公开(公告)号：US20100163754A1

公开(公告)日：2010-07-01

申请号：US12663525

申请日：2008-06-11

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： B01J19/12 ,  B08B7/00

CPC分类号： B32B17/10761 ,  B32B17/10036 ,  B32B17/10174 ,  Y10T428/252

摘要： The invention relates to a self-cleaning system (10) and window glass. The self-cleaning system comprises a translucent substrate (20), a light-emitting device (30) and a photo-catalytic layer (40) applied to a surface (22) of the translucent substrate for generating a self-cleaning surface. The photo-catalytic layer produces the self-cleaning effect when illuminated with light of a predefined wavelength range. The translucent substrate is translucent for at least a sub-range of the predefined wavelength range. The light-emitting device is arranged for illuminating the photo-catalytic layer via the translucent substrate, an emission spectrum emitted by the light-emitting device comprising light within the sub-range. The effect of the illumination system according to the invention is that the illumination of the photo-catalytic layer via the translucent substrate enables the light-emitting device to be arranged relatively near to the photo-catalytic layer such that only a relatively low light flux is required from the light-emitting device to activate the self-cleaning process.

摘要翻译： 本发明涉及自清洁系统（10）和窗玻璃。 自清洁系统包括施加到透光性基板的表面（22）的透光性基板（20），发光元件（30）和光催化剂层（40），用于产生自清洁表面。 当用预定波长范围的光照射时，光催化层产生自清洁效果。 半透明基板在预定波长范围的至少一个子范围内是半透明的。 发光装置被布置用于经由透光性基板照射光催化剂层，发光装置发射的发光光谱包括在子范围内的光。 根据本发明的照明系统的效果在于，通过透光性基板对光催化剂层的照射使得发光装置能够相对靠近光催化剂层布置，使得只有较低的光通量为 需要从发光装置启动自清洁过程。

公开(公告)号：US07687788B2

公开(公告)日：2010-03-30

申请号：US11826525

申请日：2007-07-16

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Kurt Gielissen

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer ,  Kurt Gielissen

IPC分类号： H05G2/00

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70883 ,  G03F7/70983

摘要： A debris prevention system is constructed and arranged to prevent debris that emanates from a radiation source from propagating with radiation from the radiation source into or within a lithographic apparatus. The debris prevention system includes an aperture that defines a maximum emission angle of the radiation coming from the radiation source, and a first debris barrier having a radiation transmittance. The first debris barrier includes a rotatable foil trap. The debris prevention system also includes a second debris barrier that has a radiation transmittance. The first debris barrier is configured to cover a part of the emission angle and the second debris barrier is configured to cover another part of the emission angle.

摘要翻译： 防碎系统被构造和布置成防止从辐射源发出的碎屑通过来自辐射源的辐射传播到光刻设备内或在光刻设备内。 碎片防止系统包括限定来自辐射源的辐射的最大发射角的孔，以及具有辐射透射率的第一碎片屏障。 第一个碎片障碍物包括一个可旋转的箔片陷阱。 碎片防止系统还包括具有辐射透射率的第二碎片屏障。 第一碎片屏障配置成覆盖发射角的一部分，并且第二碎片屏障构造为覆盖发射角的另一部分。

公开(公告)号：US20090272917A1

公开(公告)日：2009-11-05

申请号：US12431423

申请日：2009-04-28

申请人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Tjarko Adriaan Rudolf Van Empel ,  Erik Roelof Loopstra ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Tjarko Adriaan Rudolf Van Empel ,  Erik Roelof Loopstra ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： G21K5/00 ,  H05G2/00

CPC分类号： G03F7/70916 ,  G21K2201/064 ,  H05G2/005

摘要： A radiation source includes a radiation emitter configured to emit radiation, a collector configured to collect the radiation, and a contamination trap configured to trap contamination emitted by the radiation source. The contamination trap includes a plurality of foils that extend substantially radially, a first magnet ring configured to lie outside of an outer conical trajectory of radiation that is collected by the collector, and a second magnet ring configured to lie within the trajectory of radiation that is collected by the collector. The magnet rings are configured to provide a magnetic field that includes a component that is parallel to the foils.

摘要翻译： 辐射源包括被配置为发射辐射的辐射发射器，被配置为收集辐射的收集器以及被配置为捕获由辐射源发射的污染的污染阱。 污染物捕集器包括大致径向延伸的多个箔片，构造成位于由收集器收集的辐射的外锥形轨迹之外的第一磁环，以及构造成位于辐射轨迹内的第二磁环， 由收藏者收集。 磁环被配置成提供包括与箔片平行的部件的磁场。

公开(公告)号：US07561247B2

公开(公告)日：2009-07-14

申请号：US11207996

申请日：2005-08-22

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Carolus Ida Maria Antonius Spee ,  Derk Jan Wilfred Klunder ,  Antonius Maria Bernardus De Mol

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Carolus Ida Maria Antonius Spee ,  Derk Jan Wilfred Klunder ,  Antonius Maria Bernardus De Mol

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70925

摘要： A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H2 containing gas and one or more additional compounds selected from the group of hydrocarbon compounds and silane compounds in at least part of the apparatus includes producing hydrogen radicals from H2 from the H2 containing gas; and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of an optical element of an apparatus including the optical element includes providing a cap layer to the optical element by a deposition process; and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus.

