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    LOW REFRACTIVE LAYER AND ANTI-REFLECTIVE FILM COMPRISING THE SAME
    22.
    发明申请
    LOW REFRACTIVE LAYER AND ANTI-REFLECTIVE FILM COMPRISING THE SAME 审中-公开

    公开(公告)号：US20170343704A1

    公开(公告)日：2017-11-30

    申请号：US15639669

    申请日：2017-06-30

    Applicant: LG CHEM, LTD.

    Inventor： Boo Kyung KIM ,  Yeong Rae CHANG ,  Seok Hoon JANG ,  Eun Kyu HER ,  Jin Seok BYUN

    IPC: G02B1/111 ,  G02B1/14

    CPC classification number: G02B1/111 ,  G02B1/14

    Abstract: The present invention relates to a low refractive layer and an anti-reflective film comprising the same. The low refractive layer can exhibit excellent optical properties such as a low reflectance and a high light transmittance, and excellent mechanical properties such as high wear resistance and scratch resistance at the same time, without adversely affecting the color of the polymer resin forming the low refractive layer. In particular, due to the excellent alkali resistance, the low refractive layer can maintain excellent physical properties even after alkali treatment. Therefore, when introducing a low refractive layer to the display device, it is expected that the production process can be simplified and further the production rate and the productivity can significantly increase.

    ANTI-REFLECTIVE FILM AND MANUFACTURING METHOD THEREOF
    26.
    发明申请
    ANTI-REFLECTIVE FILM AND MANUFACTURING METHOD THEREOF 审中-公开

    公开(公告)号：US20200217991A1

    公开(公告)日：2020-07-09

    申请号：US16820037

    申请日：2020-03-16

    Applicant: LG CHEM, LTD.

    Inventor： Jin Seok BYUN ,  Heon KIM ,  Boo Kyung KIM ,  Seok Hoon JANG ,  Yeong Rae CHANG

    IPC: G02B1/111 ,  G02B1/14 ,  B32B27/08 ,  B32B7/02 ,  C08J7/04 ,  C09D4/00

    Abstract: Described herein is an anti-reflective film including: a hard coating layer; and a low-refractive layer containing a binder resin and hollow inorganic nanoparticles and solid inorganic nanoparticles dispersed in the binder resin. The hollow and solid inorganic particles are dispersed in the low-refractive layer such that the amount of the solid inorganic nanoparticles positioned close to an interface between the hard coating layer and the low-refractive layer is larger than that of the hollow inorganic nanoparticles. Also described is a manufacturing method of the anti-reflective film including: applying a resin composition containing a photopolymerizable compound or a (co)polymer thereof, a fluorine-containing compound including a photoreactive functional group, a photoinitiator, hollow inorganic nanoparticles, and solid inorganic nanoparticles on a hard coating layer, and drying the applied resin composition at a temperature of 35° C. to 100° C.; and photocuring the dried resin composition.

    ANTI-REFLECTIVE FILM AND MANUFACTURING METHOD THEREOF
    28.
    发明申请
    ANTI-REFLECTIVE FILM AND MANUFACTURING METHOD THEREOF 审中-公开

    公开(公告)号：US20180231688A1

    公开(公告)日：2018-08-16

    申请号：US15674257

    申请日：2016-11-03

    Applicant: LG CHEM, LTD.

    Inventor： Jin Seok BYUN ,  Heon KIM ,  Boo Kyung KIM ,  Seok Hoon JANG ,  Yeong Rae CHANG

    IPC: G02B1/111 ,  G02B1/14 ,  C08J7/04 ,  C09D4/00

    CPC classification number: G02B1/111 ,  B32B7/02 ,  B32B27/08 ,  C08J7/042 ,  C08J2301/02 ,  C08J2435/02 ,  C08K3/36 ,  C08K7/26 ,  C09D4/00 ,  G02B1/14

    Abstract: Described herein is an anti-reflective film including: a hard coating layer; and a low-refractive layer containing a binder resin and hollow inorganic nanoparticles and solid inorganic nanoparticles dispersed in the binder resin. The hollow and solid inorganic particles are dispersed in the low-refractive layer such that the amount of the solid inorganic nanoparticles positioned close to an interface between the hard coating layer and the low-refractive layer is larger than that of the hollow inorganic nanoparticles. Also described is a manufacturing method of the anti-reflective film including: applying a resin composition containing a photopolymerizable compound or a (co)polymer thereof, a fluorine-containing compound including a photoreactive functional group, a photoinitiator, hollow inorganic nanoparticles, and solid inorganic nanoparticles on a hard coating layer, and drying the applied resin composition at a temperature of 35° C. to 100° C.; and photocuring the dried resin composition.

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