公开(公告)号：US06847730B1

公开(公告)日：2005-01-25

申请号：US09677530

申请日：2000-10-02

申请人： Emanuel Beer ,  John M. White

发明人： Emanuel Beer ,  John M. White

IPC分类号： B25J9/16 ,  B65G49/06 ,  H01L21/02 ,  H01L21/677 ,  H01L21/68 ,  G06K9/00

CPC分类号： H01L21/681 ,  G05B2219/37555 ,  G05B2219/37575 ,  G05B2219/37576 ,  G05B2219/40622 ,  G05B2219/45031

摘要： A substrate handling apparatus includes a transfer arm having a substrate support. The apparatus includes at least one image acquisition sensor configured to acquire images of a substrate supported by the substrate support. In addition, the apparatus includes a controller coupled to the image acquisition sensor and configured to control the image acquisition sensor to acquire at least one image of the substrate supported on the substrate support. The controller is further configured to receive the images acquired by the image acquisition sensor and to determine an initial position of the substrate based on the acquired images. The controller is further coupled to the substrate support to control movement thereof to move the substrate to a new position based on the substrate's initial position. The apparatus also can be used to determine a substrate identification and to detect certain substrate defects either before or after processing the substrate in a thermal processing chamber. A method of positioning a substrate on a transfer arm also is disclosed.

摘要翻译： 基板处理装置包括具有基板支撑件的输送臂。 该装置包括至少一个图像采集传感器，被配置为获取由基板支撑件支撑的基板的图像。 另外，该装置包括耦合到图像采集传感器并被配置为控制图像采集传感器以获取支撑在基板支撑件上的基板的至少一个图像的控制器。 控制器还被配置为接收由图像采集传感器获取的图像，并且基于所获取的图像来确定基板的初始位置。 控制器还耦合到衬底支撑件以控制其移动，以基于衬底的初始位置将衬底移动到新的位置。 该装置还可以用于确定衬底识别并且在热处理室中处理衬底之前或之后检测某些衬底缺陷。 公开了一种将衬底定位在转移臂上的方法。

公开(公告)号：US06225601B1

公开(公告)日：2001-05-01

申请号：US09115112

申请日：1998-07-13

申请人： Emanuel Beer ,  Duoyan Shen ,  Eitan Zohar ,  Marc M. Kollrack

发明人： Emanuel Beer ,  Duoyan Shen ,  Eitan Zohar ,  Marc M. Kollrack

IPC分类号： F27B514

CPC分类号： H01L21/67109 ,  C03B29/02 ,  C23C16/46 ,  G05D23/1904 ,  G05D23/1932

摘要： A technique for heating a substrate support, such as a susceptor, includes establishing respective final temperature setpoints for first and second heating elements in the susceptor. The temperatures of the heating elements are raised to their respective final temperature setpoints based on a predetermined heating rate. The temperatures of the first and second heating elements are controlled so that the difference between the temperatures of the first and second heating elements does not exceed the predetermined value while the temperatures of the heating elements are raised to their respective final temperature setpoints. Controlling the temperatures includes setting interim setpoints for the first and second heating elements, where the interim setpoint for the heating element having the greater heating capacity depends on the current value of the interim setpoint of the other heating element and the predetermined value. The temperatures of the first and second heating elements are raised toward their respective interim temperature setpoints for a predetermined delay period. At the end of the delay period, new interim setpoints can be established and the process repeated until the temperature of at least one of the first and second heating elements is close to its respective final setpoint. A relatively high duty cycle can be achieved which also reduces the likelihood of deformation of the substrate support.

摘要翻译： 用于加热衬底支撑件（例如基座）的技术包括为基座中的第一和第二加热元件建立相应的最终温度设定点。 基于预定的加热速率将加热元件的温度升高到它们各自的最终温度设定点。 控制第一和第二加热元件的温度，使得第一和第二加热元件的温度之间的差值不超过预定值，同时将加热元件的温度升高到其各自的最终温度设定点。 控制温度包括设置第一和第二加热元件的临时设定值，其中具有较大加热能力的加热元件的临时设定值取决于另一加热元件的临时设定值的当前值和预定值。 第一加热元件和第二加热元件的温度在其预定的延迟周期内朝其相应的临时温度设定点升高。 在延迟期结束时，可以建立新的临时设定点，并重复该过程，直到第一和第二加热元件中的至少一个的温度接近其相应的最终设定点。 可以实现相对高的占空比，这也降低了基板支撑件变形的可能性。

