Differential scanning calorimeter
    21.
    发明授权
    Differential scanning calorimeter 有权
    差示扫描量热仪

    公开(公告)号:US07455449B2

    公开(公告)日:2008-11-25

    申请号:US11657271

    申请日:2007-01-24

    Inventor: Shinya Nishimura

    CPC classification number: G01N25/4866

    Abstract: There is provided a differential scanning calorimeter possessing an accommodation chamber accommodating a sample to be measured and a reference material, a heater heating the accommodation chamber, a differential heat flow detector outputting a temperature difference between the sample to be measured and the reference material as a heat flow difference signal, a cooling block cooling-controlled to a predetermined temperature, a heat resistor which mechanically connects the cooling block and the accommodation chamber and forms a heat flow path between both, a first fixation means which fixes the heat resistor to the cooling block by pressing the former while being biased by a constant elastic force, and a second fixation means which fixes the accommodation chamber to the heat resistor by pressing the former while being biased by a constant elastic force.

    Abstract translation: 提供了一种具有容纳要测量的样本的容纳室和参考材料的差示扫描量热计,加热该容纳室的加热器,将要测量的样品与参考材料之间的温度差输出为差分热量检测器 热流差信号,冷却控制到预定温度的冷却块,将冷却块和容纳室机械连接并在两者之间形成热流路的热电阻器,将热电阻器固定在冷却 在通过恒定的弹性力被偏压的同时按压前者,以及第二固定装置,其通过在恒定的弹性力被偏压的同时按压前者而将收纳室固定到热电阻器。

    Surface information measuring apparatus and surface information measuring method
    22.
    发明授权
    Surface information measuring apparatus and surface information measuring method 有权
    表面信息测量装置和表面信息测量方法

    公开(公告)号:US07441445B2

    公开(公告)日:2008-10-28

    申请号:US11230903

    申请日:2005-09-20

    CPC classification number: G01Q10/04 G01B7/34

    Abstract: To measure surface information and physical information of a sample with high accuracy by promoting linearity in Z direction by nullifying cross talk in XY directions as less as possible, there is provided a surface information measuring apparatus including a probe having a stylus, a Z actuator fixed with the probe for being elongated and contracted in Z direction orthogonal to a sample surface B when applied with a voltage, an applicator for applying the voltage to the Z actuator, and a controller for controlling to operate the applicator, in which the Z actuator includes a piezoelectric member capable of being elongated and contracted in Z direction and a plurality of divided electrodes provided to be respectively electrically independent from each other in a state of being divided by at least 3 or more in a peripheral direction at an inner peripheral face or an outer peripheral face of the piezoelectric member for applying voltages to elongate and contract the piezoelectric member within ranges of contact regions, and the controller controls the applicator to apply voltages by a previously determined rates of voltage applying amounts such that elongating or contracting amounts of respective contact regions of the piezoelectric member respectively brought into contact with the divided electrodes respectively become the same.

    Abstract translation: 为了尽可能的减少XY方向上的串扰,通过提高Z方向的线性度来高精度地测量样品的表面信息和物理信息,提供了一种表面信息测量装置,包括具有触针的探头,Z致动器固定的 该探针在被施加电压时在Z方向上与样品表面B正交地伸长和收缩,用于向Z致动器施加电压的施加器以及用于控制施加施加器的控制器,其中Z致动器包括 能够在Z方向上伸长和收缩的压电元件和多个分开的电极,其分别在外周面上沿周向被划分为至少3个以上的状态而彼此分别电气独立,或者 用于施加电压以使细长和收缩压电元件w的压电元件的外周面 在接触区域的范围内,控制器控制施加器以通过预先确定的电压施加量施加电压,使得分别与分离电极接触的压电元件的各个接触区域的伸长或收缩量分别变得相同 。

    Fluorescent X-ray analysis apparatus
    23.
    发明授权
    Fluorescent X-ray analysis apparatus 有权
    荧光X射线分析仪

