公开(公告)号：US20070296943A1

公开(公告)日：2007-12-27

申请号：US11471728

申请日：2006-06-21

申请人： Uwe Mickan ,  Antonius Johannes Josephus Van Dijsseldonk

发明人： Uwe Mickan ,  Antonius Johannes Josephus Van Dijsseldonk

IPC分类号： G03B27/54

CPC分类号： G03F7/702 ,  G03F7/70175 ,  G03F7/70583

摘要： An optical apparatus is disclosed that has a convex mirror and a concave mirror with an aperture, wherein, in use, radiation from a radiation emitter passes through the aperture and is incident upon the convex mirror before being incident upon the concave mirror, the optical apparatus arranged to form the radiation into a radiation beam, wherein the concave mirror is translatable towards and away from the convex mirror or the convex mirror is translatable towards and away from the concave mirror, to adjust divergence of the radiation beam.

摘要翻译： 公开了一种光学装置，其具有凸面镜和具有孔径的凹面镜，其中在使用中，来自辐射发射器的辐射通过该孔并在入射到凹面镜之前入射到凸面镜上，光学装置 布置成将辐射形成为辐射束，其中所述凹面镜可朝向和远离所述凸面反射镜平移，或者所述凸面镜可朝向和远离所述凹面镜面平移，以调节所述辐射束的发散度。

公开(公告)号：US07177010B2

公开(公告)日：2007-02-13

申请号：US10979798

申请日：2004-11-03

申请人： Hans Van Der Laan ,  Uwe Mickan ,  Markus Franciscus Antonius Eurlings ,  Jan Bernard Plechelmus Van Schoot

发明人： Hans Van Der Laan ,  Uwe Mickan ,  Markus Franciscus Antonius Eurlings ,  Jan Bernard Plechelmus Van Schoot

IPC分类号： G03B27/42

CPC分类号： G03F7/70941 ,  G03F7/70558 ,  G03F7/70666

摘要： A lithographic apparatus comprises an illumination system for providing a projection beam of radiation, a support structure for supporting patterning device, the patterning device serving to transmit or reflect radiation in the projection beam and impart the projection beam with a pattern in its cross-section, a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. A sensor is provided for measuring the spatial intensity distribution of the projection beam at the substrate. The spatial distribution of transmission or reflectance of the patterning device, together with the distribution of the projection beam incident on the patterning device, may be determined from the measured intensity distribution. By comparing the transmission or reflectance from regions having identical patterns the overall (macroscopic) distribution of the transmission or reflectance of the patterning device can be determined.

摘要翻译： 光刻设备包括用于提供投影辐射束的照明系统，用于支撑图案形成装置的支撑结构，所述图案形成装置用于透射或反射投影光束中的辐射并且在其横截面中赋予投影光束图案， 用于保持基板的基板台，以及用于将图案化的光束投影到基板的目标部分上的投影系统。 提供了一种传感器，用于测量投影光束在基板处的空间强度分布。 可以根据测量的强度分布来确定图案形成装置的透射或反射率的空间分布以及入射在图案形成装置上的投影光束的分布。 通过比较具有相同图案的区域的透射率或反射率，可以确定透射率的总体（宏观）分布或图案形成装置的反射率。

公开(公告)号：US20060279718A1

公开(公告)日：2006-12-14

申请号：US11441348

申请日：2006-05-26

申请人： Arie Den Boef ,  Jacobus Burghoorn ,  Martinus Leenders ,  Uwe Mickan ,  Roeland Vanneer ,  Jan Hauschild

发明人： Arie Den Boef ,  Jacobus Burghoorn ,  Martinus Leenders ,  Uwe Mickan ,  Roeland Vanneer ,  Jan Hauschild

IPC分类号： G03B27/52

CPC分类号： G03F7/70641 ,  G03F7/70283 ,  G03F9/7026 ,  G03F9/7069

摘要： A method for performing a tilted focus test includes the steps of providing a target object, providing a projection beam of radiation using a radiation source, providing a reflective device to introduce a projected projection beam of radiation onto the target portion, introducing a first projected projection beam of radiation onto the target object using the reflective device in a first orientation, using a tilting device for tilting the reflective device to a second orientation to provide a second projection beam with a tilt relative to said first projection beam, introducing a second projected projection beam of radiation onto the target object, and determining a lateral shift of the first and second projected projection beams on the target object and determining from said lateral shift a defocus of the target object with respect to the projected projection beam.

