公开(公告)号：US20010006216A1

公开(公告)日：2001-07-05

申请号：US09748226

申请日：2000-12-27

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Toru Koike

IPC: G01K001/08 ,  H01J003/14 ,  H01J003/26

CPC classification number: H01J37/3045 ,  H01J2237/2817 ,  H01J2237/3175

Abstract: A sample has a first mark and a second mark formed in a layer upper than the first mark on a Si substrate. The first and second marks are arrange such that they do not have an overlapping area in a direction in which relative positions of the first and second marks are measured. The sample is scanned with an electron beam, detecting a first scattered-electron signal from the sample on a line including the first mark, and a second scattered-electron signal from the sample on a line including the second mark. Based on the first and second scattered-electron signal, representative positions of the first and second marks are obtained, and a positional misalignment amount of the first and second marks is further obtained.

Abstract translation: 样品在Si衬底上形成在比第一标记上的层中的第一标记和第二标记。 第一和第二标记布置成使得它们在测量第一和第二标记的相对位置的方向上不具有重叠区域。 用电子束扫描样品，在包括第一标记的线上检测来自样品的第一散射电子信号，以及在包括第二标记的线上从样品检测第二散射电子信号。 基于第一和第二散射电子信号，获得第一和第二标记的代表性位置，并且进一步获得第一和第二标记的位置偏移量。

公开(公告)号：US20040149925A1

公开(公告)日：2004-08-05

申请号：US10478752

申请日：2003-11-20

Inventor： Heiko Muller

IPC: G02B013/18 ,  G02B003/06 ,  H01J049/42 ,  H01J003/26 ,  H01J003/14 ,  G21K001/08

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/10 ,  H01J37/153 ,  H01J37/3174

Abstract: A slit lens arrangement for particle beams, in particular for the projection of a mask onto a workpiece, is disclosed, comprising a combined lens, made up of a cylinder lens and a quadrupole lens, the optical axes of which run parallel to each other, whereby the optical axis of the quadrupole lens may be displaced in a parallel manner and which have a gap-like opening between the pole shoes or in the electrodes with the same spatial relationship to each other. Both lenses are thus so arranged relative to each other, that the focussing of the quadrupole lens occurs in that plane in which the cylinder lens is not focussed, and the defocusing of the quadrupole lens occurs in that plane in which the cylinder lens focuses. According to the invention, two combined lenses are provided with functionally identical elements arranged such that the optical axes of the both lenses lie coaxial to each other, define the mid-axis of the total system and whereby the beam path is telescopic throughout the total system. The optical axis of the image is thus given by the optical axis of the quadrupole. Further, the diffraction plane (aperture plane) for the total system lies between both named combined lenses and fixes a point on the on the mid-axis, relative to which the combined lenses are arranged such that the above are anti-symmetric to each other and simultaneously fill the condition that the separation of the first and the second combined lenses from the diffraction plane (aperture plane) and the assembly and/or and the fields of functionally identical elements in the combined lenses is in a ratio which corresponds to the image scale, preferably reduction ratio. Furthermore, the shifts of the optical axes of the quadrupole lenses of both combined lenses occur in diametrically opposed directions such that the size of the shifts are in a ratio to each other which corresponds to the image scale, preferably reduction ratio.

Abstract translation: 公开了一种用于粒子束的狭缝透镜装置，特别是用于将掩模投影到工件上的包括由柱面透镜和四极透镜组成的组合透镜的光束，其光轴彼此平行地延伸， 由此四极透镜的光轴可以以平行的方式移位，并且在极靴之间或者在电极之间具有彼此具有相同的空间关系的间隙形开口。 因此，两个透镜相对于彼此布置，四极透镜的聚焦发生在其中气泡透镜未被聚焦的平面中，并且四极透镜的散焦发生在柱面透镜聚焦的平面中。 根据本发明，两个组合透镜设置有功能相同的元件，其布置成使得两个透镜的光轴彼此同轴，限定整个系统的中轴线，并且由此光束路径在整个系统中是可伸缩的 。 因此，图像的光轴由四极的光轴给出。 此外，用于整个系统的衍射平面（孔径平面）位于两个命名的组合透镜之间，并固定在中轴上的点，相对于此，组合的透镜被布置成使得上述物体彼此反对称 并且同时填充第一和第二组合透镜与衍射平面（孔平面）的分离以及组合透镜中的组合和/或功能相同元件的场与对应于图像的比率 规模，优选减速比。 此外，两个组合透镜的四极透镜的光轴的偏移沿径向相反的方向发生，使得偏移的尺寸彼此成比例，其对应于图像尺度，优选地减小比。

