公开(公告)号：US10104353B2

公开(公告)日：2018-10-16

申请号：US15478951

申请日：2017-04-04

Applicant: Microvision, Inc.

Inventor： Robert James Jackson

IPC: G02B26/08 ,  H04N9/31 ,  G02B3/00 ,  G02B26/10 ,  G01J1/04 ,  G02B27/01 ,  H04N3/08 ,  H04N9/14

Abstract: A scanning projector and method is provided that generates a feedback signal from at least one photodetector. In the scanning projector, a scanning mirror is configured to reflect laser light into an image region and an over scanned region. The at least one photodetector is configured to receive a portion of the reflected laser light impacting the over scanned region, and provides the feedback signal responsive to the received portion of light. This feedback signal can then be used to provide precise control of the scanning mirror.

公开(公告)号：US10088438B2

公开(公告)日：2018-10-02

申请号：US15339421

申请日：2016-10-31

Applicant: Hermes Microvision, Inc.

Inventor： Guochong Weng ,  Youjin Wang ,  Chiyan Kuan ,  Chung-Shih Pan

IPC: H01J37/00 ,  G01N23/2251 ,  H05F3/02 ,  H01J37/20 ,  H01J37/02 ,  H01J37/28

Abstract: A structure for grounding an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for grounding an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and back side. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUV mask is grounded. The reflective surface of the EUV mask on a continuously moving stage is scanned by using the electron beam simultaneously. The moving direction of the stage is perpendicular to the scanning direction of the electron beam.

公开(公告)号：US10070016B2

公开(公告)日：2018-09-04

申请号：US15044433

申请日：2016-02-16

Applicant: Microvision, Inc.

Inventor： Matthieu Saracco ,  Dale Eugene Zimmerman

IPC: G03G21/14 ,  H04N9/31 ,  H04N3/28 ,  G03B21/20

Abstract: A scanning projector and method is provided that that uses at least one multi-stripe laser to generate the laser light for the scanned image. Specifically, the multi-stripe laser includes at least a first laser element and a second laser element formed together on a semiconductor die. The first laser element is configured to output a first laser light beam, and the second laser element is configured to output a second laser light beam. At least one scanning mirror is configured to reflect the first laser light beam and the second laser light beam, and a drive circuit is configured to provide an excitation signal to excite motion of the at least one scanning mirror. Specifically, the motion is excited such that the at least one scanning mirror reflects the first laser light beam and the second laser light beam in a raster pattern of scan lines.

公开(公告)号：US10061441B2

公开(公告)日：2018-08-28

申请号：US15390927

申请日：2016-12-27

Applicant: Microvision, Inc.

Inventor： Jonathan A. Morarity ,  Patrick J. McVittie ,  P. Selvan Viswanathan ,  Ru Chen ,  Justin R. Zilke

IPC: G06F3/042 ,  G06F3/041

CPC classification number: G06F3/0421 ,  G01S17/88 ,  G06F3/017 ,  G06F3/0416 ,  G06F3/0418 ,  G06F3/0423 ,  G06F3/0426 ,  G06F2203/04101 ,  G06F2203/04108

Abstract: A projection system emits light pulses in a field of view and measures properties of reflections. Properties may include time of flight and return amplitude. Foreground objects and background surfaces are distinguished, distances between foreground objects and background surfaces are determined based on reflections that are occluded by the foreground objects and other properties of the projection system.

公开(公告)号：US10032600B2

公开(公告)日：2018-07-24

申请号：US15404618

申请日：2017-01-12

Applicant: Hermes Microvision Inc.

Inventor： Shuai Li

IPC: H01J37/143 ,  H01J37/28 ,  H01J3/20 ,  H01J37/09

Abstract: This invention provides a charged particle source, which comprises an emitter and means for generating a magnetic field distribution. The magnetic field distribution is minimum, about zero, or preferred zero at the tip of the emitter, and along the optical axis is maximum away from the tip immediately. In a preferred embodiment, the magnetic field distribution is provided by dual magnetic lens which provides an anti-symmetric magnetic field at the tip, such that magnetic field at the tip is zero.

公开(公告)号：US20180176551A1

公开(公告)日：2018-06-21

申请号：US15386576

申请日：2016-12-21

Applicant: Microvision, Inc.

