公开(公告)号：US20230050169A1

公开(公告)日：2023-02-16

申请号：US17977651

申请日：2022-10-31

Applicant: Applied Materials, Inc.

Inventor： David Alexander BRITZ ,  Lance A. SCUDDER ,  Yuriy MELNIK ,  Sukti CHATTERJEE

IPC: C23C16/34 ,  C23C16/455 ,  C23C28/04 ,  C23C16/40 ,  C23C16/50

Abstract: Embodiments of the present disclosure generally relate to protective coatings on various substrates including aerospace components and methods for depositing the protective coatings. In one or more embodiments, an aerospace component has a protective coating containing an aluminum oxide layer disposed on a surface of the aerospace component, a metal-containing catalytic layer disposed on the aluminum oxide layer, and a boron nitride layer disposed on the metal-containing catalytic layer. The aerospace component contains a superalloy having at least nickel and aluminum. In some examples, the aerospace component is a turbine blade, a turbine vane, a support member, a frame, a rib, a fin, a pin fin, a fuel nozzle, a combustor liner, a combustor shield, a heat exchanger, a fuel line, a fuel valve, an internal cooling channel, or any combination thereof.

公开(公告)号：US20220055772A1

公开(公告)日：2022-02-24

申请号：US17404823

申请日：2021-08-17

Applicant: Applied Materials, Inc.

Inventor： Sukti CHATTERJEE ,  Lance A. SCUDDER ,  Yuriy MELNIK ,  Kenichi OHNO ,  Eric H. LIU ,  David Alexander BRITZ

IPC: B64F5/30 ,  B08B7/00

Abstract: Embodiments of the present disclosure generally relate to methods for cleaning aerospace components having oxidation, corrosion, contaminants, and/or other degradations. In one or more embodiments, a cleaning method includes positioning the aerospace component into a processing region of a processing chamber, introducing hydrogen gas into the processing region, maintaining the processing region at a pressure of about 100 mTorr to about 5,000 mTorr, and heating the aerospace component at a temperature of about 500° C. to about 1,200° C. for about 0.5 hours to about 24 hours to produce a cleaned surface on the aerospace component. In other embodiments, a cleaning method includes exposing the aerospace component to ozone while maintaining the aerospace component at a temperature of about 15° C. to about 500° C. for 0.25 hours to about 24 hours to produce a cleaned surface on the aerospace component.

公开(公告)号：US20210262099A1

公开(公告)日：2021-08-26

申请号：US17313858

申请日：2021-05-06

Applicant: Applied Materials, Inc.

Inventor： David BRITZ ,  Pravin K. NARWANKAR ,  David THOMPSON ,  Yuriy MELNIK ,  Sukti CHATTERJEE

IPC: C23C28/00 ,  F01D5/28 ,  F01D5/18 ,  C23C16/455

Abstract: Using the systems and methods discussed herein, CMAS corrosion is inhibited via CMAS interception in an engine environment and/or is prevented or reduced by the formation of a metal oxide protective coating on a hot engine section component. The CMAS interception can occur while the engine is in operation in flight or in a testing or quality control environment. The metal oxide protective coating can be applied over other coatings, including Gd-zirconates (GZO) or yttria-stabilized zirconia (YSZ). The metal oxide protective coating is applied at original equipment manufacturers (OEM) and can also be applied in-situ using a gas injection system during engine use in-flight or during maintenance or quality testing. The metal oxide protective coating contains a rare earth element, aluminum, zirconium, chromium, or combinations thereof.

公开(公告)号：US20210071299A1

公开(公告)日：2021-03-11

申请号：US16670555

申请日：2019-10-31

Applicant: Applied Materials, Inc.

Inventor： Kenichi OHNO ,  Eric H. LIU ,  Sukti CHATTERJEE ,  Yuriy MELNIK ,  Thomas KNISLEY ,  David Alexander BRITZ ,  Lance A. SCUDDER ,  Pravin K. NARWANKAR

IPC: C23C16/455 ,  C23C16/02 ,  C23C16/40 ,  C23C16/56

Abstract: Embodiments of the present disclosure generally relate to protective coatings on substrates and methods for depositing the protective coatings. In one or more embodiments, a method of forming a protective coating on a substrate includes depositing a chromium oxide layer containing amorphous chromium oxide on a surface of the substrate during a first vapor deposition process and heating the substrate containing the chromium oxide layer comprising the amorphous chromium oxide to convert at least a portion of the amorphous chromium oxide to crystalline chromium oxide during a first annealing process. The method also includes depositing an aluminum oxide layer containing amorphous aluminum oxide on the chromium oxide layer during a second vapor deposition process and heating the substrate containing the aluminum oxide layer disposed on the chromium oxide layer to convert at least a portion of the amorphous aluminum oxide to crystalline aluminum oxide during a second annealing process.

公开(公告)号：US20200240018A1

公开(公告)日：2020-07-30

申请号：US16843358

申请日：2020-04-08

Applicant: Applied Materials, Inc.

