利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

6 条记录 (耗时 0.015 秒)

    Methods of Fabricating a Microarray
    2.
    发明申请
    Methods of Fabricating a Microarray 审中-公开
    制作微阵列的方法

    公开(公告)号：US20110244397A1

    公开(公告)日：2011-10-06

    申请号：US13079958

    申请日：2011-04-05

    申请人： Myung-Sun Kim ,  Hyo-Jin Yun ,  Se-Kyung Baek ,  Soo-Kyung Kim ,  Ji-Yun Ham ,  Young-Ho Kim

    发明人： Myung-Sun Kim ,  Hyo-Jin Yun ,  Se-Kyung Baek ,  Soo-Kyung Kim ,  Ji-Yun Ham ,  Young-Ho Kim

    IPC分类号： G03F7/20

    CPC分类号： G03F7/165 ,  G01N33/487 ,  G03F7/0392 ,  G03F7/095 ,  G03F7/405

    摘要： A method of fabricating a microarray is provided, which includes providing a substrate having a surface that is protected by an acid labile protective group that includes an acetal group represented by formula (1) and has a functional group that can be coupled with a monomer of a probe; applying a photoresist including a photo acid generator to the substrate; selectively exposing the photoresist to deprotect the acid labile protective group that corresponds to an exposed region; removing the photoresist; and coupling the monomer that is combined with the acid labile protective group with the deprotected functional group. Formula (1) has the following structure: wherein, R1 denotes an alkyl group having 1 to 5 carbon atoms, R2 denotes hydrogen or a methyl group, and Y denotes a monomer or a site coupled with the substrate.

    摘要翻译： 提供了一种制造微阵列的方法，其包括提供具有被酸不稳定保护基保护的表面的基底，所述酸不稳定保护基包括由式（1）表示的缩醛基，并具有可以与式 探针 将包含光酸产生剂的光致抗蚀剂施加到基底上; 选择性地暴露光致抗蚀剂以使对应于暴露区域的酸不稳定保护基脱保护; 去除光致抗蚀剂; 并将与酸不稳定保护基结合的单体与去保护的官能团偶合。 式（1）具有以下结构：其中，R 1表示碳原子数为1〜5的烷基，R 2表示氢或甲基，Y表示与基材偶合的单体或部位。