公开(公告)号：US07830497B2

公开(公告)日：2010-11-09

申请号：US11785548

申请日：2007-04-18

申请人： Santiago del Puerto ,  Erik R. Loopstra ,  Andrew Massar ,  Duane P. Kish ,  Abdullah Alikhan ,  Woodrow J. Olsen ,  Jonathan H. Feroce

发明人： Santiago del Puerto ,  Erik R. Loopstra ,  Andrew Massar ,  Duane P. Kish ,  Abdullah Alikhan ,  Woodrow J. Olsen ,  Jonathan H. Feroce

IPC分类号： G03B27/32 ,  G03B27/52 ,  G03B27/62

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/62 ,  G03F1/64 ,  G03F1/66 ,  G03F7/70741 ,  G03F7/70983 ,  G03F9/7011 ,  H01L21/67353 ,  H01L21/67359 ,  Y10S414/135

摘要： Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.

摘要翻译： 描述了保护面罩免受空气传播颗粒污染的系统和方法。 这些系统和方法包括提供固定在两部分覆盖物中的掩模版。 两部分盖子包括一个可拆卸的保护装置，用于保护光罩免受污染。 盖可以保持在可以用于将盖通过光刻系统从大气部分输送到真空部分的盒或盒中。 在真空部分中，可移动的盖可以在曝光过程中移动，在曝光过程期间可以在晶片上形成掩模版上的图案。

公开(公告)号：US07019815B2

公开(公告)日：2006-03-28

申请号：US10975429

申请日：2004-10-29

申请人： Johannes C. M. Jasper ,  Erik R. Loopstra ,  Theodorus M. Modderman ,  Gerrit J. Nijmeijer ,  Nicolaas A. A. J. van Asten ,  Frederik T. E. Heuts ,  Jacobus Gemen ,  Richard J. H. Du Croo de Jongh ,  Marcus E. J. Boonman ,  Jacob F. F. Klinkhamer ,  Thomas J. M. Castenmiller

发明人： Johannes C. M. Jasper ,  Erik R. Loopstra ,  Theodorus M. Modderman ,  Gerrit J. Nijmeijer ,  Nicolaas A. A. J. van Asten ,  Frederik T. E. Heuts ,  Jacobus Gemen ,  Richard J. H. Du Croo de Jongh ,  Marcus E. J. Boonman ,  Jacob F. F. Klinkhamer ,  Thomas J. M. Castenmiller

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F9/7026 ,  G03F9/70 ,  G03F9/7034 ,  G03F9/7049 ,  G03F9/7096

摘要： In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.

摘要翻译： 在离轴调平程序中，在测量站产生衬底的高度图。 高度图参考衬底台的物理参考表面。 物理参考表面可以是其中插入透射图像传感器的表面。 在曝光站，测量物理基准表面的高度并与投影透镜的焦平面相关。 然后可以使用高度图来确定衬底台的最佳高度和/或倾斜，以在曝光期间以最佳聚焦将曝光区域定位在衬底上。 相同的原理可以应用于（反射）掩模。

公开(公告)号：US06875992B2

公开(公告)日：2005-04-05

申请号：US10845231

申请日：2004-05-14

申请人： Thomas J. M. Castenmiller ,  Andreas B. G. Ariens ,  Martinus H. H. Hoeks ,  Patrick D. Vogelsang ,  Erik R. Loopstra ,  YimBun P. Kwan

发明人： Thomas J. M. Castenmiller ,  Andreas B. G. Ariens ,  Martinus H. H. Hoeks ,  Patrick D. Vogelsang ,  Erik R. Loopstra ,  YimBun P. Kwan

IPC分类号： G01B11/00 ,  G01B11/03 ,  G01B15/00 ,  G03F7/20 ,  G03F7/22 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F9/7015 ,  G03F7/70716 ,  G03F9/7049

摘要： A position measuring device includes a radiation source mounted on an isolated reference frame and a two-dimensional radiation detector mounted adjacent the radiation source. The object whose position is to be detected has a mirroring device, e.g. a retro-reflector, mounted on it so as to reflect light emitted from the radiation source along a return path that is parallel to but displaced from the incident light path. The amount of displacement is dependent on the position of the object and is measured by the two-dimensional detector. Three such devices can be combined in a system to measure the position of the object in all six degrees of freedom.

