公开(公告)号：US5478869A

公开(公告)日：1995-12-26

申请号：US281137

申请日：1994-07-27

申请人： Yosuke Takahashi ,  Noriaki Oshima ,  Yasuhiko Shida ,  Reiko Otomo

发明人： Yosuke Takahashi ,  Noriaki Oshima ,  Yasuhiko Shida ,  Reiko Otomo

IPC分类号： C09D4/00 ,  G11B7/253 ,  G11B7/2534 ,  G11B7/254 ,  G11B7/2542 ,  G11B7/2545 ,  G11B7/258 ,  G11B7/2585 ,  C08K3/34

CPC分类号： G11B7/2542 ,  C09D4/00 ,  G11B7/2534 ,  G11B7/2545 ,  G11B7/2585

摘要： A protective coating material comprising (meth)acrylate derivatives of the following formulas 1, 2, 3, 4 and 5 within the following ranges of a, b, c, d and e % by weight, respectively:5.ltoreq.a.ltoreq.80, 0.ltoreq.b.ltoreq.30, 0.ltoreq.c.ltoreq.30, 5.ltoreq.d.ltoreq.50,0.ltoreq.e.ltoreq.50, provided that a+b+c+d+e=100, ##STR1## wherein each of R.sub.1 to R.sub.3 is H or CH.sub.3, and R.sub.4 is CH.sub.2 CH.sub.3 or CH.sub.2 OH, ##STR2## wherein each of R.sub.5 to R.sub.8 is H or CH.sub.3, ##STR3## wherein each of R.sub.9 to R.sub.14 is H or CH.sub.3,CH.sub.2 .dbd.C(R.sub.15)COO(CH.sub.2).sub.n OCOC(R.sub.16).dbd.CH.sub.2 4wherein each of R.sub.15 and R.sub.16 is H or CH.sub.3, and n is an integer of from 2 to 10. ##STR4## wherein R17 is H or CH.sub.3.

摘要翻译： 包含以下式的（甲基）丙烯酸酯衍生物+ E，crc / 1 /，+ E，crc / 2 /，+ E，crc / 3 /，+ E，crc / 4 /和+ E，crc 分别为a，b，c，d和e重量％的以下范围：5≤a≤80,0≤b≤30,0， a + b + c + d + e = 100，其中R 1至R 3各自为H 或R 3为CH 3，R 4为CH 2 CH 3或CH 2 OH，其中R 5至R 8各自为H或CH 3，其中R 9至R 14各自为H或CH 3，CH 2 = C（R 15） ）COO（CH2）nOCOC（R16）= CH2 + E，crc / 4 /其中R15和R16各自为H或CH3，n为2至10的整数。其中R17为H或 CH3。

公开(公告)号：US08779174B2

公开(公告)日：2014-07-15

申请号：US12996690

申请日：2009-06-12

申请人： Ken-ichi Tada ,  Toshiki Yamamoto ,  Hirokazu Chiba ,  Kohei Iwanaga ,  Atsushi Maniwa ,  Tadahiro Yotsuya ,  Noriaki Oshima

发明人： Ken-ichi Tada ,  Toshiki Yamamoto ,  Hirokazu Chiba ,  Kohei Iwanaga ,  Atsushi Maniwa ,  Tadahiro Yotsuya ,  Noriaki Oshima

IPC分类号： C07F7/28

CPC分类号： H01L21/28556 ,  B01J21/063 ,  B01J31/1805 ,  B01J35/004 ,  B01J2531/46 ,  C07C209/54 ,  C07C209/66 ,  C07C211/65 ,  C07C251/08 ,  C07F7/003 ,  C23C16/405 ,  C23C16/45553 ,  H01L21/02186 ,  H01L21/02271

摘要： A subject for the invention is to provide novel titanium complexes which have a high vapor pressure and high thermal stability and serve as an excellent material for producing a titanium-containing thin film by a technique such as the CVD method or ALD method and to further provide processes for producing these complexes, titanium-containing thin films produced from the complexes, and a process for producing the thin films. The invention relates to producing a titanium complex represented by general formula (1): (wherein R1 and R4 each independently represent an alkyl group having 1-16 carbon atoms; R2 and R3 each independently represent a hydrogen atom or an alkyl group having 1-3 carbon atoms; and R5 represents an alkyl group which has 1-16 carbon atoms and may have been substituted with one or more fluorine atoms) and to producing a titanium-containing thin film using the complex.

