公开(公告)号：US20140175348A1

公开(公告)日：2014-06-26

申请号：US14193881

申请日：2014-02-28

Applicant: FUJIFILM CORPORATION

Inventor： Hidenori TAKAHASHI ,  Shuichiro OSADA

IPC: C08F20/36 ,  C08F20/04 ,  C08F20/10 ,  G03C1/73 ,  G02B5/20 ,  C08F20/52 ,  C08F20/26 ,  G03C1/735

CPC classification number: C08F20/36 ,  C08F2/38 ,  C08F20/04 ,  C08F20/10 ,  C08F20/26 ,  C08F20/52 ,  C08F220/14 ,  C08F220/18 ,  C08F220/26 ,  C09B67/009 ,  C09B69/101 ,  C09B69/109 ,  G02B5/20 ,  G03C1/73 ,  G03C1/735 ,  G03F7/0007 ,  G03F7/032 ,  G03F7/033

Abstract: The present invention provides a polymer compound represented by the following Formula (1) and a method for production thereof, a pigment dispersant, a pigment dispersion composition, and a photocurable composition respectively using the polymer compound, and a color filter and a method for production thereof [R1: an organic linking group having a valency of (m+n); R2: a single bond or a divalent organic linking group; A1: a monovalent organic group containing at least one moiety selected from an organic dye structure, a heterocyclic structure, an acidic group, a group having a basic nitrogen atom, a urea group, a urethane group, a group having a coordinating oxygen atom, a hydrocarbon group having 4 or more carbon atoms, an alkoxysilyl group, an epoxy group, an isocyanate group, and a hydroxyl group; m=1 to 8, n=2 to 9 (m+n=3 to 10); and P1: polymer skeleton]. (A1-R2nR1P1)m  Formula (1)

Abstract translation: 本发明提供由下述通式（1）表示的高分子化合物及其制造方法，颜料分散剂，颜料分散组合物和使用该高分子化合物的光固化性组合物，以及滤色器及其制造方法 [R1：具有（m + n）价的有机连接基团; R2：单键或二价有机连接基团; A1：含有选自有机染料结构，杂环结构，酸性基团，具有碱性氮原子的基团，脲基，氨基甲酸酯基，具有配位氧原子的基团的至少一个部分的一价有机基团， 具有4个以上碳原子的烃基，烷氧基甲硅烷基，环氧基，异氰酸酯基和羟基; m = 1〜8，n = 2〜9（m + n = 3〜10）。 和P1：聚合物骨架]。 （A1-R2nnR1P1）m式（1）

公开(公告)号：US20140113223A1

公开(公告)日：2014-04-24

申请号：US14141748

申请日：2013-12-27

Applicant: FUJIFILM Corporation

Inventor： Keita KATO ,  Michihiro SHIRAKAWA ,  Tadahiro ODANI ,  Atsushi NAKAMURA ,  Hidenori TAKAHASHI ,  Kaoru IWATO

IPC: G03F7/32

CPC classification number: G03F7/325 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/095

Abstract: There is provided a pattern forming method comprising: (i) a step of forming a first film on a substrate by using a first resin composition (I), (ii) a step of forming a second film on the first film by using a second resin composition (II) different from the resin composition (I), (iii) a step of exposing a multi-layered film having the first film and the second film, and (iv) a step of developing the first film and the second film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.

Abstract translation: 提供一种图案形成方法，包括：（i）通过使用第一树脂组合物（I）在基材上形成第一膜的步骤，（ii）通过使用第二树脂在第一膜上形成第二膜的步骤 不同于树脂组合物（I）的树脂组合物（II），（iii）暴露具有第一膜和第二膜的多层膜的步骤，以及（iv）使第一膜和第二膜显影的步骤 在曝光的多层膜中，通过使用含有机溶剂的显影剂形成负图案。

公开(公告)号：US20150301245A1

公开(公告)日：2015-10-22

申请号：US14753189

申请日：2015-06-29

Applicant: FUJIFILM Corporation

Inventor： Takashi KAWASHIMA ,  Seiichi HITOMI ,  Hidenori TAKAHASHI ,  Yuki NARA ,  Seongmu BAK

IPC: G02B5/20 ,  H04N5/225 ,  H04N5/33 ,  C07F1/08

CPC classification number: G02B5/208 ,  C07F1/08 ,  C08F2/44 ,  C08K5/0091 ,  C08K5/42 ,  C08L63/00 ,  C09D5/32 ,  G02B5/22 ,  G02B5/223 ,  H01L27/14618 ,  H01L27/14625 ,  H01L2224/11 ,  H04N5/2254 ,  H04N5/332

Abstract: An object of the present invention is to provide a near-infrared-absorbing composition capable of forming a cured film having excellent heat resistance while maintaining strong near-infrared shielding properties when a cured film is produced. The near-infrared-absorbing composition of the present invention includes a copper complex obtained by reacting two or more kinds of sulfonic acids represented by General Formula (I) described below or salts thereof with a copper component and a solvent.