摘要翻译： 位置测量装置包括安装在隔离参考框架上的辐射源和邻近辐射源安装的二维辐射探测器。 要检测其位置的物体具有镜像装置，例如， 后反射器，安装在其上以便沿着平行于入射光路移动的返回路径反射从辐射源发出的光。 位移量取决于物体的位置，并由二维检测器测量。 三个这样的装置可以组合在系统中以在所有六个自由度中测量物体的位置。

公开(公告)号：US06791443B2

公开(公告)日：2004-09-14

申请号：US10704972

申请日：2003-11-12

申请人： Erik R. Loopstra

发明人： Erik R. Loopstra

IPC分类号： H01F708

CPC分类号： G03F7/70758 ,  H01J2237/0458 ,  H01J2237/31794 ,  H02K41/0354 ,  H02K2201/18

摘要： An actuator comprises a magnet yoke and a carrier member movable relative to the magnet yoke. The magnet yoke has at least one permanent magnet and the carrier member is positioned in the magnetic field produced by this magnet. The carrier member has an auxiliary magnetic member that produces a relative bias force between the carrier member and the magnet yoke. The bias force will be used to compensate for a weight applied to the device and acts as a bearing with a very large compliance. The carrier member also comprises a coil. Passing current through the coil produces a Lorentz force for further control of the actuator; alternatively, the device provides a velocity transducer by sensing the EMF generated in the coil by relative motion of the carrier member and magnet yoke.

公开(公告)号：US06730920B2

公开(公告)日：2004-05-04

申请号：US09758172

申请日：2001-01-12

申请人： Rogier H. M. Groeneveld ,  Erik R. Loopstra ,  Jacobus Burghoom ,  Leon M. Levasier ,  Alexander Straaijer

发明人： Rogier H. M. Groeneveld ,  Erik R. Loopstra ,  Jacobus Burghoom ,  Leon M. Levasier ,  Alexander Straaijer

IPC分类号： G03B2752

CPC分类号： G03F9/7019 ,  F41H7/04 ,  G03F9/7011 ,  G03F9/7034

摘要： In a lithographic apparatus, a reference grating 11 mounted on the wafer table WT is illuminated with a measurement beam 20 incident in a direction independent of wafer table tilt. The diffraction orders are detected by detector 30 and used to determine the lateral shift in the wafer table resulting from a non-zero Abbe arm, and hence the Abbe arm, for calibration purposes. The detector 30 may be a detector also used for off-axis alignment of the wafer and wafer table.

摘要翻译： 在光刻设备中，安装在晶片台WT上的参考光栅11用独立于晶片台倾斜的方向入射的测量光束20照射。 衍射级由检测器30检测，用于确定由非零的阿贝臂以及因此用于校准目的的阿贝臂产生的晶片台中的横向偏移。 检测器30可以是也用于晶片和晶片台的离轴对准的检测器。

公开(公告)号：US06674510B1

公开(公告)日：2004-01-06

申请号：US09519875

申请日：2000-03-06

申请人： Johannes C. M. Jasper ,  Erik R. Loopstra ,  Theodorus M. Modderman ,  Gerrit J. Nijmeijer ,  Nicolaas A. A. J. van Asten ,  Frederik T. E. Heuts ,  Jacobus Gemen ,  Richard J. H. Du Croo de Jongh ,  Marcus E. J. Boonman ,  Jacob F. F. Klinkhamer ,  Thomas J. M. Castenmiller

发明人： Johannes C. M. Jasper ,  Erik R. Loopstra ,  Theodorus M. Modderman ,  Gerrit J. Nijmeijer ,  Nicolaas A. A. J. van Asten ,  Frederik T. E. Heuts ,  Jacobus Gemen ,  Richard J. H. Du Croo de Jongh ,  Marcus E. J. Boonman ,  Jacob F. F. Klinkhamer ,  Thomas J. M. Castenmiller

IPC分类号： G03B2752

CPC分类号： G03F9/7026 ,  G03F9/70 ,  G03F9/7034 ,  G03F9/7049 ,  G03F9/7096

摘要： In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.

