公开(公告)号：US5385830A

公开(公告)日：1995-01-31

申请号：US771632

申请日：1991-10-04

Applicant: Yoshifumi Amano ,  Kazuo Nakamura ,  Hiroshi Kurosawa ,  Takeshi Sato ,  Hirofumi Akano ,  Yoshiya Kawamura

Inventor： Yoshifumi Amano ,  Kazuo Nakamura ,  Hiroshi Kurosawa ,  Takeshi Sato ,  Hirofumi Akano ,  Yoshiya Kawamura

IPC: C12Q1/00 ,  C12Q1/02 ,  C12Q1/26 ,  C12Q1/32 ,  C12S3/00 ,  C12M1/00 ,  C12P1/04 ,  C12P11/00

CPC classification number: C12Q1/02 ,  C12Q1/001 ,  C12Q1/26 ,  C12Q1/32 ,  Y10T436/15 ,  Y10T436/18 ,  Y10T436/184 ,  Y10T436/186 ,  Y10T436/188

Abstract: The present invention provides a method for measuring the amount of free sulfurous acid and bound sulfurous acid in a sample using a bacterium belonging to Thiobacillus thiooxidans or Thiobacillus ferrooxidans of in which the sample is treated with acid and/or alkali to give free sulfurous acid alone in the sample. Then, the total amount of free sulfurous acid in the sample is measured by an oxidation reaction of free sulfurous acid to sulfuric acid using a bacterium belonging to Thiobacillus thiooxidans or Thiobacillus ferrooxidans.

Abstract translation: 本发明提供了使用属于硫氧化硫杆菌（Thiobacillus thiooxidans）或硫氧化硫杆菌（Thiobacillus ferrooxidans）的细菌测量样品中游离亚硫酸和结合亚硫酸的量的方法，其中样品用酸和/或碱处理以产生单独的亚硫酸 在样品中。 然后，使用属于硫氧化硫杆菌（Thiobacillus thiooxidans）或硫氧化硫杆菌（Thiobacillus ferrooxidans）的细菌，通过游离亚硫酸与硫酸的氧化反应测定样品中游离亚硫酸的总量。

公开(公告)号：US4403831A

公开(公告)日：1983-09-13

申请号：US301114

申请日：1981-09-10

Applicant: Yoshifumi Amano

Inventor： Yoshifumi Amano

IPC: G01D7/00 ,  G02F1/01 ,  G02F1/133 ,  G02F1/1333 ,  G02F1/1339 ,  G09F9/30 ,  G09F13/24 ,  G02F1/13

CPC classification number: G02F1/0102 ,  G02F1/0107 ,  G09F13/24

Abstract: A display apparatus includes a first panel having an electrode provided on one surface thereof, a second panel having an electrode provided on the surface thereof facing to the electrode of the first panel, display material intervened between the electrodes of the first and second panels and a spacer disposed between the first and second panels, the peripheral portions of the first and second panels being sealed by sealing material. In this case, one of the first and second panels comprises a substrate and an elastic plate which is sealed to the substrate with its periphery, and fluid is sealed into a space defined by the substrate and elastic plate with such a pressure that the elastic plate contacts the spacer.

Abstract translation: 显示装置包括：第一面板，具有设置在其一个表面上的电极;第二面板，具有设置在其面对第一面板的电极的表面上的电极，介于第一和第二面板的电极之间的显示材料和 间隔件设置在第一和第二面板之间，第一和第二面板的周边部分由密封材料密封。 在这种情况下，第一面板和第二面板中的一个包括基板和弹性板，其与其周边密封到基板，并且流体被密封到由基板和弹性板限定的空间中，压力使得弹性板 接触垫片。

