公开(公告)号：US09091944B2

公开(公告)日：2015-07-28

申请号：US13497741

申请日：2010-09-24

申请人： Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Gerardus Hubertus Petrus Maria Swinkels ,  Sven Pekelder ,  Dzmitry Labetski ,  Uwe Bruno Heini Stamm ,  William N. Partlo

发明人： Erik Roelof Loopstra ,  Vadim Yevgenyevich Banine ,  Gerardus Hubertus Petrus Maria Swinkels ,  Sven Pekelder ,  Dzmitry Labetski ,  Uwe Bruno Heini Stamm ,  William N. Partlo

IPC分类号： G03B27/54 ,  G03F7/20 ,  H05G2/00

CPC分类号： G03F7/70933 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70808 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70925 ,  H05G2/003 ,  H05G2/005

摘要： An EUV lithographic apparatus includes a source collector apparatus in which the extreme ultraviolet radiation is generated by exciting a fuel to provide a plasma emitting the radiation. The source collector apparatus includes a chamber in fluid communication with a guide way external to the chamber. A pump for circulating buffer gas is part of the guide way, and provides a closed loop buffer gas flow. The gas flowing through the guide way traverses a gas decomposer wherein a compound of fuel material and buffer gas material is decomposed, so that decomposed buffer gas material can be fed back into the closed loop flow path.

摘要翻译： EUV光刻设备包括源极收集器装置，其中通过激发燃料产生极紫外辐射以提供发射辐射的等离子体。 源极收集器装置包括与腔室外部的引导方式流体连通的腔室。 用于循环缓冲气体的泵是引导方式的一部分，并提供闭环缓冲气体流。 流过引导方式的气体穿过气体分解器，其中燃料和缓冲气体材料的化合物被分解，使得分解的缓冲气体材料可以反馈回闭环流动路径。

公开(公告)号：US20140160455A1

公开(公告)日：2014-06-12

申请号：US14181076

申请日：2014-02-14

申请人： Andrei Mikhailovich YAKUNIN ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Harmen Klaas Ven Der Schoot ,  Lucas Henricus Johannes Stevens ,  Maarten Van Kampen

发明人： Andrei Mikhailovich YAKUNIN ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Harmen Klaas Ven Der Schoot ,  Lucas Henricus Johannes Stevens ,  Maarten Van Kampen

IPC分类号： G03F7/20

CPC分类号： G03F1/64 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/20 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/204 ,  G02B5/208 ,  G02B27/0006 ,  G03B27/54 ,  G03F1/24 ,  G03F1/62 ,  G03F7/70058 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/061 ,  H01B1/04 ,  H01B1/24

摘要： A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.

摘要翻译： 包括石墨烯的防护薄膜组件被构造并布置成用于EUV掩模版。 多层反射镜包括石墨烯作为最外层。

公开(公告)号：US20140085619A1

公开(公告)日：2014-03-27

申请号：US14002000

申请日：2011-12-21

申请人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

发明人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

IPC分类号： G03F7/20

CPC分类号： G03F7/70191 ,  B82Y10/00 ,  G02B1/11 ,  G02B5/1838 ,  G02B5/281 ,  G02B5/283 ,  G03F7/70008 ,  G03F7/702 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

摘要翻译： 一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度 过滤器具有彼此不同的辐射过滤结构。

公开(公告)号：US08493548B2

公开(公告)日：2013-07-23

申请号：US11882853

申请日：2007-08-06

申请人： Vladimir Vitalevich Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

发明人： Vladimir Vitalevich Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevich Koshelev ,  Vladimir Mihailovitch Krivtsun

IPC分类号： G03B27/54 ,  G03B27/72 ,  G03B27/32 ,  G03B27/42

CPC分类号： H05H1/24 ,  B82Y10/00 ,  G03F7/70033 ,  H05G2/003

摘要： A lithographic system includes a source configured to generate a radiation, the source including a cathode and an anode, the cathode and the anode configured to create a discharge in a fuel located in a discharge space so as to generate a plasma, the discharge space including, in use, a substance configured to adjust radiation emission by the plasma so as to control a volume defined by the plasma; a pattern support configured to hold a patterning device, the patterning device configured to pattern the radiation to form a patterned beam of radiation; a substrate support configured to support a substrate; and a projection system configured to project the patterned beam of radiation onto the substrate.

