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公开(公告)号：US20120320373A1
公开(公告)日：2012-12-20
申请号：US13597553
申请日：2012-08-29
Applicant: Yoshimasa Oshima , Yuta Urano , Toshiyuki Nakao
Inventor： Yoshimasa Oshima , Yuta Urano , Toshiyuki Nakao
IPC: G01N21/88
CPC classification number: G01N21/9501 , G01N21/21 , G01N21/47 , G01N21/94 , G01N2021/4707 , G01N2021/4709 , G01N2021/8864
Abstract: An inspection method and apparatus for detecting defects or haze of a sample, includes illuminating light to the sample from an oblique direction relative to a surface of the sample with an illuminator, detecting first scattered light at a forward position relative to an illuminating direction from the sample with a first detector, detecting sec and scattered light at a sideward or backward position relative to the illuminating direction from the sample with a second detection, and processing a first signal of the first scattered light and a second signal of the second scattered light with different weighting for the first signal and for the second signal with a processor.
Abstract translation: 一种用于检测样品的缺陷或雾度的检查方法和装置，包括使用照明器从相对于样品表面的倾斜方向向样品照射光，从相对于照射方向的前方位置检测第一散射光， 采用第一检测器，利用第二检测从样品检测相对于照明方向的向后或向后位置处的秒和散射光，并且处理第一散射光的第一信号和第二散射光的第二信号， 对于第一信号和与处理器的第二信号的加权不同。
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公开(公告)号：US08310665B2
公开(公告)日：2012-11-13
申请号：US13404749
申请日：2012-02-24
Applicant: Akira Hamamatsu , Yoshimasa Oshima , Shunji Maeda , Hisae Shibuya , Yuta Urano , Toshiyuki Nakao , Shigenobu Maruyama
Inventor： Akira Hamamatsu , Yoshimasa Oshima , Shunji Maeda , Hisae Shibuya , Yuta Urano , Toshiyuki Nakao , Shigenobu Maruyama
IPC: G01N21/00
CPC classification number: G01B11/303 , G01N21/47 , G01N21/94 , G01N21/9501
Abstract: An inspecting method and apparatus for inspecting a substrate surface includes application of a light to the substrate surface, detection of scattered light or reflected light from the substrate surface due to the applied light at a plurality of positions to obtain a plurality of electrical signals, extraction of a signal in a mutually different frequency band from each of the plurality of electrical signals, and calculation of a value regarding a state of film of the substrate through an arithmetical operation process of a plurality of extracted signals in the frequency bands.
Abstract translation: 用于检查基板表面的检查方法和装置包括：由于在多个位置处施加的光，向基板表面施加光，检测散射光或来自基板表面的反射光，以获得多个电信号，提取 在与所述多个电信号中的每一个相互不同的频带中的信号的信号，以及通过所述频带中的多个提取的信号的算术运算处理来计算关于所述衬底的膜的状态的值。
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公开(公告)号：US20120275681A1
公开(公告)日：2012-11-01
申请号：US13505803
申请日：2010-11-05
Applicant: Toshifumi Honda , Hiroko Fujita , Muneo Maeshima , Akira Maekawa , Yoshiko Ishida , Yuta Urano , Shinya Murakami
Inventor： Toshifumi Honda , Hiroko Fujita , Muneo Maeshima , Akira Maekawa , Yoshiko Ishida , Yuta Urano , Shinya Murakami
IPC: G06K9/62
Abstract: When multiple kinds of bacterial colonies are present in a petri dish and, for example, a drug tolerance is to be measured, harvesting of mixed colonies of different types of bacteria makes it impossible to accurately determine the drug tolerance. Also, it is required to improve the throughput of a device for harvesting a bacterial colony. From images illuminated from multiple directions, isolating bacterial colonies are automatically extracted. Next, the image feature amounts are calculated from the multiple images that are illuminated from multiple directions and colonies are grouped depending on the feature amounts. Then, bacterial colonies to be harvested are determined based on the results of the grouping.