公开(公告)号：US09257313B2

公开(公告)日：2016-02-09

申请号：US13104331

申请日：2011-05-10

Applicant: Yoshifumi Amano

Inventor： Yoshifumi Amano

IPC: H01L21/66 ,  C23F1/08 ,  H01L21/67

CPC classification number: H01L21/67051 ,  H01L21/6708 ,  H01L21/67253

Abstract: Disclosed is a substrate processing apparatus including: a substrate processing unit that performs substrate processing by supplying a processing liquid to a substrate to be processed; a positioning mechanism that contacts the sides of the substrate to determine the position of the substrate; a positioning driver that drives the positioning mechanism; a detector that detects the position of the positioning mechanism; a storage unit that stores the position of the positioning mechanism with respect to a reference substrate serving as a reference of the substrate as a reference position information; and an operator that calculates a difference between the reference position information and the position information of the positioning mechanism detected in the detector and calculates measurement information on the processed substrate based on the difference.

Abstract translation: 公开了一种基板处理装置，包括：基板处理单元，其通过将处理液体供给到待处理基板来进行基板处理; 定位机构，其与基板的侧面接触以确定基板的位置; 驱动定位机构的定位驱动器; 检测器，其检测定位机构的位置; 存储单元，其存储所述定位机构相对于作为所述基板的基准的参考基板的位置作为基准位置信息; 以及运算器，其计算参考位置信息和在检测器中检测到的定位机构的位置信息之间的差异，并基于该差异来计算处理的基板上的测量信息。

公开(公告)号：US08617318B2

公开(公告)日：2013-12-31

申请号：US12678013

申请日：2009-05-25

Applicant: Yoshifumi Amano ,  Satoshi Kaneko

Inventor： Yoshifumi Amano ,  Satoshi Kaneko

IPC: B08B3/00

CPC classification number: H01L21/67051

Abstract: A liquid processing apparatus including: a second housing; a first housing capable of being brought into contact with the second housing; a holding part configured to hold an object to be processed; a rotation driving part configured to rotate the object to be processed held by the holding part; front-side process-liquid supply nozzle configured to supply a process liquid onto a peripheral portion of a front surface of the object to be processed held by the holding part; and a storage part disposed on a side of a rear surface of the object to be processed held by the holding part, the storage part being configured to store the process liquid having been passed through the object to be processed. The respective first housing and the second housing can be moved in one direction, so that the first housing and the second housing can be brought into contact and separated from each other.

Abstract translation: 一种液体处理装置，包括：第二壳体; 能够与第二壳体接触的第一壳体; 被配置为保持待处理对象的保持部; 旋转驱动部，其构造成使由所述保持部保持的被处理体旋转; 前处理液供给喷嘴，被配置为将处理液体供给到由所述保持部保持的待处理对象物的前表面的周边部; 以及存储部，其设置在由所述保持部保持的被处理体的背面的一侧，所述收纳部被配置为存储已经通过所述被处理物的处理液。 相应的第一壳体和第二壳体可以在一个方向上移动，使得第一壳体和第二壳体可以彼此接触和分离。

公开(公告)号：US08136538B2

公开(公告)日：2012-03-20

申请号：US12308372

申请日：2007-11-12

Applicant: Yoshifumi Amano

Inventor： Yoshifumi Amano

IPC: B08B7/00 ,  B08B7/04

CPC classification number: H01L21/67109 ,  G03F7/42 ,  G03F7/423 ,  Y10S134/902

Abstract: A processing system 1 comprises: a processing vessel 30 configured to accommodate an object to be processed W in a processing space 83; a process-fluid generating part 41 configured to generate a process fluid of a predetermined temperature; and a main duct 56 arranged between the process-fluid generating part 41 and the processing vessel 30, the main duct 56 being configured to guide the process fluid supplied from the process-fluid generating part 41. A process-fluid supply duct 171 is arranged on a downstream side of the main duct 56 via a switching valve 70, the process-fluid supply duct 171 being configured to introduce the process fluid into the processing space 83 of the processing vessel 30. A process-fluid bypass duct 172 is arranged on the downstream side of the main duct 56 via the switching valve 70, the process-fluid bypass duct 172 being configured to guide a process fluid, which is not introduced to the process-fluid supply duct 171, so as to bypass the processing space 83. The main duct 56 is provided with a flow-rate adjusting mechanism 65 for adjusting a flow rate of the process fluid flowing through the main duct 56.

