公开(公告)号：US20150140484A1

公开(公告)日：2015-05-21

申请号：US14605631

申请日：2015-01-26

Applicant: FUJIFILM Corporation

Inventor： Hiroo TAKIZAWA ,  Shuji HIRANO ,  Natsumi YOKOKAWA ,  Wataru NIHASHI

IPC: G03F7/038 ,  G03F7/20 ,  C08F220/28 ,  G03F7/30

CPC classification number: G03F7/0388 ,  C08F12/20 ,  C08F12/22 ,  C08F12/24 ,  C08F12/30 ,  C08F12/32 ,  C08F212/14 ,  C08F220/28 ,  C08F2220/281 ,  C09D125/18 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2002 ,  G03F7/2037 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/325

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising: (A) a resin containing a repeating unit represented by the first specific formula and a repeating unit represented by the second specific formula, wherein the content of the repeating unit represented by the first specific formula is 35 mol % or more based on all repeating units in the resin (A), a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition.

Abstract translation: 提供一种光化射线敏感或辐射敏感性树脂组合物，其包含：（A）含有由第一特定式表示的重复单元的树脂和由第二具体式表示的重复单元，其中所述重复单元的含量 通过第一具体式为基于树脂（A）中的所有重复单元的35摩尔％以上，使用光化射线敏感性或辐射敏感性树脂组合物形成的抗蚀剂膜。

公开(公告)号：US20140363758A1

公开(公告)日：2014-12-11

申请号：US14466332

申请日：2014-08-22

Applicant: FUJIFILM Corporation

Inventor： Wataru NIHASHI ,  Hiroo TAKIZAWA ,  Shuji HIRANO

IPC: G03F7/038 ,  G03F7/30 ,  G03F7/027

CPC classification number: G03F7/0384 ,  C08F212/14 ,  C08F220/28 ,  G03F7/027 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/325

Abstract: There is provided a pattern forming method comprising (A) forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin containing a repeating unit having a phenol skeleton and a repeating unit having a group capable of decomposing by the action of an acid to produce an alcoholic hydroxy group; (B) exposing the film; and (C) developing the exposed film by using an organic solvent-containing developer.

Abstract translation: 提供一种图案形成方法，其包括（A）通过使用含有含有具有酚骨架的重复单元的树脂的光化射线敏感性或辐射敏感性树脂组合物形成膜，以及具有能够由 酸的作用产生醇羟基; （B）曝光胶片; 和（C）通过使用含有机溶剂的显影剂显影所述曝光的膜。

公开(公告)号：US20140272692A1

公开(公告)日：2014-09-18

申请号：US14289718

申请日：2014-05-29

Applicant: FUJIFILM Corporation

Inventor： Natsumi YOKOKAWA ,  Takeshi KAWABATA ,  Hiroo TAKIZAWA ,  Hideaki TSUBAKI ,  Shuji HIRANO

IPC: G03F7/038

CPC classification number: G03F7/0388 ,  C08F8/00 ,  C08F212/00 ,  C08F222/10 ,  C09D125/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive composition comprising (P) a compound having a phenolic hydroxyl group and a group formed by substituting for the hydrogen atom in a phenolic hydroxyl group by a group represented by the specific formula, a resist film formed using the specific actinic ray-sensitive or radiation-sensitive composition, a pattern forming method containing steps of exposing and developing the resist film, a manufacturing method of an electronic device, containing the pattern forming method, and an electronic device manufactured by the specific manufacturing method of an electronic device.

Abstract translation: 提供了光化射线敏感或辐射敏感性组合物，其包含（P）具有酚羟基的化合物和通过用特定式表示的基团取代酚羟基中的氢原子形成的基团，抗蚀剂 使用特定的光化射线敏感或辐射敏感组合物形成的膜，包含曝光和显影抗蚀剂膜的步骤的图案形成方法，包含图案形成方法的电子器件的制造方法和由 电子设备的具体制造方法。

公开(公告)号：US20200164629A1

公开(公告)日：2020-05-28

申请号：US16698964

申请日：2019-11-28

Applicant: FUJIFILM Corporation

Inventor： Ryo NAKAMURA ,  Kenjiro ARAKI ,  Shuji HIRANO ,  Koji SONOKAWA ,  Yuuya MIYAGAWA

IPC: B41C1/10 ,  G03F7/029 ,  G03F7/30 ,  G03F7/20

Abstract: Provided are a lithographic printing plate precursor having an image-recording layer on an aluminum support, in which the image-recording layer contains a polymerization initiator, an infrared absorber, a polymer particle, and a polymerizable compound, and the polymerizable compound has a) a molecular weight of 1,500 to 3,000, b) a double bond equivalent of 200 or less, and c) a CLog P of 9 or less and a method for producing a lithographic printing plate in which the lithographic printing plate precursor is used.