Abstract translation: 当培养皿中存在多种细菌菌落时，例如测定药物耐受性时，收集不同类型细菌的混合菌落使得不可能准确地确定药物耐受性。 此外，需要提高用于收获细菌菌落的装置的产量。 从多个方向照射的图像，分离细菌菌落被自动提取。 接下来，根据从多个方向照明的多个图像计算图像特征量，并且根据特征量对殖民地进行分组。 然后，基于分组的结果确定要收获的细菌菌落。
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公开(公告)号：US20110063603A1
公开(公告)日：2011-03-17
申请号：US12950243
申请日：2010-11-19
Applicant: Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
Inventor： Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
CPC classification number: G01N21/94 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/9513 , G01N2021/95638 , H01L22/12
Abstract: A defect inspection apparatus includes a movable stage for mounting a substrate having circuit patterns as an object of inspection, an irradiation optical system which irradiates a slit-shaped light beam from an oblique direction to the circuit patterns of the substrate, a detection optical system which includes an image sensor for receiving reflected/scattered light from the substrate by irradiation of the slit-shaped light beam and converting the received light into a signal, and an image processor which processes the signal. The irradiation optical system includes a cylindrical lens and a coherency reduction optical system, which receives the light beam and emits a plurality of slit-shaped light sub-beams which are spatially reduced in coherency in a light-converging direction of the cylindrical lens. The cylindrical lens focuses the plurality of slit-shaped light sub-beams into the slit-shaped light beam irradiated to the surface of the substrate.
Abstract translation: 缺陷检查装置包括：可移动台，用于安装具有作为检查对象的电路图案的基板;照射光学系统，其将来自倾斜方向的狭缝状光束照射到基板的电路图案;检测光学系统， 包括图像传感器，用于通过照射狭缝状光束并将接收到的光转换成信号来从基板接收反射/散射光，以及处理该信号的图像处理器。 照射光学系统包括柱面透镜和相干性降低光学系统，其接收光束并发射在柱面透镜的聚光方向上空间相减的多个狭缝状光子束。 柱面透镜将多个狭缝状光子束聚焦成照射到基板表面的狭缝状光束。
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公开(公告)号：US20100271626A1
公开(公告)日：2010-10-28
申请号：US12830922
申请日：2010-07-06
Applicant: Izuo HORAI , Hirokazu Koyabu , Yuta Urano , Takahiro Jingu
Inventor： Izuo HORAI , Hirokazu Koyabu , Yuta Urano , Takahiro Jingu
IPC: G01N21/00
CPC classification number: G01N21/9501 , G01N21/65 , G01N21/9505 , G01N2021/4711 , G01N2021/473 , G01N2021/8861 , G01N2021/8864
Abstract: An inspection method and an inspection device, or apparatus each capable of conducting composition analysis of a defect detected by elastic or stokes scattered light, an inspection surface or defect on the surface of the inspection surface, or a defect on the surface of the inspection object and its internal composition. A surface inspection method for optically detecting elastic or stokes scattering or inelastic or anti-stokes scattered light from inside the surface of the inspection object, for detecting existence of defects of the inspection object and features of the defects, for detecting positions of the detected defects on the surface of the inspection object, classifying and analyzing the detected defects in accordance with their features on the basis of the positions of the defects and the features of the defects or the classification result of the defects.