摘要翻译： 执行倾斜聚焦测试的方法包括以下步骤：提供目标物体，使用辐射源提供辐射投影光束，提供反射装置以将投射的投射射束投射到目标部分上，引入第一投射投影 使用倾斜装置将反射装置倾斜到第二取向以提供具有相对于所述第一投影光束的倾斜的第二投影光束，引入第二投射投影 确定目标物体上的第一和第二投影投影光束的横向位移，并根据所述横向偏移确定目标物体相对于投影投影光束的散焦。

公开(公告)号：US20060001856A1

公开(公告)日：2006-01-05

申请号：US10882684

申请日：2004-07-02

申请人： Johannes Moors ,  Uwe Mickan

发明人： Johannes Moors ,  Uwe Mickan

IPC分类号： G03B27/72

CPC分类号： G03F7/70558

摘要： A calibration apparatus is provided for calibrating a radiation sensor in a lithographic apparatus. The calibration apparatus includes a window formed of substantially radiation-transparent material for allowing radiation to pass therethrough to reach the radiation sensor. A first reference sensor is located behind the window, having an active surface abutting the window, for measuring the intensity of radiation which passes through the window. A second reference sensor is located a short distance behind the window, having an active surface facing the window, for measuring the intensity of radiation which passes through the window, a first contamination layer formed on the window, and a second contamination layer formed on the active surface of the second reference sensor. The radiation sensor can be calibrated by combining the measurements from the first and second radiation sensors.

摘要翻译： 提供了一种用于校准光刻设备中的辐射传感器的校准设备。 校准装置包括由基本上辐射透明的材料形成的窗口，用于允许辐射通过其中以到达辐射传感器。 第一参考传感器位于窗后，具有邻接窗口的活动表面，用于测量通过窗口的辐射强度。 第二参考传感器位于窗后的短距离处，具有面向窗口的活动表面，用于测量通过窗口的辐射强度，形成在窗口上的第一污染层，以及形成在窗户上的第二污染层 第二参考传感器的有效表面。 可以通过组合来自第一和第二辐射传感器的测量来校准辐射传感器。

公开(公告)号：US20050206869A1

公开(公告)日：2005-09-22

申请号：US10805526

申请日：2004-03-22

申请人： Harm-Jan Voorma ,  Antonius Johannes Van Dijsseldonk ,  Uwe Mickan

发明人： Harm-Jan Voorma ,  Antonius Johannes Van Dijsseldonk ,  Uwe Mickan

IPC分类号： H01L21/027 ,  G03F7/20 ,  G03B27/52

CPC分类号： G03F7/70558

摘要： A lithographic apparatus includes an illumination system for providing a projection beam of radiation, a support structure for supporting patterning structure for imparting a pattern to the projection beam, a substrate table for holding a wafer and a projection system for projecting the patterned beam onto a target portion of the wafer. In order to permit control of the radiation dose at the wafer so that the throughput of wafers can be optimised, a variable attenuator is provided to vary the intensity of the projection beam while not changing the position of the beam. The variable attenuator comprises two parallel mirrors positioned such that an input beam of radiation is incident on a first of the mirrors by which it is reflected towards a second of the mirrors by which the beam is reflected to produce an output beam of radiation of required intensity for input to the illumination system, and a tilting mechanism for tilting the mirrors such that the mirrors remain parallel to one another and the angles of incidence of the beams on the mirrors are changed so as to vary the intensity of the output beam. This allows the intensity of the projection beam to be varied continuously without changing the position of the beam, whether the input beam is converging, diverging or parallel.

摘要翻译： 光刻设备包括用于提供投射辐射束的照明系统，用于支撑用于将投影光束赋予图案的图形结构的支撑结构，用于保持晶片的基板台和用于将图案化光束投影到目标上的投影系统 部分晶片。 为了允许控制晶片上的辐射剂量，从而可以优化晶片的生产量，可以提供可变衰减器来改变投影光束的强度，同时不改变光束的位置。 可变衰减器包括两个平行的反射镜，其被定位成使得输入射线束入射在第一反射镜上，通过该反射镜被反射到第二反射镜，通过该反射镜反射光束以产生所需强度的辐射输出束 用于输入到照明系统，以及倾斜机构，用于倾斜反射镜，使得反射镜保持彼此平行，并且改变反射镜上的光束的入射角度，以便改变输出光束的强度。 这允许投影光束的强度连续变化而不改变光束的位置，无论输入光束是会聚，发散还是平行。