Inventor： P. Selvan Viswanathan ,  Jari Honkanen ,  Douglas R. Wade ,  Bin Xue

IPC: H04N13/04 ,  H04N13/00 ,  H04N9/31

CPC classification number: H04N13/388 ,  G01B11/25 ,  H04N9/3161 ,  H04N13/128 ,  H04N13/324

Abstract: Devices and methods are described herein for providing foveated image projection. In general, at least one source of laser light is used to generate a laser beam, and scanning mirror(s) that reflect the laser beam into a pattern of scan lines. The source of light is controlled to selectively generate projected image pixels during a first portion of the pattern of scan lines, and to selectively generate depth mapping pulses during a second portion of the pattern of scan lines. The projected image pixels generate a projected image, while the depth mapping pulses are reflected from the surface, received, and used to generate a 3-dimensional point clouds that describe the measured surface depth at each point. Thus, during each scan of the pattern both a projected image and a surface depth map can be generated, with the surface depth map used to modify some portion of the projected pixels.

公开(公告)号：US09991147B2

公开(公告)日：2018-06-05

申请号：US14531263

申请日：2014-11-03

Applicant: Hermes Microvision Inc.

Inventor： Yi-Xiang Wang ,  Juying Dou ,  Kenichi Kanai

IPC: H01L21/683 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/20 ,  H01J37/28 ,  H01J37/317

CPC classification number: H01L21/6831 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/20 ,  H01J37/28 ,  H01J37/3174 ,  H01J2237/0044 ,  H01J2237/2008

Abstract: A wafer grounding apparatus and method adaptable to a charged particle beam apparatus is disclosed. A wafer substrate is supported by a wafer mount. A pulse current pin is arranged to be in contact with a backside film formed on a backside of the wafer substrate. A grounding pulse generator provides at least one pulse to drive the pulse current pin such that dielectric breakdown occurring at the backside film leads to establishment of a current path through the backside films. Accordingly, a current flows in the wafer substrate through this current path and then flows out of the wafer substrate via at least one current return path formed from capacitive coupling between the wafer substrate and the wafer mount.

公开(公告)号：US09953803B2

公开(公告)日：2018-04-24

申请号：US15049524

申请日：2016-02-22

Applicant: Hermes Microvision Inc.

Inventor： Wei Fang ,  Kevin Liu ,  Fei Wang ,  Jack Jau

IPC: H01J37/20 ,  H01J37/06

CPC classification number: H01J37/20 ,  H01J37/06 ,  H01J37/222 ,  H01J37/3045 ,  H01J2237/202 ,  H01J2237/2826 ,  H01L22/12

Abstract: A calibration method for calibrating the position error in the point of interest induced from the stage of the defect inspection tool is achieved by controlling the deflectors directly. The position error in the point of interest is obtained from the design layout database.

公开(公告)号：US09921056B2

公开(公告)日：2018-03-20

申请号：US15661270

申请日：2017-07-27

Applicant: Microvision, Inc.

Inventor： Jari Honkanen ,  P. Selvan Viswanathan

IPC: G01J5/02 ,  G01B11/25 ,  G01B11/22

CPC classification number: G01B11/2518 ,  G01S7/4817 ,  G01S7/4863 ,  G01S17/08 ,  G01S17/89

Abstract: Devices and methods are described that provide for scanning surfaces and generating 3-dimensional point clouds that describe the depth of the measured surface at each point. In general, the devices and methods utilize scanning mirror(s) that reflect a laser beam into a pattern of scan lines. When the raster pattern of scan lines is directed at a surface, reflections of the laser beam from the surface are received and used to the generate 3-dimensional point clouds that describe the measured surface depth at each point. The motion of the scanning mirror(s) can be dynamically adjusted to modify the characteristics of the resulting 3-dimensional point cloud of the surface. For example, the adjustment of the scanning mirror motion can modify the resolution or data density of the resulting 3-dimensional point cloud that describes the measured depths of the surface.

公开(公告)号：US20170309449A1

公开(公告)日：2017-10-26

申请号：US15633639

申请日：2017-06-26

Applicant: Hermes Microvision, Inc.

Inventor： Weiming REN ,  Shuai LI ,  Xuedong LIU ,  Zhongwei CHEN

IPC: H01J37/28 ,  H01J37/12 ,  H01J37/147

CPC classification number: H01J37/28 ,  H01J37/12 ,  H01J37/1472 ,  H01J2237/04924 ,  H01J2237/083 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/2817

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.