METHOD OF FORMING A PATTERN AND METHOD OF MANUFACTURING A CAPACITOR USING THE SAME
    23.
    发明申请
    METHOD OF FORMING A PATTERN AND METHOD OF MANUFACTURING A CAPACITOR USING THE SAME 有权
    形成图案的方法和使用其制造电容器的方法

    公开(公告)号:US20080124911A1

    公开(公告)日:2008-05-29

    申请号:US11945922

    申请日:2007-11-27

    IPC分类号: H01L21/44 H01G4/00

    摘要: In a method of forming a pattern and a method of manufacturing a capacitor using the same, a conductive layer is formed on a mold layer having an opening. A first buffer layer pattern including a polymer having a repeating unit of anthracene-methyl methacrylate and a repeating unit of alkoxyl-vinyl benzene is formed on the conductive layer in the opening. The first buffer layer pattern is baked to cross-link the polymers and form a second buffer layer pattern that is insoluble in a developing solution. The conductive layer on a top portion of the mold layer is selectively removed by using the second buffer layer pattern as an etching mask. Accordingly, a conductive pattern for a semiconductor device is formed. The method of forming a pattern may simplify manufacturing processes for a capacitor and a semiconductor device, and may improve their efficiencies.

    摘要翻译: 在形成图案的方法和使用其的电容器的制造方法中,在具有开口的模具层上形成导电层。 在开口中的导电层上形成包含具有蒽 - 甲基丙烯酸甲酯的重复单元的聚合物和烷氧基 - 乙烯基苯的重复单元的第一缓冲层图案。 烘烤第一缓冲层图案以交联聚合物并形成不溶于显影溶液的第二缓冲层图案。 通过使用第二缓冲层图案作为蚀刻掩模,选择性地去除模层顶部的导电层。 因此,形成用于半导体器件的导电图案。 形成图案的方法可以简化电容器和半导体器件的制造工艺,并且可以提高它们的效率。

    Methods of Fabricating a Microarray
    25.
    发明申请
    Methods of Fabricating a Microarray 审中-公开
    制作微阵列的方法

    公开(公告)号:US20110244397A1

    公开(公告)日:2011-10-06

    申请号:US13079958

    申请日:2011-04-05

    IPC分类号: G03F7/20

    摘要: A method of fabricating a microarray is provided, which includes providing a substrate having a surface that is protected by an acid labile protective group that includes an acetal group represented by formula (1) and has a functional group that can be coupled with a monomer of a probe; applying a photoresist including a photo acid generator to the substrate; selectively exposing the photoresist to deprotect the acid labile protective group that corresponds to an exposed region; removing the photoresist; and coupling the monomer that is combined with the acid labile protective group with the deprotected functional group. Formula (1) has the following structure: wherein, R1 denotes an alkyl group having 1 to 5 carbon atoms, R2 denotes hydrogen or a methyl group, and Y denotes a monomer or a site coupled with the substrate.

    摘要翻译: 提供了一种制造微阵列的方法,其包括提供具有被酸不稳定保护基保护的表面的基底,所述酸不稳定保护基包括由式(1)表示的缩醛基,并具有可以与式 探针 将包含光酸产生剂的光致抗蚀剂施加到基底上; 选择性地暴露光致抗蚀剂以使对应于暴露区域的酸不稳定保护基脱保护; 去除光致抗蚀剂; 并将与酸不稳定保护基结合的单体与去保护的官能团偶合。 式(1)具有以下结构:其中,R 1表示碳原子数为1〜5的烷基,R 2表示氢或甲基,Y表示与基材偶合的单体或部位。

    Photoresist compositions and methods of forming a pattern using the same
    26.
    发明申请
    Photoresist compositions and methods of forming a pattern using the same 审中-公开
    光刻胶组合物和使用其形成图案的方法

    公开(公告)号:US20080102403A1

    公开(公告)日:2008-05-01

    申请号:US11977893

    申请日:2007-10-26

    IPC分类号: G03C1/00

    CPC分类号: G03F7/0397 G03F7/40

    摘要: A photoresist-composition includes about 4 to about 20 percent by weight of an acrylate copolymer; about 0.1 to about 0.5 percent by weight of a photoacid generator; and a solvent. The acrylate copolymer includes about 28 to about 38 percent by mole of a first repeating unit represented by Formula (1), about 28 to about 38 percent by mole of a second repeating unit represented by Formula (2), about 0.5 to about 22 percent by mole of a third repeating unit represented by Formula (3) and about 4 to about 42 percent by mole of a fourth repeating unit represented by Formula (4), wherein R1, R2, R3 and R4 independently represent a hydrogen atom or a C1-C3 alkyl group, X is a blocking group including an alkyl-substituted adamantane or an alkyl-substituted tricycloalkane, Y is a blocking group including a lactone, Z1 is a blocking group including a hydroxyl-substituted adamantane, and Z2 is a blocking group including an alkoxy-substituted adamantane.