公开(公告)号：US20050157284A1

公开(公告)日：2005-07-21

申请号：US10758270

申请日：2004-01-16

申请人： Johannes Moors ,  Uwe Mickan ,  Harm-Jan Voorma ,  Johannes Leonardus Franken

发明人： Johannes Moors ,  Uwe Mickan ,  Harm-Jan Voorma ,  Johannes Leonardus Franken

IPC分类号： G02B17/00 ,  G03F7/20 ,  H01L21/027 ,  G03B27/72

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891

摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the beam with a pattern in its cross-section. The apparatus further includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a collector which is arranged for transmitting radiation, received from a first radiation source, to the illumination system. The apparatus includes at least a heater for heating the collector when the collector receives substantially no radiation from the first radiation source. Further aspects of the invention relate to a device manufacturing method as well as a device manufactured thereby.

摘要翻译： 光刻设备包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑结构，所述图案形成装置用于在其横截面中赋予光束图案。 该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统以及被布置成用于将从第一辐射源接收的辐射传送到照明系统的收集器。 当收集器基本上不接收来自第一辐射源的辐射时，该装置至少包括用于加热集电器的加热器。 本发明的其它方面涉及一种装置制造方法以及由此制造的装置。

公开(公告)号：US20140071420A1

公开(公告)日：2014-03-13

申请号：US13903885

申请日：2013-05-28

申请人： Erik Roelof Loopstra ,  Johannes Jacobus Matheus Baselmans ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Christiaan Maria Jasper ,  Matthew Lipson ,  Hendricus Johannes Maria Meijer ,  Uwe Mickan ,  Johannes Catharinus Hubertus Mulkens ,  Tammo Uitterdijk

发明人： Erik Roelof Loopstra ,  Johannes Jacobus Matheus Baselmans ,  Marcel Mathijs Theodore Marie Dierichs ,  Johannes Christiaan Maria Jasper ,  Matthew Lipson ,  Hendricus Johannes Maria Meijer ,  Uwe Mickan ,  Johannes Catharinus Hubertus Mulkens ,  Tammo Uitterdijk

IPC分类号： G03F7/20

CPC分类号： G03F7/70866 ,  G03F7/7015 ,  G03F7/70341 ,  Y10S430/162

摘要： A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.

摘要翻译： 公开了一种与位于投影系统和基板之间的浸没液体一起使用的光刻投影装置。 公开了几种方法和机构来保护投影系统，衬底台和液体限制系统的组件。 这些包括在投影系统的最终元件上提供保护涂层，以及在部件上游提供一个或多个牺牲体。 还公开了CaF2的双组分最终光学元件。

公开(公告)号：US07463336B2

公开(公告)日：2008-12-09

申请号：US10823775

申请日：2004-04-14

申请人： Uwe Mickan ,  Antonius Johannes Josephus Van Dijsseldonk

发明人： Uwe Mickan ,  Antonius Johannes Josephus Van Dijsseldonk

IPC分类号： G03B27/58 ,  G02B27/42

CPC分类号： G03F7/11 ,  G03F7/70941

摘要： A method of fabricating a device using a lithographic process, the method comprising applying a layer of radiation sensitive resist on top of the device, applying a metallic layer on top of the resist layer, and exposing a part of the resist layer to radiation while coupling the metallic layer to a fixed potential so as to apply an electric field across the resist layer, the direction of the electric field being substantially perpendicular to the plane of the resist layer.

摘要翻译： 一种使用光刻工艺制造器件的方法，所述方法包括在器件的顶部上施加一层辐射敏感抗蚀剂，在抗蚀剂层的顶部上施加金属层，并将抗蚀剂层的一部分暴露于辐射同时耦合 将金属层固定为电位，以便在抗蚀剂层上施加电场，电场的方向基本上垂直于抗蚀剂层的平面。