摘要翻译： 在包括光学元件的装置的光学元件上去除沉积物的方法包括在装置的至少一部分中提供含H2气体和一种或多种选自烃化合物和硅烷化合物的其它化合物，包括生产 来自含H 2气体的H 2的氢原子; 并使具有沉积的光学元件与至少部分氢自由基接触并除去至少部分沉积物。 此外，用于保护包括光学元件的装置的光学元件的方法包括通过沉积工艺向光学元件提供盖层; 并且在使用所述装置期间或之后，如上所述在去除过程中从所述光学元件中去除所述盖层的至少一部分。 该方法可以应用在光刻设备中。

公开(公告)号：US07504643B2

公开(公告)日：2009-03-17

申请号：US11444535

申请日：2006-06-01

申请人： Johannes Maria Freriks ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Johannes Maria Freriks ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Derk Jan Wilfred Klunder ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： G03F7/20 ,  G21G5/00 ,  A61N5/00 ,  C23F1/00 ,  C25F1/00 ,  H05H1/00 ,  H05H1/24

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70925

摘要： A cleaning arrangement for a lithographic apparatus module may be provided in a collector. The cleaning arrangement includes a hydrogen radical source configured to provide a hydrogen radical containing gas to at least part of the module and a pump configured to pump gas through the module such that a flow speed of the hydrogen radical containing gas provided through at least part of the module is at least 1 m/s. The cleaning arrangement may also include a gas shutter configured to modulate a flow of the hydrogen radical containing gas to at least part of the module, a buffer volume of at least 1 m3 in communication with the module, and a pump configured to provide a gas pressure in the buffer volume between 0.001 mbar (0.1 Pa) and 1 mbar (100 Pa). The cleaning arrangement may further include a gas return system.

摘要翻译： 用于光刻设备模块的清洁装置可以设置在收集器中。 清洁装置包括被配置为向至少部分模块提供含氢自由基气体的氢根源，以及构造成将气体泵送通过模块的泵，使得通过至少部分的至少一部分提供含氢自由基气体的流速 该模块至少为1米/秒。 清洁装置还可以包括配置成将含氢自由基气体的流动调制到模块的至少一部分的气闸，与模块连通的至少1m 3的缓冲体积以及配置成提供气体的泵 缓冲体积在0.001毫巴（0.1帕）至1毫巴（100帕）之间的压力。 清洁装置还可以包括气体返回系统。

公开(公告)号：US07463413B2

公开(公告)日：2008-12-09

申请号：US11337807

申请日：2006-01-24

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder

IPC分类号： F21V9/04 ,  F21V9/06 ,  G02B5/08 ,  G02B5/20

CPC分类号： G02B1/10 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/283 ,  G03F1/24 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/062 ,  G21K2201/067

摘要： A multi-layer mirror includes on top of the multi-layer mirror a spectral purity enhancement layer, for example for application in an EUV lithographic apparatus. This spectral purity enhancement layer includes a first spectral purity enhancement layer, but between the multi-layer mirror and first spectral purity enhancement layer there may optionally be an intermediate layer or a second spectral purity enhancement layer and intermediate layer. Hence, multi-layer mirrors with the following configurations are possible: multi-layer mirror/first spectral purity enhancement layer; multi-layer mirror/intermediate layer/first spectral purity enhancement layer; and multi-layer mirror/second spectral purity enhancement layer/intermediate layer/first spectral purity enhancement layer. The spectral purity of normal incidence radiation may be enhanced, such that DUV radiation is diminished relatively stronger than EUV radiation.

摘要翻译： 多层反射镜在多层镜的顶部包括光谱纯度增强层，例如用于EUV光刻设备中。 该光谱纯度增强层包括第一光谱纯度增强层，但是在多层反射镜和第一光谱纯度增强层之间，可选地可以有中间层或第二光谱纯度增强层和中间层。 因此，具有以下配置的多层反射镜是可能的：多层镜/第一光谱纯度增强层; 多层镜/中间层/第一光谱纯度增强层; 和多层镜/第二光谱纯度增强层/中间层/第一光谱纯度增强层。 可以增强正常入射辐射的光谱纯度，使得DUV辐射比EUV辐射相对更强。

公开(公告)号：US20080273188A1

公开(公告)日：2008-11-06

申请号：US11797358

申请日：2007-05-02

申请人： Wouter Anthon Soer ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Niels Machiel Driessen ,  Vadim Yevgenyevich Banine ,  Johannes Christiaan Leonardus Franken ,  Olav Waldemar Vladimir Frijns ,  Derk Jan Wilfred Klunder

发明人： Wouter Anthon Soer ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Niels Machiel Driessen ,  Vadim Yevgenyevich Banine ,  Johannes Christiaan Leonardus Franken ,  Olav Waldemar Vladimir Frijns ,  Derk Jan Wilfred Klunder

IPC分类号： G03B27/74

CPC分类号： G03F7/70916 ,  G03F7/70558 ,  G03F7/7085

摘要： A device is arranged to measure a quantity relating to radiation. The device includes a sensor configured to measure the quantity, a screen arranged to protect the sensor from incoming particles emitted from a source configured to emit extreme ultraviolet radiation, and a mirror configured to redirect extreme ultraviolet radiation emitted by the source, past the screen, to the sensor.