摘要翻译： 本发明的主题是提供具有高蒸气压和高热稳定性的新型钛络合物，并且通过诸如CVD法或ALD法的技术制造含钛薄膜的优异材料，并进一步提供 用于制备这些络合物的方法，由络合物制备的含钛薄膜以及薄膜的制造方法。 本发明涉及制备由通式（1）表示的钛络合物：（其中R 1和R 4各自独立地表示具有1-16个碳原子的烷基; R 2和R 3各自独立地表示氢原子或具有1- 3个碳原子; R5表示具有1-16个碳原子并且可以被一个或多个氟原子取代的烷基），并使用该络合物制备含钛薄膜。

公开(公告)号：US5100957A

公开(公告)日：1992-03-31

申请号：US734015

申请日：1991-07-22

申请人： Noriaki Oshima ,  Masaki Uchikura ,  Hideki Ohno

发明人： Noriaki Oshima ,  Masaki Uchikura ,  Hideki Ohno

IPC分类号： G03F1/62

CPC分类号： G03F1/62

摘要： A protective dust cover for a photomask or reticle useful for forming semiconductor integrated circuits, which is a transparent thin film cover to be disposed with a certain distance from the substrate surface of the photomask or reticle for the protection and dust proof of the substrate surface, said transparent thin film consisting essentially of a polyvinyl acetal of the formula: ##STR1## wherein R is a hydrogen atom, --CH.sub.3, --C.sub.2 H.sub.5 or --C.sub.n H.sub.m F.sub.2n-m+1 wherein n is an integer of from 1 to 8 and m is an integer of from 0 to 2n, x is a number of from 5 to 40, y is a number of from 0 to 10, z1 is a number of from 0 to 90/2, and z2 is a number of from 3/2 to 95/2, having a vinyl acetate content of at most 10 mol % and an acetal content of at least 60 mol %.

摘要翻译： 用于形成半导体集成电路的光掩模或掩模版的保护防尘罩，其是与光掩模或掩模版的基板表面一定距离设置的透明薄膜盖，用于基板表面的防护和防尘， 所述透明薄膜基本上由下式的聚乙烯醇缩醛组成：其中R是氢原子，-CH 3，-C 2 H 5或-C n H m F 2n + m + 1，其中n是1至8的整数，和 m为0〜2n的整数，x为5〜40的数，y为0〜10的数，z1为0〜90/2的数，z2为3的数 / 2〜95/2，乙酸乙烯酯含量为10摩尔％以下，缩醛含量为60摩尔％以上。

公开(公告)号：US09371452B2

公开(公告)日：2016-06-21

申请号：US14342993

申请日：2012-09-03

申请人： Tomoyuki Kinoshita ,  Kohei Iwanaga ,  Sachio Asano ,  Takahiro Kawabata ,  Noriaki Oshima ,  Satori Hirai ,  Yoshinori Harada ,  Kazuyoshi Arai ,  Ken-ichi Tada

发明人： Tomoyuki Kinoshita ,  Kohei Iwanaga ,  Sachio Asano ,  Takahiro Kawabata ,  Noriaki Oshima ,  Satori Hirai ,  Yoshinori Harada ,  Kazuyoshi Arai ,  Ken-ichi Tada

IPC分类号： C07F7/02 ,  G21H5/00 ,  C09D1/00 ,  C01B33/113 ,  C07F7/00 ,  H01L21/02

CPC分类号： C09D1/00 ,  C01B33/113 ,  C07F7/003 ,  C07F7/025 ,  H01L21/02164 ,  H01L21/02181 ,  H01L21/02186 ,  H01L21/02189 ,  H01L21/02216 ,  H01L21/02282

摘要： An object of the present invention is to provide a method for producing a Group IV metal oxide film useful as a semiconductor element or an optical element at a low temperature. The present invention relates to a method for producing a Group IV metal oxide film, comprising coating a surface of a substrate with a film-forming material dissolved in an organic solvent, and subjecting the substrate to a heat treatment, an ultraviolet irradiation treatment, or both of these treatments, wherein a film-forming material obtained by reacting a vinylenediamide complex having a specific structure with an oxidizing agent such as oxygen gas, air, ozone, water and hydrogen peroxide is used as the film-forming material.