公开(公告)号：US08445873B2

公开(公告)日：2013-05-21

申请号：US13478446

申请日：2012-05-23

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

IPC分类号： G21G5/00

CPC分类号： G01N25/142 ,  G01N25/68 ,  Y10T436/25875

摘要： A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

摘要翻译： 一种用于检测光刻设备的内部空间中的至少一种污染物质的系统，包括：被配置为与所述内部空间接触的至少一个监测表面;被配置为将所述监测表面的温度控制在至少 一个检测温度，以及至少一个检测器，被配置为检测所述至少一种污染物质到所述监测表面上的冷凝。

公开(公告)号：US20130077064A1

公开(公告)日：2013-03-28

申请号：US13561502

申请日：2012-07-30

申请人： Dirk Heinrich Ehm ,  Maarten van Kampen ,  Stefan-Wolfgang Schmidt ,  Vadim Yevgenyevich Banine ,  Erik Loopstra

发明人： Dirk Heinrich Ehm ,  Maarten van Kampen ,  Stefan-Wolfgang Schmidt ,  Vadim Yevgenyevich Banine ,  Erik Loopstra

IPC分类号： G03F7/20

CPC分类号： G03F7/70891 ,  G01J1/58 ,  G02B5/0891 ,  G03F7/70316 ,  G03F7/70558 ,  G03F7/7085 ,  G03F7/70958

摘要： An arrangement for use in a projection exposure tool (100) for microlithography comprises a reflective optical element (10; 110) and a radiation detector (30; 32; 130). The reflective optical element (10; 110) comprises a carrier element (12) guaranteeing the mechanical strength of the optical element (10; 110) and a reflective coating (18) disposed on the carrier element (12) for reflecting a use radiation (20a). The carrier element (12) is made of a material which upon interaction with the use radiation (20a) emits a secondary radiation (24) the wavelength of which differs from the wavelength of the use radiation (20a), and the radiation detector (30; 32; 130) is configured to detect the secondary radiation (24).

摘要翻译： 用于微光刻的投影曝光工具（100）中的布置包括反射光学元件（10; 110）和辐射检测器（30; 32; 130）。 反射光学元件（10; 110）包括保证光学元件（10; 110）的机械强度的载体元件（12）和设置在载体元件（12）上的反射涂层（18），用于反射使用辐射 20a）。 载体元件（12）由与使用辐射（20a）相互作用发射其波长与使用辐射（20a）的波长不同的次级辐射（24）和辐射检测器（30）的材料制成 ; 32; 130）被配置为检测所述次级辐射（24）。

公开(公告)号：US08390788B2

公开(公告)日：2013-03-05

申请号：US12500198

申请日：2009-07-09

申请人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrey Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

发明人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrey Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

IPC分类号： G03B27/72 ,  G02B27/44

CPC分类号： G03F7/702 ,  G03F7/70191 ,  G03F7/70575 ,  G21K1/10

摘要： According to an aspect of the present invention, a spectral purity filter includes an aperture, the aperture being arranged to diffract a first wavelength of radiation and to allow at least a portion of a second wavelength of radiation to be transmitted through the aperture, the second wavelength of radiation being shorter than the first wavelength of radiation, wherein the aperture has a diameter greater than 20 μm.

公开(公告)号：US20130038926A1

公开(公告)日：2013-02-14

申请号：US13643265

申请日：2011-02-22

申请人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Andrei Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

发明人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Andrei Mikhailovich Yakunin ,  Martin Jacobus Johan Jak

IPC分类号： G02B27/42 ,  B29C39/02 ,  B44C1/22 ,  B82B1/00

CPC分类号： G03F7/70891 ,  G02B5/208 ,  G03F7/70191 ,  G03F7/70575

摘要： A spectral purity filter includes a body of material, through which a plurality of apertures extend. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation. The body of material is formed from a material having a bulk reflectance of substantially greater than or equal to 70% at the first wavelength of radiation. The material has a melting point above 1000° C.