Abstract translation: 本发明的目的是提供一种能够形成具有优异的耐热性的固化膜的近红外吸收组合物，同时在生产固化膜时保持强的近红外屏蔽性能。 本发明的近红外吸收组合物包括通过使两种或更多种由下述通式（I）表示的磺酸或其盐与铜组分和溶剂反应而获得的铜络合物。

公开(公告)号：US20150147699A1

公开(公告)日：2015-05-28

申请号：US14607146

申请日：2015-01-28

Applicant: FUJIFILM Corporation

Inventor： Sou KAMIMURA ,  Hidenori TAKAHASHI ,  Keita KATO

IPC: G03F7/038 ,  G03F7/20 ,  G03F7/30

CPC classification number: G03F7/0388 ,  C08F212/14 ,  C08F212/32 ,  C08F220/04 ,  C08F220/18 ,  C08F220/26 ,  C08F220/28 ,  C08F220/58 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2002 ,  G03F7/2037 ,  G03F7/30 ,  G03F7/325 ,  G03F7/40

Abstract: The pattern forming method of the present invention includes (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition which contains a resin (A) which has a repeating unit including a group capable of generating a polar group by being decomposed due to an action of an acid and a repeating unit including a carboxyl group, a compound (B) which generates an acid according to irradiation with actinic rays or radiation, and a solvent (C); (ii) exposing the film using a KrF excimer laser, extreme ultraviolet rays, or an electron beam; and (iii) forming a negative tonetone pattern by developing the exposed film using a developer which includes an organic solvent.

Abstract translation: 本发明的图案形成方法包括：（i）使用含有具有包含能够产生极性基团的重复单元的树脂（A）的光化射线敏感性或辐射敏感性树脂组合物形成膜， 由于酸和包含羧基的重复单元的作用，根据光化射线或辐射照射产生酸的化合物（B）和溶剂（C）而分解; （ii）使用KrF准分子激光器，极紫外线或电子束曝光该膜; 和（iii）通过使用包括有机溶剂的显影剂显影所述曝光的膜来形成阴性图案。

公开(公告)号：US20150079508A1

公开(公告)日：2015-03-19

申请号：US14550181

申请日：2014-11-21

Applicant: FUJIFILM Corporation

Inventor： Junichi ITO ,  Shuhei YAMAGUCHI ,  Hidenori TAKAHASHI ,  Kei YAMAMOTO

IPC: G03F7/038 ,  G03F7/30

CPC classification number: G03F7/0046 ,  C08F220/18 ,  C08F220/22 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/32 ,  G03F7/325 ,  G03F7/40 ,  H01L21/027 ,  H01L21/0273

Abstract: There is provided a pattern forming method comprising (i) a step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition; (ii) a step of exposing the film; and (iii) a step of performing development by using a developer containing an organic solvent to form a negative pattern, wherein the actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin capable of increasing the polarity by an action of an acid to decrease the solubility in a developer containing an organic solvent, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a solvent, and (D) a resin having a repeating unit having a fluorine atom and not having a CF3 partial structure.

Abstract translation: 提供了一种图案形成方法，其包括（i）通过光化射线敏感或辐射敏感树脂组合物形成膜的步骤; （ii）曝光胶片的步骤; （iii）通过使用含有有机溶剂的显影剂形成负型图案进行显影的工序，其中，所述光化射线敏感性或辐射敏感性树脂组合物含有（A）能够通过 降低在含有有机溶剂的显影剂中的溶解性的酸，（B）在用光化射线或辐射照射时能够产生酸的化合物，（C）溶剂，（D）具有重复单元的树脂， 不具有CF 3部分结构的氟原子。

公开(公告)号：US20140141360A1

公开(公告)日：2014-05-22

申请号：US14164389

申请日：2014-01-27

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Hidenori TAKAHASHI ,  Michihiro SHIRAKAWA ,  Fumihiro YOSHINO

IPC: G03F7/038

CPC classification number: G03F7/0382 ,  C08F20/10 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041

Abstract: A pattern forming method, includes: (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a1) a repeating unit represented by the following formula (I) or (II) as defined in the specification in an amount of 20 mol % or more based on all repeating units in the resin (P) and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, so as to form an exposed film; and (iii) a step of developing the exposed film by using a developer containing an organic solvent to form a negative pattern.

