公开(公告)号：US20060095495A1

公开(公告)日：2006-05-04

申请号：US11046340

申请日：2005-01-28

申请人： Yong Choi ,  Ku Chang ,  Do Hong ,  Hyun Cho

发明人： Yong Choi ,  Ku Chang ,  Do Hong ,  Hyun Cho

IPC分类号： G06F7/52

CPC分类号： G06F7/724

摘要： An apparatus and method for hybrid multiplication in GF(2m) by which trade-off between the area and the operation speed of an apparatus for a hybrid multiplier in finite field GF(2m) can be achieved are provided. The apparatus for hybrid multiplication includes: a matrix Z generation unit generating [m×k] matrix Z for performing a partial multiplication of a(x) and b(x), by dividing b(x) by k bits (k≦┌m/2┐), when multiplication of m-bit multiplier a(x) and m-bit multiplicand b(x) is performed from [(m+k−1)×k] coefficient matrix of a(x) in GF(2m); a partial multiplication unit performing the partial multiplication ┌m/k┐k−1 times in units of rows of the matrix Z to calculate an (┌m/k┐k−1)-th partial multiplication value and a final result value of the multiplication; and a reduction unit receiving the (┌m/k┐k−1)-th partial multiplication value fed back from the partial multiplication unit and performing reduction of the value in order to obtain a partial multiplication value next to the (┌m/k┐k−1 )-th partial multiplication value.

摘要翻译： 一种用于在GF（2MM）中的混合乘法的装置和方法，通过该方法在有限域GF（2）中的混合乘法器的装置的面积和操作速度之间进行权衡， / SUP>）可以实现。 用于混合乘法的装置包括：通过将b（x）除以k位（k <=┌m/ m）来生成用于执行a（x）和b（x）的部分相乘的[mxk]矩阵Z的矩阵Z生成单元 2）中，当从GF（2 m ）; 部分乘法单元以矩阵Z的行为单位执行部分乘法┌m/k┐k-1次，以计算（┌m/k┐k-1）个部分乘法值和最终结果值 乘法; 以及缩小单元，接收从部分乘法单元反馈的（┌m/k┐k-1）个部分相乘值，并执行该值的减少，以获得与（┌m/ k ┐k-1）部分乘法值。

公开(公告)号：US20050087848A1

公开(公告)日：2005-04-28

申请号：US10988523

申请日：2004-11-16

申请人： Joon Yoon ,  Yong Choi ,  Suk Bae

发明人： Joon Yoon ,  Yong Choi ,  Suk Bae

IPC分类号： H01L23/12 ,  H01L21/60 ,  H01L21/78 ,  H01L23/31 ,  H01L23/48 ,  H01L23/485 ,  H05K3/34 ,  H05K5/00 ,  H01L21/48 ,  H01L29/40

CPC分类号： H05K5/0091 ,  H01L21/78 ,  H01L23/3114 ,  H01L24/05 ,  H01L24/48 ,  H01L24/97 ,  H01L2224/04042 ,  H01L2224/05599 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/48235 ,  H01L2224/4848 ,  H01L2224/73265 ,  H01L2224/85051 ,  H01L2224/85399 ,  H01L2224/97 ,  H01L2924/00014 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01014 ,  H01L2924/01015 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/15787 ,  H01L2924/181 ,  H05K3/3442 ,  H05K2201/09381 ,  H05K2201/10636 ,  Y02P70/611 ,  Y02P70/613 ,  H01L2224/45099 ,  H01L2924/00 ,  H01L2924/00012

摘要： Disclosed are a chip scale package and a method of fabricating the chip scale package. The chip scale package comprises conductive layers with a designated depth formed on an upper and a lower surfaces of a chip, and electrode surfaces formed on the same side surfaces of the conductive layers, which are connected to corresponding connection pads of a printed circuit board. The chip scale package is miniaturized in the whole package size. Further, the method of fabricating the chip scale package does not require a wire-bonding step or a via hole forming step, thereby simplifying the fabrication process of the chip scale package and improving the reliability of the chip scale package.

