公开(公告)号：US20080218767A1

公开(公告)日：2008-09-11

申请号：US11714904

申请日：2007-03-07

申请人： Everhardus Cornelis Mos ,  Arie Jeffrey Den Boef ,  Maurits Van Der Schaar

发明人： Everhardus Cornelis Mos ,  Arie Jeffrey Den Boef ,  Maurits Van Der Schaar

IPC分类号： G01B11/24

CPC分类号： G03F7/70633

摘要： An overlay marker for use with a scatterometer includes two overlying two-dimensional gratings. The two gratings have the same pitch but the upper grating has a lower duty ratio. Cross-talk between X and Y overlay measurements can therefore be avoided. The gratings may be directly overlying or off set so as to be interleaved in one or two directions.

摘要翻译： 与散射仪一起使用的叠加标记包括两个上覆的二维光栅。 两个光栅具有相同的间距，但是上部光栅具有较低的占空比。 因此可以避免X和Y重叠测量之间的串扰。 光栅可以直接覆盖或偏离设置，以便沿一个或两个方向交错。

公开(公告)号：US07064807B2

公开(公告)日：2006-06-20

申请号：US10840360

申请日：2004-05-07

申请人： Cheng-Qun Gui ,  Henricus Wilhelmus Maria Van Buel ,  Maurits Van Der Schaar ,  Arie Jeffrey Den Boef

发明人： Cheng-Qun Gui ,  Henricus Wilhelmus Maria Van Buel ,  Maurits Van Der Schaar ,  Arie Jeffrey Den Boef

IPC分类号： G03B27/54 ,  G03B27/42 ,  G03B27/32 ,  G01B11/00

CPC分类号： G03F7/70691 ,  G03F7/70216 ,  G03F9/7084

摘要： A lithographic projection apparatus is provided with an optical system built into the wafer table for producing an image of a wafer mark that is provided on the back side of the wafer. The image is located at the plane of the front side of the wafer and can be viewed by an alignment system from the front side of the wafer. Simultaneous alignment between marks on the back and front of the wafer and a mask can be performed using a pre-existing alignment system.

摘要翻译： 光刻投影装置设置有内置在晶片台中的光学系统，用于产生设置在晶片背面的晶片标记的图像。 图像位于晶片正面的平面上，并且可以通过对准系统从晶片的正面观察。 可以使用预先存在的对准系统来执行晶片背面和前面的标记与掩模之间的同时对准。

公开(公告)号：US20120033193A1

公开(公告)日：2012-02-09

申请号：US13186895

申请日：2011-07-20

申请人： Maurits VAN DER SCHAAR ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos ,  Andreas Fuchs ,  Martyn John Coogans ,  Hendrik Jan Hidde Smilde

发明人： Maurits VAN DER SCHAAR ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos ,  Andreas Fuchs ,  Martyn John Coogans ,  Hendrik Jan Hidde Smilde

IPC分类号： G03B27/54 ,  G01J3/36

CPC分类号： G03F7/70633 ,  G01B2210/56 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/95607 ,  G03F7/70616 ,  G03F9/70

摘要： An inspection apparatus measures a property of a substrate including a periodic structure. An illumination system provides a beam of radiation with an illumination profile including a plurality of illuminated portions. A radiation projector projects the beam of radiation onto the substrate. A detector detects radiation scattered from the periodic structure and separately detects first order diffracted radiation and at least one higher order of diffracted radiation of each of the illuminated portions. A processor determines the property of the substrate from the detected radiation. The plurality of illuminated portions are arranged such that first order diffracted radiation arising from one or more of the illuminated portions are not overlapped by zeroth order or first order diffracted radiation arising from any other of the illuminated portions. Furthermore, the plurality of illuminated portions are arranged such that first order diffracted radiation arising from the one or more of the illuminated portions are overlapped by at least one of the higher orders of diffracted radiation arising from any other of the illuminated portions.

摘要翻译： 检查装置测量包括周期性结构的基板的性质。 照明系统提供具有包括多个照明部分的照明轮廓的辐射束。 辐射投影仪将辐射束投影到基板上。 检测器检测从周期性结构散射的辐射，并分别检测每个照明部分的一级衍射辐射和衍射辐射的至少一个高阶。 处理器根据检测到的辐射来确定衬底的性质。 多个照明部分被布置成使得从一个或多个被照射部分产生的一级衍射辐射不会被任何其他照明部分产生的零级或一级衍射辐射重叠。 此外，多个照明部分被布置成使得由一个或多个被照射部分产生的一阶衍射辐射与从任何其他照明部分产生的衍射辐射的较高阶数中的至少一个重叠。

公开(公告)号：US07898662B2

公开(公告)日：2011-03-01

申请号：US11455942

申请日：2006-06-20

申请人： Maurits Van Der Schaar ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos ,  Stefan Carolus Jacobus Antonius Keij

发明人： Maurits Van Der Schaar ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos ,  Stefan Carolus Jacobus Antonius Keij

IPC分类号： G01B11/00

CPC分类号： G03F9/7076 ,  G03F7/70633

摘要： An overlay target on a substrate includes two sets of gratings; the first set having a pitch P1 and the second set having a pitch P2 and each set including a grating with an orientation substantially perpendicular to the first grating of each set. When a layer of resist is to be aligned with the layer below it, the same overlay marks are provided on the upper layer and the relative positions of the overlay targets on the upper layer and the lower layer are compared by shining an overlay beam on to the overlay targets and measuring the diffraction spectrum of the reflected beam. Having two sets of overlay targets with different pitches in gratings enables the measurement of overlay errors that are greater than the pitch of either one of the overlay gratings.

