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    Process for Unitary Graphene Layer or Graphene Single Crystal
    22.
    发明申请
    Process for Unitary Graphene Layer or Graphene Single Crystal 有权
    单一石墨烯层或石墨烯单晶的工艺

    公开(公告)号：US20170073834A1

    公开(公告)日：2017-03-16

    申请号：US15354706

    申请日：2016-11-17

    申请人： Aruna Zhamu ,  Wei Xiong ,  Bor Z. Jang

    发明人： Aruna Zhamu ,  Wei Xiong ,  Bor Z. Jang

    IPC分类号： C30B1/02 ,  C30B29/02

    CPC分类号： C30B1/02 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/182 ,  C01B32/184 ,  C01B32/19 ,  C01B32/192 ,  C01B32/22 ,  C01B32/225 ,  C01B32/23 ,  C01P2006/10 ,  C01P2006/32 ,  C01P2006/40 ,  C01P2006/80 ,  C30B5/00 ,  C30B29/02 ,  C30B29/68 ,  Y10S977/734 ,  Y10S977/842 ,  Y10T428/30

    摘要： A unitary graphene layer or graphene single crystal containing closely packed and chemically bonded parallel graphene planes having an inter-graphene plane spacing of 0.335 to 0.40 nm and an oxygen content of 0.01% to 10% by weight, which unitary graphene layer or graphene single crystal is obtained from heat-treating a graphene oxide gel at a temperature higher than 100° C., wherein the average mis-orientation angle between two graphene planes is less than 10 degrees, more typically less than 5 degrees. The molecules in the graphene oxide gel, upon drying and heat-treating, are chemically interconnected and integrated into a unitary graphene entity containing no discrete graphite flake or graphene platelet. This graphene monolith exhibits a combination of exceptional thermal conductivity, electrical conductivity, mechanical strength, surface smoothness, surface hardness, and scratch resistance unmatched by any thin-film material of comparable thickness range.

    摘要翻译： 单层石墨烯层或石墨烯单晶，其含有紧密堆积和化学结合的平行石墨烯平面，其石墨烯平面间距为0.335至0.40nm，氧含量为0.01重量％至10重量％，该单一石墨烯层或石墨烯单晶 通过在高于100℃的温度下热处理石墨烯氧化物凝胶获得，其中两个石墨烯平面之间的平均错位取向角小于10度，更典型地小于5度。 石墨烯氧化物凝胶中的分子在干燥和热处理后被化学相互连接并整合成不含离散石墨薄片或石墨烯薄片的单一石墨烯实体。 该石墨烯整体结构具有卓越的导热性，导电性，机械强度，表面平滑度，表面硬度和耐刮擦性，可与任何相当厚度范围的薄膜材料匹配。

    METHOD AND COMPOSITION FOR DEPOLYMERIZATION OF CURED EPOXY RESIN MATERIALS
    23.
    发明申请
    METHOD AND COMPOSITION FOR DEPOLYMERIZATION OF CURED EPOXY RESIN MATERIALS 审中-公开
    固化环氧树脂材料的分离方法和组合物

    公开(公告)号：US20170022636A1

    公开(公告)日：2017-01-26

    申请号：US15187062

    申请日：2016-06-20

    申请人： Korea Institute of Science and Technology

    发明人： Munju GOH ,  Bon-Cheol KU ,  Nam Ho YOU ,  Sang Jun YOUN ,  Hyeonuk YEO

    IPC分类号： D01F9/24 ,  C01B31/36 ,  C03C13/00 ,  C01F7/02 ,  C01B31/04 ,  C01B31/02

    CPC分类号： D01F9/24 ,  C01B32/16 ,  C01B32/184 ,  C01B32/23 ,  C01B32/956 ,  C01F7/02 ,  C03C13/00 ,  C08J11/16 ,  C08J2363/00 ,  Y02W30/705

