公开(公告)号：US06493057B1

公开(公告)日：2002-12-10

申请号：US09347834

申请日：1999-07-02

申请人： Masahiko Sato ,  Toshimitsu Konuma ,  Masakazu Odaka ,  Toshiharu Yamaguchi ,  Toshio Watanabe ,  Osamu Aoyagi ,  Kaoru Tabata ,  Chizuru Isigaki ,  Hiroyuki Sakayori ,  Ippei Kobayashi ,  Akio Osabe ,  Shunpei Yamazaki ,  Toru Takayama ,  Akira Mase

发明人： Masahiko Sato ,  Toshimitsu Konuma ,  Masakazu Odaka ,  Toshiharu Yamaguchi ,  Toshio Watanabe ,  Osamu Aoyagi ,  Kaoru Tabata ,  Chizuru Isigaki ,  Hiroyuki Sakayori ,  Ippei Kobayashi ,  Akio Osabe ,  Shunpei Yamazaki ,  Toru Takayama ,  Akira Mase

IPC分类号： G02F11339

CPC分类号： G02F1/13394 ,  G02F1/1339

摘要： An improved liquid crystal device and manufacturing method for same are described. In the device, a pair of substrates, between which a liquid crystal layer is disposed, is joined with pillars inbetween functioning as spacers which are provided of photocurable resin by photolithography. With this structure, the spacers can be in surface contact with the inside surfaces of the substrates on which electrode arrangement and active devices are formed.

摘要翻译： 描述了一种改进的液晶装置及其制造方法。 在该装置中，配置有液晶层的一对基板与作为间隔物之间​​的柱连接起来，该间隔物通过光刻法设置在光固化树脂上。 利用这种结构，间隔物可以与其上形成电极布置和有源器件的基板的内表面接触。

公开(公告)号：US4917474A

公开(公告)日：1990-04-17

申请号：US198699

申请日：1988-05-23

申请人： Shunpei Yamazaki ,  Akira Mase ,  Toshimitsu Konuma

发明人： Shunpei Yamazaki ,  Akira Mase ,  Toshimitsu Konuma

IPC分类号： G02F1/135 ,  G02F1/1365

CPC分类号： G02F1/1354 ,  G02F1/1365

摘要： An optoelectronic panel is disclosed wherein the liquid crystal device and the photo detecting device are formed on a common transparent substrate. The liquid crystal display device includes at least one liquid crystal element which is supplied with a drive signal via a non-single-crystal semiconductor diode serving as a non-linear element and a photo diode of the same structure as the non-single-crystal semiconductor diode serving as the non-linear element of the liquid crystal display device. The liquid crystal display device and the photo detecting device are disposed side by side on the transparent substrate. The liquid crystal element, the non-linear element, the non-single-crystal element and the non-single-crystal semiconductor diode, as the non-linear element, of the liquid crystal display device are formed adjacent one another on the transparent substrate. The one electrode of the liquid crystal element and the one electrode of the non-single-crystal semiconductor diode, serving as the photo diode are both formed on the transparent substrate and are transparent. The one electrode of the non-single-crystal semiconductor diode serving as the non-linear element is also formed on the transparent first substrate but is nontransparent.

摘要翻译： 公开了一种光电板，其中液晶装置和光检测装置形成在共同的透明基板上。 液晶显示装置包括至少一个液晶元件，该液晶元件经由用作非线性元件的非单晶半导体二极管和与非单晶体结构相同的光电二极管提供驱动信号 作为液晶显示装置的非线性元件的半导体二极管。 液晶显示装置和光检测装置并排设置在透明基板上。 作为液晶显示装置的非线性元件的液晶元件，非线性元件，非单晶元件和非单晶半导体二极管在透明基板上彼此相邻地形成 。 作为光电二极管的液晶元件的一个电极和非单晶半导体二极管的一个电极均形成在透明基板上并且是透明的。 用作非线性元件的非单晶半导体二极管的一个电极也形成在透明第一衬底上，但是不透明。

公开(公告)号：US5541749A

公开(公告)日：1996-07-30

申请号：US228277

申请日：1994-04-15

申请人： Toshimitsu Konuma ,  Michio Shimuzu ,  Akira Mase ,  Takeshi Nishi ,  Shunpei Yamazaki

