摘要:
A method for making a patterned-media magnetic recording disk uses nano-imprint lithography (NIL) for patterning a resist layer over the magnetic recording layer. A hard mask layer is located above the magnetic recording layer and an etch stop layer is located above the hard mask layer and below the resist layer. Residual resist material in the recesses of the patterned resist layer is removed by reactive ion etching (RIE) to expose the underlying etch stop layer. The etch stop material in the recesses is then removed by RIE to expose regions of the hard mask layer. A reactive ion milling (RIM) process removes the exposed hard mask material. The RIM process causes no undercutting of the unexposed hard mask material, which allows the very small critical dimensions of the patterned-media disk to be reliably achieved when ion milling is subsequently performed through the hard mask that has been patterned by the RIM process.
摘要:
A magnetic write head for data recording having a magnetic write pole with a stepped magnetic shell structure that defines a secondary flare point. The secondary flare point defined by the magnetic shell portion can be more tightly controlled with respect to its distance from the air bearing surface (ABS) of the write head than can a traditional flare point that is photolithographically on the main pole structure. This allows the effective flare point of the write head to be moved much closer to the ABS than would otherwise be possible using currently available tooling and photolithography techniques. The write head also includes a non-magnetic spacer layer formed over the magnetic shell structure that is recessed from the ABS by a distance that is greater than that of the magnetic shell portion. A magnetic shield is formed over the magnetic shell and non-magnetic spacer.
摘要:
An optical lapping guide for determining an amount of lapping performed on a row of sliders in a process for manufacturing sliders for magnetic data recording. The optical lapping guide is constructed with a front edge that is at an angle with respect to an air bearing surface plane ABS plane, such that a portion of the lapping guides is in front of the ABS and portion of the lapping guide is behind the ABS. As lapping progresses, an increasing amount of the lapping guide will be exposed at the ABS and visible for inspection. Therefore, after a lapping process has been performed, the optical lapping guide can be inspected to determine the amount of material removed by lapping. The greater the amount of the lapping guide that is exposed and visible, the greater the amount of material removed by lapping.
摘要:
A perpendicular magnetic recording write head has a flux conductor in contact with the write pole. The flux conductor is substantially wider than the write pole tip in the cross-track direction and has a blunt end that is recessed from the pole tip end. The region of the flux conductor where its blunt end is in contact with the pole tip is the “choke” point for the write pole, i.e., the point where the flux density is highest. The flux conductor enables the write pole to be made with no flare, or with a flare angle and throat height with a much wider tolerance, which substantially simplifies the manufacturing process. The write head may have a trailing shield and side shields that substantially surround the write pole tip and remove stray fields that may be produced by the flux conductor, so that regions of the recording layer other than the track being written are not adversely affected.
摘要:
A method is provided for fabricating a head for perpendicular recording with self-aligning side shields. The voids where the side shields will be formed are milled into the layer of material for the pole tip to achieve self-alignment. A mask is patterned with openings defining initial shape of the pole piece tip nearest the air-bearing surface including the width and the point at which the pole tip widens out. A film of soft magnetic material to form the side shields is deposited over the wafer. A chemical-mechanical-polishing process is preferably used to remove the mask and the material deposited on it. A new mask is patterned over the predetermined area for the final shape of the pole tip and the side shields. The excess side shield material and pole tip material outside of the mask is then removed.
摘要:
A process for electroplating and annealing thin-films of nickel-iron alloys having from 63% to 81% iron content by weight to produce pole pieces having saturation flux density (BS) in the range from 1.9 to 2.3 T (19 to 23 kG) with acceptable magnetic anisotropy and magnetostriction and a coercivity (HC) no higher than 160 A/m (2 Oe). The desired alloy layer properties, including small crystal size and minimal impurity inclusions, can be produced by including higher relative levels of Fe++ ions in the electroplating bath while holding the bath at a lower temperature while plating from a suitable seed layer. The resulting alloy layer adopts a small crystal size (BCC) without significant inclusion of impurities, which advantageously permits annealing to an acceptable HC while retaining the high BS desired.
摘要翻译:电镀和退火铁含量为63%至81%的镍铁合金薄膜的方法,以产生具有饱和磁通密度(B S S S S)的范围在1.9至 2.3 T(19〜23kG)具有可接受的磁各向异性和磁致伸缩,矫顽力(H C C)不高于160A / m(2Oe)。 包括小晶体尺寸和最小杂质夹杂物在内的期望的合金层性能可以通过在电镀浴中包含更高的相对水平的Fe ++离子而制备,同时将浴保持在较低温度,同时从 合适的种子层。 所得到的合金层采用小晶粒尺寸(BCC),而不显着地包含杂质,这有利地允许退火到可接受的H C,同时保持所需的高B S S S。
摘要:
An etch barrier to be used in a photolithograph process is disclosed. A silicon rich etch barrier is deposited on a substrate using a low energy deposition technique. A diamond like carbon layer is deposited on the silicon rich etch barrier. Photoresist is then placed on this etch barrier DLC combination. To form photolithographic features, successive steps of oxygen and flourine reactive ion etching is used.
摘要:
A read head is provided with an N-cycle switch for sequentially shorting and unshorting a sense current circuit of a read head so that the read head will be protected from electrostatic discharges (ESDs) by shorting when the read head is not being tested and unshorted during tests of the read head. The shorting and unshorting switches, which are mounted on or in a slider carrying the read head, are activated by a laser beam.
摘要:
A magnetic head assembly has an open yoke type write head constructed on top of a read head so that the write head can be constructed with a very narrow track width without restraint by the requirements of the read head. The write head has first and second pole piece portions wherein the second pole piece portion has separate front and back layer portions. A coil layer is wrapped around only the first pole piece portion and the back layer portion so that the front layer portion can be constructed separately to provide a narrow track width. Further, in a preferred embodiment the front layer portion has a reduced thickness and a higher magnetic moment than the thickness and magnetic moment of the first pole piece portion and the back layer portion. Still further, in a preferred embodiment the first pole piece portion and the back layer portion are planar due to planarization of underlying layers.
摘要:
A method is provided for providing extra insulation between lead layers and first and second shield layers of a read head so as to prevent electrical shorting therebetween. A sensor layer is partially formed with a capping layer of a first oxidizable metallic layer. A lead layer is formed with a second oxidizable metallic capping layer thereon. A rear edge of the partially completed sensor is then formed followed by formation of an insulation layer which seals the rear edge. The wafer, upon which the components are constructed, is then subjected to an oxygen-based plasma which oxidizes the oxidizable layers with the second oxidizable metallic layers oxidizing at a faster rate than the first oxidizable metallic layer. The second oxidized layer then provides the desired extra insulation between the lead layers and the second shield layer. The read head produced by the method includes a sensor layer and first and second lead layers. A first metal oxide layer is on the sensor layer and a sensor layer and a second metal oxide layer is on each of the first and second lead layers. The sensor layer, the first and second lead layers and the first and second metal oxide layers are located between first and second gap layers and the first and second gap layers are located between first and second shield layers.