Inventor： Yuriy MELNIK ,  Sukti CHATTERJEE ,  Kaushal GANGAKHEDKAR ,  Jonathan FRANKEL ,  Lance A. SCUDDER ,  Pravin K. NARWANKAR ,  David Alexander BRITZ ,  Thomas KNISLEY ,  Mark SALY ,  David THOMPSON

IPC: C23C16/455 ,  C23C16/34 ,  C23C16/40 ,  C23C16/30 ,  C23C16/56 ,  F01D5/28 ,  F01D9/02 ,  F01D25/12 ,  F01D25/14 ,  F01D25/28 ,  F23R3/28

Abstract: Protective coatings on an aerospace component are provided. An aerospace component includes a surface containing nickel, nickel superalloy, aluminum, chromium, iron, titanium, hafnium, alloys thereof, or any combination thereof, and a coating disposed on the surface, where the coating contains a nanolaminate film stack having two or more pairs of a first deposited layer and a second deposited layer. The first deposited layer contains chromium oxide, chromium nitride, aluminum oxide, aluminum nitride, or any combination thereof, the second deposited layer contains aluminum oxide, aluminum nitride, silicon oxide, silicon nitride, silicon carbide, yttrium oxide, yttrium nitride, yttrium silicon nitride, hafnium oxide, hafnium nitride, hafnium silicide, hafnium silicate, titanium oxide, titanium nitride, titanium silicide, titanium silicate, or any combination thereof, and the first deposited layer and the second deposited layer have different compositions from each other.

公开(公告)号：US20190330746A1

公开(公告)日：2019-10-31

申请号：US16283567

申请日：2019-02-22

Applicant: Applied Materials, Inc.

Inventor： David BRITZ ,  Pravin K. NARWANKAR ,  David THOMPSON ,  Yuriy MELNIK ,  Sukti CHATTERJEE

IPC: C23C28/04 ,  C23C16/40 ,  C23C14/08 ,  F01D5/28

Abstract: Using the systems and methods discussed herein, CMAS corrosion is inhibited via CMAS interception in an engine environment and/or is prevented or reduced by the formation of a metal oxide protective coating on a hot engine section component. The CMAS interception can occur while the engine is in operation in flight or in a testing or quality control environment. The metal oxide protective coating can be applied over other coatings, including Gd-zirconates (GZO) or yttria-stabilized zirconia (YSZ). The metal oxide protective coating is applied at original equipment manufacturers (OEM) and can also be applied in-situ using a gas injection system during engine use in-flight or during maintenance or quality testing. The metal oxide protective coating contains a rare earth element, aluminum, zirconium, chromium, or combinations thereof, and is from 1 nm to 3 microns in thickness.

公开(公告)号：US20190119810A1

公开(公告)日：2019-04-25

申请号：US16137797

申请日：2018-09-21

Applicant: Applied Materials, Inc.

Inventor： Ranga Rao ARNEPALLI ,  Colin Costano NEIKIRK ,  Yuriy MELNIK ,  Suresh Chand SETH ,  Pravin K. NARWANKAR ,  Sukti CHATTERJEE ,  Lance A. SCUDDER

IPC: C23C16/02 ,  C23C16/455 ,  C23C16/50

Abstract: Methods of removing native oxide layers and depositing dielectric layers having a controlled number of active sites on MEMS devices for biological applications are disclosed. In one aspect, a method includes removing a native oxide layer from a surface of the substrate by exposing the substrate to one or more ligands in vapor phase to volatize the native oxide layer and then thermally desorbing or otherwise etching the volatized native oxide layer. In another aspect, a method includes depositing a dielectric layer selected to provide a controlled number of active sites on the surface of the substrate. In yet another aspect, a method includes both removing a native oxide layer from a surface of the substrate by exposing the substrate to one or more ligands and depositing a dielectric layer selected to provide a controlled number of active sites on the surface of the substrate.

公开(公告)号：US20180148833A1

公开(公告)日：2018-05-31

申请号：US15800266

申请日：2017-11-01

Applicant: APPLIED MATERIALS, INC.

Inventor： Sukti CHATTERJEE ,  LANCE SCUDDER ,  ERIC H. LIU ,  PRAVIN K. NARWANKAR ,  PRAMIT MANNA ,  ABHIJIT MALLICK

IPC: C23C16/448 ,  H01L21/02 ,  C23C16/24 ,  C23C16/32 ,  C23C16/34 ,  C23C16/40 ,  C23C16/56 ,  C23C16/52

CPC classification number: C23C16/448 ,  C23C16/24 ,  C23C16/325 ,  C23C16/345 ,  C23C16/401 ,  C23C16/52 ,  C23C16/56 ,  H01L21/02126 ,  H01L21/02167 ,  H01L21/0217 ,  H01L21/02211 ,  H01L21/02216 ,  H01L21/02219 ,  H01L21/02277 ,  H01L21/0228 ,  H01L21/02337 ,  H01L21/02348 ,  H01L21/02529 ,  H01L21/02532 ,  H01L21/0262 ,  H01L21/02664

Abstract: In some embodiments, a method of processing a substrate disposed within a processing volume of a hot wire chemical vapor deposition (HWCVD) process chamber, includes: (a) providing a silicon containing precursor gas into the processing volume, the silicon containing precursor gas is provided into the processing volume from an inlet located a first distance above a surface of the substrate; (b) breaking hydrogen-silicon bonds within molecules of the silicon containing precursor via introduction of hydrogen radicals to the processing volume to deposit a flowable silicon containing layer atop the substrate, wherein the hydrogen radicals are formed by flowing a hydrogen containing gas over a plurality of wires disposed within the processing volume above the substrate and the inlet.