公开(公告)号：US06215897B1

公开(公告)日：2001-04-10

申请号：US09082413

申请日：1998-05-20

申请人： Emanuel Beer ,  John M. White

发明人： Emanuel Beer ,  John M. White

IPC分类号： G06K900

CPC分类号： H01L21/681 ,  G05B2219/37555 ,  G05B2219/37575 ,  G05B2219/37576 ,  G05B2219/40622 ,  G05B2219/45031

摘要： A substrate handling apparatus includes a transfer arm having a substrate support. The apparatus includes at least one image acquisition sensor configured to acquire images of a substrate supported by the substrate support. In addition, the apparatus includes a controller coupled to the image acquisition sensor and configured to control the image acquisition sensor to acquire at least one image of the substrate supported on the substrate support. The controller is further configured to receive the images acquired by the image acquisition sensor and to determine an initial position of the substrate based on the acquired images. The controller is further coupled to the substrate support to control movement thereof to move the substrate to a new position based on the substrate's initial position. The apparatus also can be used to determine a substrate identification and to detect certain substrate defects either before or after processing the substrate in a thermal processing chamber. A method of positioning a substrate on a transfer arm also is disclosed.

摘要翻译： 基板处理装置包括具有基板支撑件的输送臂。 该装置包括至少一个图像采集传感器，被配置为获取由基板支撑件支撑的基板的图像。 另外，该装置包括耦合到图像采集传感器并被配置为控制图像采集传感器以获取支撑在基板支撑件上的基板的至少一个图像的控制器。 控制器还被配置为接收由图像采集传感器获取的图像，并且基于所获取的图像来确定基板的初始位置。 控制器还耦合到衬底支撑件以控制其移动，以基于衬底的初始位置将衬底移动到新的位置。 该装置还可以用于确定衬底识别并且在热处理室中处理衬底之前或之后检测某些衬底缺陷。 公开了一种将衬底定位在转移臂上的方法。

公开(公告)号：US06182603B2

公开(公告)日：2001-02-06

申请号：US09115111

申请日：1998-07-13

申请人： Quanyuan Shang ,  Sheng Sun ,  Kam S. Law ,  Emanuel Beer

发明人： Quanyuan Shang ,  Sheng Sun ,  Kam S. Law ,  Emanuel Beer

IPC分类号： C23C1600

CPC分类号： C23C16/45565 ,  C23C16/4404 ,  C23C16/4405 ,  G03F7/70925 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32522 ,  H01J2237/3325 ,  H01J2237/334 ,  Y10S438/905

摘要： A substrate processing system includes a processing chamber and a plasma source located external to the chamber. A conduit connects the plasma source to an interior region of the chamber to provide a reactive species to the chamber interior for cleaning interior surfaces of the chamber. A shower head, disposed between the plasma source and an interior region of the chamber, can serve as an electrode and also can serve as a gas distribution mechanism. The shower head includes a surface treatment, such as a non-anodized aluminum outer layer, an electro-polished surface of bare aluminum, or a fluorine-based protective outer layer. The surface-treated shower head improves the rate of removal of materials deposited on the interior surfaces of the chamber during cleaning, reduces contamination of substrates during processing, and provides more efficient use of the power source used for heating the substrate during processing.

公开(公告)号：US07499767B2

公开(公告)日：2009-03-03

申请号：US11562309

申请日：2006-11-21

申请人： Shinichi Kurita ,  Emanuel Beer

发明人： Shinichi Kurita ,  Emanuel Beer

IPC分类号： G06F7/00

CPC分类号： H01L21/67265 ,  Y10S414/135 ,  Y10S414/136 ,  Y10S414/141

摘要： In a first aspect, a substrate positioning system includes a plurality of pushers arranged in a spaced relation about a stage adapted to support a substrate. Each pusher is adapted to assume a retracted position so as to permit the substrate to be loaded onto and unloaded from the stage, extend toward an edge of the substrate that is supported by the stage, contact the edge of the substrate, and continue extending so as to cause the substrate to move relative to the stage until the substrate is calibrated to the stage. Numerous other aspects are provided.

