公开(公告)号：US20100112225A1

公开(公告)日：2010-05-06

申请号：US12528866

申请日：2008-02-27

申请人： Tsuyoshi Sato ,  Hiroyasu Kondo ,  Naoaki Sakurai ,  Junsei Yamabe ,  Katsuyuki Soeda ,  Hiroshi Koizumi ,  Shuichi Kimura ,  Shizuo Kinoshita

发明人： Tsuyoshi Sato ,  Hiroyasu Kondo ,  Naoaki Sakurai ,  Junsei Yamabe ,  Katsuyuki Soeda ,  Hiroshi Koizumi ,  Shuichi Kimura ,  Shizuo Kinoshita

IPC分类号： B05D3/04 ,  B05C9/12

CPC分类号： H01L21/67028 ,  B05D3/105 ,  G02F1/1303 ,  H01L21/6715 ,  H01L21/6776

摘要： A coater (1) includes: a droplet jet part (4) which ejects droplets of a first solution toward an object to be coated (2) to apply the droplets to the object to be coated (2); and a remoisturizing-drying part (6) which gives a residue of the first solution applied on the object to be coated (2) a solvent capable of dissolving the residue to form an applied body with a second solution containing the residue as a solute, and which dries the formed applied body with the second solution.

摘要翻译： 涂布机（1）包括：液滴喷射部分（4），其向待涂覆物体（2）喷射第一溶液的液滴以将液滴施加到待涂覆物体（2）上; 和再次干燥部分（6），其将施加在待涂覆物体上的第一溶液的残渣（2）提供能够溶解残余物以形成施加体的溶剂，其中第二溶液含有残留物作为溶质， 并且用第二溶液干燥形成的应用体。

公开(公告)号：US07291188B2

公开(公告)日：2007-11-06

申请号：US10994229

申请日：2004-11-23

申请人： Hideaki Hirabayashi ,  Naoaki Sakurai ,  Akiko Saito ,  Koji Sato ,  Tomiho Yamada

发明人： Hideaki Hirabayashi ,  Naoaki Sakurai ,  Akiko Saito ,  Koji Sato ,  Tomiho Yamada

IPC分类号： C09K3/14 ,  B24D11/00

CPC分类号： B24B37/24

摘要： A polishing cloth used in the chemical mechanical polishing treatment comprises a molded body of (meth)acrylic copolymer having an acid value of 10 to 100 mg KOH/g and a hydroxyl group value of 50 to 150 mg KOH/g.

摘要翻译： 用于化学机械抛光处理的抛光布包括酸值为10至100mg KOH / g，羟基值为50至150mg KOH / g的（甲基）丙烯酸共聚物的成型体。

公开(公告)号：US20070200903A1

公开(公告)日：2007-08-30

申请号：US11535304

申请日：2006-09-26

申请人： Hironori Takabayashi ,  Naoaki Sakurai ,  Atsushi Kinase

发明人： Hironori Takabayashi ,  Naoaki Sakurai ,  Atsushi Kinase

IPC分类号： B41J2/17

CPC分类号： B41J2/18 ,  B41J2/19 ,  H01L51/0005

摘要： A droplet jetting applicator includes a droplet jetting head having an inside channel allowing a passage of the liquid supplied from a liquid accommodating part to jet the liquid flowing in the inside channel in form of droplets, a liquid supply channel communicating the liquid accommodating part with the inside channel of the droplet jetting head, a liquid supply part supplying the liquid from the liquid accommodating part to the droplet jetting head through the liquid supply channel, a liquid return channel communicating the inside channel of the droplet jetting head with the liquid accommodating part and a liquid return part interposed in the liquid return channel to return the liquid after passing through the inside channel of the droplet jetting head from the droplet jetting head to the liquid accommodating part through the liquid return channel.