发明人： Toshimitsu Konuma ,  Michio Shimuzu ,  Akira Mase ,  Takeshi Nishi ,  Shunpei Yamazaki

IPC分类号： G02F1/1334 ,  G02F1/1335 ,  G02F1/1368 ,  G02F1/137 ,  G02F1/13

CPC分类号： G02F1/133514 ,  G02F1/1334 ,  G02F1/1368 ,  G02F2001/13756

摘要： A reflective-type liquid crystal device including a first substrate; a plurality of color layers formed on the substrate and arranged in the form of a matrix; a first electrode arrangement formed on the substrate; a light modulating layer including a dispersion-type liquid crystal adjacent the first electrode arrangement; a second electrode arrangement opposite to the first electrode arrangement with the light modulating layer therebetween; and a plurality of thin film transistors for switching the light modulating layer.

摘要翻译： 一种反射型液晶装置，包括：第一基板; 多个彩色层，形成在基板上并以矩阵的形式排列; 形成在所述基板上的第一电极布置; 包括与所述第一电极装置相邻的分散型液晶的光调制层; 与第一电极装置相对的第二电极装置，其间具有光调制层; 以及用于切换光调制层的多个薄膜晶体管。

公开(公告)号：US06853431B2

公开(公告)日：2005-02-08

申请号：US10304706

申请日：2002-11-27

申请人： Masahiko Sato ,  Masakazu Odaka ,  Akira Mase ,  Toru Takayama ,  Kaoru Tabata ,  Chizuru Ishigaki ,  Ippei Kobayashi ,  Toshimitsu Konuma ,  Toshiharu Yamaguchi ,  Toshio Watanabe ,  Osamu Aoyagi ,  Hiroyuki Sakayori ,  Akio Osabe ,  Shunpei Yamazaki

发明人： Masahiko Sato ,  Masakazu Odaka ,  Akira Mase ,  Toru Takayama ,  Kaoru Tabata ,  Chizuru Ishigaki ,  Ippei Kobayashi ,  Toshimitsu Konuma ,  Toshiharu Yamaguchi ,  Toshio Watanabe ,  Osamu Aoyagi ,  Hiroyuki Sakayori ,  Akio Osabe ,  Shunpei Yamazaki

IPC分类号： G02F1/1339

CPC分类号： G02F1/13394 ,  G02F1/1339

摘要： An improved liquid crystal device and manufacturing method for same are described. In the device, a pair of substrates, between which a liquid crystal layer is disposed, is joined with pillars inbetween functioning as spacers which are provided of photocurable resin by photolithography. With this structure, the spacers can be in surface contact with the inside surfaces of the substrates on which electrode arrangement and active devices are formed.

摘要翻译： 描述了一种改进的液晶装置及其制造方法。 在该装置中，配置有液晶层的一对基板与作为间隔物之间​​的柱连接起来，该间隔物通过光刻法设置在光固化树脂上。 利用这种结构，间隔物可以与其上形成电极布置和有源器件的基板的内表面接触。

公开(公告)号：US4936251A

公开(公告)日：1990-06-26

申请号：US725596

申请日：1985-04-22

申请人： Shunpei Yamazaki ,  Mamoru Tashiro ,  Minoru Miyazaki ,  Mitsunori Sakama ,  Takeshi Fukada

发明人： Shunpei Yamazaki ,  Mamoru Tashiro ,  Minoru Miyazaki ,  Mitsunori Sakama ,  Takeshi Fukada

IPC分类号： C23C16/458 ,  C23C16/54

CPC分类号： C23C16/4587 ,  C23C16/54

摘要： A vapor phase reaction apparatus includes a reaction chamber defined by first and second walls fixed opposite each other. Third and fourth walls are introduced into the reaction chamber already having affixed to them a substrate for deposition. A reactive gas is introduced into the reaction chamber for chemical vapor deposition onto the substrate.