摘要翻译： 在第一方面，一种基板定位系统包括围绕适于支撑基板的台阶间隔设置的多个推动器。 每个推动器适于采取缩回位置，以便允许将基板装载到载物台上并从载物台上卸载，朝向由载物台支撑的基板的边缘延伸，接触基板的边缘，并且继续延伸 以使基板相对于载物台移动，直到基板被校准到载物台。 提供了许多其他方面。

公开(公告)号：US20080111577A1

公开(公告)日：2008-05-15

申请号：US12016834

申请日：2008-01-18

申请人： Shinichi Kurita ,  Emanuel Beer ,  Hung Nguyen ,  Benjamin Johnston ,  Fayez Abboud

发明人： Shinichi Kurita ,  Emanuel Beer ,  Hung Nguyen ,  Benjamin Johnston ,  Fayez Abboud

IPC分类号： G01R31/26

CPC分类号： G09G3/006 ,  G01R31/2893 ,  G01R31/305

摘要： A system and method for supporting and transferring a substrate relative to a plurality of testing columns are provided. The system includes a testing table adapted to support and move the substrate relative to the plurality of testing columns. The testing table may include an end effector disposed therein to transfer the substrate relative to an upper surface of the testing table. The method includes transferring the substrate to the testing table and moving the substrate relative to the plurality of testing columns. Signals indicative of electronic device performance are sensed to determine operability of the devices on the substrate.

摘要翻译： 提供了一种用于相对于多个测试柱支撑和传送衬底的系统和方法。 该系统包括适于相对于多个测试柱支撑和移动衬底的测试台。 测试台可以包括设置在其中的端部执行器，以相对于测试台的上表面传送衬底。 该方法包括将衬底转移到测试台并相对于多个测试柱移动衬底。 感测指示电子设备性能的信号以确定衬底上的器件的可操作性。

公开(公告)号：US07372250B2

公开(公告)日：2008-05-13

申请号：US10782503

申请日：2004-02-19

申请人： Shinichi Kurita ,  Emanuel Beer ,  Edgar Kehrberg ,  Matthias Brunner

发明人： Shinichi Kurita ,  Emanuel Beer ,  Edgar Kehrberg ,  Matthias Brunner

IPC分类号： G01R31/02 ,  G01R31/28

CPC分类号： H01L21/67265 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70791 ,  G03F9/7011

摘要： A sensing system includes a plurality of probes arranged in a spaced relation around a stage that is adapted to support a substrate. Each probe includes a detection portion adapted to move from a known starting position toward an edge of the substrate that is supported by the stage; detect the edge of the substrate while the substrate is supported by the stage; generate a detection signal following said detection; and stop moving toward the edge of the substrate following said detection. A controller may determine an edge position of the substrate relative to the stage based on the known starting position of each detection portion and based on the detection signal generated by each detection portion. Numerous other aspects are provided.

摘要翻译： 感测系统包括围绕适于支撑衬底的平台间隔设置的多个探针。 每个探针包括适于从已知起始位置移动到由所述载物台支撑的所述基底的边缘的检测部分; 在衬底由载物台支撑的同时检测衬底的边缘; 在所述检测之后产生检测信号; 并且在所述检测之后停止移动到基板的边缘。 控制器可以基于每个检测部分的已知开始位置并且基于由每个检测部分生成的检测信号来确定基板相对于载物台的边缘位置。 提供了许多其他方面。

公开(公告)号：US07319335B2

公开(公告)日：2008-01-15

申请号：US10889695

申请日：2004-07-12

申请人： Matthias Brunner ,  Shinichi Kurita ,  Ralf Schmid ,  Fayez (Frank) E. Abboud ,  Benjamin Johnston ,  Paul Bocian ,  Emanuel Beer

发明人： Matthias Brunner ,  Shinichi Kurita ,  Ralf Schmid ,  Fayez (Frank) E. Abboud ,  Benjamin Johnston ,  Paul Bocian ,  Emanuel Beer

IPC分类号： G01R31/305

CPC分类号： G09G3/006 ,  G01R31/2893 ,  G01R31/305

摘要： An improved prober for an electronic devices test system is provided. The prober is “configurable,” meaning that it can be adapted for different device layouts and substrate sizes. The prober generally includes a frame, at least one prober bar having a first end and a second end, a frame connection mechanism that allows for ready relocation of the prober bar to the frame at selected points along the frame, and a plurality of electrical contact pins along the prober bar for placing selected electronic devices in electrical communication with a system controller during testing. In one embodiment, the prober is be used to test devices such as thin film transistors on a glass substrate. Typically, the glass substrate is square, and the frame is also square. In this way, “x” and “y” axes are defined by the frame.

