覆盖精度的间接鉴定方法。
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公开(公告)号：US08730448B2
公开(公告)日：2014-05-20
申请号：US13409752
申请日：2012-03-01
Applicant: Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Nicolaas Ten Kate , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Laurentius Johannes Adrianus Van Bokhoven , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
Inventor： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Nicolaas Ten Kate , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Laurentius Johannes Adrianus Van Bokhoven , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
CPC classification number: G03F7/70933 , G03F7/70875 , G03F7/70891
Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
Abstract translation: 光刻设备包括被构造成保持基板的基板台，配置成将图案化的辐射束投射通过开口并到达基板的目标部分的投影系统，以及在开口中具有出口的导管。 导管构造成将气体输送到开口。 光刻设备还包括由控制系统控制的冷却装置。 冷却装置构造成冷却气体，使得当气体入射到基板上时，从开口行进到基板的气体具有预定温度。
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Patent Agency Ranking
26.发明授权公开(公告)号：US08477287B2
公开(公告)日：2013-07-02
申请号：US12531230
申请日：2008-03-14
Applicant: Alex Oudshoorn , Leon Martin Levasier , Erik Roelof Loopstra , Roland Blok
Inventor： Alex Oudshoorn , Leon Martin Levasier , Erik Roelof Loopstra , Roland Blok
CPC classification number: G03F7/70725 , G03F9/7003 , G03F9/7026 , G03F9/7034
Abstract: The invention relates to a device manufacturing method comprising exposing a substrate with a patterned beam of radiation formed by a reticle mounted on a displaceable reticle stage, wherein the method comprises the steps of determining a non-linear function for approximating a height and a tilt profile of a reticle surface with respect to the reticle stage and controlling a displacement of the reticle stage during exposure of the substrate in accordance with the non-linear function. The invention further relates to a lithographic apparatus and a computer program.
Abstract translation: 本发明涉及一种器件制造方法，包括用安装在可移位标线片平台上的掩模版形成的图案化的辐射束暴露衬底，其中该方法包括以下步骤：确定近似高度和倾斜轮廓的非线性函数 的标线片表面，并且根据非线性函数控制在衬底曝光期间标线片台的位移。 本发明还涉及光刻设备和计算机程序。
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公开(公告)号：US08368902B2
公开(公告)日：2013-02-05
申请号：US12964483
申请日：2010-12-09
Applicant: Erik Roelof Loopstra , Leon Martin Levasier , Rene Oesterholt
Inventor： Erik Roelof Loopstra , Leon Martin Levasier , Rene Oesterholt
IPC: G01B11/14
CPC classification number: G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
Abstract: A method for calibrating an encoder in a lithographic apparatus, the encoder including a sensor and a grating, the encoder configured to measure a position of a moveable support of the lithographic apparatus, the method including measuring a position of the moveable support using an interferometer; and calibrating the encoder based on the position of the moveable support measured by the interferometer.
Abstract translation: 一种用于校准光刻设备中的编码器的方法，所述编码器包括传感器和光栅，所述编码器被配置为测量所述光刻设备的可移动支撑件的位置，所述方法包括使用干涉仪测量所述可移动支撑件的位置; 并且基于由干涉仪测量的可移动支撑件的位置来校准编码器。
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公开(公告)号：US20120229783A1
公开(公告)日：2012-09-13
申请号：US13409752
申请日：2012-03-01
Applicant: Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Nicolaas Ten Kate , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Laurentius Johannes Adrianus Van Bokhoven , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
Inventor： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Nicolaas Ten Kate , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Laurentius Johannes Adrianus Van Bokhoven , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
IPC: G03B27/52
CPC classification number: G03F7/70933 , G03F7/70875 , G03F7/70891
Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
Abstract translation: 光刻设备包括被构造成保持基板的基板台，配置成将图案化的辐射束投射通过开口并到达基板的目标部分的投影系统，以及在开口中具有出口的导管。 导管构造成将气体输送到开口。 光刻设备还包括由控制系统控制的冷却装置。 冷却装置构造成冷却气体，使得当气体入射到基板上时，从开口行进到基板的气体具有预定温度。
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公开(公告)号：US20100002207A1
公开(公告)日：2010-01-07
申请号：US12483703
申请日：2009-06-12
Applicant: Erik Roelof LOOPSTRA , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etienne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
Inventor： Erik Roelof LOOPSTRA , Petrus Rutgerus Bartray , Leon Martin Levasier , Bernardus Antonius Johannes Luttikhuis , Josephus Jacobus Smits , Anthonie Aantjes , Maurice Willem Jozef Etienne Wijckmans , Johannes Bernardus Ridder , Andre Schreuder , Dennis Jozef Maria Paulussen , Peter Gerardus Jonkers , Hugues Poincelin , Fransiscus Theresia Noel Heusschen
IPC: G03B27/52
CPC classification number: G03F7/709 , G03F7/70808
Abstract: A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.
Abstract translation: 光刻设备包括：投影系统，被配置为将图像投影到基板上;衬底台，其被配置为支撑所述基板;第一室，其至少部分地围绕所述投影系统;以及第二室，其至少部分地围绕所述基板台; 第一帧。 该装置包括被配置为支撑第二室的基座框架，以及耦合到该底座框架的中间框架。 中间框架构造成分离第一室和第二室。 该装置包括耦合到第一框架的支撑件。 支撑构造成通过中间框架和第二室中的联接开口支撑第一室。
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公开(公告)号：US20090207422A1
公开(公告)日：2009-08-20
申请号：US12426713
申请日：2009-04-20
Applicant: Erik Roelof LOOPSTRA , Leon Martin LEVASIER , Rene OESTERHOLT
Inventor： Erik Roelof LOOPSTRA , Leon Martin LEVASIER , Rene OESTERHOLT
IPC: G01B11/14
CPC classification number: G03F7/70775 , G03F7/70458 , G03F7/70516 , G03F9/7011 , G03F9/7019
Abstract: A measurement system configured to measure a position of an object in a lithographic apparatus, includes at least three position detectors configured to detect the position of the object, the at least three position detectors each including a single or multi-dimensional optical encoder to provide at least six position values, the optical encoders being coupled to the object at different locations within a three dimensional coordinate system, wherein at least one position value is provided for each dimension of the three dimensional coordinate system, and wherein the measurement system is configured to calculate the position of the object within the three dimensional coordinate system from a subset of at least three of the six position values and to calculate an orientation of the object with respect to the three dimensional coordinate system from another subset of at least three of the six position values.
Abstract translation: 被配置为测量光刻设备中的物体的位置的测量系统包括配置成检测物体的位置的至少三个位置检测器，所述至少三个位置检测器包括单个或多维光学编码器以提供在 至少六个位置值，所述光学编码器在三维坐标系内的不同位置处耦合到所述对象，其中为所述三维坐标系的每个维度提供至少一个位置值，并且其中所述测量系统被配置为计算 从六个位置值中的至少三个的子集的三维坐标系中的对象的位置，并且从六个位置中的至少三个的另一子集计算相对于三维坐标系的对象的取向 价值观。
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