摘要翻译： 液滴喷射器包括：液滴喷射头，其具有内部通道，允许从液体容纳部分供应的液体通过以液滴形式喷射在内部通道中流动的液体;液体供应通道，其将液体容纳部分与 液滴喷射头的内部通道，通过液体供应通道将液体从液体容纳部分供应到液滴喷射头的液体供应部分，将液滴喷射头的内部通道与液体容纳部分连通的液体返回通道，以及 液体返回部件插入在液体返回通道中，以在通过液滴喷射头的内部通道之后通过液体返回通道将液体返回到液体容纳部分。

公开(公告)号：US07226513B2

公开(公告)日：2007-06-05

申请号：US10645911

申请日：2003-08-22

申请人： Hisatsugu Kurita ,  Manabu Hirasawa ,  Hiromi Nagahama ,  Koji Izumome ,  Takao Ino ,  Jyunsei Yamabe ,  Naoya Hayamizu ,  Naoaki Sakurai

发明人： Hisatsugu Kurita ,  Manabu Hirasawa ,  Hiromi Nagahama ,  Koji Izumome ,  Takao Ino ,  Jyunsei Yamabe ,  Naoya Hayamizu ,  Naoaki Sakurai

IPC分类号： B08B3/00

CPC分类号： H01L21/02052 ,  B08B3/08 ,  B08B2203/005 ,  C11D7/02 ,  C11D7/08 ,  C11D11/0047 ,  Y10S438/906

摘要： This invention provides a cleaning method of silicon wafer for obtaining a silicon wafer in which micro roughness thereof under spatial frequency of 20/μm is 0.3 to 1.5 nm3 in terms of power spectrum density, by passing a process of oxidizing the silicon wafer with ozonized water and a process of cleaning said oxidized silicon wafer with hydrofluoric acid. Consequently, it is possible to remove surface adhering pollutant such as particles and metallic foreign matter with the surface structure of silicon wafer flattened up to atomic level by annealing maintained.

摘要翻译： 本发明提供了一种用于获得硅晶片的硅晶片的清洁方法，其中，在功率谱密度方面，其空间频率为20 /μm的微观粗糙度为0.3至1.5nm 3，通过将工艺 用臭氧化水氧化硅晶片和用氢氟酸清洗所述氧化硅晶片的工艺。 因此，通过退火维持，将硅晶片的表面结构平坦化为原子级，可以除去表面附着污染物如颗粒和金属异物。

公开(公告)号：US20060076314A1

公开(公告)日：2006-04-13

申请号：US11236578

申请日：2005-09-28

申请人： Naoaki Sakurai

发明人： Naoaki Sakurai

IPC分类号： B44C1/22 ,  H01L21/311

CPC分类号： H01L21/0273 ,  H01L21/31138 ,  H01L21/312 ,  H01L21/32139 ,  H05K3/061

摘要： One aspect of the present invention is directed to a method of forming a pattern. A first layer which comprises a polymerization initiator is selectively formed on a second layer of a substrate. A polymer layer is selectively formed on the first layer by subjecting an organic monomer to living radical polymerization using the polymerization initiator. The second layer is selectively etched using the polymer layer as a mask.

摘要翻译： 本发明的一个方面涉及一种形成图案的方法。 包含聚合引发剂的第一层选择性地形成在基材的第二层上。 通过使用聚合引发剂使有机单体进行活性自由基聚合，在第一层上选择性地形成聚合物层。 使用聚合物层作为掩模来选择性地蚀刻第二层。

公开(公告)号：US06235186B1

公开(公告)日：2001-05-22

申请号：US09315945

申请日：1999-05-21

申请人： Masashi Tanaka ,  Yoshinori Nishiki ,  Naoya Hayamizu ,  Naoaki Sakurai

发明人： Masashi Tanaka ,  Yoshinori Nishiki ,  Naoya Hayamizu ,  Naoaki Sakurai

IPC分类号： C25B146

CPC分类号： C02F1/46109 ,  C02F1/42 ,  C02F1/4618 ,  C02F1/4674 ,  C02F9/00 ,  C02F2001/46142 ,  C02F2001/46161 ,  C02F2201/46115 ,  C02F2201/46195 ,  C02F2209/04

摘要： An apparatus for producing electrolytic water in which the yielded electrolytic water does not suffer quality deterioration caused by chemical species, e.g., hydrogen ions, moving to the counter-electrode chamber. A diaphragm 4 of a two-chamber type electrolytic cell comprises two or more ion-exchange membranes 3, and a noble-metal layer 2 or another layer may be formed in the diaphragm. Use of the ion-exchange membranes produces an enhanced physical screening effect, while formation of the noble-metal layer produces catalytic effect to decompose chemical species. Both the ion-exchange membranes and the anode-metal layer are effective in diminishing the movement of chemical species to the counter-electrode chamber.