Abstract translation: 图案形成方法包括：（i）从含有（P）具有（a1）由下式（I）表示的重复单元的树脂或（a1）由下式（I）表示的重复单元的树脂的光化射线敏感性或辐射敏感性树脂组合物形成膜的步骤， （II），基于树脂（P）中的所有重复单元为20摩尔％以上，（B）在光化射线或辐射照射时能够产生酸的化合物; （ii）曝光胶片的步骤，以形成曝光胶片; 和（iii）通过使用包含有机溶剂的显影剂形成负图案来显影所述曝光的薄膜的步骤。

公开(公告)号：US20190148451A1

公开(公告)日：2019-05-16

申请号：US16242152

申请日：2019-01-08

Applicant: FUJIFILM Corporation

Inventor： Hirotaka TAKISHITA ,  Yoichi HOSOYA ,  Tokuju OIKAWA ,  Hidenori TAKAHASHI

IPC: H01L27/146 ,  G02B1/04 ,  H04N5/225 ,  C09K3/10 ,  G02B5/24

Abstract: A composition includes a metal particle and a resin and has a wavelength band A having a wavelength band width of 1 μm or more in a wavelength range of 1 to 14 μm and a wavelength band B having a lower absorbance than the wavelength band A and having a wavelength band width of 1 μm or more, and a ratio Amin/Bmax between a minimum value Amin of an absorbance of the wavelength band A and a maximum value Bmax of an absorbance of the wavelength band B is 3 or more.

公开(公告)号：US20190004422A1

公开(公告)日：2019-01-03

申请号：US16123492

申请日：2018-09-06

Applicant: FUJIFILM Corporation

Inventor： Yoshinori TAGUCHI ,  Hidenori TAKAHASHI

IPC: G03F7/004 ,  G03F7/033 ,  G03F7/031 ,  G03F7/029 ,  G03F7/20 ,  G03F7/32 ,  G03F7/16

Abstract: A composition includes at least one of particles having an average primary particle diameter of 50 to 150 nm or particles having an average major axis length of 50 to 150 nm, and a resin, in which the composition has an L* in an L*a*b* color space of CIE 1976 of 35 to 75 in a case of forming a film with a thickness of 3 μm using the composition. A film; a cured film; an optical sensor; and a method for producing a film each use the composition.

公开(公告)号：US20140356771A1

公开(公告)日：2014-12-04

申请号：US14446599

申请日：2014-07-30

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Hidenori TAKAHASHI ,  Junichi ITO ,  Kei YAMAMOTO

IPC: G03F7/038 ,  G03F7/20

CPC classification number: G03F7/0388 ,  C08F220/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition, having: (A) a resin having a repeating unit represented by formula (I); (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a resin having at least one repeating unit (x) out of a repeating unit represented by formula (II) and a repeating unit represented by formula (III) and containing substantially neither fluorine atom nor silicon atom, wherein the content of the repeating unit (x) is 90% or more by mole based on all repeating units in the resin (C).

Abstract translation: 提供了一种光化射线敏感或辐射敏感性树脂组合物，其具有：（A）具有由式（I）表示的重复单元的树脂; （B）能够在用光化射线或辐射照射时能产生酸的化合物; 和（C）具有由式（II）表示的重复单元中的至少一个重复单元（x）和基本上不包含氟原子或硅原子的式（III）表示的重复单元的树脂，其中， 重复单元（x）相对于树脂（C）中的所有重复单元为90％以上。

公开(公告)号：US20140234761A1

公开(公告)日：2014-08-21

申请号：US14261896

申请日：2014-04-25

Applicant: FUJIFILM Corporation

Inventor： Michihiro SHIRAKAWA ,  Keita KATO ,  Tadahiro ODANI ,  Atsushi NAKAMURA ,  Hidenori TAKAHASHI ,  Kaoru IWATO

IPC: G03F7/095 ,  G03F7/30

CPC classification number: G03F7/095 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/091 ,  G03F7/094 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/325 ,  H01L21/0271

Abstract: A pattern forming method contains: (i) a step of forming a first film on a substrate by using a first resin composition (I), (ii) a step of forming a second film on the first film by using a second resin composition (II) different from the resin composition (I), (iii) a step of exposing a multi-layered film having the first film and the second film, and (iv) a step of developing the first film and the second film in the exposed multi-layered film by using an organic solvent-containing developer to form a negative pattern.

Abstract translation: 图案形成方法包括：（i）通过使用第一树脂组合物（I）在基材上形成第一膜的步骤，（ii）通过使用第二树脂组合物在第一膜上形成第二膜的步骤 II），（iii）暴露具有第一膜和第二膜的多层膜的步骤，和（iv）在暴露的第一膜和第二膜中显影第一膜和第二膜的步骤 通过使用含有机溶剂的显影剂形成负图案的多层膜。