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38 条记录 (耗时 0.026 秒)

    Composite tire assembly
    21.
    发明申请
    Composite tire assembly 有权
    复合轮胎组件

    公开(公告)号：US20070246139A1

    公开(公告)日：2007-10-25

    申请号：US11407154

    申请日：2006-04-19

    申请人： David Abdallah

    发明人： David Abdallah

    IPC分类号： B60B9/18

    CPC分类号： B60B19/00 ,  B60B2310/318 ,  B60B2310/321 ,  B60B2360/102 ,  B60B2360/104 ,  B60B2360/32 ,  B60B2360/341 ,  B60B2360/348 ,  B60B2360/50 ,  Y10T152/10063

    摘要： A tire for a vehicle comprises, an inner wheel (12) adapted to mount to a vehicle having a radially outer surface (34). A first ring (16) is annular and concentric with the inner wheel (12) and has a radially outer (40) and a radially inner (38) surface. An annular inner-tube (14) is securedly positioned between the inner wheel (12) and the first ring (16). A second ring (18) has a radially outer surface (46) and a radially inner surface (44) adapted to mate with first ring (16). A tread (20) is secured to radially outer surface (46) of said second ring (18).

    摘要翻译： 一种用于车辆的轮胎包括适于安装到具有径向外表面（34）的车辆的内轮（12）。 第一环（16）是环形的并且与内轮（12）同心，并具有径向外（40）和径向内（38）表面。 环形内管（14）固定地定位在内轮（12）和第一环（16）之间。 第二环（18）具有适于与第一环（16）配合的径向外表面（46）和径向内表面（44）。 胎面（20）固定到所述第二环（18）的径向外表面（46）上。

    Hardmask process for forming a reverse tone image using polysilazane
    23.
    发明授权
    Hardmask process for forming a reverse tone image using polysilazane 有权
    使用聚硅氮烷形成反向色调图像的硬掩模工艺

    公开(公告)号：US08084186B2

    公开(公告)日：2011-12-27

    申请号：US12368720

    申请日：2009-02-10

    申请人： David Abdallah ,  Ralph R. Dammel ,  Yusuke Takano ,  Jin Li ,  Kazunori Kurosawa

    发明人： David Abdallah ,  Ralph R. Dammel ,  Yusuke Takano ,  Jin Li ,  Kazunori Kurosawa

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/26 ,  G03F7/40

    CPC分类号： G03F7/40 ,  H01L21/02123 ,  H01L21/02222 ,  H01L21/02282 ,  H01L21/0234 ,  H01L21/0337 ,  H01L21/31138 ,  H01L21/3125 ,  Y10T428/24802

    摘要： The present invention relates to a process for forming an reverse tone image on a device comprising; a) forming an optional absorbing organic underlayer on a substrate; b) forming a coating of a photoresist over the underlayer; c) forming a photoresist pattern; d) forming a polysilazane coating over the photoresist pattern from a polysilazane coating composition, where the polysilazane coating is thicker than the photoresist pattern, and further where the polysilazane coating composition comprises a silicon/nitrogen polymer and an organic coating solvent; e) etching the polysilazane coating to remove the polysilazane coating at least up to a level of the top of the photoresist such that the photoresist pattern is revealed; and, f) dry etching to remove the photoresist and the underlayer which is beneath the photoresist, thereby forming an opening beneath where the photoresist pattern was present.The invention further relates to a product of the above process and to a microelectronic device made from using the above process.

    摘要翻译： 本发明涉及一种在装置上形成反向色调图像的方法，包括： a）在衬底上形成可选的吸收有机底层; b）在底层上形成光致抗蚀剂的涂层; c）形成光致抗蚀剂图案; d）从聚硅氮烷涂料组合物在光致抗蚀剂图案上形成聚硅氮烷涂层，其中聚硅氮烷涂层比光致抗蚀剂图案厚，此外聚硅氮烷涂层组合物包含硅/氮聚合物和有机涂层溶剂; e）蚀刻聚硅氮烷涂层以除去聚硅氮烷涂层至少高达光致抗蚀剂顶部的水平，使得光刻胶图案显露出来; 以及f）干蚀刻以除去光致抗蚀剂下面的光致抗蚀剂和底层，从而在存在光致抗蚀剂图案的下方形成开口。 本发明还涉及上述方法的产品和使用上述方法制造的微电子器件。

    Hardmask Process for Forming a Reverse Tone Image Using Polysilazane
    24.
    发明申请
    Hardmask Process for Forming a Reverse Tone Image Using Polysilazane 有权
    使用聚硅氮烷形成反向色调图像的硬掩模工艺

    公开(公告)号：US20100203299A1

    公开(公告)日：2010-08-12

    申请号：US12368720

    申请日：2009-02-10

    申请人： David Abdallah ,  Ralph R. Dammel ,  Yusuke Takano ,  Jin Li ,  Kazunori Kurosawa