摘要翻译： 衬底上的覆盖目标包括两组光栅; 第一组具有节距P1，第二组具有节距P2，并且每组包括具有大致垂直于每组的第一光栅的取向的光栅。 当抗蚀剂层与其下面的层对准时，在上层上提供相同的覆盖标记，并且通过将覆盖光束照射到上层和下层来比较覆盖目标在上层和下层上的相对位置 覆盖目标并测量反射光束的衍射光谱。 在光栅中具有两组具有不同间距的覆盖目标使得可以测量大于叠加光栅中的任一个的间距的重叠误差。

公开(公告)号：US20100277706A1

公开(公告)日：2010-11-04

申请号：US12770153

申请日：2010-04-29

申请人： Maurits Van der Schaar ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos

发明人： Maurits Van der Schaar ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos

IPC分类号： G03B27/42 ,  G01B11/00 ,  G03F7/20

CPC分类号： G03F7/70633 ,  H01L22/12

摘要： According to an example, a first layer of a substrate comprises a plurality of gratings having a periodicity P. A second layer of the substrate comprises a plurality of gratings, overlapping with the first set of gratings, and having a periodicity of NP, where N is an integer greater than 2. A first set of gratings has a bias of +d and the second set of gratings has a bias of −d. A beam of radiation is projected onto the gratings and the angle resolved spectrum of the reflected radiation detected. The overlay error is then calculated using the angle resolved spectrum of the reflected radiation.

摘要翻译： 根据示例，衬底的第一层包括具有周期P的多个光栅。衬底的第二层包括与第一组光栅重叠并且具有NP的周期性的多个光栅，其中N 是大于2的整数。第一组光栅具有+ d的偏置，第二组光栅具有-d的偏置。 将辐射束投射到光栅上，并检测到反射辐射的角度分辨光谱。 然后使用反射辐射的角度分辨光谱计算覆盖误差。

公开(公告)号：US07710572B2

公开(公告)日：2010-05-04

申请号：US11606376

申请日：2006-11-30

申请人： Everhardus Cornelis Mos ,  Arie Jeffrey Den Boef ,  Maurits Van Der Schaar ,  Thomas Leo Maria Hoogenboom

发明人： Everhardus Cornelis Mos ,  Arie Jeffrey Den Boef ,  Maurits Van Der Schaar ,  Thomas Leo Maria Hoogenboom

IPC分类号： G01N21/00 ,  G01N21/25 ,  G01N21/55

CPC分类号： G03F7/70991 ,  G03F7/70525 ,  G03F7/70533 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7046

摘要： A fault detection and classification method is disclosed that uses raw back-focal-plane image data of radiation from a substrate surface, detected by a scatterometer detector, to determine a variation in the raw data and correlate the variation in the raw data with a possible fault in a lithographic apparatus or a process that patterned the substrate surface. The correlation is carried out by comparing the variation in the raw data with known metrology data. Once a fault has been determined, a user may be notified of the fault.

摘要翻译： 公开了一种故障检测和分类方法，其使用由散射仪检测器检测的来自衬底表面的辐射的原始背焦平面图像数据来确定原始数据的变化并将原始数据的变化与可能的原始数据相关联 光刻设备中的故障或图案化衬底表面的工艺。 通过将原始数据的变化与已知计量数据进行比较来进行相关性。 一旦确定故障，就可以向用户通知故障。

公开(公告)号：US07656518B2

公开(公告)日：2010-02-02

申请号：US11729962

申请日：2007-03-30

申请人： Arie Jeffrey Den Boef ,  Karel Diederick Van Der Mast ,  Maurits Van Der Schaar

发明人： Arie Jeffrey Den Boef ,  Karel Diederick Van Der Mast ,  Maurits Van Der Schaar

IPC分类号： G01N21/00

CPC分类号： G01N21/4785 ,  G03F7/70516 ,  G03F7/70616 ,  G03F7/70633

摘要： In a method of measuring asymmetry in a scatterometer, a target portion is illuminated twice, first with 0° of substrate rotation and secondly with 180° of substrate rotation. One of those images is rotated and then that rotated image is subtracted from the other image. In this way, asymmetry of the scatterometer can be corrected.

