公开(公告)号：US06573514B2

公开(公告)日：2003-06-03

申请号：US09864244

申请日：2001-05-25

Applicant: Michael S. Gordon ,  Jon E. Lieberman ,  Christopher F. Robinson

Inventor： Michael S. Gordon ,  Jon E. Lieberman ,  Christopher F. Robinson

IPC: H01J3700

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3045 ,  H01J37/3174

Abstract: A method of aligning elements of an electron beam beam tool such as an electron beam projection lithography tool utilizes a detector such as a pinhole and scintillator over which an image is rastered to provide a real-time display of a projected image at a target plane. A shaping aperture is projected and the detector centered thereon. A reticle sub-field image is then centered on and aligned with the image of the shaping aperture and the compound image thus formed is rotated using deflectors. The compound image is then aligned with movement of a translation device at the target plane using lenses and compound image orientation is corrected by electrical or mechanical rotation of the deflectors. Sub-field size can then be adjusted and any observed further rotation of the compound image may be corrected by reiteration of rotation adjustment with lenses and deflectors, in sequence.

公开(公告)号：US06566661B1

公开(公告)日：2003-05-20

申请号：US09685773

申请日：2000-10-11

Applicant: Robert John Clifford Mitchell

Inventor： Robert John Clifford Mitchell

IPC: H01J3700

CPC classification number: H01J37/3171 ,  H01J37/304

Abstract: A beam/wafer alignment arrangement has a laser and sensor mounted on the scanning magnet. Direct alignment of the wafer relative to the scanning magnet is determined by reflecting the beam in a specular surface on the wafer holder back to the sensor. Correct alignment of the wafer translation direction is also confirmed from any movement of the reflected light spot on the sensor as the wafer holder is translated up and down. A further sensor is mounted on the beam stop to monitor any misalignment of the process chamber to the collimator magnet, and for checking the location of the travelling Faraday.

Abstract translation: 光束/晶片对准装置具有安装在扫描磁体上的激光和传感器。 通过将晶片保持器上的镜面中的光束反射回传感器来确定晶片相对于扫描磁体的直接对准。 当晶片保持器上下翻转时，也可以从传感器上的反射光点的任何移动来确认晶片平移方向的正确对准。 另外的传感器安装在光束停止器上，以监测处理室与准直仪磁体的任何未对准，并用于检查行进法拉第的位置。

公开(公告)号：US06531697B1

公开(公告)日：2003-03-11

申请号：US09259334

申请日：1999-03-01

Applicant: Kuniyasu Nakamura ,  Hiroshi Kakibayashi ,  Mikio Ichihashi ,  Shigeto Isakozawa ,  Yuji Sato ,  Takahito Hashimoto

Inventor： Kuniyasu Nakamura ,  Hiroshi Kakibayashi ,  Mikio Ichihashi ,  Shigeto Isakozawa ,  Yuji Sato ,  Takahito Hashimoto

IPC: H01J3700

CPC classification number: H01J37/1471 ,  H01J37/28 ,  H01J2237/2802

Abstract: A scanning transmission electron microscope (STEM) has an electron source for generating a primary electron beam and an electron illuminating lens system for converging the primary electron beam from the electron source onto a specimen for illumination. An electron deflecting system is provided for scanning the specimen with the primary electron beam. The STEM also has a scattered electron detector for detecting scattered electrons transmitted through the specimen. A projection lens system projects the scattered electrons onto a detection surface of the scattered electron detector. An image displaying device displays the scanning transmission electron microscope image of the specimen using a detection signal from the scattered electron detector. A detection angle changing device for establishes the range of the scattering angle of the scattered electrons detected by the scattered electron detector. This structure enhances the contrast of a desired portion of the specimen under observation for a scanning transmitted image by selective establishment of detection angle ranges for the scattered electron detector.