    摘要： A cured epoxy resin material is depolymerized by using a composition including a compound represented by the chemical formula of XOmYn (wherein X is hydrogen, alkali metal or alkaline earth metal, Y is halogen, m is a number satisfying 1≦m≦8 and n is a number satisfying 1≦n≦6), and a reaction solvent, wherein X is capable of being dissociated from XOmYn and Y radical is capable of being produced from XOmYn in the reaction solvent. It is possible to carry out depolymerization of a cured epoxy resin material, for example, at 200° C., specifically 100° C. or lower, and to reduce a processing cost and an energy requirement. It is also possible to substitute for a reaction system using an organic solvent as main solvent, so that the contamination problems caused by the organic solvent functioning as separate contamination source may be solved and environmental contamination or pollution may be minimized.

    摘要翻译： 固化的环氧树脂材料通过使用包含由化学式XOmYn表示的化合物的组合物（其中X是氢，碱金属或碱土金属，Y是卤素，m是满足1≤m≤8且n 是满足1≤n≤6的数），并且其中X能够从XOmYn和Y自由基解离的反应溶剂能够在反应溶剂中由XOmYn产生。 例如可以在200℃，特别是100℃以下进行固化环氧树脂材料的解聚，降低加工成本和能量需求。 也可以用有机溶剂作为主要溶剂代替反应体系，从而可以解决有机溶剂作为单独的污染源发挥的污染问题，并且可以使环境污染或污染最小化。

    Modified Graphene, Method for Producing a Modified Graphene and Applications Thereof
    25.
    发明申请
    Modified Graphene, Method for Producing a Modified Graphene and Applications Thereof 有权
    改性石墨烯，生产改性石墨烯的方法及其应用

    公开(公告)号：US20160347619A1

    公开(公告)日：2016-12-01

    申请号：US14964742

    申请日：2015-12-10

    申请人： National Taiwan University of Science and Technology

    发明人： Wei-Hung Chiang ,  Yen-Sheng Li ,  Jia-Liang Liao

    IPC分类号： C01B31/04

    CPC分类号： C01B31/0469 ,  C01B32/19 ,  C01B32/23

    摘要： Provided is a method for producing a modified graphene, comprising the steps of intercalating or inserting a mixture of intercalating agents in a spacing between interlayers of carbon substrates or between carbon substrates, whereby the binding force between the interlayers of the carbon substrates or between the carbon substrates is weaken; and then exfoliating the pretreated carbon substrates to form the modified graphene. Upon environmental friendly purpose, the method according to the present invention is useful for reducing the total amount of strong acid. Therefore, the amount of the generated oxygen-containing functional groups attached on the modified graphene is modulated to avoid defects and maintain a yield over 80%.

    摘要翻译： 提供了一种制备改性石墨烯的方法，其包括以下步骤：在碳基底的中间层之间或碳基底之间的间隔中插入或插入插入剂的混合物，由此碳底物的夹层之间或碳 底物减弱; 然后去除预处理的碳基底以形成改性石墨烯。 在环境友好的目的下，根据本发明的方法可用于减少强酸的总量。 因此，调整附着在改性石墨烯上的产生的含氧官能团的量，以避免缺陷并保持80％以上的产率。

    LARGE SCALE PRODUCTION OF OXIDIZED GRAPHENE
    26.
    发明申请
    LARGE SCALE PRODUCTION OF OXIDIZED GRAPHENE 有权
    大规模生产氧化石墨

    公开(公告)号：US20160340194A1

    公开(公告)日：2016-11-24

    申请号：US15163247

    申请日：2016-05-24

    申请人： Group NanoXplore Inc.