公开(公告)号：US20030203287A1

公开(公告)日：2003-10-30

申请号：US10419771

申请日：2003-04-22

Applicant: NEC Electronics Corporation

Inventor： Seiji Miyagawa

IPC: G03F001/00 ,  G03F007/20 ,  G21K001/08 ,  H01J003/14 ,  H01J003/26 ,  H01J049/42 ,  G06F017/50

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F1/36 ,  H01J37/3174 ,  H01J2237/31764 ,  H01J2237/31769 ,  Y10S430/143

Abstract: The preparation method of an exposure original plate according to the present invention includes a step of subdividing a pattern constituting an exposure original plate into a plurality of rectangular patterns, a step of extracting micro patterns having the size of a side smaller than a prescribed value from among the divided individual rectangular patterns, a step of forming a corrected micro pattern by increasing the size of the side of the extracted micro pattern perpendicular to the side making contact with an adjacent patter at least by the prescribed value, a step of forming a corrected adjacent pattern by retreating the side of the adjacent pattern making contact with the corrected micro pattern by the increased amount corresponding to the prescribed value, and a step of finding EB exposure data for the pattern including the corrected micro pattern and the corrected adjacent pattern, and carrying out EB exposure by the variable shaped beam exposure method based on the EB exposure data.

Abstract translation: 根据本发明的曝光原版的制备方法包括将构成曝光原版的图案细分为多个矩形图案的步骤，将具有小于规定值的一侧的尺寸的微图案从 在分割的单独的矩形图案中，通过增加垂直于与相邻图案进行接触的侧面的提取的微图案的一侧的尺寸至少达到规定值来形成校正的微图案的步骤;形成校正的微图案的步骤， 通过使相邻图案的与经修正的微图案接触的一侧的规定值相对应的增加量的相邻图案的背面进行退回，以及找到包括校正后的微图案和校正后的相邻图案的图案的EB曝光数据的步骤，以及 通过基于EB曝光的可变形束曝光方法进行EB曝光 e数据。

公开(公告)号：US20030173524A1

公开(公告)日：2003-09-18

申请号：US10357725

申请日：2003-02-03

Inventor： John E.P. Syka

IPC: G21K001/08 ,  H01J003/14 ,  H01J003/26 ,  H01J049/42

CPC classification number: H01J49/422 ,  H01J49/022 ,  H01J49/423

Abstract: A circuit is described for applying RF and AC voltages to the elements or electrodes of an ion trap or ion guide. The circuit includes an RF transformer having a primary winding and a secondary winding. The secondary winding includes at least two filars. A broadband transformer adapted to be connected to a source of AC voltage applies AC voltage across the low-voltage end of two of the filars. Another broadband transformer connected to the filars at the high-voltage end provides a combined RF and AC output for application to selected electrodes. Also described is a circuit employing a multi-filar RF transformer and broadband transformers for applying RF and AC voltages to spaced rods of a linear ion trap. Also described is a circuit employing a multi-filar RF transformer and broadband transformers for applying RF and AC voltages to the electrodes in each section of a linear ion trap of the type having a center section and end sections, and different DC voltages to the electrodes in the end sections.

Abstract translation: 描述了用于将RF和AC电压施加到离子阱或离子导向器的元件或电极的电路。 该电路包括具有初级绕组和次级绕组的RF变压器。 次级绕组包括至少两个丝。 适用于连接到交流电压源的宽带变压器在两条电线的低电压端施加交流电压。 连接到高压端的丝状体的另一个宽带变压器提供组合的RF和AC输出，用于选定的电极。 还描述了采用多线RF变压器和宽带变压器的电路，用于将RF和AC电压施加到线性离子阱的间隔的棒。 还描述了一种使用多线RF变压器和宽带变压器的电路，用于将RF和AC电压施加到具有中心部分和末端部分的类型的线性离子阱的每个部分中的电极以及与电极的不同DC电压 在最后部分。

公开(公告)号：US20020148971A1

公开(公告)日：2002-10-17

申请号：US09797955

申请日：2001-03-05

Inventor： Michael Sogard

IPC: H01J003/26

CPC classification number: H01J37/18 ,  H01J37/141 ,  H01J37/301

Abstract: A lens assembly for use with an electron beam optical system operating in a vacuum. The lens assembly includes a housing forming a sealed enclosure and at least one lens disposed within the housing. The housing includes a port for connection to a vacuum source for creating a vacuum in the sealed enclosure. A method of creating a vacuum within the lens assembly is also disclosed.

