公开(公告)号：US20070125458A1

公开(公告)日：2007-06-07

申请号：US10580463

申请日：2004-12-10

申请人： Minoru Kawasaki ,  Tadashi Oshima ,  Takao Kobayashi ,  Kazuyuki Nakanishi ,  Hideo Tachikawa

发明人： Minoru Kawasaki ,  Tadashi Oshima ,  Takao Kobayashi ,  Kazuyuki Nakanishi ,  Hideo Tachikawa

IPC分类号： C22C9/06 ,  C22C9/00

CPC分类号： C22C9/06 ,  C22C9/00

摘要： This aims to provide a wear-resistant copper-based alloy, which is advantages in not only enhancing wear resistance in a high temperature range but also enhancing crack resistance and machinability and which is especially suitable for forming a cladding layer. The wear-resistant copper-based alloy comprises, by weight, 4.7 to 22.0% nickel, 0.5 to 5.0% silicon, 2.7 to 22.0% iron, 1.0 to 15.0% chromium, 0.01 to 2.00% cobalt, 2.7 to 22.0% one or more of tantalum, titanium, zirconium and hafnium, and the balance of copper with inevitable impurities.

摘要翻译： 本发明的目的在于提供一种耐磨铜基合金，其优点在于不仅在高温范围内提高耐磨性，而且提高抗裂性和切削性，特别适合于形成包覆层。 耐磨铜基合金按重量计含有4.7〜22.0％的镍，0.5〜5.0％的硅，2.7〜22.0％的铁，1.0〜15.0％的铬，0.01〜2.00％的钴，2.7〜22.0％的一种或多种 的钽，钛，锆和铪，余量为铜与不可避免的杂质。

公开(公告)号：US20070108009A1

公开(公告)日：2007-05-17

申请号：US11512214

申请日：2006-08-30

申请人： Junji Ando ,  Naoyuki Sakai ,  Toshifumi Sakai ,  Toshiyuki Saito ,  Hajime Fukami ,  Kazuyuki Nakanishi ,  Hiroyuki Mori ,  Hideo Tachikawa

发明人： Junji Ando ,  Naoyuki Sakai ,  Toshifumi Sakai ,  Toshiyuki Saito ,  Hajime Fukami ,  Kazuyuki Nakanishi ,  Hiroyuki Mori ,  Hideo Tachikawa

IPC分类号： F16D27/115 ,  F16D13/74

CPC分类号： F16D13/64 ,  F16D13/648 ,  F16D13/74 ,  F16D27/004 ,  F16D27/115 ,  F16D2027/008 ,  F16D2065/132 ,  F16D2069/004 ,  F16D2200/0008 ,  F16D2200/0039 ,  F16D2200/0052 ,  F16D2300/10

摘要： A drive force transmission device has an outer clutch plate and an inner clutch plate, which are rotatable relative to each other about a common rotational axis. The inner and outer clutch plates become frictionally engaged with each other with lubricant oil provided in between. The outer and inner clutch plates each have a sliding surface. The sliding surfaces face each other. A diamond-like carbon film is formed on the sliding surface of the outer clutch plate. Fine grooves are formed in the sliding surface of the inner clutch plate. The proportion of the sliding area to the sliding surface of the inner clutch plate at the initial stage of use is 55 to 90%.

摘要翻译： 驱动力传递装置具有外离合器片和内离合器片，它们能绕相同的旋转轴线相对于彼此旋转。 内外离合器片之间设置有润滑油，彼此摩擦接合。 外离合板和内离合器板各自具有滑动面。 滑动面相互面对。 在外离合器板的滑动面上形成类金刚石碳膜。 在内离合器板的滑动面上形成微细的槽。 在使用初始阶段，内侧离合器片的滑动面的滑动面积的比例为55〜90％。

公开(公告)号：US20060057768A1

公开(公告)日：2006-03-16

申请号：US10538222

申请日：2003-12-09

申请人： Kazuyuki Nakanishi ,  Tadashi Oshima ,  Hideo Hasegawa ,  Hiroyuki Mori ,  Hideo Tachikawa ,  Yukio Miyachi ,  Yasushi Yamada ,  Hiroyuki Ueda ,  Masayasu Ishiko

发明人： Kazuyuki Nakanishi ,  Tadashi Oshima ,  Hideo Hasegawa ,  Hiroyuki Mori ,  Hideo Tachikawa ,  Yukio Miyachi ,  Yasushi Yamada ,  Hiroyuki Ueda ,  Masayasu Ishiko