摘要翻译： 本发明的目的是提供一种在低温下用作半导体元件或光学元件的IV族金属氧化物膜的制造方法。 本发明涉及一种IV族金属氧化物膜的制造方法，其特征在于，包括用溶解在有机溶剂中的成膜材料涂布基板的表面，对所述基板进行热处理，紫外线照射处理或 使用这些处理，其中使用通过使具有特定结构的亚乙烯基二胺配合物与氧气，氧气，空气，臭氧，水和过氧化氢等氧化剂反应获得的成膜材料作为成膜材料。

公开(公告)号：US20120029220A1

公开(公告)日：2012-02-02

申请号：US12996690

申请日：2009-06-12

申请人： Ken-ichi Tada ,  Toshiki Yamamoto ,  Hirokazu Chiba ,  Kohei Iwanaga ,  Atsushi Maniwa ,  Tadahiro Yotsuya ,  Noriaki Oshima

发明人： Ken-ichi Tada ,  Toshiki Yamamoto ,  Hirokazu Chiba ,  Kohei Iwanaga ,  Atsushi Maniwa ,  Tadahiro Yotsuya ,  Noriaki Oshima

IPC分类号： C07F7/28

CPC分类号： H01L21/28556 ,  B01J21/063 ,  B01J31/1805 ,  B01J35/004 ,  B01J2531/46 ,  C07C209/54 ,  C07C209/66 ,  C07C211/65 ,  C07C251/08 ,  C07F7/003 ,  C23C16/405 ,  C23C16/45553 ,  H01L21/02186 ,  H01L21/02271

摘要： A subject for the invention is to provide novel titanium complexes which have a high vapor pressure and high thermal stability and serve as an excellent material for producing a titanium-containing thin film by a technique such as the CVD method or ALD method and to further provide processes for producing these complexes, titanium-containing thin films produced from the complexes, and a process for producing the thin films. The invention relates to producing a titanium complex represented by general formula (1): (wherein R1 and R4 each independently represent an alkyl group having 1-16 carbon atoms; R2 and R3 each independently represent a hydrogen atom or an alkyl group having 1-3 carbon atoms; and R5 represents an alkyl group which has 1-16 carbon atoms and may have been substituted with one or more fluorine atoms) and to producing a titanium-containing thin film using the complex.

摘要翻译： 本发明的主题是提供具有高蒸气压和高热稳定性的新型钛络合物，并且通过诸如CVD法或ALD法的技术制造含钛薄膜的优异材料，并进一步提供 用于制备这些络合物的方法，由络合物制备的含钛薄膜以及薄膜的制造方法。 本发明涉及制备由通式（1）表示的钛络合物：（其中R 1和R 4各自独立地表示具有1-16个碳原子的烷基; R 2和R 3各自独立地表示氢原子或具有1- 3个碳原子; R5表示具有1-16个碳原子并且可以被一个或多个氟原子取代的烷基），并使用该络合物制备含钛薄膜。

公开(公告)号：US20050237914A1

公开(公告)日：2005-10-27

申请号：US11169922

申请日：2005-06-30

申请人： Noriaki Oshima ,  Hideki Oono ,  Takashi Taniguchi ,  Keiichiro Nishizawa

发明人： Noriaki Oshima ,  Hideki Oono ,  Takashi Taniguchi ,  Keiichiro Nishizawa

IPC分类号： G11B7/007 ,  G11B7/013 ,  G11B7/12 ,  G11B7/24 ,  G11B7/26

CPC分类号： G11B11/10584 ,  G11B7/007 ,  G11B7/122 ,  G11B7/24 ,  G11B7/24085 ,  G11B11/10578 ,  G11B11/1058 ,  G11B11/10586

摘要： An optical recording medium comprising at least a land and a groove where information-recording/reproducing is carried out by a flying type optical head. The optical recording medium keep the flying height of the flying optical head constant in the entire region of the recording/reproducing area, and is provided with at least one characteristic among the following characteristics: RP which is dependent on land and groove parameters and the flying height satisfied the relationship of H>Rp 01.H; centerline means roughness Ra is in the range of 0.2 nm Ra 2.0 nm, and the layer thickness of a liquid lubricant layer satisfies the relation of ΔRp≦λ/16NA which is dependent on the effective numerical aperature, laser wavelength and surface parameters is satisfied where all parameters in the formula are defined in the specification; and the height of a header area is different from the height of a land portion.