    发明人： Marie BOZALINA ,  Philippe PERRET ,  Soroush NAZARPOUR

    IPC分类号： C01B31/04 ,  C30B33/04 ,  C30B33/00 ,  C30B29/02 ,  C30B29/64

    CPC分类号： C01B32/19 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/184 ,  C01B32/23 ,  C01B2204/04 ,  C01P2006/40 ,  C30B29/02 ,  C30B29/16 ,  C30B29/60 ,  C30B29/64 ,  C30B33/00 ,  C30B33/04 ,  C30B33/06 ,  H01G11/36 ,  H01M4/587 ,  Y10S977/734 ,  Y10S977/847 ,  Y10S977/948

    摘要： Embodiments described herein relate generally to the large scale production of functionalized graphene. In some embodiments, a method for producing functionalized graphene includes combining a crystalline graphite with a first electrolyte solution that includes at least one of a metal hydroxide salt, an oxidizer, and a surfactant. The crystalline graphite is then milled in the presence of the first electrolyte solution for a first time period to produce a thinned intermediate material. The thinned intermediate material is combined with a second electrolyte solution that includes a strong oxidizer and at least one of a metal hydroxide salt, a weak oxidizer, and a surfactant. The thinned intermediate material is then milled in the presence of the second electrolyte solution for a second time period to produce functionalized graphene.

    摘要翻译： 本文所述的实施方案一般涉及功能化石墨烯的大规模生产。 在一些实施方案中，生产官能化石墨烯的方法包括将结晶石墨与包含金属氢氧化物盐，氧化剂和表面活性剂中的至少一种的第一电解质溶液组合。 然后在第一电解质溶液的存在下研磨结晶石墨第一次以产生变薄的中间体材料。 稀释的中间体材料与包含强氧化剂和金属氢氧化物盐，弱氧化剂和表面活性剂中的至少一种的第二电解质溶液组合。 然后在第二电解质溶液的存在下研磨稀释的中间材料第二时间以产生官能化的石墨烯。

    Highly conducting graphitic films from graphene liquid crystals
    29.
    发明申请
    Highly conducting graphitic films from graphene liquid crystals 有权
    来自石墨烯液晶的高导电石墨膜

    公开(公告)号：US20160304351A1

    公开(公告)日：2016-10-20

    申请号：US15192241

    申请日：2016-06-24

    申请人： Aruna Zhamu ,  Bor Z. Jang

    发明人： Aruna Zhamu ,  Bor Z. Jang

    IPC分类号： C01B31/04 ,  H01B1/04 ,  H01B1/24 ,  C09K5/14

    CPC分类号： C01B32/182 ,  C01B32/184 ,  C01B32/192 ,  C01B32/198 ,  C01B32/23 ,  C01B2204/22 ,  C01P2006/10 ,  C01P2006/32 ,  C01P2006/40 ,  C09K5/14 ,  H01B1/04 ,  H01B1/24

    摘要： A process for producing a highly oriented graphitic film, consisting of (a) preparing a dispersion having graphene oxide (GO) or chemically functionalized graphene (CFG) dispersed in a liquid to form a liquid crystal phase (but not in a GO gel state); (b) depositing the dispersion onto a supporting substrate to form a layer of GO or CFG under an orientation-inducing stress; (c) removing the liquid to form a dried GO or CFG layer having an inter-plane spacing d002 of 0.4 nm to 1.2 nm; (d) thermally reducing the dried layer at a first temperature higher than 100° C. to produce a porous layer of reduced GO or CFG; (e) further heat-treating the porous layer at a second temperature to produce a porous graphitic film having an inter-plane spacing d002 less than 0.4 nm; and (f) compressing the porous graphitic film to produce the highly oriented graphitic film.

    摘要翻译： 一种高取向石墨膜的制造方法，由（a）制备分散在液体中的石墨烯氧化物（GO）或化学官能化石墨烯（CFG）的分散体形成液晶相（但不在GO凝胶状态） ; （b）将分散体沉积在支撑基底上以在取向诱导应力下形成一层GO或CFG; （c）去除液体以形成具有0.4nm至1.2nm的平面间距d002的干GO或CFG层; （d）在高于100℃的第一温度下热干燥干燥层以产生减少的GO或CFG的多孔层; （e）在第二温度下进一步热处理多孔层以产生具有小于0.4nm的平面间距d002的多孔石墨膜; 和（f）压缩多孔石墨膜以产生高取向的石墨膜。