公开(公告)号：US09753383B2

公开(公告)日：2017-09-05

申请号：US14409048

申请日：2013-06-13

Applicant: ASML Netherlands B.V.

Inventor： Michel Riepen ,  Dzmitry Labetski ,  Wilbert Jan Mestrom ,  Wim Ronald Kampinga ,  Jan Okke Nieuwenkamp ,  Jacob Brinkert ,  Henricus Jozef Castelijns ,  Nicolaas Ten Kate ,  Hendrikus Gijsbertus Schimmel ,  Hans Jansen ,  Dennis Jozef Maria Paulussen ,  Brian Vernon Virgo ,  Reinier Theodorus Martinus Jilisen ,  Ramin Badie ,  Albert Pieter Rijpma ,  Johannes Christiaan Leonardus Franken ,  Peter Van Putten ,  Gerrit Van Der Straaten

IPC: G03F7/20 ,  G21K5/08 ,  F15D1/00 ,  G21K1/06 ,  H05G2/00

CPC classification number: G03F7/70983 ,  F15D1/0065 ,  G03F7/70033 ,  G03F7/70916 ,  G21K1/06 ,  G21K5/08 ,  H05G2/005 ,  H05G2/008 ,  Y10T137/206

Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

公开(公告)号：US20160370713A1

公开(公告)日：2016-12-22

申请号：US15250658

申请日：2016-08-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcel BECKERS ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Ferdy Migchelbrink ,  Elmar Evers

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/70808

Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.

公开(公告)号：US09442395B2

公开(公告)日：2016-09-13

申请号：US14374197

申请日：2013-01-17

Applicant: ASML Netherlands B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade ,  Elisabeth Corinne Rodenburg

IPC: G03B27/58 ,  G03F7/20 ,  B23Q3/18 ,  B05D3/06 ,  B05D5/00 ,  B23K26/00

CPC classification number: B22F7/062 ,  B05D3/06 ,  B05D5/00 ,  B22F3/1055 ,  B23K26/342 ,  B23K26/354 ,  B23Q3/18 ,  B33Y10/00 ,  B33Y80/00 ,  G03F7/20 ,  G03F7/70341 ,  G03F7/70416 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/708

Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

Abstract translation: 用于光刻设备的衬底保持器具有设置在其表面上的薄膜堆叠的主体。 薄膜堆叠形成诸如电极，传感器，加热器，晶体管或逻辑器件的电子或电气部件，并且具有顶部隔离层。 在薄膜叠层或薄膜叠层的孔中形成有用于支撑衬底的多个毛刺。

公开(公告)号：US09268238B2

公开(公告)日：2016-02-23

申请号：US14690032

申请日：2015-04-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Ten Kate ,  Raymond Wilhelmus Louis Lafarre

IPC: G03B27/52 ,  G03B27/58 ,  G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341

Abstract: A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.

公开(公告)号：US20150309420A1

公开(公告)日：2015-10-29

申请号：US14664360

申请日：2015-03-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Marcel BECKERS ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Nicolaas Rudolf Kemper ,  Ferdy Migchelbrink ,  Elmar Evers

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/70808

Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.

Abstract translation: 用于浸没式光刻设备的液体供应系统在投影系统的最终元件和基底之间提供浸液的层流。 控制系统使溢出的机会最小化，并且提取器包括被配置为使振动最小化的出口阵列。

公开(公告)号：US11807937B2

公开(公告)日：2023-11-07

申请号：US16969088

申请日：2019-02-26

Applicant: ASML Netherlands B.V.

Inventor： Sonia Castellanos Ortega ,  Jan Verhoeven ,  Joost Wilhelmus Maria Frenken ,  Pavlo Antonov ,  Nicolaas Ten Kate ,  Olivier Christian Maurice Lugier

IPC: C23C16/04 ,  C23C16/26 ,  C23C16/48 ,  H01L21/02 ,  H01L29/16

CPC classification number: C23C16/047 ,  C23C16/26 ,  C23C16/482 ,  C23C16/483 ,  H01L21/02527 ,  H01L21/02636 ,  H01L29/1606

Abstract: Methods and apparatus for forming a patterned layer of carbon are disclosed. In one arrangement, a selected portion of a surface of a solid structure is irradiated with extreme ultraviolet radiation in the presence of a carbon-containing precursor. The radiation interacts with the solid structure in the selected portion to cause formation of a layer of carbon in the selected portion from the carbon-containing precursor. The layer of carbon is formed in a pattern defined by the selected portion.

公开(公告)号：US11720034B2

公开(公告)日：2023-08-08

申请号：US16604976

申请日：2018-01-31

Applicant: ASML Netherlands B.V.

Inventor： Gosse Charles De Vries ,  Nicolaas Ten Kate

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70891

Abstract: A lithographic apparatus arranged to project a pattern from a patterning device onto a substrate, comprising at least one housing comprising at least one internal wall, at least one optical component arranged within at least one chamber defined at least in part by the at least one internal wall and configured to receive a radiation beam and a cooling apparatus arranged to cool at least a portion of the at least one internal wall to a temperature below that of the at least one optical component.

公开(公告)号：US11630399B2

公开(公告)日：2023-04-18

申请号：US17698100

申请日：2022-03-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Ten Kate ,  Joost Jeroen Ottens ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Robbert Jan Voogd ,  Giovanni Francisco Nino ,  Marinus Jan Remie ,  Johannes Henricus Wilhelmus Jacobs ,  Thibault Simon Mathieu Laurent ,  Johan Gertrudis Cornelis Kunnen

IPC: G03F7/20

Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

公开(公告)号：US10372044B2

公开(公告)日：2019-08-06

申请号：US15856133

申请日：2017-12-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Ten Kate ,  Raymond Wilhelmus Louis Lafarre

IPC: G03F7/20

Abstract: A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.

公开(公告)号：US10254660B2

公开(公告)日：2019-04-09

申请号：US15994492

申请日：2018-05-31

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20 ,  H01L21/687 ,  C23C16/44

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.