Abstract translation: 一种与在真空中操作的电子束光学系统一起使用的透镜组件。 透镜组件包括形成密封外壳的壳体和设置在壳体内的至少一个透镜。 壳体包括用于连接到真空源的端口，用于在密封外壳中产生真空。 还公开了在透镜组件内产生真空的方法。

公开(公告)号：US20020145118A1

公开(公告)日：2002-10-10

申请号：US09832765

申请日：2001-04-10

Applicant: Applied Materials, Inc.

Inventor： Henry Pearce-Percy

IPC: G01K001/08 ,  H01J003/14 ,  H01J003/26

CPC classification number: H01L31/1185 ,  H01J37/244 ,  H01J2237/2441 ,  H01J2237/24475 ,  H01J2237/3175

Abstract: A backscattered electron detector capable of detecting electrons backscattered from a substrate includes a p-n junction diode having a p-doped semiconductor in contact with an n-doped semiconductor and a surface to receive the backscattered electrons. The backscattered electron detector also has a diode voltage source adapted to electrically bias the diode relative to the substrate by a diode bias voltage of at least about 500 V to increase the number or energy level of the backscattered electrons received by the diode. A signal amplifier may be used to process an input signal from the diode and generate an output signal that is amplified and passed to a controller that uses the amplified signal to locate a fiducial mark on the substrate.

Abstract translation: 能够检测从衬底反向散射的电子的反向散射电子检测器包括具有与n掺杂半导体接触的p掺杂半导体和接收反向散射电子的表面的p-n结二极管。 反向散射电子检测器还具有二极管电压源，其适于通过至少约500V的二极管偏置电压使二极管相对于衬底电偏压以增加由二极管接收的反向散射电子的数量或能级。 信号放大器可用于处理来自二极管的输入信号，并产生放大并传给使用放大信号的控制器的输出信号，以在基板上定位基准标记。

公开(公告)号：US20020137358A1

公开(公告)日：2002-09-26

申请号：US09779944

申请日：2001-02-08

Inventor： Mike Binnard ,  Kazuya Ono ,  Bausan Yuan ,  Martin E. Lee

IPC: B32B017/00 ,  B32B018/00 ,  G01K001/08 ,  H01J003/26 ,  H01L021/469 ,  H01J003/14

CPC classification number: G03F7/70783 ,  G03F7/70725 ,  Y10T428/24926

Abstract: A device stage assembly (10) for positioning a device (26) is provided herein. The device stage assembly (10) includes a mover housing (44), a device stage (14), a support assembly (18), and a control system (22). The support assembly (18) moves the device stage (14) relative to the mover housing (44) under the control of the control system (22). Uniquely, the support assembly (18) includes at least four, spaced apart Z device stage movers (84), (86), (88), (90) that move the device stage (14) relative to the mover housing (44). Further, the control system (22) controls the Z device stage movers (84), (86), (88), (90) to inhibit dynamic and static deformation of the device stage (14) during movement of the device stage (14). Further, the four Z device stage movers (84), (86), (88), (90) distribute forces on the device stage (14) in a way that more closely matches the gravitational and inertial loads on the device stage (14).

Abstract translation: 本文提供了一种用于定位设备（26）的设备台组件（10）。 装置台组件（10）包括可动件壳体（44），装置台（14），支撑组件（18）和控制系统（22）。 支撑组件（18）在控制系统（22）的控制下相对于动子壳体（44）移动装置台（14）。 独特地，支撑组件（18）包括相对于移动器壳体（44）移动装置台（14）的至少四个间隔开的Z装置级移动器（84），（86），（88），（90） 。 此外，控制系统（22）控制Z装置级移动器（84），（86），（88），（90），以在装置级（14）移动期间抑制装置级（14）的动态和静态变形 ）。 此外，四个Z装置级移动器（84），（86），（88），（90）以与装置载物台（14）上的重力和惯性载荷更紧密匹配的方式在装置载物台（14） ）。

公开(公告)号：US20020097391A1

公开(公告)日：2002-07-25

申请号：US09767971

申请日：2001-01-23

Applicant: Sikorsky Aircraft Corporation

Inventor： Peter F. Perkins

IPC: G01K001/08 ,  H01J003/14 ,  H01J003/26 ,  G01C001/00 ,  G01B011/26

CPC classification number: G01B11/272 ,  F41G7/004 ,  G01S3/7803 ,  G01S3/781 ,  G01S3/786

Abstract: An alignment device mounts to a missile system such that the view of a missile seeker is limited to limited fields of view at predetermined positions relative to a known reference such as the missile centerline. Once the alignment device is mounted to the missile system, an energy source emitting energy viewable by the seeker is located within a field of view. Once the seeker has locked-on to the energy source in a limited field of view, the pointing angle of the seeker can be observed by a measurement device communicating with the missile controller. Any pointing angle observed by the measurement device which differs from the known position defined by the alignment device, represents a displacement error of the seeker. Appropriate compensation is then applied to the missile controller such that alignment errors are accounted for.