IPC分类号： H01L21/44

CPC分类号： H01L23/3732 ,  H01L2224/48091 ,  H01L2224/48247 ,  H01L2224/49109 ,  H01L2924/1305 ,  H01L2924/13055 ,  H01L2924/13091 ,  H01L2924/19107 ,  H01L2924/3025 ,  H01L2924/00014 ,  H01L2924/00

摘要： A semiconductor element heat dissipating member is provided which has excellent heat dissipation characteristics and adhesion characteristics and enables production of a semiconductor device at a low cost. A semiconductor device using the same, and a method of producing the same are also provided. The semiconductor element heat dissipating member has a conductive substrate and an electrically insulating amorphous carbon film containing hydrogen, and the electrically insulating amorphous carbon film is formed at least on a region of the conductive substrate on which region a semiconductor element is to be mounted.

摘要翻译： 提供了具有优异的散热特性和粘合特性的半导体元件散热构件，并且能够以低成本制造半导体器件。 还提供了使用该半导体器件的半导体器件及其制造方法。 半导体元件散热构件具有导电基板和含有氢的电绝缘非晶碳膜，并且至少在导电基板的要安装半导体元件的区域的区域上形成电绝缘非晶碳膜。

公开(公告)号：US6090497A

公开(公告)日：2000-07-18

申请号：US32068

申请日：1998-02-27

申请人： Hiroyuki Mori ,  Kazuyuki Nakanishi ,  Hideoki Fukushima ,  Hideo Tachikawa

发明人： Hiroyuki Mori ,  Kazuyuki Nakanishi ,  Hideoki Fukushima ,  Hideo Tachikawa

IPC分类号： C23C4/08 ,  C22C1/04 ,  C22C21/02 ,  C22C28/00 ,  C23C30/00 ,  B32B15/20

CPC分类号： C23C30/00 ,  C22C1/0416 ,  C22C21/02 ,  C22C28/00 ,  Y10S428/937 ,  Y10T428/12674 ,  Y10T428/12736 ,  Y10T428/12743 ,  Y10T428/1275

摘要： A wear-resistant coated member comprising 26 to 80% by weight of silicon (Si), additional components if required and necessary, the remainder being aluminum (Al), and unavoidable impurities, wherein Si is in a fine particle, and has an average particle size in the range of 0.01 to less than 10 .mu.m, and Al matrix and 3% by weight or more of Si form solid solutions. The wear-resistant coated member has excellent wear resistance and machinability.

摘要翻译： 包含26至80重量％的硅（Si）的耐磨涂层构件，如果需要和必要的另外的组分，剩余部分是铝（Al）和不可避免的杂质，其中Si是细颗粒，并且具有平均 在0.01至小于10μm的范围内的粒径，Al基质和3重量％以上的Si形成固体溶液。 耐磨涂层件具有优异的耐磨性和可加工性。

公开(公告)号：US07972653B2

公开(公告)日：2011-07-05

申请号：US11854957

申请日：2007-09-13

申请人： Hideo Tachikawa ,  Ken-ichi Suzuki ,  Fumio Shimizu ,  Takashi Iseki

发明人： Hideo Tachikawa ,  Ken-ichi Suzuki ,  Fumio Shimizu ,  Takashi Iseki

IPC分类号： B05D3/02

CPC分类号： C23G1/32 ,  C23C14/021 ,  C23C16/0227

摘要： A coating film removal method for a coated member having a coating film formed over the surface of a substrate is disclosed, which can easily achieve a coating film removal, even for a carbon-based coating film containing carbon as a main component, besides a carbon-based coating film containing a metal element etc. A coated member regeneration method is also disclosed, which removes a coating film from a coated member, and then forms a new coating film over the member, to regenerate the coated member. The coating film removal method is adapted to remove a carbon-based coating film from a coated member (10) including a substrate, and the carbon-based coating film coated on at least a portion of a surface of the substrate while containing carbon as a main component. The coating film removal method includes bringing a molten salt having an oxidizing function for carbon into contact with the carbon-based coating film, to remove at least a portion of the carbon-based coating film coated over the surface of the substrate. A coated member regeneration method includes removing the carbon-based coating film from the coated member, using such coating film removal method, and subsequently forming a coating film on at least a portion of a surface of the film-removed member (11).

