公开(公告)号：US20110253311A1

公开(公告)日：2011-10-20

申请号：US13175469

申请日：2011-07-01

申请人： Sunao MURAOKA ,  Jun Yamashita ,  Atsushi Ueda

发明人： Sunao MURAOKA ,  Jun Yamashita ,  Atsushi Ueda

IPC分类号： H01L21/3065 ,  C23C16/511 ,  C23C16/50

CPC分类号： H01L21/68742 ,  C23C16/4586 ,  H01L21/67103

摘要： A substrate processing apparatus for performing a plasma process on a target substrate includes a process container configured to accommodate the target substrate. The apparatus includes a gas feed passage configured to supply a process gas into the process container and an exhaust passage configured to exhaust gas from inside the process container. The apparatus further includes a plasma generation mechanism configured to generate plasma of the process gas inside the process container and a metal component to be exposed to plasma inside the process container. The metal component is provided with a silicon film that coats at least a portion thereof to be exposed to plasma and to suffer an intense electric filed generated thereabout.

摘要翻译： 用于在目标衬底上执行等离子体处理的衬底处理装置包括配置成容纳目标衬底的处理容器。 该装置包括：气体供给通道，其构造成将处理气体供应到处理容器中;以及排气通道，其构造成从处理容器内部排出气体。 该装置还包括等离子体生成机构，其被配置为产生处理容器内的处理气体的等离子体，以及暴露于处理容器内的等离子体的金属成分。 金属部件设置有涂覆其至少一部分以暴露于等离子体并且在其周围产生强电场的硅膜。

公开(公告)号：US20110024048A1

公开(公告)日：2011-02-03

申请号：US12935392

申请日：2009-03-31

申请人： Hideo Nakamura ,  Jun Yamashita ,  Junichi Kitagawa ,  Yoshiro Kabe ,  Yoshinori Fukuda

发明人： Hideo Nakamura ,  Jun Yamashita ,  Junichi Kitagawa ,  Yoshiro Kabe ,  Yoshinori Fukuda

IPC分类号： H01L21/306 ,  C23F1/08 ,  C23C16/00

CPC分类号： H01J37/32623 ,  H01J37/32091 ,  H01J37/32559 ,  H01J37/32633

摘要： In a plasma oxidation processing apparatus (100) which supplies a high-frequency bias power to an electrode (7) embedded in a stage (5), the interior surface, which is to be exposed to a plasma, of an aluminum lid (27) which functions as an opposite electrode for the stage (5) is coated with a silicon film (48) as a protective film. Positioned adjacent to the silicon film (48), an upper liner (49a) and a thicker lower liner (49b) are provided on the interior surfaces of a second container (3) and a first container (2). This prevents a short circuit or abnormal electrical discharge to the interior surfaces, making it possible to form a proper high-frequency current path and enhance the efficiency of power consumption.

摘要翻译： 在等离子体氧化处理装置（100）中，该等离子体氧化处理装置（100）向嵌入在载物台（5）中的电极（7）提供高频偏置功率，即将暴露于等离子体的铝表面（27） ）作为用于载物台（5）的相对电极，被涂覆有作为保护膜的硅膜（48）。 在第二容器（3）和第一容器（2）的内表面上设置有邻近硅膜（48）的上衬垫（49a）和较厚的下衬套（49b）。 这防止了内部表面的短路或异常放电，使得可以形成适当的高频电流路径并提高功耗的效率。

公开(公告)号：US07707965B2

公开(公告)日：2010-05-04

申请号：US11684717

申请日：2007-03-12

申请人： Jun Yamashita

发明人： Jun Yamashita

IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306

CPC分类号： H01J37/32192 ,  H01J37/32458

摘要： A processing apparatus includes an openable/closable lid disposed on a process container, and an opening/closing mechanism configured to open/close the lid. The opening/closing mechanism includes a hinge structure swingably coupling the lid to one end of the process container, and a drive structure configured to swing the lid. The hinge structure includes a main shaft used as a rotation axis when the lid is swung by the drive structure, and an adjusting shaft located on a distal end side relative to the main shaft, for adjusting an angle of the lid.

摘要翻译： 一种加工设备包括设置在处理容器上的可开闭盖子，以及构造成打开/关闭盖子的打开/关闭机构。 打开/关闭机构包括将盖可旋转地联接到处理容器的一端的铰链结构以及构造成使盖旋转的驱动结构。 铰链结构包括当盖被驱动结构摆动时用作旋转轴的主轴和相对于主轴位于远端侧的调节轴，用于调节盖的角度。

公开(公告)号：US20090065486A1

公开(公告)日：2009-03-12

申请号：US12281073

申请日：2007-02-27

申请人： Jun Yamashita

发明人： Jun Yamashita

IPC分类号： B23K9/00

CPC分类号： H01L21/02238 ,  H01J37/20 ,  H01J37/32192 ,  H01J2237/2001 ,  H01L21/02252 ,  H01L21/31662 ,  H01L21/67069 ,  H01L21/67103 ,  H01L21/68742

摘要： A plasma processing apparatus includes a chamber configured to accommodate a target substrate; a plasma generation mechanism configured to generate plasma inside the chamber; a process gas supply mechanism configured to supply a process gas into the chamber; an exhaust mechanism connected to the chamber to exhaust gas from inside the chamber; a table configured to place the target substrate thereon inside the chamber, the table including a table main body and a heating element disposed in the main body to heat the substrate; a support portion that supports the substrate table; a fixing member that fixes the support portion to the chamber; and an electrode configured to supply a power to the heating element, wherein the heating element and the electrode are made of an SiC-containing material, the electrode is fixed to the fixing member, extends through the support portion, and is connected to the heating element at a distal end, and an electrode sheath member made of a quartz-containing insulative material envelops the electrode except for the distal end, and extends through a portion of the substrate table below the heating element, the support portion, and the fixing member.