摘要翻译： 一个装置被安排来测量与辐射有关的数量。 该装置包括被配置为测量该数量的传感器，布置成保护传感器免受从被配置为发射极紫外辐射的源射出的入射颗粒的屏幕，以及被配置为重定向由该源发射的超过紫外线的过滤器， 到传感器。

公开(公告)号：US20080266654A1

公开(公告)日：2008-10-30

申请号：US11790681

申请日：2007-04-26

申请人： Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Frank Jeroen Pieter Schuurmans ,  Vladimir Mihailovitch Krivtsun ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Vladimir Vitalevich Ivanov ,  Konstantin Nikolaevich Koshelev ,  Frank Jeroen Pieter Schuurmans ,  Vladimir Mihailovitch Krivtsun ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： G02B21/00

CPC分类号： G21K7/00

摘要： An extreme ultraviolet (EUV) microscope configured to analyze a sample. The microscope includes a source of EUV radiation constructed and arranged to generate the EUV radiation with a wavelength at least in a range of about 2-6 nm, and an optical system constructed and arranged to illuminate the sample with the EUV radiation and to collect a radiation emanating from the sample. The optical system is arranged with at least one mirror that includes a multilayer structure for in-phase reflection of at least a portion of the radiation in the range of about 2-6 nm.

摘要翻译： 配置用于分析样品的极紫外（EUV）显微镜。 显微镜包括EUV辐射源，其被构造和布置成产生具有至少在约2-6nm范围内的波长的EUV辐射，以及构造和布置成用EUV辐射照射样品并收集一个 样品发出的辐射。 光学系统布置有至少一个反射镜，该反射镜包括多层结构，用于至少部分辐射在约2-6nm范围内的同相反射。

公开(公告)号：US20080239262A1

公开(公告)日：2008-10-02

申请号：US11730187

申请日：2007-03-29

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： H01J1/12 ,  H01J1/42 ,  H01J1/44 ,  H01J7/06

CPC分类号： G03F7/70033 ,  B82Y10/00 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A radiation source for generating electromagnetic radiation includes an anode, a cathode, and a discharge space. The anode and the cathode are configured to create a discharge in a substance in the discharge space to form a plasma so as to generate the electromagnetic radiation. The radiation source also includes a fuel supply constructed and arranged to supply at least a component of the substance to a location near the discharge space. The fuel supply is located at a distance from the anode and the cathode. The radiation source also includes a further supply constructed and arranged to create and/or maintain a cooling and/or protective layer on or near the anode and/or cathode.

摘要翻译： 用于产生电磁辐射的辐射源包括阳极，阴极和放电空间。 阳极和阴极被配置为在放电空间中的物质中产生放电以形成等离子体，以便产生电磁辐射。 辐射源还包括构造和布置为将物质的至少一部分供应到放电空间附近的位置的燃料供应。 燃料供应位于距离阳极和阴极一定距离处。 辐射源还包括构造和布置成在阳极和/或阴极上或附近产生和/或维持冷却和/或保护层的另外的供给源。

公开(公告)号：US20080198724A1

公开(公告)日：2008-08-21

申请号：US11908411

申请日：2006-03-07

申请人： Marcello Leonardo Mario Balistreri ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Marcello Leonardo Mario Balistreri ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： G11B7/00

CPC分类号： G11B7/0065 ,  G03H1/28 ,  G03H2001/0417 ,  G03H2001/266 ,  G03H2210/22 ,  G11B7/00772 ,  G11B7/083 ,  G11B7/127 ,  G11B7/24038 ,  G11B7/24044

摘要： The invention relates to a method for recording data in a holographic recording medium (14) in a holographic data storage system. This method comprises the steps of: —recording a first hologram (H1, H1′) through a first side (141) of said holographic recording medium, —rotating said holographic recording medium (14), —recording a second hologram (H2, H2′) through a second side (142) of same holographic recording medium.

摘要翻译： 本发明涉及一种用于在全息数据存储系统中的全息记录介质（14）中记录数据的方法。 该方法包括以下步骤： - 通过所述全息记录介质的第一侧（141）记录第一全息图（H 1，H 1'），旋转所述全息记录介质（14）， - 记录第二全息图（H 2，H 2'）通过相同全息记录介质的第二侧（142）。