摘要翻译： 一种生产电解水的设备，其中产生的电解水不会由于移动到对电极室的化学物质例如氢离子而引起质量劣化。 两室式电解池的隔膜4包括两个或更多个离子交换膜3，并且可以在隔膜中形成贵金属层2或另一层。 使用离子交换膜产生增强的物理筛选效果，而贵金属层的形成产生催化作用以分解化学物质。 离子交换膜和阳极 - 金属层都有效地减少化学物质向对电极室的移动。

公开(公告)号：US08535765B2

公开(公告)日：2013-09-17

申请号：US12556080

申请日：2009-09-09

申请人： Naoaki Sakurai ,  Hiroyasu Kondo ,  Hiroshi Koizumi

发明人： Naoaki Sakurai ,  Hiroyasu Kondo ,  Hiroshi Koizumi

IPC分类号： B05D1/02 ,  C23C16/00 ,  C09K11/06

CPC分类号： B01J3/04 ,  C09K11/02 ,  C09K11/06

摘要： A method of producing a low-molecular luminous material dispersant having: inserting a coat agent in gas phase and an inner gas into a vacuum atmosphere, wherein the coat agent has a strong affinity for a solvent when the coat agent is in liquid phase; heating and vaporizing a low-molecular luminous material in the vacuum atmosphere so as to obtain a mix gas comprising the low-molecular luminous material and inner gas; cooling the mix gas so as to obtain a coat agent in liquid phase; and recovering the coat agent in liquid phase and adding the coat agent in liquid phase into the solvent so as to obtain the low-molecular luminous material dispersant.

摘要翻译： 一种低分子发光体分散剂的制造方法，其特征在于，在气相和内部气体中插入涂布剂到真空气氛中，其中，当涂布剂处于液相时，涂料对溶剂具有强的亲和性; 在真空气氛中加热和蒸发低分子发光材料，以获得包含低分子量发光材料和内部气体的混合气体; 冷却混合气体，得到液相涂层剂; 并回收液相中的涂层剂，并将液相中的涂层剂加入到溶剂中以获得低分子发光材料分散剂。

公开(公告)号：US08132903B2

公开(公告)日：2012-03-13

申请号：US12365400

申请日：2009-02-04

申请人： Naoaki Sakurai ,  Tsuyoshi Sato ,  Hiroyasu Kondo

发明人： Naoaki Sakurai ,  Tsuyoshi Sato ,  Hiroyasu Kondo

IPC分类号： B41J2/19 ,  B41J2/165 ,  B41J2/18

CPC分类号： B41J2/19 ,  B41J2/1707

摘要： An ink jet system according to the present invention is provided with an air bubble removing unit including: an ink jet body having a plurality of ink supply path; a nozzle plate connected to an end of the ink jet body and having a plurality of spaced nozzle holes therein; and a cap configured to cover the nozzle holes formed in the nozzle plate wherein a first ink channel space is formed continuous to the nozzle holes and the plurality of ink supply path, and a second ink channel space is formed between a recess of the cap and a surface of the nozzle plate, so that the second ink channel space and the first ink channel space are continuous through the nozzle holes.