    公开(公告)号:US07428293B2

    公开(公告)日:2008-09-23

    申请号:US11729247

    申请日:2007-03-28

    CPC classification number: G01N23/223 G01N33/02 G01N2223/076

    Abstract: There is provided a fluorescent X-ray analysis apparatus in which a detection lower limit has been improved by reducing an X-ray generating subsidiarily and detected. The fluorescent X-ray analysis apparatus is one which possesses an X-ray source irradiating a primary X-ray, and a detector in which a collimator having a through-hole in its center part has been placed in a front face, and in which, by the detector, there is detected a primary fluorescent X-ray which generates from a sample by irradiating the primary X-ray to a sample, and passes through the through-hole of the collimator. The X-ray source and the detector are disposed while adjoining the sample, and an irradiated face of the X-ray source or the detector, to which a primary scattered ray having generated by the fact that the primary X-ray scatters in the sample and the primary fluorescent X-ray having generated from the sample are irradiated, is covered by a secondary X-ray reduction layer reducing a secondary scattered ray and a secondary fluorescent X-ray, which generate by irradiations of the primary scattered ray and the primary fluorescent X-ray.

    Abstract translation: 提供了一种荧光X射线分析装置,其中通过减少辅助地产生X射线并检测到已经提高了检测下限。 荧光X射线分析装置是具有照射初级X射线的X射线源的荧光X射线分析装置和其中央部具有贯通孔的准直仪被放置在正面的检测器,其中 通过检测器检测到通过对样品照射主X射线从样品产生并通过准直器的通孔的初级荧光X射线。 X射线源和检测器在邻接样品的同时被设置,X射线源或检测器的被照射的面由主要X射线散布在样品中而产生的主要散射光线 并且从样品产生的初级荧光X射线被照射的二次X射线减少层被减少通过一次散射光和初级荧光体的照射产生的二次散射光和次级荧光X射线的次级X射线减少层覆盖 荧光X射线。

    Sample height regulating method, sample observing method, sample processing method and charged particle beam apparatus
    24.
    发明授权
    Sample height regulating method, sample observing method, sample processing method and charged particle beam apparatus 有权
    样品高度调节方法,样品观察方法,样品处理方法和带电粒子束装置

    公开(公告)号:US07423266B2

    公开(公告)日:2008-09-09

    申请号:US11360948

    申请日:2006-02-23

    Abstract: In a sample height regulating method, an area including the observation point on the sample is scan-irradiated with a first charged particle beam to obtain a first secondary electron image including the observation point. An area including the observation point on the sample is then scan-irradiated with a second charged particle beam to obtain a second secondary electron image including the observation point. Thereafter, based on magnifications of the first secondary electron image and the second secondary electron image and a distance between the observation point in the first secondary electron image and the observation point in the second secondary electron image, a height of the sample required for focusing the first charged particle beam and the second charged particle beam on the observation point is calculated. A sample stage supporting the sample is then displaced so as to position the sample at the calculated sample height.

    Abstract translation: 在样品高度调节方法中,利用第一带电粒子束对包含样品上的观察点的区域进行扫描照射,以获得包括该观察点的第一二次电子图像。 然后利用第二带电粒子束对样品上的观察点进行扫描照射,得到包含该观察点的第二二次电子像。 此后,基于第一二次电子图像和第二二次电子图像的放大率和第一二次电子图像中的观察点与第二二次电子图像中的观察点之间的距离,聚焦所需的样本的高度 计算观测点上的第一带电粒子束和第二带电粒子束。 然后移动支撑样品的样品台,以将样品定位在计算的样品高度。

    Photomask defect correction method employing a combined device of a focused electron beam device and an atomic force microscope
    25.
    发明授权
    Photomask defect correction method employing a combined device of a focused electron beam device and an atomic force microscope 有权
    使用聚焦电子束装置和原子力显微镜的组合装置的光掩模缺陷校正方法

    公开(公告)号:US07375352B2

    公开(公告)日:2008-05-20

    申请号:US11137843

    申请日:2005-05-25

    Abstract: In order to make it possible to improve throughput of AFM scratch processing, enable correction of small defects in clear defect correction with a high degree of precision, and enable correction in a shorter period of time in the event of overcutting by AFM scratch processing, throughput of AFM scratch processing is increased by maximizing high-resolution of the electron beam device and minimizing the time taken in observations using a device incorporating both an electro-optical system and an AFM head in a vacuum, correcting small clear defects with high precision by eliminating portions left over from AFM scratch processing after applying a clear defect correction film using an electron beam while providing light-blocking film raw material, and correction in a short time is made possible by eliminating portions remaining using AFM scratch processing after applying a clear defect correction film using an electron beam while providing light-blocking film raw material also in cases of overcutting in AFM scratch processing.