公开(公告)号：US20170351176A1

公开(公告)日：2017-12-07

申请号：US15685499

申请日：2017-08-24

Applicant: FUJIFILM Corporation

Inventor： Shuhei YAMAGUCHI ,  Koutarou TAKAHASHI ,  Toshiaki FUKUHARA ,  Shuji HIRANO

IPC: G03F7/038 ,  G03F7/20 ,  G03F7/16 ,  G03F7/30 ,  G03F1/50

Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a resin (B) having a group that decomposes by the action of an alkali developer to increase the solubility in the alkali developer and having at least one of a fluorine atom or a silicon atom, and a resin (C) having a phenolic hydroxyl group, different from the resin (B), an actinic ray-sensitive or radiation-sensitive film and a mask blank, each formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method using the actinic ray-sensitive or radiation-sensitive resin composition, and a method for manufacturing an electronic device.

公开(公告)号：US20170174801A1

公开(公告)日：2017-06-22

申请号：US15446128

申请日：2017-03-01

Applicant: FUJIFILM Corporation

Inventor： Shuji HIRANO

IPC: C08F220/06 ,  C08F220/18 ,  C08F220/38 ,  C08F112/32 ,  C08F112/14 ,  G03F7/038 ,  G03F7/32 ,  G03F7/004 ,  G03F7/16 ,  G03F7/40 ,  G03F7/039 ,  C08F220/28 ,  G03F7/20

CPC classification number: C08F220/06 ,  C08F12/24 ,  C08F112/14 ,  C08F112/32 ,  C08F212/14 ,  C08F212/32 ,  C08F220/18 ,  C08F220/28 ,  C08F220/38 ,  C08F232/00 ,  C08F244/00 ,  C08F2220/283 ,  C08F2220/382 ,  C09D125/18 ,  C09D133/10 ,  G03F7/0042 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/039 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2004 ,  G03F7/2037 ,  G03F7/322 ,  G03F7/327 ,  G03F7/40 ,  C08F2220/282 ,  C08F2220/1875 ,  C08F2220/281 ,  C08F2220/1841 ,  C08F230/02 ,  C08F220/20 ,  C08F212/12 ,  C08F2220/185 ,  C08F2220/1816

Abstract: Provided are a non-chemical amplification type resist composition in which the resolving power in an isolated line pattern or an isolated space pattern is excellent, and a non-chemical amplification type resist film, a pattern forming method, and a method for manufacturing an electronic device. The non-chemical amplification type resist composition contains a resin (Ab) having a metal salt structure.

公开(公告)号：US20160147147A1

公开(公告)日：2016-05-26

申请号：US15008945

申请日：2016-01-28

Applicant: FUJIFILM Corporation

Inventor： Shuji HIRANO ,  Hiroo TAKIZAWA

IPC: G03F7/038 ,  G03F7/30

CPC classification number: G03F7/038 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/30 ,  G03F7/325

Abstract: There are provided a pattern forming method which satisfies high sensitivity, high resolving power at the time of isolated line pattern formation, a good pattern shape, and high dry etching resistance at the same time, an actinic ray sensitive or radiation sensitive resin composition and a resist film which are provided thereto, a method for manufacturing an electronic device using these, and an electronic device by using a pattern forming method including step (1) of forming a film using the actinic ray sensitive or radiation sensitive resin composition containing a resin (Ab) having a repeating unit represented by the specific General Formula (Ab1), step (2) of exposing the film, and step (4) of performing development using a developer including an organic solvent after exposing and of forming a negative type pattern, in this order.

Abstract translation: 提供了一种图案形成方法，其在隔离线图案形成时满足高灵敏度，高分辨能力，良好的图案形状和高耐干蚀刻性，同时具有光化射线敏感或辐射敏感性树脂组合物和 提供给它的抗蚀剂膜，使用它们的电子器件的制造方法和使用包括使用包含树脂的光化射线敏感或辐射敏感性树脂组合物形成膜的步骤（1）的图案形成方法的电子器件（ Ab）具有由特定通式（Ab1）表示的重复单元，使膜暴露的步骤（2）;以及使用包含有机溶剂的显影剂在曝光和形成负型图案之后进行显影的步骤（4） 按此顺序

公开(公告)号：US20160048075A1

公开(公告)日：2016-02-18

申请号：US14921524

申请日：2015-10-23

Applicant: FUJIFILM Corporation

Inventor： Hiroo TAKIZAWA ,  Shuji HIRANO

IPC: G03F7/039 ,  G03F7/32 ,  G03F7/11 ,  G03F7/20

CPC classification number: G03F7/039 ,  C08F20/28 ,  C08F220/28 ,  C08F2220/283 ,  G03F7/004 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2004 ,  G03F7/2037 ,  G03F7/32

Abstract: There is provided a pattern forming method comprising (i) forming a film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition which contains (A) a resin which decomposes due to an action of an acid to change its solubility with respect to a developer and (C) a specific resin, (ii) forming a top coat layer using a top coat composition which contains a resin (T) on the film, (iii) exposing the film which has the top coat layer to actinic rays or radiation, and (iv) forming a pattern by developing the film which has the top coat layer after the exposing.

