公开(公告)号：US20020020817A1

公开(公告)日：2002-02-21

申请号：US09767615

申请日：2001-01-22

Inventor： W. Bruce Feller ,  James A. Hill ,  Paul L. White ,  James M. Abraham

IPC: G01K001/08 ,  H01J003/14 ,  H01J003/26

CPC classification number: H01J49/025 ,  H01J2237/24435

Abstract: Detection systems for mass spectrometry involving a combination of novel detector face coatings, repeller grid position and voltage, and in some embodiments employing tandem detectors, an interplate voltage. The mass spectra show improved sensitivities to high mass ions.

Abstract translation: 用于质谱的检测系统涉及新型检测器面涂层，排斥器栅格位置和电压的组合，并且在一些实施例中采用串联检测器，板间电压。 质谱显示出对高质量离子的改善的敏感性。

公开(公告)号：US20010010362A1

公开(公告)日：2001-08-02

申请号：US09765530

申请日：2001-01-19

Applicant: Nikon Corporation

Inventor： Hiroyasu Simizu

IPC: G21K001/08 ,  H01J003/14 ,  H01J003/26 ,  H01J049/42

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G21K1/08 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/30472 ,  H01J2237/31757

Abstract: Methods and devices are disclosed for aligning a beam-propagation axis with the center of an aperture, especially an aperture configured to limit the aperture angle of the charged particle beam. In an exemplary method, an alignment-measurement aperture is provided at an imaging plane of a charged-particle-beam (CPB) optical system, and a beam detector is downstream of the alignment-measurement aperture. A scanning deflector is energized to cause the beam to be scanned in two dimensions, transverse to an optical axis, over the aperture. Meanwhile, the beam detector obtains an image of beam intensity in the two dimensions. In the image a maximum-intensity point is identified, corresponding to the propagation axis. Based on the two-dimensional image, the beam is deflected as required to align the propagation axis with the aperture center.

Abstract translation: 公开了用于将光束传播轴与孔的中心对准的方法和装置，特别是被配置为限制带电粒子束的孔径角的孔。 在示例性方法中，在带电粒子束（CPB）光学系统的成像平面处提供对准测量孔，并且光束检测器位于对准测量孔径的下游。 扫描偏转器被通电以使光束在光轴上横向于光轴的二维扫描。 同时，光束检测器获得二维光束强度的图像。 在图像中，识别出与传播轴对应的最大强度点。 基于二维图像，根据需要将光束偏转以将传播轴与孔径中心对准。

公开(公告)号：US20030215722A1

公开(公告)日：2003-11-20

申请号：US10326112

申请日：2002-12-23

Inventor： Shingo Kanamitsu ,  Takashi Hirano ,  Fumiaki Shigemitsu ,  Motosuke Miyoshi ,  Kazuyoshi Sugihara ,  Yuichiro Yamazaki ,  Makoto Sekine ,  Takayuki Sakai ,  Ichiro Mori ,  Katsuya Okumura

IPC: G03F001/00 ,  G03F007/207 ,  C25F003/00 ,  G03C005/00 ,  G21K007/00 ,  G01N023/00 ,  C23F001/00 ,  H01L021/306 ,  G21K001/08 ,  H01J003/14 ,  H01J003/26 ,  H01J049/42

CPC classification number: G03F1/74 ,  G03F1/84 ,  H01J37/3056 ,  H01J2237/30438 ,  H01J2237/31744

Abstract: A photomask repair method including scanning an electron beam across a main surface of the photomask, thereby producing a pattern image of the photomask, identifying the position of a defective portion from the pattern image thus produced, and applying an electron beam to a region to be etched including a defective portion under an atmosphere of a gas capable of performing a chemical etching of a film material forming the photomask pattern, thereby removing a defect. In this method, the electron beam to be applied to the region to be etched is a shaped beam. The electron beam is set such that the side of the electron beam is applied in parallel to a borderline between a non-defective pattern and the defect.

Abstract translation: 一种光掩模修复方法，包括在光掩模的主表面上扫描电子束，从而产生光掩模的图案图像，从这样产生的图案图像中识别缺陷部分的位置，并将电子束施加到 在能够对形成光掩模图案的薄膜材料进行化学蚀刻的气体气氛下蚀刻包括缺陷部分，从而消除缺陷。 在该方法中，要施加到待蚀刻区域的电子束是成形光束。 电子束的设置使得电子束的侧面平行于无缺陷图案与缺陷之间的边界线被施加。

公开(公告)号：US20020008207A1

公开(公告)日：2002-01-24

申请号：US09733980

申请日：2000-12-12

Inventor： Masato Muraki ,  Yoshikiyo Yui

IPC: G01K001/08 ,  H01J003/14 ,  H01J003/26

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3023 ,  H01J37/3174 ,  H01J2237/30461

Abstract: A charged-particle beam exposure apparatus for exposing a member to be exposed to a charged particle beam with a pattern includes memories (902-905) for storing a plurality of control data for controlling reference dose data of the charged particle beam in accordance with the incident position of the charged particle beam on the member to be exposed, a selector (907) for selecting any one of the plurality of control data stored in the memories, and an exposure unit for controlling the reference dose data of the charged particle beam for each irradiation position on the basis of the control data selected by the selector, thereby exposing the member to be exposed with the pattern. The charged-particle beam exposure apparatus rapidly performs proper proximity effect correction to expose the member to be exposed with the pattern.