    Abstract translation: 为了提高AFM划痕处理的生产能力,能够以高精度校正清晰的缺陷校正中的小缺陷,并且能够在AFM划痕处理过度切割的情况下在更短的时间内进行修正 通过最大限度地提高电子束装置的高分辨率和最小化在使用在真空中并入电光系统和AFM头的装置的观察所花费的时间来增加AFM划痕处理,通过消除以高精度校正小的清晰缺陷 在使用电子束施加清晰的缺陷校正膜同时提供遮光膜原料之后,从AFM划痕处理剩余的部分,并且通过在施加清晰的缺陷校正之后通过消除使用AFM划痕处理剩余的部分在短时间内进行校正成为可能 同时在o的情况下也提供遮光膜原料的电子束 在AFM划痕处理中强化。

    Cantilever holder and scanning probe microscope
    26.
    发明授权
    Cantilever holder and scanning probe microscope 有权
    悬臂支架和扫描探针显微镜

    公开(公告)号:US07375322B2

    公开(公告)日:2008-05-20

    申请号:US11374841

    申请日:2006-03-14

    CPC classification number: G01Q70/02

    Abstract: To prevent an influence from effecting on an oscillating state of a cantilever by firmly fixing a main body portion, there is provided a cantilever holder for attachably and detachably fixing a cantilever which is provided with a stylus at a front end thereof and a base end side of which is supported by a main body portion in a single-supported state, the cantilever holder including a base member having a mounting portion for mounting the main body portion in a state of being positioned at a predetermined position, a holding member made to be able to be brought into contact with at least a surface of the main body portion in a state of mounting the main body portion on the mounting portion and extended in a direction substantially orthogonal to a longitudinal direction (axis line A direction) of the cantilever, and pressing means for pressing both ends of the holding member to the base member by a predetermined pressure, fixing the main body portion to the mounting portion by way of the holding member and capable of separating the holding member from the surface of the main body portion by releasing depression, in which the holding member is formed by a resin species material.

    Abstract translation: 为了通过牢固地固定主体部分来防止对悬臂的振荡状态的影响,提供了一种用于可拆卸地固定悬臂的悬臂支架,该悬臂在其前端设置有触针和基端侧 其中,所述悬臂支架包括:基座构件,具有用于将所述主体部安装在预定位置的状态的安装部;保持构件, 能够在将主体部安装在安装部上并沿与悬臂的纵向(轴线A方向)大致正交的方向延伸的状态下与主体部的至少一个表面接触, 以及按压装置,用于将保持构件的两端按压预定的压力按压到基座构件上,并将主体部分固定在安装部分上 e保持构件,并且能够通过释放凹部来分离保持构件与主体部的表面,其中保持构件由树脂种材料形成。

    Sample support prepared by semiconductor silicon process technique
    27.
    发明授权
    Sample support prepared by semiconductor silicon process technique 有权
    采用半导体硅工艺制备样品

    公开(公告)号:US07345289B2

    公开(公告)日:2008-03-18

    申请号:US11356698

    申请日:2006-02-17

    CPC classification number: H01J37/20 G01N1/32

    Abstract: A sample support of the present invention is prepared such that a silicon substrate is used as a raw material, the thickness structure having a shape and a thickness of 10 μm or less is prepared using a semiconductor silicon process technique. The sample support of the present invention is adhered to a partially-cut mesh in a state that a sample portion is not adhered. Further, a plurality of portions where the samples are mounted is arranged on the same substrate.

    Abstract translation: 制备本发明的样品载体,使用硅衬底作为原料,使用半导体硅工艺技术制备具有10μm或更小的形状和厚度的厚度结构。 本发明的样品支持体在样品部分未被粘附的状态下被粘附到部分切割的网状物上。 此外,在同一基板上配置多个安装样品的部分。

    Method and apparatus of evaluating layer matching deviation based on CAD information
    28.
    发明授权
    Method and apparatus of evaluating layer matching deviation based on CAD information 有权
    基于CAD信息评估层匹配偏差的方法和装置

    公开(公告)号:US07257785B2

    公开(公告)日:2007-08-14

    申请号:US10823104

    申请日:2004-04-13

    Inventor: Ryoichi Matsuoka

    Abstract: An apparatus of evaluating a layer matching deviation based on CAD information of the invention, is provided with means for storing CAD data and a function of displaying to overlap a scanning microscope image of a pattern of a semiconductor device formed on a wafer and a design CAD image read from the storing means and a function of evaluating acceptability of formation of the pattern by displaying to overlap a pattern image of the semiconductor device formed on the wafer and the design CAD image of the pattern, in addition thereto, a function capable of evaluating acceptability of formation of the pattern also with regard to a shape and positional relationship with a pattern formed at a later step by displaying to overlap a design CAD image of the pattern formed at the later step.