    发明人： David Abdallah ,  Ralph R. Dammel ,  Yusuke Takano ,  Jin Li ,  Kazunori Kurosawa

    IPC分类号： B32B3/10 ,  G03F7/20

    CPC分类号： G03F7/40 ,  H01L21/02123 ,  H01L21/02222 ,  H01L21/02282 ,  H01L21/0234 ,  H01L21/0337 ,  H01L21/31138 ,  H01L21/3125 ,  Y10T428/24802

    摘要： The present invention relates to a process for forming an reverse tone image on a device comprising; a) forming an optional absorbing organic underlayer on a substrate; b) forming a coating of a photoresist over the underlayer; c) forming a photoresist pattern; d) forming a polysilazane coating over the photoresist pattern from a polysilazane coating composition, where the polysilazane coating is thicker than the photoresist pattern, and further where the polysilazane coating composition comprises a silicon/nitrogen polymer and an organic coating solvent; e) etching the polysilazane coating to remove the polysilazane coating at least up to a level of the top of the photoresist such that the photoresist pattern is revealed; and, f) dry etching to remove the photoresist and the underlayer which is beneath the photoresist, thereby forming an opening beneath where the photoresist pattern was present.The invention further relates to a product of the above process and to a microelectronic device made from using the above process.

    摘要翻译： 本发明涉及一种在装置上形成反向色调图像的方法，包括： a）在衬底上形成任选的吸收有机底层; b）在底层上形成光致抗蚀剂的涂层; c）形成光致抗蚀剂图案; d）从聚硅氮烷涂料组合物在光致抗蚀剂图案上形成聚硅氮烷涂层，其中聚硅氮烷涂层比光致抗蚀剂图案厚，此外聚硅氮烷涂层组合物包含硅/氮聚合物和有机涂层溶剂; e）蚀刻聚硅氮烷涂层以除去聚硅氮烷涂层至少高达光致抗蚀剂顶部的水平，使得光刻胶图案显露出来; 以及f）干蚀刻以除去光致抗蚀剂下面的光致抗蚀剂和底层，从而在存在光致抗蚀剂图案的下方形成开口。 本发明还涉及上述方法的产品和使用上述方法制造的微电子器件。

    Antireflective coating composition
    26.
    发明申请
    Antireflective coating composition 有权
    防反射涂料组合物

    公开(公告)号：US20090280435A1

    公开(公告)日：2009-11-12

    申请号：US12115776

    申请日：2008-05-06

    申请人： Douglas McKenzie ,  David Abdallah ,  Allen G. Timko ,  M. Dalil Rahman

    发明人： Douglas McKenzie ,  David Abdallah ,  Allen G. Timko ,  M. Dalil Rahman

    IPC分类号： G03F7/20 ,  G03F7/039

    CPC分类号： G03F7/091

    摘要： The invention relates to an antireflective coating composition comprising a polymer, a crosslinker and a thermal acid generator, where the polymer comprises at least one unit of structure (1), at least one unit of structure (2) and at least one structure of structure (3), where R1 to R9 is independently selected from H and C1-C6 alkyl, R′ and R″ is independently selected from H and C1-C6 alkyl, X is C1-C6 alkylene, Y is C1-C6 alkylene. The invention further relates to a process for imaging a photoresist coated over the antireflective coating composition.

    摘要翻译： 本发明涉及包含聚合物，交联剂和热酸发生剂的抗反射涂料组合物，其中聚合物包含至少一个结构单元（1），至少一个结构单元（2）和至少一个结构结构 （3），其中R 1至R 9独立地选自H和C 1 -C 6烷基，R'和R“独立地选自H和C 1 -C 6烷基，X是C 1 -C 6亚烷基，Y是C 1 -C 6亚烷基。 本发明还涉及一种用于对涂覆在抗反射涂层组合物上的光致抗蚀剂进行成像的方法。

    Photoresist Image-Forming Process Using Double Patterning
    27.
    发明申请
    Photoresist Image-Forming Process Using Double Patterning 审中-公开
    使用双重图案的光刻胶图像形成过程

    公开(公告)号：US20090253080A1

    公开(公告)日：2009-10-08

    申请号：US12061061

    申请日：2008-04-02

    申请人： Ralph R. Dammel ,  David Abdallah ,  Eric Alemy ,  Munirathna Padmanaban

    发明人： Ralph R. Dammel ,  David Abdallah ,  Eric Alemy ,  Munirathna Padmanaban

    IPC分类号： G03F7/30

    CPC分类号： G03F7/0035 ,  G03F7/40

    摘要： A process for forming a photoresist pattern on a device, comprising; a) forming a layer of first photoresist on a substrate from a first photoresist composition; b) imagewise exposing the first photoresist; c) developing the first photoresist to form a first photoresist pattern; d) treating the first photoresist pattern with a hardening compound comprising at least 2 amino (NH2) groups, thereby forming a hardened first photoresist pattern; e) forming a second photoresist layer on the region of the substrate including the hardened first photoresist pattern from a second photoresist composition; f) imagewise exposing the second photoresist; and, g) developing the imagewise exposed second photoresist to form a second photoresist pattern between the first photoresist pattern, thereby providing a double photoresist pattern.

