公开(公告)号：US08675173B2

公开(公告)日：2014-03-18

申请号：US13044325

申请日：2011-03-09

申请人： Paulus Martinus Maria Liebregts ,  Johannes Henricus Wilhelmus Jacobs ,  Tammo Uitterdijk

发明人： Paulus Martinus Maria Liebregts ,  Johannes Henricus Wilhelmus Jacobs ,  Tammo Uitterdijk

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70341

摘要： A immersion lithographic apparatus is disclosed in which one or more liquid diverters are positioned in a space surrounded by a liquid confinement structure. A function of the liquid diverter(s) is to hinder the formation of one or more recirculation zones of immersion liquid which may lead to variations in refractive index of the immersion liquid in the space and thereby imaging errors.

摘要翻译： 公开了一种浸没式光刻设备，其中一个或多个液体转向器位于由液体限制结构包围的空间中。 液体转向器的功能是妨碍形成一个或多个浸没液体的再循环区域，这可能导致浸没液体在空间中的折射率变化，从而造成误差。

公开(公告)号：US07126664B2

公开(公告)日：2006-10-24

申请号：US10888513

申请日：2004-07-12

申请人： Bernardus Antonius Johannes Luttikhuis ,  Petrus Rutgerus Bartray ,  Johannes Henricus Wilhelmus Jacobs ,  Thijs Harink ,  Paulus Martinus Maria Liebregts

发明人： Bernardus Antonius Johannes Luttikhuis ,  Petrus Rutgerus Bartray ,  Johannes Henricus Wilhelmus Jacobs ,  Thijs Harink ,  Paulus Martinus Maria Liebregts

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/62

CPC分类号： G03F7/70841

摘要： A lithographic apparatus is disclosed. The apparatus includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam. A projection system is configured to project the patterned radiation beam onto a target portion of a substrate. A first vacuum environment contains the projection system, a second vacuum environment contains the patterning device support, and a separator separates the first and second vacuum environments. The separator includes an aperture for passing the projection beam from the first vacuum environment towards the patterning device and/or vice-versa. The patterning device forms at least part of a seal for substantially sealing the aperture of the separator.

摘要翻译： 公开了一种光刻设备。 该装置包括构造成支撑图案形成装置的支撑件，该图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上。 第一真空环境包含投影系统，第二真空环境包含图案形成装置支撑件，分离器分离第一和第二真空环境。 分离器包括用于使投影束从第一真空环境朝向图案形成装置传递的孔，和/或反之亦然。 图案形成装置形成用于基本上密封隔膜的孔的密封件的至少一部分。

公开(公告)号：US20110199592A1

公开(公告)日：2011-08-18

申请号：US12946618

申请日：2010-11-15

申请人： Roelof Frederik De Graff ,  Marcus Adrianus Van De Kerkhof ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Gerardus Martinus Antonius De Rooij ,  Martijn Houben ,  Nina Vladimirovna Dziomkina ,  Johanna Antoinette Maria Sondag-Huethorst ,  Niek Elout De Kruijf ,  Vijay Kumar Badam

发明人： Roelof Frederik De Graff ,  Marcus Adrianus Van De Kerkhof ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Gerardus Martinus Antonius De Rooij ,  Martijn Houben ,  Nina Vladimirovna Dziomkina ,  Johanna Antoinette Maria Sondag-Huethorst ,  Niek Elout De Kruijf ,  Vijay Kumar Badam

IPC分类号： G03B27/52 ,  C09J7/00 ,  F16J15/02

CPC分类号： C09J7/0217 ,  B32B2307/546 ,  B32B2307/56 ,  B32B2307/71 ,  B32B2307/73 ,  B32B2405/00 ,  C09J7/21 ,  C09J7/385 ,  G03F7/70341 ,  G03F7/70808 ,  G03F7/70916 ,  G03F7/7095 ,  Y10T428/28 ,  Y10T428/2843 ,  Y10T428/2848 ,  Y10T428/2852

摘要： A sealing member is provided to prevent immersion liquid ingress to a gap between components. The sealing member has a plastic or polymer sealing portion that is adhered to the components forming the gap being sealed. The sealing member is constructed so as to reduce the force-coupling, in particular the time-related force-coupling, between the components being sealed.

摘要翻译： 提供密封构件以防止浸入液体进入部件之间的间隙。 密封构件具有粘附到形成被密封的间隙的部件的塑料或聚合物密封部分。 密封构件被构造成减少被密封的部件之间的力耦合，特别是与时间有关的力耦合。

公开(公告)号：US09256136B2

公开(公告)日：2016-02-09

申请号：US13090311

申请日：2011-04-20

申请人： Rogier Hendrikus Magdalena Cortie ,  Paulus Martinus Maria Liebregts ,  Michel Riepen ,  Fabrizio Evangelista

发明人： Rogier Hendrikus Magdalena Cortie ,  Paulus Martinus Maria Liebregts ,  Michel Riepen ,  Fabrizio Evangelista

IPC分类号： G03F7/20

CPC分类号： G03F7/70341

摘要： A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.