Abstract translation: 用于使被暴露于带电粒子束的构件暴露于图案的带电粒子束曝光装置包括用于存储多个用于控制带电粒子束的参考剂量数据的控制数据的存储器（902-905） 带电粒子束在要曝光的构件上的入射位置，用于选择存储在存储器中的多个控制数据中的任何一个的选择器（907），以及用于控制带电粒子束的参考剂量数据的曝光单元 基于由选择器选择的控制数据的每个照射位置，从而使该图案曝光的构件露出。 带电粒子束曝光装置快速进行适当的邻近效应校正，以暴露出具有图案的待暴露部件。

公开(公告)号：US20010028037A1

公开(公告)日：2001-10-11

申请号：US09766129

申请日：2001-01-19

Inventor： Shohei Suzuki

IPC: G21K001/08 ,  H01J003/14 ,  H01J003/26 ,  H01J049/42

CPC classification number: H01J37/1471 ,  B82Y10/00 ,  B82Y40/00 ,  G21K1/02 ,  H01J37/09 ,  H01J37/3174 ,  H01J2237/3175

Abstract: Hollow-beam apertures and methods for using same are disclosed, especially for achieving alignment of the beam center with the center of the hollow-beam aperture. The hollow-beam apertures define beam-transmissive portions (e.g., through-holes) that form a hollow beam propagating downstream of the hollow-beam aperture. Also included is a relatively thick region that causes absorption of at least a portion of the incident beam and may also cause localized scattering of the beam. Absorption of charged particles generates an electrical current that can be measured. From such current measurements accompanying controlled displacement of the incident beam, a measurement of the lateral beam-intensity distribution can be obtained. I.e., the current typically is maximal whenever the beam center is aligned with the center of the hollow-beam aperture. Lateral beam adjustment can be achieved using an aligner (deflector assembly).

Abstract translation: 公开了空心光束孔及其使用方法，特别是用于实现光束中心与中空光束孔的中心的对准。 中空光束孔限定了透射部分（例如，通孔），其形成在中空光束孔径的下游传播的中空光束。 还包括引起至少一部分入射光束的吸收的相对较厚的区域，并且还可能引起光束的局部散射。 带电粒子的吸收产生可以测量的电流。 根据伴随入射光束受控位移的这种电流测量，可以获得横向光束强度分布的测量。 即，当光束中心与中空光束孔径的中心对准时，电流通常是最大的。 可以使用对准器（偏转器组件）实现横梁调节。

公开(公告)号：US20010025932A1

公开(公告)日：2001-10-04

申请号：US09820257

申请日：2001-03-28

Applicant: Nikon Corporation

Inventor： Mamoru Nakasuji

IPC: G01K001/08 ,  H01J003/14 ,  H01J003/26 ,  G21K005/10 ,  H01J037/08

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/0458 ,  H01J2237/202

Abstract: Charged-particle-beam (CPB) microlithography apparatus are disclosed that do not require installation in a magnetically shielded room, and that exhibit improved attenuation of the incursion of magnetic fields, originating in linear motors used to drive motions of the reticle and substrate stages, to the charged particle beam. The illumination-optical and projection-optical systems are enclosed in respective columns made of a thick ferromagnetic material. The reticle and substrate chambers are similarly constructed. Consequently, there is very low incursion of external magnetic fields to the beam in the columns. The reticle and substrate chambers include partition shields, each having a multi-layer construction with alternating layers of ferromagnetic material sandwiched with layers of non-magnetic material, attached via non-magnetic material to the respective chambers. The partition shields prevent magnetic fields from the respective linear motors from reaching the beam inside the columns.

Abstract translation: 公开了带电粒子束（CPB）微光刻设备，其不需要安装在磁屏蔽室中，并且显示出来源于用于驱动标线片和衬底台的运动的线性电动机的磁场侵入的改善的衰减， 到带电粒子束。 照明光学和投影光学系统被包围在由厚铁磁材料制成的各个列中。 类似地构造掩模版和衬底室。 因此，外部磁场对列中的梁的侵入非常低。 标线板和衬底室包括分隔屏蔽，每个隔板具有多层结构，其中夹有非磁性材料层的铁磁材料的交替层，通过非磁性材料附着到各个室。 隔板防止各线性电机的磁场到达列内的梁。

公开(公告)号：US20040232349A1

公开(公告)日：2004-11-25

申请号：US10797364

申请日：2004-03-10

Inventor： Pieter Kruit

IPC: H01J003/26 ,  H01J003/14

CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.

