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公开(公告)号：US07372548B2
公开(公告)日：2008-05-13
申请号：US11218620
申请日：2005-09-06
CPC分类号： G03F7/70066 , G03F7/70758 , G03F7/70816 , G03F7/70825 , H02K41/03 , H02K2201/18
摘要： A method, apparatus, and system for controlling a reticle-masking blade in a photolithography system. A reticle-masking blade is supported with a reticle-masking blade carriage assembly. The reticle-masking blade carriage assembly is levitated at a position with respect to a reference frame and at an orientation with respect to the reference frame. Preferably, the reticle-masking blade carriage assembly is electromagnetically levitated. At least one of the position and the orientation of the reticle-masking blade carriage assembly is measured. At least one of the position and the orientation of the reticle-masking blade carriage assembly is controlled. Optionally, the reticle-masking blade carriage assembly is moved within a dimension within a range defined by the reference frame. The dimension can be two dimensions. The movement of the reticle-masking blade carriage assembly can be controlled.
摘要翻译： 一种用于在光刻系统中控制掩模掩模刀片的方法，装置和系统。 掩模版掩模刀片由掩模版掩模刀片托架组件支撑。 掩模版掩模刀片托架组件相对于参考框架在相对于参考框架的取向处悬浮。 优选地，掩模掩模刮板滑架组件是电磁悬浮的。 测量掩模版掩模片滑架组件的位置和取向中的至少一个。 掩模版掩模刀片支架组件的位置和取向中的至少一个被控制。 可选地，掩模版掩模刮板滑架组件在由参考框限定的范围内的尺寸内移动。 尺寸可以是两个维度。 可以控制掩模掩模刮板托架组件的运动。
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公开(公告)号：US07359037B2
公开(公告)日：2008-04-15
申请号：US11128315
申请日：2005-05-13
CPC分类号： G03F7/70066 , G03F7/70758 , G03F7/70816 , G03F7/70825 , H02K41/03 , H02K2201/18
摘要： A method, apparatus, and system for controlling a reticle-masking blade in a photolithography system. A reticle-masking blade is supported with a reticle-masking blade carriage assembly. The reticle-masking blade carriage assembly is levitated at a position with respect to a reference frame and at an orientation with respect to the reference frame. Preferably, the reticle-masking blade carriage assembly is electromagnetically levitated. At least one of the position and the orientation of the reticle-masking blade carriage assembly is measured. At least one of the position and the orientation of the reticle-masking blade carriage assembly is controlled. Optionally, the reticle-masking blade carriage assembly is moved within a dimension within a range defined by the reference frame. The dimension can be two dimensions. The movement of the reticle-masking blade carriage assembly can be controlled.
摘要翻译： 一种用于在光刻系统中控制掩模掩模刀片的方法，装置和系统。 掩模版掩模刀片由掩模版掩模刀片托架组件支撑。 掩模版掩模刀片托架组件相对于参考框架在相对于参考框架的取向处悬浮。 优选地，掩模掩模刮板滑架组件是电磁悬浮的。 测量掩模版掩模片滑架组件的位置和取向中的至少一个。 掩模版掩模刀片支架组件的位置和取向中的至少一个被控制。 可选地，掩模版掩模刮板滑架组件在由参考框限定的范围内的尺寸内移动。 尺寸可以是两个维度。 可以控制掩模掩模刮板托架组件的运动。
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23.发明授权Fluid gauge proximity sensor and method of operating same using a modulated fluid flow 有权液位计接近传感器和使用调制流体流动操作相同方法公开(公告)号：US07134321B2
公开(公告)日：2006-11-14
申请号：US10894028
申请日：2004-07-20
IPC分类号： G01B13/08
CPC分类号： G01B13/04
摘要： A system and method that use a fluid gauge proximity sensor. A source of modulated unidirectional or alternating fluid flow travels along at least one path having a nozzle and a flow or pressure sensor. The fluid exists at a gap between the nozzle and a target. The sensor outputs an amplitude modulated signal that varies according to a size of the gap. The amplitude modulated signal is processed either digitally or in analog devices, which can include being filtered (e.g., band pass, band limited, high pass, etc. filter) to include the modulated frequency and sufficient bandwidth on either side of that frequency and/or being demodulated using a demodulator operating at the acoustical driver modulation frequency. Using this system and method can result in only ambient acoustical energy in a desired frequency range of the device actually having the opportunity to interfere with the device operation. This can lower the devices overall sensitivity to external acoustical noise and sensor offset.