摘要翻译： 公开了一种用于光刻设备的流体处理结构，流体处理结构在从被配置为将浸没流体包含在流体处理结构外部区域的空间的边界处依次具有：细长开口或多个开口 在使用中的第一线指向被配置为支撑衬底的衬底和/或衬底台; 气刀设备，其具有在第二线中的细长孔; 以及与气刀装置相邻的细长开口或多个开口。

公开(公告)号：US09036127B2

公开(公告)日：2015-05-19

申请号：US12423528

申请日：2009-04-14

申请人： Clemens Johannes Gerardus Van den Dungen ,  Nicolaas Franciscus Koppelaars ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Marcel Beckers ,  Richard Moerman ,  Cédric Désiré Grouwstra ,  Danny Maria Hubertus Philips ,  Remko Jan Peter Verhees ,  Pieter Mulder ,  Evert Van Vliet

发明人： Clemens Johannes Gerardus Van den Dungen ,  Nicolaas Franciscus Koppelaars ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Johannes Catharinus Hubertus Mulkens ,  Erik Henricus Egidius Catharina Eummelen ,  Marcel Beckers ,  Richard Moerman ,  Cédric Désiré Grouwstra ,  Danny Maria Hubertus Philips ,  Remko Jan Peter Verhees ,  Pieter Mulder ,  Evert Van Vliet

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/70341

摘要： An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.

摘要翻译： 公开了一种浸没式光刻设备，其包括被配置为供应流体的流体供应系统，所述流体供应系统具有在第一侧壁中具有多个入口孔的腔室和在第二侧壁中的多个出口孔，所述第一 面向第二侧壁的侧壁，其中入口孔引导流体沿朝向多个出口孔之间的第二侧壁的区域的方向进入腔室。

公开(公告)号：US08860924B2

公开(公告)日：2014-10-14

申请号：US13589841

申请日：2012-08-20

申请人： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Jeroen Johannes Sophia M. Mertens ,  Jan-Gerard Cornelis Van Der Toorn ,  Michel Riepen

发明人： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Jeroen Johannes Sophia M. Mertens ,  Jan-Gerard Cornelis Van Der Toorn ,  Michel Riepen

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03F7/20

CPC分类号： G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

摘要： An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

摘要翻译： 浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。 为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。

公开(公告)号：US08248577B2

公开(公告)日：2012-08-21

申请号：US11120186

申请日：2005-05-03

申请人： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Jeroen Johannes Sophia M. Mertens ,  Jan-Gerard Cornelis Van Der Toorn ,  Michel Riepen

发明人： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Jeroen Johannes Sophia M. Mertens ,  Jan-Gerard Cornelis Van Der Toorn ,  Michel Riepen

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

摘要： An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

摘要翻译： 浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。 为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。

公开(公告)号：US20110261332A1

公开(公告)日：2011-10-27

申请号：US13090311

申请日：2011-04-20

申请人： Rogier Hendrikus Magdalena CORTIE ,  Paulus Martinus Maria Liebregts ,  Michel Riepen ,  Fabrizio Evangelista

发明人： Rogier Hendrikus Magdalena CORTIE ,  Paulus Martinus Maria Liebregts ,  Michel Riepen ,  Fabrizio Evangelista

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.

摘要翻译： 公开了一种用于光刻设备的流体处理结构，流体处理结构在从被配置为将浸没流体包含在流体处理结构外部区域的空间的边界处依次具有：细长开口或多个开口， 在使用中的第一线指向被配置为支撑衬底的衬底和/或衬底台; 气刀设备，其具有在第二线中的细长孔; 以及与气刀装置相邻的细长开口或多个开口。

公开(公告)号：US08634058B2

公开(公告)日：2014-01-21

申请号：US12579083

申请日：2009-10-14

申请人： Jan-Jaap Kuit ,  Paulus Martinus Maria Liebregts

发明人： Jan-Jaap Kuit ,  Paulus Martinus Maria Liebregts

IPC分类号： G02B27/42 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/70358

摘要： An immersion lithographic apparatus is provided in which a maximum permissible velocity of the substrate relative to a fluid confinement structure that controls the immersion fluid is determined based on a property of the substrate to be exposed and, during the exposure process, the velocity of the substrate relative to the fluid confinement structure is limited to be below this maximum permissible velocity.

摘要翻译： 提供一种浸没式光刻设备，其中基于待暴露的基板的性质和在曝光过程中基板的速度确定基板相对于控制浸没流体的流体限制结构的最大允许速度 相对于流体限制结构被限制在低于该最大允许速度。

公开(公告)号：US08823919B2

公开(公告)日：2014-09-02

申请号：US12946566

申请日：2010-11-15

申请人： Nina Vladimirovna Dziomkina ,  Roelof Frederik De Graaf ,  Marcus Adrianus Van De Kerkhof ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Gerardus Martinus Antonius De Rooij ,  Martijn Houben ,  Vijay Kumar Badam ,  Johanna Antoinette Maria Sondag-Huethorst ,  Niek Elout De Kruijf

发明人： Nina Vladimirovna Dziomkina ,  Roelof Frederik De Graaf ,  Marcus Adrianus Van De Kerkhof ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Gerardus Martinus Antonius De Rooij ,  Martijn Houben ,  Vijay Kumar Badam ,  Johanna Antoinette Maria Sondag-Huethorst ,  Niek Elout De Kruijf

IPC分类号： G03B27/52 ,  B32B7/12 ,  G03F7/20 ,  C09J7/02 ,  C09J7/04

CPC分类号： G03F7/70916 ,  B32B2307/71 ,  B32B2307/73 ,  B32B2405/00 ,  C09J7/385 ,  G03F7/70341 ,  G03F7/7095 ,  Y10T428/28 ,  Y10T428/2843 ,  Y10T428/2848 ,  Y10T428/2852

摘要： A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion is opaque to DUV radiation. It may be resistant to degradation through exposure to DUV radiation. It may have a liquid phobic coating or property.

摘要翻译： 提供一个构件以防止浸入液体进入部件之间的间隙或粘附到至少一个部件以提供浸入系统特征的表面。 该部件具有粘附到部件上的塑料密封部分。 塑料密封部分对于DUV辐射是不透明的。 它可能通过暴露于DUV辐射来抵抗降解。 它可能具有液体恐怖涂层或性质。