摘要翻译： 公开了一种芯片级封装和一种制造芯片级封装的方法。 芯片级封装包括形成在芯片的上表面和下表面上的指定深度的导电层，以及形成在导电层的相同侧表面上并连接到印刷电路板的相应连接焊盘的电极表面。 芯片尺寸封装在整个封装尺寸上小型化。 此外，制造芯片级封装的方法不需要引线键合步骤或通孔形成步骤，从而简化了芯片级封装的制造工艺，并提高了芯片级封装的可靠性。

公开(公告)号：US20110270076A1

公开(公告)日：2011-11-03

申请号：US12871220

申请日：2010-08-30

申请人： Jihoon Kang ,  Yong Choi ,  Key Jo Hong ,  Wei Hu ,  Hyun Keong Lim ,  Yoon Suk Huh ,  Sangsu Kim

发明人： Jihoon Kang ,  Yong Choi ,  Key Jo Hong ,  Wei Hu ,  Hyun Keong Lim ,  Yoon Suk Huh ,  Sangsu Kim

IPC分类号： A61B5/055

CPC分类号： A61B5/055 ,  A61B5/0035 ,  A61B6/5247 ,  G01R33/481 ,  G01T1/1603 ,  G01T1/2985

摘要： Provided is a method for removing noise of a positron emission tomography (PET) signal in a PET-magnetic resonance imaging (MRI) fusion device without using an MRI radio frequency (RF) shield that degrades image quality. The method includes: receiving a PET output signal from a PET-MRI fusion device and performing analog filtering by removing noise components due to an RF pulse frequency based on the relationship between the frequency of the PET output signal and a magnetic resonance (MR) RF frequency (Larmor frequency); and converting the filtered signal into a digital signal through sampling. The method allows acquisition of molecular-level images without declined performance of a PET detector in MRI environment.

摘要翻译： 提供了一种在不使用降低图像质量的MRI射频（RF）屏蔽）的情况下去除PET-磁共振成像（MRI）融合装置中的正电子发射断层摄影（PET）信号的噪声的方法。 该方法包括：从PET-MRI融合装置接收PET输出信号，并且通过基于PET输出信号的频率与磁共振（MR）RF之间的关系消除由于RF脉冲频率引起的噪声分量来执行模拟滤波 频率（拉莫尔频率）; 并通过采样将滤波后的信号转换成数字信号。 该方法允许采集分子水平的图像，而不会在MRI环境中PET检测器的性能下降。

公开(公告)号：US20100002924A1

公开(公告)日：2010-01-07

申请号：US12262880

申请日：2008-10-31

申请人： Sey Joon Park ,  Yong Kown Kim ,  Yong Choi ,  Ki Sung Lee ,  Hyoung Uk Choi

发明人： Sey Joon Park ,  Yong Kown Kim ,  Yong Choi ,  Ki Sung Lee ,  Hyoung Uk Choi

IPC分类号： G06K9/00 ,  H05G1/60

CPC分类号： A61B6/037 ,  A61B6/032 ,  A61B6/04 ,  A61B6/4014 ,  A61B6/4405 ,  A61B6/4441

摘要： Disclosed is a versatile single photon emission computerized tomograph capable of imaging a number of areas of the patient by the same system to obtain diagnostic nuclear medical images of excellent resolution and sensitivity, and imaging method using the same. The versatile single photon emission computerized tomograph includes a support means configured in a plate structure so that the patient can lie down and adapted to move in longitudinal and vertical directions while the patient is lying down; a gantry configured in an arc shape about an object to be imaged; a body for retaining and supporting an outer surface of the gantry while being able to slide and rotate; and at least one detector mounted so as to slide along the inner surface of the gantry and adapted to protract toward or retract from the center point of the gantry to image an organ of the patient.

摘要翻译： 公开了一种通用的单光子发射计算机断层摄影机，其能够通过相同的系统对患者的许多区域进行成像，以获得具有优异的分辨率和灵敏度的诊断性核医学图像，以及使用其的成像方法。 通用的单光子发射计算机断层摄影机包括一个被配置成板结构的支撑装置，使得患者躺下并适应于在患者躺下时在纵向和垂直方向上移动; 围绕要成像的物体构成弧形的台架; 用于在能够滑动和旋转的同时保持和支撑台架的外表面的主体; 以及至少一个检测器，其安装成沿着台架的内表面滑动并且适于从机架的中心点伸出或缩回以对患者的器官成像。

公开(公告)号：US20070161253A1

公开(公告)日：2007-07-12

申请号：US11617383

申请日：2006-12-28

申请人： Seung Jang ,  Yong Choi

发明人： Seung Jang ,  Yong Choi

IPC分类号： H01L21/311 ,  H01L21/302 ,  H01L21/461 ,  H01L21/306 ,  C23F1/00

CPC分类号： H01L21/76224 ,  H01L21/0206

摘要： A method of fabricating a trench isolation layer in a semiconductor device. A method of fabricating a trench isolation layer in a semiconductor device, which may remove particles (e.g. in the form of an oxide layer) that are formed during a moat wet etch process.