    摘要翻译： 一种在器件上形成光致抗蚀剂图案的工艺，包括： a）从第一光致抗蚀剂组合物在衬底上形成第一光致抗蚀剂层; b）成像曝光第一光致抗蚀剂; c）显影第一光致抗蚀剂以形成第一光致抗蚀剂图案; d）用包含至少2个氨基（NH 2）基团的硬化化合物处理第一光致抗蚀剂图案，从而形成硬化的第一光致抗蚀剂图案; e）在包含来自第二光致抗蚀剂组合物的硬化的第一光致抗蚀剂图案的衬底的区域上形成第二光致抗蚀剂层; f）成像曝光第二光致抗蚀剂; 以及g）显影所述成像曝光的第二光致抗蚀剂以在所述第一光致抗蚀剂图案之间形成第二光致抗蚀剂图案，从而提供双光致抗蚀剂图案。

    Antireflective Coating Composition Based on Silicon Polymer
    28.
    发明申请
    Antireflective Coating Composition Based on Silicon Polymer 失效
    基于硅聚合物的抗反射涂层组合物

    公开(公告)号：US20080199789A1

    公开(公告)日：2008-08-21

    申请号：US11676671

    申请日：2007-02-20

    申请人： David Abdallah ,  Ruzhi Zhang

    发明人： David Abdallah ,  Ruzhi Zhang

    IPC分类号： G03C11/00

    CPC分类号： C09D183/06 ,  G03F7/0752 ,  G03F7/091 ,  H01L21/02126 ,  H01L21/02137 ,  H01L21/02216 ,  H01L21/02282 ,  H01L21/3122

    摘要： The present invention relates to an antireflecting coating composition which is capable of forming a crosslinked coating underneath a layer of photoresist comprising a silicon polymer, where the silicon polymer comprises at least one unit with the structure 1, where, R1 is selected from C1-C4 alkyl. The invention also relates to a process for imaging this composition.

    摘要翻译： 本发明涉及一种抗反射涂料组合物，其能够在包含硅聚合物的光致抗蚀剂层下形成交联涂层，其中硅聚合物包含至少一个具有结构1的单元，其中R 1， SUB>选自C 1 -C 4烷基。 本发明还涉及对该组合物进行成像的方法。

    Man-machine interface for controlling access to electronic devices
    29.
    发明申请
    Man-machine interface for controlling access to electronic devices 失效
    用于控制电子设备接入的人机界面

    公开(公告)号：US20050093834A1

    公开(公告)日：2005-05-05

    申请号：US10997291

    申请日：2004-11-24

    申请人： David Abdallah ,  Barry Johnson ,  Kristen Olvera

    发明人： David Abdallah ,  Barry Johnson ,  Kristen Olvera

    IPC分类号： G07C9/00 ,  G09G5/00

    CPC分类号： H04L63/0823 ,  G06F17/3028 ,  G06F21/10 ,  G06F21/31 ,  G06F21/32 ,  G06F21/6209 ,  G06F21/72 ,  G06F21/75 ,  G06F21/85 ,  G06F2221/0771 ,  G06K9/00013 ,  G06K9/00087 ,  G06K9/6201 ,  H04L9/3231 ,  H04L63/06 ,  H04L63/0861 ,  H04L63/102 ,  H04N21/25875 ,  H04N21/4415

    摘要： The invention disclosed herein describes a man-machine interface device for controlling access to electronic devices. The man-machine interface device comprises an electronic display unit including a transparent finger touch sensor region that is seated above the display apparatus, which is responsible for determining the presence and absence of a finger and for generating fingerprint images when a finger is detected. The man-machine interface device also includes a controller unit that is coupled to the display apparatus, the finger touch sensor region, and at least one electronic device. The method of the invention describes a process for authenticating individuals and verifying their security privileges to access sensitive data, based on a finger-touch selection of an icon presented on the display apparatus of the man-machine interface device.

    摘要翻译： 本文公开的本发明描述了用于控制对电子设备的访问的人机接口设备。 人机界面装置包括电子显示单元，其包括位于显示装置上方的透明手指触摸传感器区域，该区域负责确定手指的存在和不存在以及当检测到手指时产生指纹图像。 人机界面装置还包括耦合到显示装置，手指触摸传感器区域和至少一个电子装置的控制器单元。 本发明的方法基于人机界面设备的显示装置上呈现的图标的手指触摸选择来描述用于认证个人并验证其访问敏感数据的安全特权的过程。