Abstract translation: 检查方法和检查装置或装置，其能够对由检查表面的弹性或sto kes散射光，检查面或缺陷检测到的缺陷或检查对象的表面上的缺陷进行组成分析 及其内在组成。 一种表面检查方法，用于光学检测来自检查对象的表面内的弹性或斯托克斯散射或非弹性或反射散射光，用于检测检查对象的缺陷的存在和缺陷的特征，用于检测检测到的缺陷的位置 在检查对象的表面上，根据缺陷的位置和缺陷的特征或缺陷的分类结果，根据其特征对检测到的缺陷进行分类和分析。
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Patent Agency Ranking
公开(公告)号：US20090279081A1
公开(公告)日：2009-11-12
申请号：US12412776
申请日：2009-03-27
Applicant: Yuta Urano , Toshiyuki Nakao , Yoshimasa Oshima , Akira Hamamatsu
Inventor： Yuta Urano , Toshiyuki Nakao , Yoshimasa Oshima , Akira Hamamatsu
IPC: G01N21/896
CPC classification number: G01N21/9501 , G01N21/9505 , G01N2021/8854 , G01N2021/8874 , G01N2201/103 , G01N2201/1045
Abstract: A defect inspection apparatus for inspecting a surface of a sample includes a stage for holding the sample, an illumination optical system that irradiates a laser beam to form a linear illuminated area on the surface of the sample, a detection optical system, and a signal processing system. The detection optical system includes a detector device having a plurality of pixels for detecting light scattered from the linear illuminated area of the surface of the sample, and that outputs in parallel a plurality of detection signals having mutually different sensitivities acquired from the plurality of pixels of the detector device. The signal processing system selects an unsaturated detection signal from the plurality of detection signals and detects a defect in accordance with the selected detection signal.
Abstract translation: 用于检查样品表面的缺陷检查装置包括用于保持样品的载物台，照射光学系统，其照射激光束以在样品的表面上形成线性照射区域，检测光学系统和信号处理 系统。 检测光学系统包括具有多个像素的检测器装置，用于检测从样品表面的线性照射区域散射的光，并且并行地输出具有从多个像素获得的具有相互不同的灵敏度的多个检测信号 检测器装置。 信号处理系统从多个检测信号中选择不饱和检测信号，并根据所选择的检测信号检测缺陷。
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公开(公告)号：US20090122303A1
公开(公告)日：2009-05-14
申请号：US12328357
申请日：2008-12-04
Applicant: Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
Inventor： Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
IPC: G01N21/88
CPC classification number: G01N21/94 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/9513 , G01N2021/95638 , H01L22/12
Abstract: A defect inspection apparatus includes a movable stage for mounting a substrate having circuit patterns as an object of inspection, an irradiation optical system which irradiates a slit-shaped light beam from an oblique direction to the circuit patterns of the substrate, a detection optical system which includes an image sensor for receiving reflected/scattered light from the substrate by irradiation of the slit-shaped light beam and converting the received light into a signal, and an image processor which processes the signal. The irradiation optical system includes a cylindrical lens and a coherency reduction optical system, which receives the light beam and emits a plurality of slit-shaped light sub-beams which are spatially reduced in coherency in a light-converging direction of the cylindrical lens. The cylindrical lens focuses the plurality of slit-shaped light sub-beams into the slit-shaped light beam irradiated to the surface of the substrate.
Abstract translation: 缺陷检查装置包括：可移动台，用于安装具有作为检查对象的电路图案的基板;照射光学系统，其将来自倾斜方向的狭缝状光束照射到基板的电路图案;检测光学系统， 包括图像传感器，用于通过照射狭缝状光束并将接收到的光转换成信号来从基板接收反射/散射光，以及处理该信号的图像处理器。 照射光学系统包括柱面透镜和相干性降低光学系统，其接收光束并发射在柱面透镜的聚光方向上空间相减的多个狭缝状光子束。 柱面透镜将多个狭缝状光子束聚焦成照射到基板表面的狭缝状光束。
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公开(公告)号：US07333192B2
公开(公告)日：2008-02-19
申请号：US11653322
申请日：2007-01-16
Applicant: Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
Inventor： Hiroyuki Nakano , Akira Hamamatsu , Sachio Uto , Yoshimasa Oshima , Hidetoshi Nishiyama , Yuta Urano , Shunji Maeda
IPC: G01N21/88
CPC classification number: G01N21/94 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/9513 , G01N2021/95638 , H01L22/12
Abstract: A defect inspection apparatus includes an irradiation optical system 20, a detection optical system 30, and an image processor 40. In the irradiation optical system, a mirror 2603 is disposed to reflect downward a beam flux that has been guided to a first or second optical path, and a cylindrical lens 251 and an inclined mirror 2604 are disposed to focus the beam flux that has been directed downward by the mirror, at an inclination angle from a required oblique direction extending horizontally, onto a substrate 1 to be inspected, as a slit-shaped beam 90.