摘要翻译： 至少包括通过飞行型光学头执行信息记录/再现的平台和凹槽的光学记录介质。 光记录介质保持飞行光学头的飞行高度在记录/再现区域的整个区域中恒定，并且具有以下特征中的至少一个特征：取决于平面和凹槽参数的RP和飞行 高度满足H> Rp 01.H的关系; 中心线表示粗糙度Ra在0.2nm Ra 2.0nm的范围内，液体润滑剂层的层厚度满足取决于有效数值的DeltaRp <=λ/ 16NA的关系，满足激光波长和表面参数 其中公式中的所有参数在规范中定义; 并且标题区域的高度与陆地部分的高度不同。

公开(公告)号：US09624581B2

公开(公告)日：2017-04-18

申请号：US13121005

申请日：2009-10-21

申请人： Tetsu Yamakawa ,  Noriaki Oshima ,  Takahiro Kawabata ,  Tomoyuki Kinoshita ,  Toshio Inase

发明人： Tetsu Yamakawa ,  Noriaki Oshima ,  Takahiro Kawabata ,  Tomoyuki Kinoshita ,  Toshio Inase

IPC分类号： H01B1/02 ,  C23C18/08 ,  B22F9/24

CPC分类号： C23C18/08 ,  B22F9/24 ,  B22F2998/00 ,  H01B1/02 ,  H01B1/026 ,  B22F1/0018

摘要： A composition that includes a high-valent compound of copper, silver or indium; a linear, branched or cyclic C1-18 alcohol; and a Group VIII metal catalyst forms a metal film of copper, silver or indium on a substrate when the composition is coated on the substrate and heated to reduce the high-valent compound. The composition may alternatively include metal particles of silver, copper or indium in which the surface layer of the particle includes a high-valent compound of copper, silver or indium. A metal film of copper, silver or indium may also be formed on a substrate by coating a substrate with the composition including the metal particles, and heating to reduce the high-valent compound in the same manner as above.

公开(公告)号：US20140227456A1

公开(公告)日：2014-08-14

申请号：US14342993

申请日：2012-09-03

申请人： Tomoyuki Kinoshita ,  Kohei Iwanaga ,  Sachio Asano ,  Takahiro Kawabata ,  Noriaki Oshima ,  Satori Hirai ,  Yoshinori Harada ,  Kazuyoshi Arai ,  Ken-ichi Tada

发明人： Tomoyuki Kinoshita ,  Kohei Iwanaga ,  Sachio Asano ,  Takahiro Kawabata ,  Noriaki Oshima ,  Satori Hirai ,  Yoshinori Harada ,  Kazuyoshi Arai ,  Ken-ichi Tada

IPC分类号： C09D1/00

CPC分类号： C09D1/00 ,  C01B33/113 ,  C07F7/003 ,  C07F7/025 ,  H01L21/02164 ,  H01L21/02181 ,  H01L21/02186 ,  H01L21/02189 ,  H01L21/02216 ,  H01L21/02282

摘要： An object of the present invention is to provide a method for producing a Group IV metal oxide film useful as a semiconductor element or an optical element at a low temperature. The present invention relates to a method for producing a Group IV metal oxide film, comprising coating a surface of a substrate with a film-forming material dissolved in an organic solvent, and subjecting the substrate to a heat treatment, an ultraviolet irradiation treatment, or both of these treatments, wherein a film-forming material obtained by reacting a vinylenediamide complex having a specific structure with an oxidizing agent such as oxygen gas, air, ozone, water and hydrogen peroxide is used as the film-forming material.