摘要翻译： 提供了一种用于电子设备测试系统的改进的探测器。 探测器是“可配置的”，这意味着它可以适用于不同的设备布局和基板尺寸。 探测器通常包括框架，至少一个具有第一端和第二端的探测杆，框架连接机构，其允许在沿着框架的选定点准备将探测杆重新定位到框架，以及多个电触点 沿着探测杆的引脚，用于在测试期间将选定的电子设备与系统控制器电连通。 在一个实施例中，探测器用于测试诸如玻璃基板上的薄膜晶体管的器件。 通常，玻璃基板是正方形的，框架也是正方形的。 以这种方式，“x”和“y”轴由框架定义。

公开(公告)号：US20070070099A1

公开(公告)日：2007-03-29

申请号：US11536533

申请日：2006-09-28

申请人： Emanuel Beer ,  Chang Lin ,  Shinichi Kurita ,  Quanyuan Shang ,  Benjamin Johnston

发明人： Emanuel Beer ,  Chang Lin ,  Shinichi Kurita ,  Quanyuan Shang ,  Benjamin Johnston

IPC分类号： B41J25/308

CPC分类号： B41J2/0456 ,  B41J2/0458 ,  B41J2/04588 ,  B41J3/28 ,  B41J3/4073 ,  B41J11/0035 ,  B41J25/308 ,  G02F1/1303 ,  G02F1/133516

摘要： A sensor apparatus for an inkjet printing device is provided. The sensor apparatus may include 1) at least one print head adapted to deposit ink on a top surface of a substrate, wherein the substrate is in motion relative to the print head, 2) at least one sensor adapted to detect the distance of the at least one sensor from the top surface of the substrate, and 3) a controller adapted to determine the substrate to nozzle distance based on the distance of the sensor to the top surface of the substrate, and adjust the trajectory of the ink being deposited on the substrate based on the substrate to nozzle distance. Numerous other aspects are provided.

摘要翻译： 提供了一种用于喷墨打印装置的传感器装置。 所述传感器装置可以包括：1）适于将墨水沉积在基底的顶表面上的至少一个打印头，其中所述基底相对于所述打印头运动; 2）至少一个传感器，适于检测所述at 至少一个传感器，以及3）控制器，其适于基于所述传感器与所述基板顶表面的距离来确定所述基板与喷嘴的距离，并且调整沉积在所述基板上的所述油墨的轨迹 基板基于基板与喷嘴的距离。 提供了许多其他方面。

公开(公告)号：US20070000608A1

公开(公告)日：2007-01-04

申请号：US11174229

申请日：2005-07-01

申请人： Ke Lee ,  Shinichi Kurita ,  Emanuel Beer

发明人： Ke Lee ,  Shinichi Kurita ,  Emanuel Beer

IPC分类号： C23F1/00

CPC分类号： F16K3/0227 ,  F16K51/02 ,  H01J37/32844 ,  H01J2237/166 ,  H01L21/67126 ,  Y02C20/30 ,  Y02P70/605 ,  Y10S277/919 ,  Y10S277/92 ,  Y10T137/8242

摘要： A method and apparatus for grounding a chamber isolation valve are provided. Generally, the method makes use of an electrically conductive elastomeric member or members to effectively ground a chamber isolation valve and/or isolation valve door while avoiding metal-to-metal contact between moving parts in the processing system. In one embodiment, the elastomeric member is attached to and in electrical communication with the door of the chamber isolation valve. The elastomeric member is brought into contact with a grounded component of the plasma processing system when the door is in the closed position. In another embodiment, the conductive elastomeric member is attached to a bracing member of the isolation valve and is brought into contact with a grounded component of the plasma processing system when the bracing member is deployed to hold the isolation valve door in place during substrate processing. Other configurations are also provided.

摘要翻译： 提供了一种用于使室隔离阀接地的方法和装置。 通常，该方法利用导电弹性体构件来有效地将室隔离阀和/或隔离阀门接地，同时避免处理系统中移动部件之间的金属与金属的接触。 在一个实施例中，弹性体构件附接到腔室隔离阀的门并且与腔室隔离阀的门电连通。 当门处于关闭位置时，弹性体构件与等离子体处理系统的接地部件接触。 在另一个实施例中，当支撑构件展开以在衬底处理期间将隔离阀门保持在适当位置时，导电弹性构件附接到隔离阀的支撑构件并与等离子体处理系统的接地构件接触。 还提供其他配置。