Abstract translation: 本发明涉及一种用于产生多个带电粒子束的装置，包括用于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置和包括多个透镜的透镜阵列，其中所述 透镜阵列位于所述带电粒子源和所述会聚装置之间。 以这种方式，可以减小会聚装置的像差。

公开(公告)号：US20030219572A1

公开(公告)日：2003-11-27

申请号：US10391956

申请日：2003-03-19

Inventor： Pieter Kruit

IPC: B32B003/10 ,  G03F007/20 ,  G21K001/08 ,  H01J003/14 ,  H01J003/26 ,  H01J049/42 ,  G21G005/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F7/70375 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/31774 ,  H01J2237/31777 ,  H01J2237/31779 ,  Y10S438/942 ,  Y10S438/949 ,  Y10T428/24802

Abstract: The invention pertains to a direct write lithography system comprising: A converter comprising an array of light controllable electron sources, each field emitter being arranged for converting light into an electron beam, the field emitters having an element distance between each two adjacent field emitters, each field emitter having an activation area; A plurality of individually controllable light sources, each light source arranged for activating one field emitter; Controller means for controlling each light source individually; Focussing means for focussing each electron beam from the field emitters With a diameter smaller than the diameter of a light source on an object plane.

Abstract translation: 本发明涉及一种直写式光刻系统，包括：A转换器，包括一组光可控电子源，每个场发射器布置成将光转换成电子束，场发射器在每两个相邻的场发射器之间具有元件距离，每个 场发射器具有激活区域; 多个可单独控制的光源，每个光源被布置用于激活一个场发射器; 用于单独控制每个光源的控制器装置; 用于聚焦来自场发射器的每个电子束的聚焦装置，其直径小于物平面上光源的直径。

公开(公告)号：US20020109099A1

公开(公告)日：2002-08-15

申请号：US09949072

申请日：2001-09-07

Applicant: Diamond Semiconductor Group, LLC

Inventor： Nicholas White ,  Edward Bell ,  Philip Harvey

IPC: G21K001/08 ,  H01J003/14 ,  H01J003/26 ,  H01J049/42

CPC classification number: H01J37/1475 ,  H01J37/147 ,  H01J2237/31701

Abstract: An apparatus is provided for one-dimensional magnetic scanning or switching of a charged particle beam. The apparatus can be extended to two dimensions at the cost of added complexity.

Abstract translation: 提供了用于一维磁扫描或带电粒子束切换的装置。 该装置可以以增加的复杂性为代价扩展到两个维度。

公开(公告)号：US20020104970A1

公开(公告)日：2002-08-08

申请号：US09851398

申请日：2001-05-08

Inventor： Stacey J. Winter ,  Stephen A. Rishton ,  Jeffrey K. Varner ,  Allan L. Sagle ,  Lee H. Veneklasen ,  Weidong Wang ,  Mary Veneklasen

IPC: G01K001/08 ,  H01J003/14 ,  H01J003/26

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/30488 ,  H01J2237/31776

Abstract: An apparatus includes: a rasterizer which rasterizes a surface of the substrate into pixels and outputs gray level values, where the gray level values specify a proportion of a pixel that overlaps with the pattern; a buffer coupled to receive and store the gray level values from the rasterizer; a flash converter coupled to receive the gray level values from the buffer, where the flash converter outputs shape data that define a flash field; a dose value circuitry coupled to the rasterizer, where the dose value circuitry computes dose values associated with the shape data; a converter coupled to receive the shape data from the flash converter and associated dose values from the dose value circuitry, where the converter outputs signals that specify a shape of the flash field, duration of the flash field, and a position of the flash field on the substrate; and a charged particle beam column coupled to receive the signals from the converter, and which generates the flash field as specified by the signals from the converter.

Abstract translation: 一种装置包括：光栅化器，其将衬底的表面光栅化成像素并输出灰度值，其中灰度值指定与图案重叠的像素的比例; 耦合以接收和存储来自光栅化器的灰度值的缓冲器; 闪存转换器，其被耦合以从缓冲器接收灰度级值，其中闪存转换器输出定义闪存场的形状数据; 耦合到所述光栅化器的剂量值电路，其中所述剂量值电路计算与所述形状数据相关联的剂量值; 耦合以从闪光转换器接收形状数据的转换器和来自剂量值电路的相关联的剂量值，其中转换器输出指定闪光场的形状，闪光场的持续时间和闪光场的位置的信号 基材; 和带电粒子束列，其被耦合以接收来自转换器的信号，并产生由来自转换器的信号指定的闪光场。