Abstract translation: 处理系统1包括：处理容器30，被配置为在处理空间83中容纳被处理物体W; 被配置为产生预定温度的处理流体的处理液生成部41; 以及布置在处理流体产生部41和处理容器30之间的主管道56，主管道56构造成引导从处理液生成部件41供给的处理流体。处理流体供给管道171布置 经由切换阀70在主管道56的下游侧，处理流体供给管道171构造成将处理流体引入处理容器30的处理空间83中。处理流体旁路管道172设置在 经由切换阀70在主管道56的下游侧，处理流体旁路管道172构造成引导未被引入到处理流体供给管道171的处理流体，以绕过处理空间83 主管道56设置有用于调节流经主管道56的工艺流体的流量的流量调节机构65。

公开(公告)号：US20120064256A1

公开(公告)日：2012-03-15

申请号：US13215778

申请日：2011-08-23

Applicant: Jiro Higashijima ,  Yoshifumi Amano

Inventor： Jiro Higashijima ,  Yoshifumi Amano

IPC: B05D3/06

CPC classification number: H01L21/02087 ,  H01L21/6708 ,  H01L21/67115 ,  H01L21/6838 ,  H01L21/68735 ,  H01L21/68785 ,  H01L21/68792

Abstract: Disclosed is a liquid processing apparatus which performs a liquid processing by supplying a chemical liquid from a chemical liquid supplying unit to substrate rotating around a vertical axis, and includes a cover member arranged at an upper surface of substrate to oppose the substrate and have a space therebetween is provided with a gas supplying port, and gas is supplied from gas supplying port toward the space. The gas is discharged from the space through a gap between protrusion at the circumferential edge of cover member protruding downward and the substrate. In addition, lamp heater heating the circumferential edge of substrate is arranged in the space along the circumferential direction of substrate, the chemical liquid supplied from a chemical liquid supplying unit is supplied to a position closer to the circumferential edge side than a position at which lamp heater is provided.

Abstract translation: 公开了一种液体处理装置，其通过从化学液体供应单元向垂直轴旋转的基板提供化学液体来进行液体处理，并且包括布置在基板的上表面以与基板相对并具有空间的盖构件 在它们之间设有气体供给口，气体从气体供给口向空间供给。 气体通过在向下突出的盖构件的圆周边缘处的突起与基板之间的间隙从空间排出。 此外，加热基板的周缘的灯加热器沿着基板的周向布置在空间中，从化学液体供给单元供给的化学液体被供给到比灯的位置更靠近周缘侧的位置 提供加热器。

公开(公告)号：US20100154836A1

公开(公告)日：2010-06-24

申请号：US12308372

申请日：2007-11-12

Applicant: Yoshifumi Amano

Inventor： Yoshifumi Amano

IPC: B08B5/00 ,  B01J19/08

CPC classification number: H01L21/67109 ,  G03F7/42 ,  G03F7/423 ,  Y10S134/902

Abstract: A processing system 1 comprises: a processing vessel 30 configured to accommodate an object to be processed W in a processing space 83; a process-fluid generating part 41 configured to generate a process fluid of a predetermined temperature; and a main duct 56 arranged between the process-fluid generating part 41 and the processing vessel 30, the main duct 56 being configured to guide the process fluid supplied from the process-fluid generating part 41. A process-fluid supply duct 171 is arranged on a downstream side of the main duct 56 via a switching valve 70, the process-fluid supply duct 171 being configured to introduce the process fluid into the processing space 83 of the processing vessel 30. A process-fluid bypass duct 172 is arranged on the downstream side of the main duct 56 via the switching valve 70, the process-fluid bypass duct 172 being configured to guide a process fluid, which is not introduced to the process-fluid supply duct 171, so as to bypass the processing space 83. The main duct 56 is provided with a flow-rate adjusting mechanism 65 for adjusting a flow rate of the process fluid flowing through the main duct 56.