摘要翻译： 等离子体处理装置包括：腔室，被配置成容纳目标衬底; 等离子体生成机构，被配置为在所述室内产生等离子体; 处理气体供给机构，其构造成将处理气体供给到所述室中; 连接到所述室以从所述室内部排出废气的排气机构; 被配置为将目标基板放置在所述室内的工作台，所述工作台包括设置在所述主体中的台主体和加热元件以加热所述基板; 支撑基板台的支撑部; 固定构件，其将所述支撑部分固定到所述腔室; 以及电极，其被配置为向所述加热元件供电，其中所述加热元件和所述电极由含SiC材料制成，所述电极固定到所述固定构件，延伸穿过所述支撑部分，并且连接到所述加热元件 元件在远端，并且由含石英的绝缘材料制成的电极护套构件包围除了远端之外的电极，并且延伸穿过加热元件下方的基板台的一部分，支撑部分和固定构件 。

公开(公告)号：US20090041568A1

公开(公告)日：2009-02-12

申请号：US12162900

申请日：2007-01-31

申请人： Sunao Muraoka ,  Jun Yamashita ,  Atsushi Ueda

发明人： Sunao Muraoka ,  Jun Yamashita ,  Atsushi Ueda

IPC分类号： B65G47/22 ,  A47B37/00

CPC分类号： H01L21/68742 ,  C23C16/4586 ,  H01L21/67103

摘要： A substrate table includes a substrate table main body provided with a heater embedded therein and having an upper surface serving as a heating face for heating a target substrate, and lifter pins inserted in the substrate table main body and configured to be moved up and down. Recessed portions are formed in the heating face of the substrate table main body at positions corresponding to the lifter pins and have a bottom lower than the heating face. Each of the lifter pins includes a lifter pin main body and a head portion formed at a distal end of the lifter pin main body and having a diameter larger than the lifter pin main body, the head portion being formed to correspond to each recessed portion and to be partly accommodated in the recessed portion. The head portion has a head portion upper end for supporting the target substrate and a head portion lower surface opposite to the head portion upper end. The lifter pins are movable between a first state where the head portion lower surface engages with the bottom of the recessed portion, and a second state where the head portion lower surface separates upward from the bottom of the recessed portion.

摘要翻译： 基板台包括设置有嵌入其中的加热器的基板台主体，并具有用作加热目标基板的加热面的上表面，以及插入到基板台主体中并被配置为上下移动的升降销。 在基板台主体的加热面上，在与升降销相对应的位置处形成凹部，并且底部比加热面低。 每个升降销包括提升销主体和形成在升降器销主体的远端处并且具有大于升降器销主体的直径的头部，该头部形成为对应于每个凹部，并且 以部分地容纳在凹部中。 头部具有用于支撑目标基板的头部上端和与头部上端相对的头部下表面。 提升销可以在头部下表面与凹部的底部接合的第一状态和头部下表面从凹部的底部向上分离的第二状态下移动。

公开(公告)号：USD563949S1

公开(公告)日：2008-03-11

申请号：US29281079

申请日：2007-06-14

申请人： Jun Yamashita ,  Cai Zhong Tian

设计人： Jun Yamashita ,  Cai Zhong Tian

公开(公告)号：US07273003B2

公开(公告)日：2007-09-25

申请号：US10858476

申请日：2004-06-02

申请人： Jun Yamashita ,  Tomohide Tanaka ,  Atsushi Shimizu ,  Naotoshi Tamai ,  Motoyasu Nakamura

发明人： Jun Yamashita ,  Tomohide Tanaka ,  Atsushi Shimizu ,  Naotoshi Tamai ,  Motoyasu Nakamura

IPC分类号： F01B1/00 ,  F01L15/00

CPC分类号： B60T8/4031 ,  F04B1/0413 ,  F04B9/042

摘要： A plunger pump, includes: a plunger pump unit including a pump chamber and a plunger for pressing a hydraulic fluid in the pump chamber to perform a discharging operation of the hydraulic fluid; a motor; and a cam portion driven by the motor to rotate and press the plunger. The cam portion has at least two discharge regions for pressing the plunger and a suction region formed between the discharge region. The plunger performs the discharging operation two times or more by one rotation of the cam portion.