摘要翻译： 公开了一种在基板表面上形成有涂膜的涂布部件的涂膜除去方法，即使对于以碳为主要成分的碳系涂膜也可以容易地进行除去膜，除了碳 含有金属元素等的涂膜。还公开了一种涂覆部件再生方法，其从涂覆部件除去涂膜，然后在该部件上形成新的涂膜，以再生涂覆部件。 涂膜去除方法适于从包括基材的涂布构件（10）中除去碳基涂膜，并且将涂覆在基材表面的至少一部分上的碳基涂膜同时含有碳作为 主要成分。 涂膜去除方法包括使具有碳氧化功能的熔融盐与碳基涂膜接触，以除去涂覆在基材表面上的碳基涂膜的至少一部分。 涂覆部件再生方法包括使用这种涂膜除去方法从涂覆部件上除去碳基涂膜，并且随后在除膜部件（11）的表面的至少一部分上形成涂膜。

公开(公告)号：US07815028B2

公开(公告)日：2010-10-19

申请号：US10404347

申请日：2003-04-02

申请人： Junji Ando ,  Naoyuki Sakai ,  Toshifumi Sakai ,  Hajime Fukami ,  Toshiyuki Saito ,  Koji Nishi ,  Kazuyuki Nakanishi ,  Hiroyuki Mori ,  Hideo Tachikawa

发明人： Junji Ando ,  Naoyuki Sakai ,  Toshifumi Sakai ,  Hajime Fukami ,  Toshiyuki Saito ,  Koji Nishi ,  Kazuyuki Nakanishi ,  Hiroyuki Mori ,  Hideo Tachikawa

IPC分类号： F16D27/115 ,  F16D27/12 ,  F16D13/74

CPC分类号： F16D27/115 ,  F16D27/004 ,  F16D69/02 ,  F16D2027/008 ,  F16D2250/0038

摘要： A friction clutch includes an iron inner clutch plate and two iron outer clutch plates. Each clutch plate has a sliding surface that friction-engages with the other clutch plates. A diamond-like carbon film containing silicon, which functions as a solid lubricant, is formed on the sliding surface of each outer clutch plate through a conventional method such as plasma chemical vapor deposition. The diamond-like carbon film contains 1 wt % to 80 wt % of silicon. A coupling device includes a pilot clutch mechanism that has the friction clutch and an electromagnetic actuator. As a result, the friction clutch has an improved resistance to wear, and the coupling device is durable.

摘要翻译： 摩擦离合器包括铁内离合器板和两个铁外离合器板。 每个离合器片具有与其他离合器片摩擦接合的滑动表面。 通过诸如等离子体化学气相沉积的常规方法，在每个外离合器板的滑动表面上形成含有作为固体润滑剂的硅的类金刚石碳膜。 类金刚石碳膜含有1重量％至80重量％的硅。 联接装置包括具有摩擦离合器和电磁致动器的先导离合器机构。 结果，摩擦离合器具有改进的耐磨性，并且联接装置是耐用的。

公开(公告)号：US07803433B2

公开(公告)日：2010-09-28

申请号：US10544674

申请日：2004-02-12

申请人： Junji Ando ,  Naoyuki Sakai ,  Toshiyuki Saito ,  Kazuyuki Nakanishi ,  Hiroyuki Mori ,  Hideo Tachikawa ,  Kyouji Itou ,  Mikio Fujioka ,  Yoshiyuki Funaki

发明人： Junji Ando ,  Naoyuki Sakai ,  Toshiyuki Saito ,  Kazuyuki Nakanishi ,  Hiroyuki Mori ,  Hideo Tachikawa ,  Kyouji Itou ,  Mikio Fujioka ,  Yoshiyuki Funaki

IPC分类号： H05H1/24 ,  H01F41/00 ,  G21H5/00 ,  G21H1/00 ,  B01J19/08

CPC分类号： C23C16/4583 ,  C23C16/272 ,  C23C16/277 ,  C23C16/45563 ,  C23C16/45578 ,  C23C16/4587 ,  C23C16/509 ,  C23C16/52 ,  F16D13/64 ,  F16D2250/0046 ,  H01J37/3244 ,  H01J37/32779