Abstract translation: 对准装置安装到导弹系统，使得导弹探测器的视野相对于诸如导弹中心线的已知参考限于预定位置的有限视场。 一旦对准装置安装到导弹系统，发射能量的能量源就可以被放置在视场内。 一旦探测器在有限的视场中锁定在能量源上，则可以通过与导弹控制器通信的测量设备来观察探测器的指向角度。 由测量装置观察到的与由对准装置限定的已知位置不同的任何指向角度表示探测器的位移误差。 然后将适当的补偿应用于导弹控制器，以便考虑对准误差。

公开(公告)号：US20020070345A1

公开(公告)日：2002-06-13

申请号：US10002144

申请日：2001-12-05

Applicant: Hitachi, Ltd.

Inventor： Masaki Mizuochi ,  Yoshimasa Fukushima ,  Mitsuru Inoue

IPC: G21K001/08 ,  H01J003/14 ,  H01J003/26 ,  H01J049/42

CPC classification number: H01J37/18 ,  H01J37/20

Abstract: An evacuation use sample chamber is constituted by a top table 21 which is provided with a recessed portion disposed in a sample chamber main body 10 and for mounting a sample 8 and a groove portion surrounding the recessed portion; a stage 20 which holds the top table 21 and is displaceable in front and back, right and left and up and down directions together with the top table 21; a sample chamber cover 11 which covers above the sample chamber main body 10 including the top table 21; and an evacuation use pipe 21C which communicates with the groove portion and evacuates gas between the bottom face of the sample chamber cover 11 and the top face of the top table 21 including the sample 8. Thereby, an evacuation use sample chamber which performs a stable evacuation and keeps around a sample at a predetermined high vacuum and a circuit pattern forming apparatus which permits a highly accurate pattern drawing over the entire region of the sample are provided.

Abstract translation: 排气用样品室由顶台21构成，顶台21设置有设置在样品室主体10中的凹部，并且用于安装样品8和围绕凹部的槽部; 保持顶台21并与顶台21一起在前后左右上下方向上移动的台架20; 样品室盖11，其覆盖包括顶台21的样品室主体10的上方; 以及与槽部连通并在样品室盖11的底面与包含样品8的顶台21的顶面之间排出气体的排气用管21C。由此，进行稳定的排气用样品室 抽出并保持预定的高真空下的样品，并且提供允许在样品的整个区域上进行高精度图案绘制的电路图案形成装置。

公开(公告)号：US20020033455A1

公开(公告)日：2002-03-21

申请号：US09780721

申请日：2001-02-08

Inventor： Harald Rose

IPC: G21K001/08 ,  H01J003/14 ,  H01J003/26 ,  H01J049/42

CPC classification number: H01J37/05 ,  H01J49/48

Abstract: The invention relates to an electron energy filter with magnetic deflection regions and a substantially W-shaped beam path. The energy filter has at least four magnetic deflection regions, that are respectively separated from each other by drift paths in the space free from magnetic fields. The whole filter is thus symmetrical with respect to a midplane (M). The total deflection angle in the first and last deflection region is at least 135null, and all the deflection regions together effect a deflection of the optical axis through an angle between 90null and 210null, preferably through 180null. The energy filter has a large Helmholtz length that is greater than double the average value of the deflection radii in the deflection regions.

Abstract translation: 本发明涉及一种具有磁偏转区域和基本上W形的光束路径的电子能量过滤器。 能量过滤器具有至少四个磁偏转区域，它们分别通过在没有磁场的空间中的漂移路径相互分离。 因此，整个过滤器相对于中平面（M）是对称的。 第一和最后偏转区域中的总偏转角至少为135°，并且所有偏转区域一起影响光轴在90°和210°之间的角度，优选地为180°。 能量滤波器具有大的亥姆霍兹长度，其大于偏转区域中的偏转半径的平均值的两倍。