摘要翻译： 一种柱塞泵，包括：柱塞泵单元，其包括泵室和用于对泵室中的液压流体进行按压以执行液压流体的排放操作的柱塞; 电机 以及由马达驱动以旋转并按压柱塞的凸轮部分。 凸轮部具有用于按压柱塞的至少两个排出区域和形成在排出区域之间的吸入区域。 柱塞通过凸轮部分的一次旋转执行两次或更多次的排出操作。

公开(公告)号：US20070212200A1

公开(公告)日：2007-09-13

申请号：US11683015

申请日：2007-03-07

申请人： Atsushi Ueda ,  Jun Yamashita

发明人： Atsushi Ueda ,  Jun Yamashita

IPC分类号： H01L21/677

CPC分类号： H01L21/68742 ,  H01L21/68757 ,  H01L21/68785

摘要： Each pin fixing portion is fitted in a through-hole formed in a lifter arm, and includes a flange portion, a movable portion, a screw portion, and a pin insertion hole. A pin is fixedly screwed into the pin insertion hole at a lower end. The movable portion is inserted with an allowance in the through-hole, and the flange portion is set in contact with an upper surface of the lifter arm. The screw portion projects downward from the through-hole. A lower support portion is screwed on the screw portion and set in contact with a lower surface of the lifter arm.

摘要翻译： 每个销固定部分装配在形成在提升臂中的通孔中，并且包括凸缘部分，可动部分，螺纹部分和销插入孔。 销在下端固定地拧入销插入孔。 可移动部分在通孔中被允许地插入，并且凸缘部分被设置成与提升臂的上表面接触。 螺纹部从通孔向下突出。 下支撑部分被拧在螺钉部分上并与升降臂的下表面接触。

公开(公告)号：US20050191744A1

公开(公告)日：2005-09-01

申请号：US11063584

申请日：2005-02-24

申请人： Kazuwa Nakao ,  Hiroshi Itoh ,  Jun Yamashita ,  Masakatsu Sone ,  Yasushi Kondo ,  Yutaka Suzuki

发明人： Kazuwa Nakao ,  Hiroshi Itoh ,  Jun Yamashita ,  Masakatsu Sone ,  Yasushi Kondo ,  Yutaka Suzuki

IPC分类号： C12N5/071 ,  C12N5/08

CPC分类号： C12N5/069 ,  C12N2501/165 ,  C12N2506/03

摘要： To provide a technique of the differentiation from a primate embryonic stem cell into a vascular cell, and techniques using the same. A method for differentiating a primate embryonic stem cell into a vascular cell, comprising differentiating a primate embryonic stem cell into a VEGFR-2-positive and undifferentiated primate embryonic stem cell marker-negative cell, and if need, further differentiating the resulting cell, a method of the differentiation into a vascular cell, and a vascular cell obtained by the method.

摘要翻译： 提供从灵长类动物胚胎干细胞分化成血管细胞的技术以及使用其的技术。 一种将灵长动物胚胎干细胞分化为血管细胞的方法，其包括将灵长类动物胚胎干细胞分化为VEGFR-2阳性和未分化的灵长类动物胚胎干细胞标记物阴性细胞，如果需要，进一步分化所得细胞， 分化成血管细胞的方法和通过该方法获得的血管细胞。

公开(公告)号：US5519933A

公开(公告)日：1996-05-28

申请号：US197744

申请日：1994-02-17

申请人： Hiroshi Sakashita ,  Jun Yamashita

发明人： Hiroshi Sakashita ,  Jun Yamashita

IPC分类号： B21D53/10 ,  B23P19/02 ,  F16C17/00 ,  F16C33/08 ,  F16C33/14 ,  H02K5/167 ,  H02K15/16 ,  H02K15/14

CPC分类号： F16C33/08 ,  F16C33/14 ,  H02K15/16 ,  H02K5/1675 ,  Y10T29/49012 ,  Y10T29/4994

摘要： A method permits the use of a low-cost bearing and by which a bearing unit can be manufactured without requiring lathe turning or any special kind of compression, pressure application, etc., that experiences low loss and which assures high precision in the perpendicularity of the rotating shaft to be supported by the bearing. The process for manufacturing a bearing unit in which bearing that supports a rotating shaft in a freely rotatable manner is secured to mounting member. The process includes at least the following three steps: the first step for providing sizing bar in hole in bearing into which the rotating shaft is to be inserted; the second step for working an end portion of the bearing, thereby forming in an end portion of the hole a small-diameter portion that is equal in size to the outside diameter of the sizing bar; and the third step for securing the bearing to the mounting member.

摘要翻译： 一种方法允许使用低成本的轴承，并且通过该轴承单元可以制造轴承单元，而不需要车床转动或经历低损失的任何特殊类型的压缩，压力施加等，并且确保垂直度的高精度 旋转轴由轴承支撑。 制造轴承单元的方法，其中以可自由旋转的方式支撑旋转轴的轴承固定到安装构件。 该方法至少包括以下三个步骤：用于在轴承孔中提供定径棒的第一步骤，旋转轴将被插入其中; 用于加工轴承的端部的第二步骤，从而在孔的端部形成尺寸与尺寸筛的外径相同的小直径部分; 以及用于将轴承固定到安装构件的第三步骤。