摘要翻译： 根据本发明的喷墨系统设置有气泡去除单元，其包括：具有多个供墨路径的喷墨体; 喷嘴板，其连接到喷墨体的端部并且在其中具有多个间隔开的喷嘴孔; 以及帽，其构造成覆盖形成在喷嘴板中的喷嘴孔，其中形成与喷嘴孔和多个供墨路径连续的第一墨水通道空间，并且在盖的凹部和 喷嘴板的表面，使得第二墨水通道空间和第一墨水通道空间通过喷嘴孔连续。

公开(公告)号：US08039858B2

公开(公告)日：2011-10-18

申请号：US12611481

申请日：2009-11-03

申请人： Naoaki Sakurai ,  Junsei Yamabe ,  Hiroshi Koizumi

发明人： Naoaki Sakurai ,  Junsei Yamabe ,  Hiroshi Koizumi

IPC分类号： H01L33/00

CPC分类号： H01L33/504 ,  H01L2224/45139 ,  H01L2224/48091 ,  H01L2224/48465 ,  H01L2224/73265 ,  H01L2924/181 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2924/00012

摘要： In a fluorescer solution, a plurality of types of fluorescent particles are contained in a resin liquid. Average particle sizes of these fluorescent particles decrease as densities of the types increase. In other words, average settling rates vs of the types of the fluorescent particles ascertained by v s = D p 2 × ( ρ p - ρ f ) × g 18 × η are equal to each other, where Dp is an average particle size of each of the types of fluorescent particles, pp is a density of each of the types of fluorescent particles, pf is a density of the resin liquid, η is a viscosity of the resin liquid, g is the acceleration due to gravity, and vs is an average settling rate of each of the types of fluorescent particles.

摘要翻译： 在荧光剂溶液中，多种类型的荧光颗粒包含在树脂液体中。 这些荧光颗粒的平均粒径随着类型密度的增加而减小。 换句话说，通过v s = D p 2×（＆rgr; p - ＆rgr; f）×g 18×＆e egr确定的荧光颗粒的类型的平均沉降速率vs。 彼此相等，其中Dp是每种荧光颗粒的平均粒度，pp是每种荧光颗粒的密度，pf是树脂液体的密度，efgr; 是树脂液体的粘度，g是重力加速度，vs是各种荧光体粒子的平均沉降速度。

公开(公告)号：US20110204490A1

公开(公告)日：2011-08-25

申请号：US13048612

申请日：2011-03-15

申请人： Tsuyoshi SATO ,  Hiroyasu Kondo ,  Naoaki Sakurai ,  Katsuyuki Soeda ,  Kenichi Ooshiro ,  Shuichi Kimura

发明人： Tsuyoshi SATO ,  Hiroyasu Kondo ,  Naoaki Sakurai ,  Katsuyuki Soeda ,  Kenichi Ooshiro ,  Shuichi Kimura

IPC分类号： H01L29/02 ,  B05C11/00 ,  H01L21/31

CPC分类号： H01L21/6715 ,  B05D1/005 ,  B05D3/0486 ,  G03F7/162 ,  H01L21/67253

摘要： According one embodiment, a film forming apparatus includes a stage, a coating section, a vapor supply section, a blower section, and a controller. On the stage, an coating target is placed. The coating section applies a material to a predetermined region on the coating target placed on the stage to form a coating film. The vapor supply section generates solvent vapor capable of dissolving the coating film. The blower section blows the solvent vapor generated by the vapor supply section onto the coating film on the coating target placed on the stage. The controller controls an amount of the solvent vapor to be blown by the blower section so that: the coating film is dissolved; viscosity in a part of the coating film on a surface layer side is lower than that in a part thereof on the coating target side; and the viscosity in the part on the surface layer side and the viscosity of the coating target side take such values that prevent the coating film on the coating target from spreading.

摘要翻译： 根据一个实施例，一种成膜装置包括载物台，涂布部分，蒸气供应部分，鼓风机部分和控制器。 在舞台上放置涂层目标。 涂布部分将材料施加到放置在载物台上的涂布靶上的预定区域，形成涂膜。 蒸气供给部产生能够溶解涂膜的溶剂蒸气。 鼓风机部分将由蒸汽供应部分产生的溶剂蒸气吹到放置在载物台上的涂覆靶上的涂膜上。 控制器控制由鼓风机部分吹送的溶剂蒸气的量，使得涂膜溶解; 表面层侧的一部分涂膜的粘度比涂布目标侧的一部分的粘度低; 并且表面层侧的部分中的粘度和涂布目标侧的粘度取得防止涂布靶上的涂膜扩散的值。