    摘要翻译: 光致抗蚀剂组合物包含约4至约20重量%的丙烯酸酯共聚物; 约0.1至约0.5重量%的光酸产生剂; 和溶剂。 丙烯酸酯共聚物包含约28至约38摩尔%的由式(1)表示的第一重复单元,约28至约38摩尔%的由式(2)表示的第二重复单元,约0.5至约22重量% 的由式(3)表示的第三重复单元和约4至约42摩尔%的由式(4)表示的第四重复单元,其中R 1,R 2 R 3和R 4独立地表示氢原子或C 1 -C 3 - 烷基,X是包括烷基取代的金刚烷或烷基取代的三环烷烃的封闭基团,Y是包含内酯的封闭基团,Z 1是包含羟基取代的金刚烷的封闭基团, Z 2是含有烷氧基取代的金刚烷的封端基。

    Battery pack and method of controlling the same
    28.
    发明授权
    Battery pack and method of controlling the same 有权
    电池组及其控制方法

    公开(公告)号:US09166414B2

    公开(公告)日:2015-10-20

    申请号:US13571755

    申请日:2012-08-10

    IPC分类号: H02J7/00 H01M10/44 G01R31/36

    摘要: A battery pack including a plurality of battery cell groups including a first battery cell group and a second battery cell group, a first switch that is connected to the first battery cell group, a second switch that is connected to the second battery cell group, and a controller configured to selectively control charging and discharging operations of the first battery cell group and the second battery cell group using the first switch and the second switch.

    摘要翻译: 一种电池组,包括包括第一电池单元组和第二电池单元组的多个电池单元组,连接到第一电池单元组的第一开关,连接到第二电池单元组的第二开关,以及 控制器,被配置为使用第一开关和第二开关选择性地控制第一电池单元组和第二电池单元组的充电和放电操作。

    Battery pack
    29.
    发明授权
    Battery pack 有权
    电池组

    公开(公告)号:US08822069B2

    公开(公告)日:2014-09-02

    申请号:US12969925

    申请日:2010-12-16

    IPC分类号: H01M2/04 H01M2/22 H01M2/34

    摘要: A battery pack includes a bare cell including an electrode assembly arranged within a can having an opening that is sealed by a cap plate, a protective circuit module (PCM) arranged on the cap plate, a lead member connecting the PCM to the cap plate; a coupling member inserted into the cap plate and coupled to the lead member. The coupling member is made out of a different material than that of the cap plate, each of the coupling member and the lead member include nickel. By including such a coupling member, the strength and durability of the weld connecting the cap plate to the PCM is improved and the contact resistance is lowered.

    摘要翻译: 电池组包括裸电池,包括布置在具有由盖板密封的开口的罐内的电极组件,布置在盖板上的保护电路模块(PCM),将PCM连接到盖板的引线构件; 插入盖板中并联接到引导构件的联接构件。 联接构件由与盖板不同的材料制成,每个联接构件和引导构件都包括镍。 通过包括这样的联接构件,连接盖板与PCM的焊接的强度和耐久性得到改善,并且接触电阻降低。

    Voltage-controlled oscillator robust against power noise and communication apparatus using the same
    30.
    发明授权
    Voltage-controlled oscillator robust against power noise and communication apparatus using the same 有权
    电压控制振荡器对抗功率噪声和使用其的通信设备

    公开(公告)号:US08228132B2

    公开(公告)日:2012-07-24

    申请号:US12779145

    申请日:2010-05-13

    IPC分类号: H03L1/00

    摘要: A voltage-controlled oscillator robust against power supply includes: a regulating unit configured to maintain a virtual power supply of a VCO core circuit in a stable condition with regard to a reference voltage; and a power supply removal unit including second transistors configured to correspond to respective first transistors of the regulating unit, the power supply removal unit being configured to remove power noise of the virtual power supply by using negative feedback through a closed-circuit loop formed by each of the first and second transistors.

    摘要翻译: 稳定抵抗电源的压控振荡器包括:调节单元,被配置成将VCO核心电路的虚拟电源相对于参考电压保持在稳定状态; 以及电源去除单元,包括被配置为对应于所述调节单元的各个第一晶体管的第二晶体管,所述电源去除单元被配置为通过使用由每个所形成的闭环回路的负反馈来消除所述虚拟电源的功率噪声 的第一和第二晶体管。