摘要翻译： 气相反应装置包括由彼此相对固定的第一和第二壁限定的反应室。 将第三和第四壁引入反应室中，已经固定在其上用于沉积的基底。 反应气体被引入到反应室中用于化学气相沉积到基底上。

公开(公告)号：US5827448A

公开(公告)日：1998-10-27

申请号：US791189

申请日：1991-11-13

申请人： Toshimitsu Konuma ,  Akira Mase ,  Shunpei Yamazaki ,  Misao Yagi ,  Hitoshi Kondo ,  Mika Tadokoro ,  Hiroko Konuma ,  Hiroshi Sugiyama ,  Toshimitsu Hagiwara

发明人： Toshimitsu Konuma ,  Akira Mase ,  Shunpei Yamazaki ,  Misao Yagi ,  Hitoshi Kondo ,  Mika Tadokoro ,  Hiroko Konuma ,  Hiroshi Sugiyama ,  Toshimitsu Hagiwara

IPC分类号： G02F1/1333 ,  C09K19/44 ,  C09K19/46 ,  G02F1/13 ,  G02F1/133 ,  G02F1/1337 ,  C09K19/34 ,  C09K19/36 ,  C09K19/52

CPC分类号： C09K19/46 ,  C09K19/44

摘要： A ferroelectric liquid crystal device is described. The device comprises a pair of substrates, an electrode arrangement formed on the inside surface of the substrates, an orientation control surface provided on the inside surface of one of said substrates, and a blended ferroelectric liquid crystal disposed between the substrates. By suitably preparing the liquid crystal, multi-micro-domains are formed in the liquid crystal. By virtue of the multi-micro-domains, the contrast ratio and the response speed are significantly improved.

摘要翻译： 描述铁电液晶装置。 该装置包括一对基板，形成在基板的内表面上的电极装置，设置在所述基板之一的内表面上的取向控制表面和设置在基板之间的混合铁电液晶。 通过适当制备液晶，在液晶中形成多微畴。 凭借多微域，对比度和响应速度显着提高。

公开(公告)号：US5036794A

公开(公告)日：1991-08-06

申请号：US498474

申请日：1990-03-23

申请人： Shunpei Yamazaki ,  Mamoru Tashiro ,  Minoru Miyazaki ,  Mitsunori Sakama ,  Takeshi Fukada

发明人： Shunpei Yamazaki ,  Mamoru Tashiro ,  Minoru Miyazaki ,  Mitsunori Sakama ,  Takeshi Fukada

IPC分类号： H01L31/04 ,  C23C16/458 ,  C23C16/54 ,  H01L21/205 ,  H01L21/31

CPC分类号： H01L21/02532 ,  C23C16/4587 ,  C23C16/54 ,  H01L21/0262

摘要： A CVD apparatus in which a reaction chamber includes a pair of electrodes which define a plasma generating space therebetween. A metallic enclosure surrounds the plasma generating space thereby preventing plasma which has been produced within the space from escaping. The enclosure can be utilized to support one or more substrates to be coated.

摘要翻译： 一种CVD装置，其中反应室包括在其间限定等离子体产生空间的一对电极。 金属外壳围绕等离子体产生空间，从而防止在空间内产生的等离子体逸出。 外壳可用于支撑待涂覆的一个或多个基底。

公开(公告)号：US5830786A

公开(公告)日：1998-11-03

申请号：US654030

申请日：1996-05-28

申请人： Hongyong Zhang ,  Hideki Uochi ,  Shunpei Yamazaki ,  Yasuhiko Takemura ,  Minoru Miyazaki ,  Akane Murakami ,  Toshimitsu Konuma ,  Akira Sugawara ,  Yukiko Uehara

发明人： Hongyong Zhang ,  Hideki Uochi ,  Shunpei Yamazaki ,  Yasuhiko Takemura ,  Minoru Miyazaki ,  Akane Murakami ,  Toshimitsu Konuma ,  Akira Sugawara ,  Yukiko Uehara

IPC分类号： H01L21/02 ,  H01L21/28 ,  H01L21/3213 ,  H01L21/336 ,  H01L21/76 ,  H01L29/49 ,  H01L21/3215

CPC分类号： H01L21/02071 ,  H01L21/28079 ,  H01L21/32134 ,  H01L29/4908 ,  H01L29/66757

摘要： A process for fabricating an electronic circuit by oxidizing the surroundings of a metallic interconnection such as of aluminum, tantalum, and titanium, wherein anodic oxidation is effected at a temperature not higher than room temperature, preferably, at 10.degree. C. or lower, and more preferably, at 0.degree. C. or lower. The surface oxidation rate of a metallic interconnection can be maintained constant to provide a surface free of irregularities.