摘要翻译： 在测量散射仪中的不对称性的方法中，目标部分被照射两次，首先是基板旋转的0°，其次是基板旋转180°。 其中一个图像被旋转，然后从另一个图像中减去旋转的图像。 以这种方式，可以校正散射仪的不对称性。

公开(公告)号：US20090027691A1

公开(公告)日：2009-01-29

申请号：US12141640

申请日：2008-06-18

申请人： Maurits Van Der Schaar ,  Arie Jeffrey Den Boef ,  Richard Johannes Franciscus Van Haren ,  Everhardus Cornelis Mos

发明人： Maurits Van Der Schaar ,  Arie Jeffrey Den Boef ,  Richard Johannes Franciscus Van Haren ,  Everhardus Cornelis Mos

IPC分类号： G01B11/25 ,  G03B27/52

CPC分类号： G03F7/70433 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/708 ,  G03F9/7084

摘要： In a device manufacturing method and a metrology apparatus, metrology measurements are executed using radiation having a first wavelength. Subsequently a grid of conducting material is applied on the substrate, the grid having grid openings which in a first direction in the plane of the grid are smaller than the first wavelength. The space in the scribe lane where the measurement target was, is now shielded and may be used again in further layers or processing steps of the substrate.

摘要翻译： 在装置制造方法和计量装置中，使用具有第一波长的辐射来执行度量测量。 随后，将导电材料栅格施加在基板上，栅格具有在栅格平面中的第一方向上的栅格开口小于第一波长。 测量目标的划线中的空间现在被屏蔽，并且可以再次用于基板的更多层或处理步骤。

公开(公告)号：US07391513B2

公开(公告)日：2008-06-24

申请号：US11391690

申请日：2006-03-29

申请人： Maurits Van Der Schaar ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos ,  Stefan Carolus Jacobus Antonius Keij

发明人： Maurits Van Der Schaar ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos ,  Stefan Carolus Jacobus Antonius Keij

IPC分类号： G01B11/00 ,  G06K9/00

CPC分类号： G03F7/70633 ,  G03F7/70483

摘要： A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate includes two reference gratings provided in the substrate and two measurement gratings on top of the reference gratings, the measurement gratings being similar to the reference gratings, and oppositely biased in a single direction relative to the respective reference gratings. An overlay measurement device with an image sensor is used for obtaining pixel data of a measurement spot in each of the two measurement gratings. Asymmetry for each pixel in the measurement spot is measured, and from the pixel asymmetry measurements in associated pixels of each of the two measurement gratings an overlay value and a process dependent value is determined, as well as a quality indicator for the overlay value and the process dependent value.

摘要翻译： 布置成将图案从图案形成装置转移到基板上的光刻设备包括设置在基板中的两个参考光栅和在参考光栅顶部的两个测量光栅，测量光栅类似于参考光栅，并且相反地偏置在单个 相对于各个参考光栅的方向。 使用具有图像传感器的覆盖测量装置来获得两个测量光栅中的每一个中的测量点的像素数据。 测量测量点中每个像素的不对称性，并且从两个测量光栅中的每一个的相关像素中的像素不对称测量结果确定覆盖值和过程相关值，以及重叠值的质量指示符和 过程依赖值。

公开(公告)号：US20080144036A1

公开(公告)日：2008-06-19

申请号：US11641124

申请日：2006-12-19

申请人： Maurits Van Der Schaar ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos

发明人： Maurits Van Der Schaar ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos

IPC分类号： G01N21/47

CPC分类号： G03F7/70633 ,  H01L22/12

摘要： An inspection system is arranged to measure an overlay error by projecting a plurality of radiation beams, differing in wavelength and/or polarization, onto two targets. A first radiation beam is projected onto a first target and the reflected radiation A1+ is detected. The first target comprises two gratings having a bias +d with respect to each other. The first radiation beam is also projected on to a second target, which comprises two gratings having a bias −d with respect to each other, and the reflected radiation A1− is detected. A second radiation beam, having a different wavelength and/or polarization from the first radiation beam, is projected onto the first target and reflected radiation A2+ is detected and projected onto the second target and reflected radiation A2− is detected. Detected radiations A1+, A1−, A2+, and A2− is used to determine the overlay error.

摘要翻译： 检查系统被布置成通过将不同波长和/或极化的多个辐射束投影到两个目标上来测量覆盖误差。 第一辐射束被投影到第一目标上，并且检测到反射辐射A 1 +。 第一个目标包括两个相对于彼此具有偏压+ d的光栅。 第一辐射束也被投影到第二靶上，第二靶被包括相对于彼此具有偏压-d的两个光栅，并且检测到反射的辐射A 1 - 。 具有与第一辐射束不同的波长和/或极化的第二辐射束被投影到第一目标上，并且检测并反射辐射A 2 + 2并将其投影到第二目标和反射辐射A 检测到<2> 。 检测到的辐射使用1 ，1 ，2 和A 2 - 来确定 重叠错误。