摘要： An amorphous carbon film forming apparatus according to the present invention is characterized by being provided with a film forming furnace 11; plural workpiece fixtures 23 for supporting plural plate-like workpieces 22 in a state that the same are piled up vertically in parallel with the interval between facing surfaces of two vertically adjoining of the plate-like workpieces 22 being in a range of 2 to 30 millimeters, the plural workpiece fixtures 23 being arranged within the film forming furnace 11 at a regular angular interval on a circle and being connected to a negative electrode; nozzles 31, 32 provided for supplying a processing gas and including at least one nozzle arranged at a center of the circle on which the plural workpiece fixtures 23 are arranged and plural nozzles arranged at a regular angular interval on another circle which surrounds the workpieces fixtures 23 radially outside thereof; and a plasma power supply connected to at least the workpiece fixtures 23. By controlling the supply gas pressure to be in a range of 13 to 1,330 Pa and a sheath width to be made in a range of 2 to 30 mm, the discharge is kept stably. As a consequence, it can be realized to form amorphous carbon films efficiently at a low cost.

摘要翻译： 根据本发明的无定形碳膜形成装置的特征在于设置有成膜炉11; 多个用于支撑多个板状工件22的工件夹具23处于2至30毫米的范围内的状态下，垂直于两个垂直相邻的板状工件22的相对表面之间的间隔垂直堆叠。 多个工件固定件23以规定的角度间隔布置在成膜炉11内并连接到负极; 用于供给处理气体的喷嘴31,32，并且包括布置在其上布置有多个工件固定件23的圆的中心处的至少一个喷嘴和在围绕工件固定件23的另一个圆周上以规则的角度间隔布置的多个喷嘴 径向地在其外面; 以及与至少工件夹具23连接的等离子体电源。通过将供给气体压力控制在13〜1330Pa的范围内，将鞘宽度设定在2〜30mm的范围内，进行放电 稳定地 因此，可以实现以低成本有效地形成无定形碳膜。

公开(公告)号：US20080317976A1

公开(公告)日：2008-12-25

申请号：US10544674

申请日：2004-02-12

申请人： Junji Ando ,  Naoyuki Sakai ,  Toshiyuki Saito ,  Kazuyuki Nakanishi ,  Hiroyuki Mori ,  Hideo Tachikawa ,  Kyouji Itou ,  Mikio Fujioka ,  Yoshiyuki Funaki

发明人： Junji Ando ,  Naoyuki Sakai ,  Toshiyuki Saito ,  Kazuyuki Nakanishi ,  Hiroyuki Mori ,  Hideo Tachikawa ,  Kyouji Itou ,  Mikio Fujioka ,  Yoshiyuki Funaki

IPC分类号： C23C16/26 ,  C23C16/513

CPC分类号： C23C16/4583 ,  C23C16/272 ,  C23C16/277 ,  C23C16/45563 ,  C23C16/45578 ,  C23C16/4587 ,  C23C16/509 ,  C23C16/52 ,  F16D13/64 ,  F16D2250/0046 ,  H01J37/3244 ,  H01J37/32779

摘要： An amorphous carbon film forming apparatus according to the present invention is characterized by being provided with a film forming furnace 11; plural workpiece fixtures 23 for supporting plural plate-like workpieces 22 in a state that the same are piled up vertically in parallel with the interval between facing surfaces of two vertically adjoining of the plate-like workpieces 22 being in a range of 2 to 30 millimeters, the plural workpiece fixtures 23 being arranged within the film forming furnace 11 at a regular angular interval on a circle and being connected to a negative electrode; nozzles 31, 32 provided for supplying a processing gas and including at least one nozzle arranged at a center of the circle on which the plural workpiece fixtures 23 are arranged and plural nozzles arranged at a regular angular interval on another circle which surrounds the workpieces fixtures 23 radially outside thereof; and a plasma power supply connected to at least the workpiece fixtures 23. By controlling the supply gas pressure to be in a range of 13 to 1,330 Pa and a sheath width to be made in a range of 2 to 30 mm, the discharge is kept stably. As a consequence, it can be realized to form amorphous carbon films efficiently at a low cost.