    Abstract translation: 基于本发明的CAD信息评估层匹配偏差的装置具有用于存储CAD数据的装置和与晶片上形成的半导体器件的图案的扫描显微镜图像重叠的显示功能和设计CAD 从存储装置读取的图像以及通过显示来评估形成图案的可接受性的功能,与形成在晶片上的半导体器件的图案图像和图案的设计CAD图像重叠,以及能够评估 通过显示与形成在稍后步骤中形成的图案的设计CAD图像重叠的形状和与稍后步骤形成的图案的位置关系,也可以形成图案。

    Scanning probe microscope and measuring method by means of the same
    29.
    发明授权
    Scanning probe microscope and measuring method by means of the same 有权
    扫描探针显微镜及其测量方法

    公开(公告)号:US07251987B2

    公开(公告)日:2007-08-07

    申请号:US11088086

    申请日:2005-03-23

    CPC classification number: G01Q20/02 G01Q30/12 G01Q80/00

    Abstract: A scanning probe microscope is capable of radiating light on a sample without moving the sample from the scanning probe microscope and is capable of measuring the sample while controlling the conditions under which the sample is placed without changing the location of the sample. The scanning probe microscope includes a cantilever having a probe at a distal end thereof, a sample moving device for moving the sample, and a detection unit for detecting deflection of the cantilever using a laser beam. The detection unit is detachably mounted to the scanning probe microscope during measurement of the sample and is detachable from the microscope to enable radiation of the sample with light without changing the location of the sample.

    Abstract translation: 扫描探针显微镜能够在样品上照射光,而不会从扫描探针显微镜移动样品,并能够在不改变样品位置的同时控制样品放置条件的同时测量样品。 扫描探针显微镜包括在其远端具有探针的悬臂,用于移动样本的样品移动装置,以及用于使用激光束检测悬臂的偏转的检测单元。 检测单元在样品测量期间可拆卸地安装到扫描探针显微镜上,并且可从显微镜拆卸以使得能够用光照射样品而不改变样品的位置。

    Scanning probe microscopy cantilever holder and scanning probe microscope using the cantilever holder
    30.
    发明授权
    Scanning probe microscopy cantilever holder and scanning probe microscope using the cantilever holder 有权
    使用悬臂支架扫描探针显微镜悬臂支架和扫描探针显微镜

    公开(公告)号:US07170054B2

    公开(公告)日:2007-01-30

    申请号:US11199290

    申请日:2005-08-08

    CPC classification number: G01Q60/34 G01Q70/02

    Abstract: A scanning probe microscope having a cantilever holder is provided which gives a cantilever great amplitude by a small-sized vibrator configurable in a limited space and is stably operated even in environments of high viscous drag such as a liquid. A cantilever base part of a cantilever is fixed to a fixing part of a scanning probe microscopy cantilever holder. A vibrator is mounted on the fixing part. When it is defined that the front side is the side close to a probe and the rear side is the side close to a supporting part of the fixing part along in the longitudinal direction of the cantilever, the vibrator displaces the front and rear sides of the fixing part of the cantilever holder to each other in the opposite directions within the plane orthogonal to the sample surface to vibrate the cantilever in a liquid.

    Abstract translation: 提供具有悬臂支架的扫描探针显微镜,其通过可在有限空间中配置的小尺寸振动器提供悬臂极大幅度,并且即使在诸如液体的高粘性阻力的环境中也能稳定地操作。 悬臂的悬臂底部固定在扫描探针显微镜悬臂支架的固定部分上。 振动器安装在固定部分上。 当确定前侧是靠近探头的一侧,并且后侧是沿着悬臂的纵向方向靠近固定部分的支撑部分的一侧时,振动器使前侧和后侧 将悬臂支架的一部分在与样品表面正交的平面内的相反方向彼此固定,以使悬臂在液体中振动。

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