公开(公告)号：US20220397834A1

公开(公告)日：2022-12-15

申请号：US17774743

申请日：2020-10-20

Applicant: ASML Netherlands B.V.

Inventor： Johan REININK ,  Jeroen COTTAAR ,  Sjoerd Nicolaas Lambertus DONDERS ,  Sietse Thijmen VAN DER POST

IPC: G03F9/00 ,  G03F7/20

Abstract: Apparatus and method for measuring one or more parameters of a substrate (300) using source radiation emitted from a radiation source (100) and directed onto the substrate. The apparatus comprises at least one reflecting element (710a) and at least one detector (720, 721). The at least one reflecting element is configured to receive a reflected radiation resulting from reflection of the source radiation from the substrate and further reflect the reflected radiation into a further reflected radiation. The at least one detector is configured for measurement of the further reflected radiation for determination of at least an alignment of the source radiation and/or the substrate

公开(公告)号：US20210173294A1

公开(公告)日：2021-06-10

申请号：US17119331

申请日：2020-12-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf KEMPER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Joost Jeroen OTTENS ,  Edwin Cornelis KADIJK ,  Sergei SHULEPOV

IPC: G03B27/42 ,  G03F7/20

Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.

公开(公告)号：US20210114101A1

公开(公告)日：2021-04-22

申请号：US17138480

申请日：2020-12-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Sjoerd Nicolaas Lambertus DONDERS ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE ,  Elisabeth Corinne RODENBURG

IPC: B22F7/06 ,  B23K26/354 ,  B23K26/342 ,  G03F7/20 ,  B22F10/00 ,  B23Q3/18 ,  B05D3/06 ,  B05D5/00 ,  B33Y10/00 ,  B33Y80/00

Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

公开(公告)号：US20200225590A1

公开(公告)日：2020-07-16

申请号：US16707525

申请日：2019-12-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Joeri LOF ,  Erik Theodorus Maria BIJLAART ,  Hans BUTLER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Aleksey Yurievich KOLESNYCHENKO ,  Erik Roelof LOOPSTRA ,  Hendricus Johannes Maria MEIJER ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS ,  Roelof Aeilko Siebrand RITSEMA ,  Frank VAN SCHAIK ,  Timotheus Franciscus SENGERS ,  Klaus SIMON ,  Joannes Theodoor DE SMIT ,  Alexander STRAAIJER ,  Bob STREEFKERK ,  Helmar VAN SANTEN ,  Antonius Theodorus Anna Maria DERKSEN ,  Hans JANSEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY

IPC: G03F7/20

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

公开(公告)号：US20180129143A1

公开(公告)日：2018-05-10

申请号：US15862604

申请日：2018-01-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Christiaan Alexander HOOGENDAM ,  Antonius Theodorus Anna Maria DERKSEN ,  Sjoerd Nicolaas Lambertus DONDERS ,  Joeri LOF ,  Erik Roelof LOOPSTRA ,  Johannes Catharinus Hubertus MULKENS ,  Hans JANSEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Alexander STRAAIJER ,  Bob STREEFKERK

IPC: G03F7/20

Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

公开(公告)号：US20170312826A1

公开(公告)日：2017-11-02

申请号：US15654413

申请日：2017-07-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Sjoerd Nicolaas Lambertus DONDERS ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE ,  Elisabeth Corinne RODENBURG

IPC: B22F7/06 ,  B33Y10/00 ,  G03F7/20 ,  B23Q3/18 ,  B23K26/00 ,  B22F3/105 ,  B05D5/00 ,  B05D3/06 ,  B23K26/342 ,  B33Y80/00

CPC classification number: B22F7/062 ,  B05D3/06 ,  B05D5/00 ,  B22F3/1055 ,  B23K26/342 ,  B23K26/354 ,  B23Q3/18 ,  B33Y10/00 ,  B33Y80/00 ,  G03F7/20 ,  G03F7/70341 ,  G03F7/70416 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/708

Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.

公开(公告)号：US20170176876A1

公开(公告)日：2017-06-22

申请号：US15452403

申请日：2017-03-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Timotheus Franciscus SENGERS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Hans JANSEN ,  Arjen BOOGAARD

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/70591 ,  G03F7/7085 ,  G03F7/7095

Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.

公开(公告)号：US20170139333A1

公开(公告)日：2017-05-18

申请号：US15417005

申请日：2017-01-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcel Mathijs Theodore Marie DIERICHS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Johannes Henricus Wilhelmus JACOBS ,  Hans JANSEN ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Marco Koert STAVENGA ,  Bob STREEFKERK ,  Martinus Cornelis Maria VERHAGEN ,  Lejla SEUNTIENS-GRUDA

IPC: G03F7/20 ,  C02F1/20 ,  B01D19/00

CPC classification number: G03F7/70866 ,  B01D19/0031 ,  B01D61/025 ,  B01D61/24 ,  C02F1/04 ,  C02F1/20 ,  C02F1/28 ,  C02F1/283 ,  C02F1/32 ,  C02F1/42 ,  C02F1/441 ,  C02F2103/40 ,  G03F7/2041 ,  G03F7/70341

Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced.

公开(公告)号：US20170102621A1

公开(公告)日：2017-04-13

申请号：US15385584

申请日：2016-12-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Joeri LOF ,  Hans BUTLER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Aleksey Yurievich KOLESNYCHENKO ,  Erik Roelof LOOPSTRA ,  Hendricus Johannes Maria MEIJER ,  Johannes Catherinus Hubertus MULKENS ,  Roelof Aeilko Siebranc RITSEMA ,  Frank VAN SCHAIK ,  Timotheus Franciscus SENGERS ,  Klaus SIMON ,  Joannes Theodoor DE SMIT ,  Alexander STRAAIJER ,  Bob STREEFKERK ,  Erik Theodorus Maria BIJLAART ,  Christiaan Alexander HOOGENDAM ,  Helmar VAN SANTEN ,  Marcus Adrianus VAN DE KERKHOF ,  Mark KROON ,  Arie Jeffrey DEN BOEF ,  Joost Jeroen OTTENS ,  Jeroen Johannes Sophia Maria MERTENS

IPC: G03F7/20

CPC classification number: G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.

公开(公告)号：US20170036272A1

公开(公告)日：2017-02-09

申请号：US15296968

申请日：2016-10-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Sjoerd Nicolaas Lambertus DONDERS ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE ,  Elisabeth Corinne RODENBURG

IPC: B22F7/06 ,  B33Y80/00 ,  B33Y10/00 ,  G03F7/20 ,  B22F3/105

CPC classification number: B22F7/062 ,  B05D3/06 ,  B05D5/00 ,  B22F3/1055 ,  B23K26/342 ,  B23K26/354 ,  B23Q3/18 ,  B33Y10/00 ,  B33Y80/00 ,  G03F7/20 ,  G03F7/70341 ,  G03F7/70416 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/708

Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.

Abstract translation: 用于光刻设备的物体保持器具有具有表面的主体。 在薄膜堆叠的表面上或孔中形成有用于支撑物体的多个毛刺。 通过激光烧结形成至少一个毛刺。 通过激光烧结形成的毛刺中的至少一个可以是先前通过激光烧结形成的损坏的隆起的修复或其他方法。