Abstract translation: 处理系统1包括：处理容器30，被配置为在处理空间83中容纳被处理物体W; 被配置为产生预定温度的处理流体的处理液生成部41; 以及布置在处理流体产生部41和处理容器30之间的主管道56，主管道56构造成引导从处理液生成部件41供给的处理流体。处理流体供给管道171布置 经由切换阀70在主管道56的下游侧，处理流体供给管道171构造成将处理流体引入处理容器30的处理空间83中。处理流体旁路管道172设置在 经由切换阀70在主管道56的下游侧，处理流体旁路管道172构造成引导未被引入到处理流体供给管道171的处理流体，以绕过处理空间83 主管道56设置有用于调节流经主管道56的工艺流体的流量的流量调节机构65。

公开(公告)号：US4021607A

公开(公告)日：1977-05-03

申请号：US469606

申请日：1974-05-13

Applicant: Yoshifumi Amano

Inventor： Yoshifumi Amano

IPC: H04N5/66 ,  G09G3/20 ,  G09G3/28 ,  G09G3/282 ,  H04N3/12 ,  H04N5/70 ,  H05B37/02

CPC classification number: G09G3/2081 ,  H04N3/12

Abstract: A video display system employs a flat panel of the X-Y matrix type with a brightness control circuit in which both the amplitude and the duration of driving pulses for the display panel are varied in response to variations in the sequentially sampled level of input video signals. In a preferred brightness control circuit, variations in the sequentially sampled level of the input video signals are converted into digitally coded signals which selectively energize respective pulse generators operative to produce pulses of correspondingly weighted durations and amplitudes which overlap in time, and such pulses are combined to provide the amplitude- and width or duration-modulated driving pulses for the display panel.

Abstract translation: 视频显示系统采用具有亮度控制电路的X-Y矩阵型平板，响应于输入视频信号的顺序采样电平的变化，显示面板的驱动脉冲的幅度和持续时间都变化。 在优选的亮度控制电路中，输入视频信号的顺序采样电平的变化被转换成数字编码的信号，其选择性地激励相应的脉冲发生器，其可操作以产生相应的加权持续时间和在时间上重叠的振幅的脉冲，并且这些脉冲被组合 以提供用于显示面板的幅度和宽度或持续时间调制的驱动脉冲。

公开(公告)号：US4005402A

公开(公告)日：1977-01-25

申请号：US566258

申请日：1975-04-09

Applicant: Yoshifumi Amano

Inventor： Yoshifumi Amano

IPC: H01J31/15 ,  H01J17/49 ,  H01J17/48

CPC classification number: H01J17/497

Abstract: A flat gas discharge panel comprising two opposed glass plates sealed with a space for gas therebetween and having a plurality of first and second electrodes, respectively mounted on opposite plates in a matrix fashion and further including a plurality of parallel insulator ribs which intersect the first electrodes at right angles and further provide physical separation between the glass plates and the adjacent discharge segments. A plurality of parallel barrier electrodes are mounted on one of the plates in alignment with the insulator ribs so as to maintain the glow from an illuminated section isolated from adjacent sections, and at least two different phosphors for emitting different color lights are mounted in the sections at different positions.

Abstract translation: 一种扁平气体放电面板，包括两个相对的玻璃板，两个相对的玻璃板在其间具有用于气体的空间密封，并且具有分别以矩阵方式安装在相对的板上的多个第一和第二电极，并且还包括多个平行的绝缘体肋， 并且进一步提供玻璃板和相邻排出段之间的物理分离。 多个平行的阻挡电极安装在与绝缘体肋对准的一个板上，以便保持来自与相邻部分隔离的照明部分的辉光，并且用于发射不同颜色的光的至少两种不同的荧光体安装在部分 在不同的位置。