摘要翻译： 在离轴调平程序中，在测量站产生衬底的高度图。 高度图参考衬底台的物理参考表面。 物理参考表面可以是其中插入透射图像传感器的表面。 在曝光站，测量物理基准表面的高度并与投影透镜的焦平面相关。 然后可以使用高度图来确定衬底台的最佳高度和/或倾斜，以在曝光期间以最佳聚焦将曝光区域定位在衬底上。 相同的原理可以应用于（反射）掩模。

公开(公告)号：US06531793B1

公开(公告)日：2003-03-11

申请号：US09652966

申请日：2000-08-31

申请人： Petrus C. M. Frissen ,  Johan C. Compter ,  Antonius T. A. Peijnenburg ,  Erik R. Loopstra

发明人： Petrus C. M. Frissen ,  Johan C. Compter ,  Antonius T. A. Peijnenburg ,  Erik R. Loopstra

IPC分类号： H02K4100

CPC分类号： G03F7/70758 ,  H02K41/031 ,  H02K2201/18 ,  Y10S414/135

摘要： A positioning device comprising a first part (1) which is movable relatively to a second part (2) in an X-direction and a Y-direction, said first part (1) comprising a carrier (5) on which a system of magnets (3) is arranged according to a pattern of rows (7) and columns (8) extending parallel to the X-direction and the Y-direction, respectively. The magnets in each row and column are arranged according to a Halbach array, i.e. the magnetic orientation of successive magnets in each row (7) and each column (8) rotates 90° counter-clockwise. The second part (2) comprises an electric coil system (4) with two types of electric coils (C1, C2), one type having an angular offset of +45°, and the other type having an offset of −45° with respect to the X-direction. The magnet configuration causes a very strong magnetic field.

摘要翻译： 一种定位装置，包括可在X方向和Y方向上相对于第二部分（2）移动的第一部分（1），所述第一部分（1）包括载体（5），磁体系统 （3）分别根据与X方向和Y方向平行延伸的行（7）和列（8）的图案排列。 每行和列中的磁体根据Halbach阵列布置，即每排（7）中的连续磁体的磁性取向和每列（8）逆时针旋转90°。 第二部分（2）包括具有两种类型的电线圈（C1，C2）的电线圈系统（4），一种具有+ 45°角偏移的类型，另一种类型具有-45°的偏移，相对于 到X方向。 磁体配置导致非常强的磁场。

公开(公告)号：US6054784A

公开(公告)日：2000-04-25

申请号：US103734

申请日：1998-06-24

申请人： Frank B. Sperling ,  Erik R. Loopstra ,  Antonius T. A. Peijnenburg

发明人： Frank B. Sperling ,  Erik R. Loopstra ,  Antonius T. A. Peijnenburg

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H02K41/00 ,  A47B85/00 ,  G05G11/00

CPC分类号： G03F7/70716 ,  Y10T74/20341

摘要： A positioning device is disclosed. The positioning device has a first part and a second part, the second part further has an object table. The second part may be displaced relative to the first part parallel to the XY-plane and may be rotated about the Z-axis by means of three motors. The motors are Lorentz type motors having a permanent magnet system and an electrical coil system cooperating therewith. The electrical coil systems each have windings which are substantially directed parallel to a main axis of the electrical coil system and perpendicular to the Z-axis. According to the invention, the main axis of each of the three motors encloses an angle of substantially 120.degree. with the main axis of each of the two other motors. In this manner, the points of application on the second part of the driving forces of the three motors are uniformly distributed relative to the second part, so that the driving forces can be uniformly transmitted to the object table by means of a relatively light and simple stiffening structure of the second part. In a particular embodiment of the positioning device, the main axes of the three motors are mutually arranged in a star-shaped configuration. In a second embodiment the main axes of the three motors are mutually arranged in a triangular configuration. The positioning device is used in a lithographic projection apparatus according to the invention for displacing a substrate table of the lithographic device relative to a focusing unit of the lithographic projection apparatus.