公开(公告)号：US07145640B2

公开(公告)日：2006-12-05

申请号：US10805526

申请日：2004-03-22

申请人： Harm-Jan Voorma ,  Antonius Johannes Josephus Van Dijsseldonk ,  Uwe Mickan

发明人： Harm-Jan Voorma ,  Antonius Johannes Josephus Van Dijsseldonk ,  Uwe Mickan

IPC分类号： G03B27/72 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70558

摘要： A lithographic apparatus includes an illumination system for providing a projection beam of radiation, a support structure for supporting patterning structure for imparting a pattern to the projection beam, a substrate table for holding a wafer and a projection system for projecting the patterned beam onto a target portion of the wafer. In order to permit control of the radiation dose at the wafer so that the throughput of wafers can be optimised, a variable attenuator is provided to vary the intensity of the projection beam while not changing the position of the beam. The variable attenuator includes two parallel mirrors positioned such that an input beam of radiation is incident on a first of the mirrors by which it is reflected towards a second of the mirrors by which the beam is reflected to produce an output beam of radiation of required intensity for input to the illumination system, and a tilting mechanism for tilting the mirrors such that the mirrors remain parallel to one another and the angles of incidence of the beams on the mirrors are changed so as to vary the intensity of the output beam. This allows the intensity of the projection beam to be varied continuously without changing the position of the beam, whether the input beam is converging, diverging or parallel.

摘要翻译： 光刻设备包括用于提供投射辐射束的照明系统，用于支撑用于将投影光束赋予图案的图形结构的支撑结构，用于保持晶片的基板台和用于将图案化光束投影到目标上的投影系统 部分晶片。 为了允许控制晶片上的辐射剂量，从而可以优化晶片的生产量，可以提供可变衰减器来改变投射光束的强度，同时不改变光束的位置。 可变衰减器包括两个平行的反射镜，其被定位成使得输入的辐射束入射在第一反射镜上，通过该反射镜被反射到第二反射镜，通过该反射镜反射光束以产生所需强度的辐射输出束 用于输入到照明系统，以及倾斜机构，用于倾斜反射镜，使得反射镜保持彼此平行，并且改变反射镜上的光束的入射角度，以便改变输出光束的强度。 这允许投影光束的强度连续变化而不改变光束的位置，无论输入光束是会聚，发散还是平行。

公开(公告)号：US20060194123A1

公开(公告)日：2006-08-31

申请号：US11345629

申请日：2006-02-02

申请人： Uwe Mickan ,  Hendricus Meijer

发明人： Uwe Mickan ,  Hendricus Meijer

IPC分类号： G03C5/00 ,  G03F9/00 ,  G03F1/00

CPC分类号： G03F7/70433 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F7/70283 ,  G03F7/70666 ,  G03F9/7003 ,  G03F9/7076 ,  G03F9/7088

摘要： A method of generating a photolithography patterning device for transferring a pattern formed in the patterning device onto a substrate utilizing a lithographic projection apparatus includes defining features within the pattern formed in the device, wherein the features have dimensions and orientations chosen to create a desired image on the substrate during pattern transfer; and adjusting the dimensions of the features to compensate the desired image for displacement and dimension errors introduced by the effective shadow angle of the radiation on the features during pattern transfer or correlated to the position of the features within the exposure slit during pattern transfer. A measurement device for determining the position of a target image on or proximate a substrate in a lithographic projection apparatus, wherein the target image is formed by features on a patterning device, includes a detector configured to measure the position of the target image on or proximate the substrate, wherein the detector compensates the measured position of the target image for displacement and dimension errors introduced by the effective shadow angle of the radiation on the features of the patterning device during pattern transfer or correlated to the position of the features within the exposure slit during pattern transfer. A lithographic apparatus includes a measurement device.

摘要翻译： 使用光刻投影装置产生用于将形成在图案形成装置中的图案转印到基板上的光刻图案形成装置的方法包括限定在所述装置中形成的图案内的特征，其中所述特征具有选择的尺寸和取向以在 图案转印时的基板; 并且调整特征的尺寸以补偿在图案转印期间由辐射对特征的有效阴影角度引入的位移和尺寸误差所需的图像，或者与图案转印期间的曝光缝隙内的特征位置相关。 一种测量装置，用于在光刻投影设备中确定目标图像在基板上或其附近的位置，其中所述目标图像由图案形成装置上的特征形成，所述测量装置包括检测器，所述检测器被配置为测量所述目标图像在或近似的位置 所述基板，其中所述检测器补偿所述目标图像的测量位置，并且通过所述辐射的有效阴影角度在所述图案转印期间对所述图案形成装置的特征引入的尺寸误差或与所述曝光缝隙内的所述特征的位置相关联 在图案转移期间。 光刻设备包括测量装置。