Abstract translation: 提供一种图案形成方法，其包括（i）使用光化射线敏感或辐射敏感性树脂组合物在基材上形成膜，所述树脂组合物含有（A）由于酸的作用而分解的树脂以改变其与 （C）特定树脂，（ii）使用在该膜上含有树脂（T）的面漆组合物形成面涂层，（iii）将具有顶涂层的膜暴露于光化反应 射线或辐射，以及（iv）通过在曝光后显影具有顶涂层的膜来形成图案。

公开(公告)号：US20150168834A1

公开(公告)日：2015-06-18

申请号：US14625897

申请日：2015-02-19

Applicant: FUJIFILM CORPORATION

Inventor： Hiroo TAKIZAWA ,  Shuji HIRANO ,  Natsumi YOKOKAWA ,  Wataru NIHASHI

IPC: G03F7/038 ,  C08F14/18 ,  C08F16/10 ,  G03F7/20 ,  C08F24/00

CPC classification number: G03F7/0388 ,  C08F14/185 ,  C08F16/10 ,  C08F24/00 ,  C08F220/18 ,  C08F220/20 ,  C08F220/26 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2002 ,  G03F7/2037 ,  G03F7/325 ,  H01L21/0273 ,  H01L21/0274

Abstract: There is provided a pattern forming method, including: (a) forming a film by using an electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition containing a resin (A) having a repeating unit represented by Formula (1-0) and a repeating unit represented by Formula (1-2); (b) exposing the film by using an electron beam or extreme ultraviolet ray; and (c) developing the exposed film by using a developer containing an organic solvent to form a negative pattern, wherein a content of the repeating unit represented by Formula (1-0) is 45 mol % or more based on a whole repeating units in the resin (A).

Abstract translation: 提供了一种图案形成方法，包括：（a）通过使用含有具有由式（1-0）表示的重复单元的树脂（A）的电子束敏感或极紫外线敏感性树脂组合物形成膜和 由式（1-2）表示的重复单元; （b）通过使用电子束或极紫外线曝光该膜; 和（c）通过使用含有有机溶剂的显影剂显影曝光的薄膜以形成负图案，其中由式（1-0）表示的重复单元的含量相对于全部重复单元为45摩尔％以上 树脂（A）。

公开(公告)号：US20140212811A1

公开(公告)日：2014-07-31

申请号：US14228894

申请日：2014-03-28

Applicant: FUJIFILM CORPORATION

Inventor： Naoki INOUE ,  Hiroo TAKIZAWA ,  Shuji HIRANO ,  Hideaki TSUBAKI

IPC: G03F7/20 ,  G03C1/73

CPC classification number: G03F7/2002 ,  C08F12/24 ,  C08F212/14 ,  G03C1/733 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/2039 ,  G03F7/2041 ,  G03F7/325 ,  C08F212/32

Abstract: A pattern-forming method includes in this order: step (1) of forming a film with an electron beam-sensitive or extreme ultraviolet radiation-sensitive resin composition that contains (A) a resin having an acid-decomposable repeating unit and capable of decreasing a solubility of the resin (A) in a developer containing an organic solvent by an action of an acid, (B) a compound capable of generating an acid upon irradiation with an electron beam or extreme ultraviolet radiation, (C) a resin having one or more groups selected from the specific group as defined in the specification and (D) a solvent; step (2) of exposing the film with an electron beam or extreme ultraviolet radiation; and step (4) of developing the film with a developer containing an organic solvent after the exposing to form a negative pattern.

Abstract translation: 图案形成方法包括以下顺序：用电子束敏感或极紫外线辐射敏感性树脂组合物形成膜的步骤（1），其包含（A）具有酸分解重复单元并能够降低的树脂 树脂（A）在含有有机溶剂的显影剂中的溶解度，（B）在电子束或极紫外线照射时能够产生酸的化合物，（C）具有一个 或更多选自本说明书中定义的特定基团的基团和（D）溶剂; 步骤（2），用电子束或极紫外线辐射曝光胶片; 以及在暴露之后用含有机溶剂的显影剂显影该膜以形成负图案的步骤（4）。