摘要翻译： 本发明的目的是提供一种在低温下用作半导体元件或光学元件的IV族金属氧化物膜的制造方法。 本发明涉及一种IV族金属氧化物膜的制造方法，其特征在于，包括用溶解在有机溶剂中的成膜材料涂布基板的表面，对基板进行热处理，紫外线照射处理或 使用这些处理，其中使用通过使具有特定结构的亚乙烯基二胺配合物与氧气，氧气，空气，臭氧，水和过氧化氢等氧化剂反应获得的成膜材料作为成膜材料。

公开(公告)号：US20110183068A1

公开(公告)日：2011-07-28

申请号：US13121005

申请日：2009-10-21

申请人： Tetsu Yamakawa ,  Noriaki Oshima ,  Takahiro Kawabata ,  Tomoyuki Kinoshita ,  Toshio Inase

发明人： Tetsu Yamakawa ,  Noriaki Oshima ,  Takahiro Kawabata ,  Tomoyuki Kinoshita ,  Toshio Inase

IPC分类号： B05D5/12 ,  H01B1/16 ,  C22B5/20

CPC分类号： C23C18/08 ,  B22F9/24 ,  B22F2998/00 ,  H01B1/02 ,  H01B1/026 ,  B22F1/0018

摘要： To provide a composition with which a metal film can be directly produced from a high-valent metal compound, a method for producing a metal film, and a method for producing a metal powder.Using a composition for production of a metal film of copper, silver or indium, which comprises a high-valent compound of copper, silver or indium, a linear, branched or cyclic C1-18 alcohol and a Group VIII metal catalyst, a coating film is formed, followed by reduction by heating to produce a metal film of copper, silver or indium. Further, using metal particles of silver, copper of indium having a surface layer comprising a high-valent compound of copper, silver or indium, instead of the high-valent compound of copper, silver or indium, a metal film of copper, silver or indium is produced in the same manner as above.

摘要翻译： 提供可以由高价金属化合物直接制造金属膜的组合物，金属膜的制造方法和金属粉末的制造方法。 使用包含铜，银或铟的高价化合物，直链，支链或环状的C1-18醇和VIII族金属催化剂的铜，银或铟金属膜的制造组合物，涂膜 ，然后通过加热还原以产生铜，银或铟的金属膜。 此外，使用银的金属颗粒，具有包含铜，银或铟的高价化合物的表面层的铟的铜代替铜，银或铟的高价化合物，铜，银或银的金属膜 以与上述相同的方式生产铟。

公开(公告)号：US07050385B2

公开(公告)日：2006-05-23

申请号：US09777686

申请日：2001-02-07

申请人： Noriaki Oshima ,  Hideki Oono ,  Takashi Taniguchi ,  Keiichiro Nishizawa

发明人： Noriaki Oshima ,  Hideki Oono ,  Takashi Taniguchi ,  Keiichiro Nishizawa

IPC分类号： G11B7/24

CPC分类号： G11B11/10584 ,  G11B7/007 ,  G11B7/122 ,  G11B7/24 ,  G11B7/24085 ,  G11B11/10578 ,  G11B11/1058 ,  G11B11/10586

摘要： An optical recording medium comprising at least a land and a groove where information-recording/reproducing is carried out by a flying type optical head, The optical recording medium keeps the flying height of the flying optical head constant in the entire region of the recording/reproducing area, and is provided with at least one characteristic among the following characteristics: RP which is dependent on land and groove parameters and the flying height satisfies the relation of H>Rp 0.1 H; centerline mean roughness Ra is in the range of 0.2 nm Ra 2.0 nm, and the layer thickness of a liquid lubricant layer satisfies the relation of t Ra; the relation of ΔRp≦λ/16 NA which is dependent on the effective numerical aperature, laser wavelength and surface parameters is satisfied where all parameters in the formula are defined in the specification; and the height of a header area is different from the height of a land portion.

摘要翻译： 至少包括通过飞行型光学头执行信息记录/再现的凹槽和凹槽的光学记录介质。光学记录介质保持飞行光学头的飞行高度在记录/ 并且具有以下特征中的至少一个特征：取决于陆地和槽参数的RP和飞行高度满足H> Rp 0.1H的关系; 中心线平均粗糙度Ra在0.2nm Ra 2.0nm的范围内，液体润滑剂层的层厚度满足t Ra的关系; 满足公式中所有参数在规范中定义的ΔRp<=λ/ 16 NA的关系，其取决于有效数值，激光波长和表面参数; 并且标题区域的高度与陆地部分的高度不同。