摘要翻译： 根据本发明的无定形碳膜形成装置的特征在于设置有成膜炉11; 多个用于支撑多个板状工件22的工件夹具23处于2至30毫米的范围内的状态下，垂直于两个垂直相邻的板状工件22的相对表面之间的间隔垂直堆叠。 多个工件固定件23以规定的角度间隔布置在成膜炉11内并连接到负极; 用于供给处理气体的喷嘴31,32，并且包括布置在其上布置有多个工件固定件23的圆的中心处的至少一个喷嘴和在围绕工件固定件23的另一个圆周上以规则的角度间隔布置的多个喷嘴 径向地在其外面; 以及与至少工件夹具23连接的等离子体电源。通过将供给气体压力控制在13〜1330Pa的范围内，将鞘宽度设定在2〜30mm的范围内，进行放电 稳定地 因此，可以实现以低成本有效地形成无定形碳膜。

公开(公告)号：US07455824B2

公开(公告)日：2008-11-25

申请号：US11002125

申请日：2004-12-03

申请人： Kazuyuki Nakanishi ,  Tadashi Oshima ,  Hideo Hasegawa ,  Hiroyuki Mori ,  Takashi Iseki ,  Hideo Tachikawa ,  Munehisa Matsui

发明人： Kazuyuki Nakanishi ,  Tadashi Oshima ,  Hideo Hasegawa ,  Hiroyuki Mori ,  Takashi Iseki ,  Hideo Tachikawa ,  Munehisa Matsui

IPC分类号： B32B9/00

CPC分类号： C23C16/26 ,  Y10T428/30

摘要： To provide a soft amorphous carbon exhibiting a low elastic modulus, an amorphous-carbon coated member provided with a coated film comprising the amorphous carbon, and a process for forming an amorphous carbon film. The amorphous carbon comprises carbon as a major component and hydrogen in an amount of from more than 30 atomic % to 60 atomic % or less, and exhibits an elastic modulus of from 40 or more to 150 GPa or less. Moreover, the amorphous-carbon coated member comprises a conductive substrate, and a coated film fixed on at least a part of a surface of the substrate and composed of the amorphous carbon. In addition, in a process for forming the amorphous-carbon coated film, an amorphous carbon film is formed on a surface of conductive substrates by a plasma CVD method. Not only a plurality of the substrates are disposed on a substrate holder, which is disposed in a film-forming furnace and is connected with a negative electrode, in such a state that they face to each other, but also a processing gas pressure and a plasma power source are operated so as to overlap negative glows of the neighboring two substrates.

摘要翻译： 为了提供具有低弹性模量的软无定形碳，设置有包含无定形碳的涂膜的非晶碳涂覆部件以及形成非晶碳膜的方法。 无定形碳包含碳为主要成分，氢为超过30原子％至60原子％以下的量，弹性模量为40以上且150GPa以下。 此外，无定形碳涂覆部件包括导电基板和固定在基板表面的至少一部分上并由非晶碳构成的涂膜。 另外，在形成非晶碳涂膜的方法中，通过等离子体CVD法在导电性基板的表面上形成无定形碳膜。 不仅多个基板被设置在基板保持器上，所述基板保持器设置在成膜炉中并且与负极连接，并且彼此相对的状态，而且处理气体压力和 等离子体动力源被操作成与相邻两个基板的负发光重叠。

公开(公告)号：US07404866B2

公开(公告)日：2008-07-29

申请号：US10480653

申请日：2002-06-26

申请人： Kazuyuki Nakanishi ,  Hideo Tachikawa ,  Hiroyuki Mori ,  Tadashi Oshima

发明人： Kazuyuki Nakanishi ,  Hideo Tachikawa ,  Hiroyuki Mori ,  Tadashi Oshima

IPC分类号： C22C38/12 ,  C22C9/00 ,  C22C21/00 ,  C22C47/16

CPC分类号： F16H57/041 ,  B22F7/08 ,  B22F2999/00 ,  C23C4/04 ,  C23C4/06 ,  C23C4/08 ,  C23C4/12 ,  C23C8/02 ,  C23C24/08 ,  F16C33/06 ,  F16C33/12 ,  F16C2204/20 ,  F16C2204/60 ,  B22F3/115

摘要： A sliding member includes a superficial portion forming a sliding surface. The superficial portion includes an oxygen-containing alloy containing at least one metallic element selected from the group consisting of molybdenum and tungsten in an amount of from 2 to 80% by weight; and oxygen in an amount of from 0.5 to 15% by weight. The sliding member sustains lubricating characteristics given to the sliding surface over a long period of time to maintain a low friction coefficient and durability.

摘要翻译： 滑动构件包括形成滑动表面的表面部分。 表面部分包括含有至少一种金属元素的含氧合金，其含量为2-80重量％的钼和钨组成的组; 和氧浓度为0.5〜15重量％。 滑动构件在长时间内保持给予滑动面的润滑特性，以保持低摩擦系数和耐久性。