摘要翻译： 通过氧化诸如铝，钽和钛的金属互连的周围来制造电子电路的方法，其中阳极氧化在不高于室温，优选在10℃或更低的温度下进行，以及 更优选在0℃以下。 金属互连的表面氧化速率可以保持恒定，以提供没有凹凸的表面。

公开(公告)号：US08304350B2

公开(公告)日：2012-11-06

申请号：US12705004

申请日：2010-02-12

申请人： Shunpei Yamazaki ,  Hisashi Ohtani ,  Hiroyuki Shimada ,  Mitsunori Sakama ,  Hisashi Abe ,  Satoshi Teramoto

发明人： Shunpei Yamazaki ,  Hisashi Ohtani ,  Hiroyuki Shimada ,  Mitsunori Sakama ,  Hisashi Abe ,  Satoshi Teramoto

IPC分类号： H01L21/461

CPC分类号： H01L21/02686 ,  C23C16/303 ,  C23C16/345 ,  C23C16/402 ,  C23C16/54 ,  H01L21/02422 ,  H01L21/02532 ,  H01L21/2022 ,  H01L21/67155 ,  H01L21/67207 ,  H01L27/1281 ,  H01L29/41733 ,  Y10S438/905 ,  Y10S438/908

摘要： A substrate processing apparatus includes a plurality of evacuable treatment chambers connected to one another via an evacuable common chamber, and the common chamber is provided with means for transporting a substrate between each treatment chamber. More specifically, a substrate processing apparatus includes a plurality of evacuable treatment chambers, at least one of said treatment chambers having a film formation function through a vapor phase reaction therein, at least one of said treatment chambers having an annealing function with light irradiation and at least one of said treatment chambers having a heating function therein. The apparatus also has a common chamber through which said plurality of evacuable treatment chambers are connected to one another, and a transportation means provided in said common chamber for transporting a substrate between each treatment chamber.

摘要翻译： 基板处理装置包括经由可抽出的公共室彼此连接的多个可抽出的处理室，公共室设有用于在每个处理室之间输送基板的装置。 更具体地，基板处理装置包括多个可排除的处理室，至少一个所述处理室通过其中的气相反应具有成膜功能，所述处理室中的至少一个具有光照射的退火功能， 所述处理室中的至少一个具有加热功能。 所述设备还具有公共室，所述多个可抽出的处理室通过所述公共室彼此连接，以及设置在所述公共室中的输送装置，用于在每个处理室之间输送基板。

公开(公告)号：US08278195B2

公开(公告)日：2012-10-02

申请号：US13287597

申请日：2011-11-02

申请人： Shunpei Yamazaki ,  Toru Takayama ,  Mitsunori Sakama ,  Hisashi Abe ,  Hiroshi Uehara ,  Mika Ishiwata

发明人： Shunpei Yamazaki ,  Toru Takayama ,  Mitsunori Sakama ,  Hisashi Abe ,  Hiroshi Uehara ,  Mika Ishiwata

IPC分类号： H01L21/469

CPC分类号： H01J37/32477 ,  C23C16/4401 ,  C23C16/5096 ,  Y10S438/905

摘要： In a plasma CVD apparatus, unnecessary discharge such as arc discharge is prevented, the amount of particles due to peeling of films attached to a reaction chamber is reduced, and the percentage of a time contributing to production in hours of operation of the apparatus is increased while enlargement of the apparatus and easy workability are maintained. The plasma CVD apparatus is configured such that in a conductive reaction chamber 104 with a power source 113, a vacuum exhausting means 118, and a reaction gas introduction pipe 114, plasma 115 is generated in a space surrounded by an electrode 111, a substrate holder 112, and an insulator 120.

摘要翻译： 在等离子体CVD装置中，防止了不必要的放电，例如电弧放电，由于附着在反应室上的膜的剥离引起的颗粒的量减少，并且在该设备的工作时间内有助于生产的时间的百分比增加 同时保持设备的扩大和易于加工的性能。 等离子体CVD装置被构造成使得在具有电源113，真空排气装置118和反应气体引入管114的导电反应室104中，在由电极111围绕的空间中产生等离子体115，衬底保持器 112和绝缘体120。