摘要翻译： 使用流量计接近传感器的系统和方法。 调制的单向或交替流体流的源沿着具有喷嘴和流量或压力传感器的至少一个路径行进。 流体存在于喷嘴和靶之间的间隙处。 传感器输出根据间隙大小而变化的幅度调制信号。 幅度调制信号以数字方式或在模拟设备中进行处理，其可以包括被滤波（例如，带通，频带限制，高通等等滤波器）以包括在该频率的任一侧上的调制频率和足够的带宽， 或者使用以声驱动器调制频率工作的解调器进行解调。 使用该系统和方法可以仅使设备的期望频率范围内的环境声能实际上具有干扰设备操作的机会。 这可以降低设备对外部声学噪声和传感器偏移的总体灵敏度。
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公开(公告)号：US07010958B2
公开(公告)日：2006-03-14
申请号：US10322768
申请日：2002-12-19
申请人： Boguslaw F. Gajdeczko , Kenneth M. Bogursky , Daniel N. Galburt , Willy M. Sander , Kevin J. Violette
发明人： Boguslaw F. Gajdeczko , Kenneth M. Bogursky , Daniel N. Galburt , Willy M. Sander , Kevin J. Violette
IPC分类号： G01B13/08
CPC分类号： G03F7/709 , G01B13/12 , G03F7/70341 , G03F7/7085 , G05D7/0186
摘要： An apparatus and method for precisely detecting very small distances between a measurement probe and a surface, and more particularly to a proximity sensor using a constant gas flow and sensing a mass flow rate within a pneumatic bridge to detect very small distances. Within the apparatus the use of a flow restrictor, and/or snubber made of porous material, and/or a mass flow rate controller enables detection of very small distances in the nanometer to sub-nanometer range. A further embodiment wherein a measurement channel of a proximity sensor is connected to multiple measurement branches.
摘要翻译： 一种用于精确检测测量探头和表面之间非常小距离的装置和方法，更具体地涉及使用恒定气流并感测气动桥中的质量流量以检测非常小的距离的接近传感器。 在该装置内，使用由多孔材料制成的限流器和/或缓冲器和/或质量流量控制器使得能够在纳米至亚纳米范围内检测非常小的距离。 另一实施例，其中接近传感器的测量通道连接到多个测量分支。
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25.发明授权Apparatus, system, and method for precision positioning and alignment of a lens in an optical system 有权用于光学系统中的透镜的精确定位和对准的装置，系统和方法公开(公告)号：US06760167B2
公开(公告)日：2004-07-06
申请号：US10403027
申请日：2003-04-01
IPC分类号： G02B702
摘要： An apparatus, system, and method for precision positioning and alignment of a lens in an optical system. The apparatus includes a support, a lever having a pivot point, and a first actuator and a second actuator coupled to the lever and to the support. The first actuator and the second actuator are used to position the lever and thereby position the lens. The first actuator is used to make finer position adjustments of the lever than are made by the second actuator. In one embodiment, the first actuator and the second actuator are pneumatic bellows. In another embodiment, the first actuator and the second actuator are electromechanical devices. A spring can be used to apply a biasing force to the lever.
摘要翻译： 用于在光学系统中精确定位和对准透镜的装置，系统和方法。 该装置包括支撑件，具有枢转点的杠杆，以及联接到杠杆和支撑件的第一致动器和第二致动器。 第一致动器和第二致动器用于定位杠杆并由此定位透镜。 第一个致动器用于使得比由第二致动器制成的杆更精细的位置调整。 在一个实施例中，第一致动器和第二致动器是气动波纹管。 在另一个实施例中，第一致动器和第二致动器是机电装置。 可以使用弹簧向杠杆施加偏压力。
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公开(公告)号：US06538720B2
公开(公告)日：2003-03-25
申请号：US09794133
申请日：2001-02-28
IPC分类号： G03B2742
CPC分类号： G03F7/70833 , G03F7/709
摘要： An apparatus, system, and method for configuring a dual isolation system lithography tool is described. An isolated base frame is supported by a non-isolated tool structure. A wafer stage component is supported by the isolated base frame. The wafer stage component provides a mount for a semiconductor wafer. A reticle stage component is supported by the isolated base frame. The reticle stage component provides a mount for a reticle. An isolated bridge provides a mount for a projection optics. The isolated bridge is supported by the isolated base frame. Alternatively, an isolated bridge is supported by a non-isolated base frame. A wafer stage component is supported by the non-isolated base frame. A reticle stage component is supported by the non-isolated base frame. An isolated optical relay is supported by the non-isolated base frame. The isolated optical relay includes one or more individually servo controlled framing blades.
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公开(公告)号：US06307619B1
公开(公告)日：2001-10-23
申请号：US09534127
申请日：2000-03-23
申请人： Daniel N. Galburt , Waiming Tam
发明人： Daniel N. Galburt , Waiming Tam
IPC分类号： G03B2742
CPC分类号： G03F7/70058 , G03F7/70066 , G03F7/70358 , H02K7/08 , H02K41/031
摘要： A scanning framing blade apparatus includes a stationary assembly having a plurality of magnets; first and second carriage assemblies that each have a plurality of coils. The first and second carriage assemblies are supported on the stationary assembly by a plurality of air bearings that permit the first and second carriage assemblies to move in only one degree of freedom. In addition, the scanning framing blade apparatus includes first and second framing blades that are attached to the first and second carriage assemblies, respectively. The scanning framing blade apparatus also includes a controller that is coupled to the plurality of coils. The controller is adapted to energize at least one of the plurality of coils, thereby causing at least one of the carriage assemblies and corresponding framing blade to move in the one degree. This motion controls illumination onto a reticle during a substrate scanning process.