摘要翻译： 一种在半导体器件中制造沟槽隔离层的方法。 一种在半导体器件中制造沟槽隔离层的方法，其可以去除在护城河湿法蚀刻工艺期间形成的颗粒（例如以氧化物层的形式）。

公开(公告)号：US20070126975A1

公开(公告)日：2007-06-07

申请号：US11476854

申请日：2006-06-29

申请人： Yong Choi ,  Jung Hwang

发明人： Yong Choi ,  Jung Hwang

IPC分类号： G02F1/13

CPC分类号： G02F1/1309 ,  G09G3/006 ,  G09G3/2018 ,  G09G3/2051 ,  G09G3/2055 ,  G09G3/3611 ,  G09G2320/0233 ,  G09G2320/0285

摘要： A method of fabricating a flat panel display includes, judging a panel defect area and a non-defect area of a display panel, generating a first compensation data for compensating the panel defect area, first modulating a data of the panel defect area by using the first compensation data, judging a brightness at a border between the panel defect area and the non-defect area of the display panel after compensating the panel defect, generating a second compensation data for compensating the border and the panel defect area, second modulating a data of the border and the panel defect area by using the second compensation data, adding the first compensation data and the second compensation data to calculate a resultant compensation data, and storing the resultant compensation data at a data modulation memory.

摘要翻译： 制造平板显示器的方法包括：判断显示面板的面板缺陷区域和非缺陷区域，产生用于补偿面板缺陷区域的第一补偿数据，首先通过使用面板缺陷区域来调制面板缺陷区域的数据 第一补偿数据，在补偿面板缺陷之后判断面板缺陷区域与显示面板的非缺陷区域之间的边界处的亮度，生成补偿边界的第二补偿数据和面板缺陷区域，第二调制数据 通过使用第二补偿数据，添加第一补偿数据和第二补偿数据来计算合成补偿数据，并将得到的补偿数据存储在数据调制存储器中。

公开(公告)号：US20060270325A1

公开(公告)日：2006-11-30

申请号：US11289942

申请日：2005-11-29

申请人： Yong Choi

发明人： Yong Choi

IPC分类号： B24B29/00

CPC分类号： B24B37/26

摘要： A polishing pad for chemically mechanically polishing a semiconductor wafer comprises a first groove pattern circularly formed on the surface of the polishing pad, and a second groove pattern formed on the surface of the polishing pad while spirally extending from the circular center of the polishing pad to the outside so as to overlap the first groove pattern. The polishing pad further comprises a third groove pattern formed on the surface of the polishing pad while radially extending from the circular center of the polishing pad to the outside so as to overlap the first and second groove patterns. A chemical mechanical polishing apparatus comprises the polishing pad. The polishing pad of the chemical mechanical polishing apparatus has enhanced groove patterns formed on the polishing pad to provide uniform distribution of the slurry, thereby enhancing polishing speed and polishing uniformity.

摘要翻译： 用于对半导体晶片进行化学机械抛光的抛光垫包括圆周地形成在抛光垫的表面上的第一凹槽图案，以及形成在抛光垫表面上的第二凹槽图案，同时从抛光垫的圆形中心螺旋地延伸到 外部以与第一凹槽图案重叠。 抛光垫还包括形成在抛光垫的表面上的第三凹槽图案，同时从抛光垫的圆形中心向外延伸以与第一和第二凹槽图案重叠。 化学机械抛光装置包括抛光垫。 化学机械抛光装置的抛光垫具有形成在抛光垫上的增强凹槽图案，以提供均匀的浆料分布，从而提高抛光速度和抛光均匀性。

公开(公告)号：US20060223319A1

公开(公告)日：2006-10-05

申请号：US11268961

申请日：2005-11-08

申请人： Yong Choi ,  Won Lee

发明人： Yong Choi ,  Won Lee

IPC分类号： C03C15/00 ,  H01L21/331 ,  H01L21/461 ,  B44C1/22

CPC分类号： H01L21/3212

摘要： Disclosed herein is a chemical mechanical polishing (CMP) method for manufacturing a semiconductor device, comprising performing partial ion implantation of dopants at different concentrations into a plurality of at least two divided regions of a wafer having a planarization-target film, and subjecting the partially ion implanted-wafer to a chemical mechanical polishing process. In accordance with the present invention, non-uniformity of the removal rate in a chemical mechanical polishing process is countervailed by dopants which are implanted at different concentrations via partial ion implantation, and thereby it is possible to polish the target film at a uniform removal rate.