摘要翻译： 光谱纯度滤光器包括一组材料，多个孔通过它们延伸。 孔被布置成抑制具有第一波长的辐射并且允许具有第二波长的辐射的至少一部分透射通过孔。 辐射的第二波长比辐射的第一波长短。 材料体在第一波长辐射下由体积反射率基本上大于或等于70％的材料形成。 该材料的熔点高于1000℃

公开(公告)号：US08362444B2

公开(公告)日：2013-01-29

申请号：US12907135

申请日：2010-10-19

申请人： Vladimir Vitalevitch Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevitch Koshelev

发明人： Vladimir Vitalevitch Ivanov ,  Vadim Yevgenyevich Banine ,  Konstantin Nikolaevitch Koshelev

IPC分类号： G21K5/00

CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005

摘要： A patterned beam of radiation is projected onto a substrate. A reflective optical element is used to help form the radiation beam from radiation emitted from a plasma region of a plasma source. In the plasma source, a plasma current is generated in the plasma region. To reduce damage to the reflective optical element, a magnetic field is applied in the plasma region with at least a component directed along a direction of the plasma current. This axial magnetic field helps limit the collapse of the Z-pinch region of the plasma. By limiting the collapse, the number of fast ions emitted may be reduced.

摘要翻译： 将图案化的辐射束投影到基底上。 反射光学元件用于帮助从等离子体源的等离子体区域发射的辐射形成辐射束。 在等离子体源中，在等离子体区域中产生等离子体电流。 为了减少对反射光学元件的损伤，在等离子体区域中施加至少一个沿着等离子体电流的方向指向的分量的磁场。 该轴向磁场有助于限制等离子体的Z夹点区域的塌陷。 通过限制塌陷，可以减少发射的快速离子的数量。

公开(公告)号：US20120267550A1

公开(公告)日：2012-10-25

申请号：US13449030

申请日：2012-04-17

申请人： Sjoerd Nicolaas Lambertus DONDERS ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Martinus Cornelis Maria Verhagen ,  Olav Waldemar Vladimir Frijns ,  Gerrit Van Donk ,  Henk Jan Van Gerner

发明人： Sjoerd Nicolaas Lambertus DONDERS ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Martinus Cornelis Maria Verhagen ,  Olav Waldemar Vladimir Frijns ,  Gerrit Van Donk ,  Henk Jan Van Gerner

IPC分类号： F28D15/00 ,  F25B29/00 ,  G21K5/08 ,  F28F27/00

CPC分类号： G03F7/70858 ,  F28D15/0266

摘要： A conditioning system for conditioning a part of a lithographic apparatus, includes an evaporator positioned in thermal contact with the part for extracting heat from the part by evaporation of a fluid inside the evaporator; a condenser for removing heat from the fluid inside the condenser; fluid lines arranged between the evaporator and the condenser to form a fluid circuit; a pump arranged in the circuit to circulate the fluid in the circuit; an accumulator to hold fluid, wherein the accumulator is in fluid communication with the circuit and comprises a heat exchanger to transfer heat from or to fluid inside the accumulator; a temperature sensor to provide a signal representative of the fluid temperature; and a controller to maintain a substantially constant temperature of the fluid inside the circuit by regulating the amount of heat transferred by the heat exchanger based on the signal.

摘要翻译： 用于调节光刻设备的一部分的调节系统包括：蒸发器，其定位成与部件热接触，用于通过蒸发器内部的流体的蒸发从部件中提取热量; 用于从冷凝器内的流体中除去热量的冷凝器; 布置在蒸发器和冷凝器之间以形成流体回路的流体管线; 布置在电路中以使流体循环的电路中的泵; 储液器以保持流体，其中所述蓄液器与所述回路流体连通，并且包括热交换器以将热量从所述蓄能器内部流体传递到流体; 温度传感器，用于提供表示流体温度的信号; 以及控制器，通过基于该信号调节由热交换器传递的热量来维持电路内的流体的基本上恒定的温度。