摘要翻译： 一种扫描框架装置，包括具有多个磁体的固定组件; 第一和第二托架组件，每个具有多个线圈。 第一和第二托架组件通过允许第一和第二托架组件仅在一个自由度上移动的多个空气轴承支撑在固定组件上。 另外，扫描框架装置包括分别附接到第一和第二托架组件的第一和第二框架叶片。 扫描成帧刀片装置还包括耦合到多个线圈的控制器。 所述控制器适于激励所述多个线圈中的至少一个，从而使所述滑架组件和对应的框架叶片中的至少一个以一度移动。 这种运动在衬底扫描过程中控制在掩模版上的照明。
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公开(公告)号：US6097474A
公开(公告)日：2000-08-01
申请号：US391928
申请日：1999-09-08
CPC分类号： G03F7/70066 , G03F7/70358 , G03F7/70558
摘要： Blades pivotally attached together linked to push rods and inserted into an illumination field, energy or flux. The blades extend longitudinally along the length of a rectangular illumination field or slit used to image a reticle onto a photosensitive substrate. The blades controllably adjust the width of the rectangular illumination field to modify the illumination intensity or energy provided to a photosensitive substrate. The illumination field is scanned across the photosensitive substrate to expose it with the image of a reticle. The blades are dynamically controlled during the scanning exposure to adjust the illumination intensity or energy in a predetermined way. The resulting selective change in exposure dose corrects local area of line width variance. Various errors in pattern reproduction using a photolithographic system are relatively easily corrected. This is particularly advantageous in a scanning lithography system used in the manufacture of semiconductors.
摘要翻译： 叶片可枢转地连接在一起，连接到推杆上并插入照明场，能量或通量。 刀片沿着用于将掩模版成像到感光基底上的矩形照明场或狭缝的长度纵向延伸。 叶片可控制地调整矩形照明场的宽度以改变提供给感光基底的照明强度或能量。 照射场被扫描在感光基片上，以将其与掩模版的图像一起曝光。 在扫描曝光期间动态地控制叶片以预定的方式调节照明强度或能量。 所得到的曝光剂量的选择性变化校正了线宽方差的局部区域。 使用光刻系统的图案再现中的各种错误相对容易地被校正。 这在用于制造半导体的扫描光刻系统中是特别有利的。
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公开(公告)号：US4907035A
公开(公告)日：1990-03-06
申请号：US842145
申请日：1986-03-21
申请人： Daniel N. Galburt , Jere D. Buckley
发明人： Daniel N. Galburt , Jere D. Buckley
IPC分类号： G03F9/00
CPC分类号： G03F9/70
摘要： An apparatus for aligning a wafer. The edge of a wafer is mapped by means of a photodetector array and a light source to provide a signal representative of the X-Y position and angular orientation of the wafer as the wafer is rotated one revolution on a shaft. The signal is digitized and processed to provide stored information of the X-Y position and angular orientation of the wafer. The shaft is then rotated to move the wafer from its calculated angular orientation to a desired angular orientation. The X-Y positional information may be used to center the wafer.
摘要翻译： 一种用于对准晶片的装置。 通过光电检测器阵列和光源来映射晶片的边缘，以在晶片在轴上旋转一周时提供表示晶片的X-Y位置和角度定向的信号。 信号被数字化并处理以提供晶片的X-Y位置和角度定向的存储信息。 然后旋转轴以将晶片从其计算的角度取向移动到期望的角度取向。 X-Y位置信息可用于使晶片居中。
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30.发明授权Method and system for operating an air gauge at programmable or constant standoff 有权用于在可编程或恒定间距下操作气压计的方法和系统公开(公告)号：US07437911B2
公开(公告)日：2008-10-21
申请号：US11011435
申请日：2004-12-15
CPC分类号： G03F7/70775 , G01B13/02 , G03F9/7023 , G03F9/7057 , G03F9/7088
摘要： Provided are a method and system for measuring a distance to an object. The system includes an air gauge configured to sense a distance to a surface of the object and a sensor configured to measure at least one from the group including (i) a relative position of the air gauge and (ii) a relative position of the surface of the object. Outputs of the air gauge and the sensor are combined to produce a combined air gauge reading.
摘要翻译： 提供了一种用于测量到物体的距离的方法和系统。 该系统包括配置成感测到物体的表面的距离的空气计和被配置为测量来自该组中的至少一个的传感器，该传感器包括（i）空气计的相对位置和（ii）表面的相对位置 的对象。 气压表和传感器的输出相结合，产生一个组合的气压表读数。
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