Abstract:
A wafer processing method, by which a device wafer may be aligned and bonded to a carrier wafer to perform a back grinding process for the device wafer and may be separated from the carrier wafer after performing the back grinding process, and a method of manufacturing a semiconductor device by using the wafer processing method are provided. The wafer processing method includes: disposing a first magnetic material on a front side of a wafer and disposing a second magnetic material on a carrier wafer, wherein a surface of the first magnetic material and a surface of the second magnetic material, which face each other, have opposite polarities; aligning and bonding the wafer to the carrier wafer by magnetic attraction between the first magnetic material and the second magnetic material; grinding a back side of the wafer to make the wafer thin; and separating the wafer from the carrier wafer.
Abstract:
A semiconductor package includes a first semiconductor package, a second semiconductor package, and a package-connecting member. The first semiconductor package includes a first substrate, a chip stacking portion disposed on the first substrate and including a plurality of first semiconductor chips, and a first sealant for surrounding the chip stacking portion on the first substrate. The second semiconductor package includes a second substrate, at least one second semiconductor chip disposed on the second substrate, and a second sealant for surrounding the second semiconductor chip on the second substrate. The package-connecting member electrically connects the first semiconductor package and the second semiconductor package. The plurality of first semiconductor chips include a first chip including through silicon vias (TSVs) and a second chip electrically connected to the first chip via the TSVs, and the chip stacking portion includes an internal sealant for filling a space between the first chip and the second chip and extending to a side of the second chip.