摘要翻译： 公开了一种定位装置。 定位装置具有第一部分和第二部分，第二部分还具有物体台。 第二部分可以相对于平行于XY平面的第一部分移位，并且可以通过三个马达围绕Z轴旋转。 电动机是具有永久磁铁系统和与其配合的电线圈系统的洛伦兹型电动机。 电线圈系统各自具有基本上定向为平行于电线圈系统的主轴线并且垂直于Z轴的绕组。 根据本发明，三个电动机中的每一个的主轴围绕两个其它电动机的主轴线约120度的角度。 以这种方式，三个电动机的驱动力的第二部分上的施加点相对于第二部分均匀分布，使得驱动力可以通过相对较轻且简单的方式均匀地传递到物体台 第二部分的加强结构。 在定位装置的特定实施例中，三个电动机的主轴相互排列成星形。 在第二实施例中，三个电动机的主轴相互排列成三角形。 定位装置用于根据本发明的光刻投影装置中，用于使光刻设备的衬底台相对于光刻投影装置的聚焦单元移位。

公开(公告)号：US5969441A

公开(公告)日：1999-10-19

申请号：US948471

申请日：1997-10-10

申请人： Erik R. Loopstra ,  Gerrit M. Bonnema ,  Harmen K. Van Der Schoot ,  Gerjan P. Veldhuis ,  Paulus M. H. Ter Beek

发明人： Erik R. Loopstra ,  Gerrit M. Bonnema ,  Harmen K. Van Der Schoot ,  Gerjan P. Veldhuis ,  Paulus M. H. Ter Beek

IPC分类号： B23Q1/66 ,  B23Q1/62 ,  B23Q11/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  H02K41/00

CPC分类号： G03F7/70733 ,  B23Q1/621 ,  B23Q1/623 ,  B23Q11/0032 ,  G03F7/70716 ,  G03F7/70741 ,  G03F7/7075 ,  G03F7/70766 ,  G03F7/709 ,  H01L21/682 ,  Y10T74/20213

摘要： Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device.A positioning device (3, 97, 179) with a first displacement unit (25, 189) for displacing a first object holder (11, 181) and a second displacement unit (27, 191) for displacing a second object holder (13, 183). The object holders can be displaced by the positioning device alternately from a measuring position into an operational position and can be displaced by the respective displacement units independently of one another in the measuring position and in the operational position.The displacement units are provided with force actuators which each have a first part (47, 49; 117, 119; 215, 217) which is coupled to the relevant object holder and which is displaceable under the influence of a driving force relative to a second part (59, 61; 133, 135, 137, 139; 219, 221) which is fastened to a balancing unit (69, 149, 205) which is common to the two displacement units. The balancing unit is displaceably guided relative to a base (81, 209), so that reaction forces of the displacement units are converted into displacements of the balancing unit relative to the base, and mechanical vibrations in the balancing unit and the base are prevented. The use of the force actuators prevents the displacements of the balancing unit from disturbing the positions of the object holders relative to the base.The positioning device is further provided with a control unit (83, 169, 237) by means of which at least the parts (47, 49; 121, 123; 219, 221) directed parallel to an X-direction of the X-actuators (39, 41; 105, 107; 211, 213) coupled to the object holders are held in positions parallel to the X-direction. It is also prevented in this manner that positions of the object holders relative to the base are interfered with by rotations of the balancing unit caused by the reaction forces of the displacement units.The positioning device can be used in a lithographic device for the displacement of a semiconductor substrate relative to an exposure system of the lithographic device and for the displacement of a mask relative to the exposure system.