摘要翻译： 本文公开了一种用于制造半导体器件的化学机械抛光（CMP）方法，包括：将具有不同浓度的掺杂剂的部分离子注入到具有平坦化靶膜的晶片的多个至少两个分割区域中， 离子注入晶片进行化学机械抛光工艺。 根据本发明，化学机械抛光工艺中的去除速率的不均匀性被通过部分离子注入以不同浓度注入的掺杂剂抵消，从而可以以均匀的去除速率对目标膜进行抛光 。

公开(公告)号：US20060194873A1

公开(公告)日：2006-08-31

申请号：US11227247

申请日：2005-09-15

申请人： Yong Choi ,  Robert Gordon ,  Gerald Novak ,  Carlos Plata-Salaman ,  Roy Twyman ,  H. White ,  Boyu Zhao

发明人： Yong Choi ,  Robert Gordon ,  Gerald Novak ,  Carlos Plata-Salaman ,  Roy Twyman ,  H. White ,  Boyu Zhao

IPC分类号： A61K31/325

CPC分类号： A61K45/06 ,  A61K31/27 ,  A61K31/325 ,  A61K2300/00

摘要： This invention is directed to methods for preventing, treating, reversing, inhibiting or arresting epilepsy and epileptogenesis in a subject comprising administering to the subject in need thereof a therapeutically effective amount of a compound selected from the group consisting of Formula (I) and Formula (II), or a pharmaceutically acceptable salt or ester thereof: wherein phenyl is substituted at X with one to five halogen atoms selected from the group consisting of fluorine, chlorine, bromine and iodine; and, R1, R2, R3, R4, R5 and R6 are independently selected from the group consisting of hydrogen and C1-C4 alkyl; wherein C1-C4 alkyl is optionally substituted with phenyl (wherein phenyl is optionally substituted with substituents independently selected from the group consisting of halogen, C1-C4 alkyl, C1-C4 alkoxy, amino, nitro and cyano).

摘要翻译： 本发明涉及在受试者中预防，治疗，逆转，抑制或阻止癫痫和癫痫发生的方法，其包括向有需要的受试者施用治疗有效量的选自式（I）和式 II）或其药学上可接受的盐或酯：其中苯基在X上被一至五个选自氟，氯，溴和碘的卤素原子取代; 和R 1，R 2，R 3，R 4，R 5和/或 和R 6和R 6独立地选自氢和C 1 -C 4烷基; 其中C 1 -C 4烷基任选被苯基取代（其中苯基任选被独立地选自卤素，C 1 -C 6烷基的取代基取代， C 1 -C 4烷基，C 1 -C 4烷氧基，氨基，硝基和氰基）。

公开(公告)号：US20060127671A1

公开(公告)日：2006-06-15

申请号：US11113230

申请日：2005-04-25

申请人： Geun Park ,  Chang Hwang ,  Yeo Yoon ,  Yong Choi ,  Hyung Joo ,  Wook Sung

发明人： Geun Park ,  Chang Hwang ,  Yeo Yoon ,  Yong Choi ,  Hyung Joo ,  Wook Sung

IPC分类号： B32B9/00

CPC分类号： C23C30/005 ,  C23C4/12 ,  C23C4/18 ,  C23C16/36 ,  C23C28/042 ,  C23C28/044 ,  Y10T428/24355 ,  Y10T428/24479 ,  Y10T428/24645 ,  Y10T428/30

摘要： Disclosed herein is a cutting tool having high toughness and abrasion resistance, in which a coated cutting tool including a cemented carbide substrate, a cermet substrate or a ceramic substrate coated with a hard coating film by means of chemical vapor deposition, moderate temperature-chemical vapor deposition or physical vapor deposition, and/or a cemented carbide cutting tool, a cermet cutting tool or a ceramic cutting tool are subjected to wet blasting using 10-300 μm sized particles to decrease residual tensile stress or increase residual compressive stress, thereby improving toughness, and also, reducing surface roughness of the cutting tool, thus remarkably increasing chipping resistance and flaking resistance.

摘要翻译： 本文公开了一种具有高韧性和耐磨性的切削工具，其中包括通过化学气相沉积涂覆有硬涂层的硬质合金基底，金属陶瓷基底或陶瓷基底的涂层切削工具，适度的温度 - 化学气相 使用10-300毫米尺寸的颗粒对沉积或物理气相沉积和/或硬质合金切削工具，金属陶瓷切削工具或陶瓷切削工具进行湿式喷砂，以减少残余拉伸应力或增加残余压应力，从而提高韧性 ，并且还减小了切削工具的表面粗糙度，因此显着提高了耐崩裂性和耐剥落性。