Abstract translation: 缺陷检查装置包括照射光学系统20，检测光学系统30和图像处理器40。 在照射光学系统中，设置反射镜2603以向下反射已经被引导到第一或第二光路的光束，并且设置柱面透镜251和倾斜镜2604以聚焦已导向的光束 作为狭缝状光束90，通过反射镜向下倾斜，从与水平方向延伸的所需倾斜方向倾斜的角度，到被检查的基板1上。
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公开(公告)号：US08958062B2
公开(公告)日：2015-02-17
申请号：US13701834
申请日：2011-07-01
Applicant: Yukihiro Shibata , Toshiyuki Nakao , Yuta Urano , Toshifumi Honda
Inventor： Yukihiro Shibata , Toshiyuki Nakao , Yuta Urano , Toshifumi Honda
IPC: G01N21/00 , G01N21/956 , G01N21/88 , G01N21/95
CPC classification number: G01N21/956 , G01N21/8806 , G01N21/9501
Abstract: In order to enable inspections to be conducted at a sampling rate higher than the pulse oscillation frequency of a pulsed laser beam emitted from a laser light source, without damaging samples, a defect inspection method is disclosed, wherein: a single pulse of a pulsed laser beam emitted from the laser light source is split into a plurality of pulses; a sample is irradiated with this pulse-split pulsed laser beam; scattered light produced by the sample due to the irradiation is focused and detected; and defects on the sample are detected by using information obtained by focusing and detecting the scattered light from the sample. Said defect inspection method is configured such that the splitting a single pulse of the pulsed laser beam into a plurality of pulses is controlled in such a manner that the peak values of the split pulses are substantially uniform.
Abstract translation: 为了使得能够以高于从激光光源发射的脉冲激光束的脉冲振荡频率的采样率进行检查，而不损害样品，公开了一种缺陷检查方法，其中：脉冲激光的单个脉冲 从激光光源发射的光束被分成多个脉冲; 用脉冲分割脉冲激光束照射样品; 聚焦和检测由于照射产生的样品产生的散射光; 通过使用通过聚焦和检测来自样品的散射光获得的信息来检测样品上的缺陷。 所述缺陷检查方法被配置为使得将脉冲激光束的单个脉冲分裂成多个脉冲以使得分离脉冲的峰值基本上均匀的方式被控制。
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公开(公告)号：US08711347B2
公开(公告)日：2014-04-29
申请号：US13701030
申请日：2011-05-25
Applicant: Toshifumi Honda , Yuta Urano , Yukihiro Shibata , Toshiyuki Nakao
Inventor： Toshifumi Honda , Yuta Urano , Yukihiro Shibata , Toshiyuki Nakao
IPC: G01N21/00
CPC classification number: G01N21/8806 , G01N21/9501 , G01N2021/8874
Abstract: Disclosed is a defect inspection method which makes it possible to scan the entire surface of a sample and detect minute defects without causing thermal damage to the sample. A defect inspection method in which a pulse laser emitted from a light source is subjected to pulse division and irradiated on the surface of a sample which moves in one direction while the divided-pulse pulse laser is rotated, reflection light from the sample irradiated by the divided-pulse pulse laser is detected, the signal of the detected reflection light is processed to detect defects on the sample, and information regarding a detected defect is output to a display screen, wherein the barycentric position of the light intensity of the divided-pulse pulse laser is monitored and adjusted.
Abstract translation: 公开了一种缺陷检查方法，其可以扫描样品的整个表面并检测微小缺陷而不会对样品造成热损伤。 对从光源射出的脉冲激光进行脉冲分割并照射在分割脉冲激光器旋转时在一个方向上移动的样品的表面的缺陷检查方法中， 检测出分割脉冲脉冲激光，检测出反射光的信号，以检测样本上的缺陷，将与检测到的缺陷有关的信息输出到显示画面，其中分割脉冲的光强度的重心位置 脉冲激光被监测和调整。
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