Abstract translation: 扫描透射电子显微镜（STEM）具有用于产生一次电子束的电子源和用于将来自电子源的一次电子束聚焦到用于照明的样本上的电子照明透镜系统。 提供电子偏转系统用于用一次电子束扫描样本。 STEM还具有散射电子检测器，用于检测通过样品传播的散射电子。 投影透镜系统将散射的电子投射到散射电子检测器的检测表面上。 图像显示装置使用来自散射电子检测器的检测信号来显示样本的扫描透射电子显微镜图像。 一种用于确定由散射电子检测器检测的散射电子的散射角的范围的检测角度改变装置。 该结构通过选择性地建立散射电子检测器的检测角度范围，增强了扫描透射图像观察下的样本的期望部分的对比度。

公开(公告)号：US06426499B1

公开(公告)日：2002-07-30

申请号：US09402256

申请日：1999-09-30

Applicant: Hans Wilfried Peter Koops

Inventor： Hans Wilfried Peter Koops

IPC: H01J3700

CPC classification number: G01Q30/02 ,  B33Y80/00 ,  G01Q60/02 ,  G01Q60/16 ,  G01Q60/22 ,  G01Q60/38 ,  G01Q60/48 ,  G01Q60/54 ,  G01Q70/10 ,  G01R1/06711 ,  Y10S977/849 ,  Y10S977/86 ,  Y10S977/866 ,  Y10S977/869 ,  Y10S977/874 ,  Y10S977/901

Abstract: In a test head for a scanning probe microscope for the contactless testing of integrated electronic circuits, a group of probes produced by three-dimensional additive lithography is disposed on a substrate. The probes are directed at a point situated centrally above the group of probes. The conducting probes as well as the base end of the capacitive probe are joined to printed circuit trace structures on the substrate for connection to a test circuit.

Abstract translation: 在用于集成电子电路的非接触测试的扫描探针显微镜的测试头中，通过三维附加光刻产生的一组探针设置在基底上。 探针指向位于探针组上方中心的点。 导电探针以及电容式探针的基端连接到衬底上的印刷电路迹线结构，用于连接到测试电路。

公开(公告)号：US06414308B1

公开(公告)日：2002-07-02

申请号：US09268170

申请日：1999-03-12

Applicant: Reginald R. Bowley, Jr.

Inventor： Reginald R. Bowley, Jr.

IPC: H01J3700

CPC classification number: H01J37/222 ,  H01J2237/2817

Abstract: A method for inspecting a plurality of similar structures in the surface of a workpiece includes providing a workpiece having a plurality of regions, each of the regions including at least two different materials, generating an image from each of the regions such that an image contrast between the two materials is enhanced and classifying the images into at least two classes including an acceptable class of images and unacceptable class of images.

Abstract translation: 用于检查工件表面中的多个类似结构的方法包括提供具有多个区域的工件，每个区域包括至少两种不同的材料，从每个区域生成图像，使得图像对比度 这两种材料被增强，并且将图像分类成至少两个类别，包括可接受的图像类别和不可接受的图像类别。

公开(公告)号：US06288392B1

公开(公告)日：2001-09-11

申请号：US09233293

申请日：1999-01-19

Applicant: Nicholas L. Abbott ,  Justin J. Skaife

Inventor： Nicholas L. Abbott ,  Justin J. Skaife

IPC: H01J3700

CPC classification number: C23C14/225 ,  C23C14/048 ,  Y10S977/852

Abstract: Scanning probe microscopy is used to quantitatively characterize structural anisotropy within obliquely deposited metal films. Whereas visual inspection of AFM images (real space or reciprocal space) reveals no obvious structural anisotropy within these gold films, by quantitative analysis of the AFM profiles, subtle structural anisotropy is observed. The quantitative characterization provides a method to estimate the influence of anisotropy on the orientations of supported mesogenic layers.

Abstract translation: 扫描探针显微镜用于定量表征倾斜沉积金属膜内的结构各向异性。 而AFM图像（实际空间或相互作用空间）的目视检查显示，在这些金膜中没有明显的结构各向异性，通过AFM谱的定量分析，观察到微小的结构各向异性。 定量表征提供了一种评估各向异性对支撑介晶层取向影响的方法。

公开(公告)号：US06201251B1

公开(公告)日：2001-03-13

申请号：US09143065

申请日：1998-08-28

Applicant: Steven Douglas Golladay ,  William Albert Enichen

Inventor： Steven Douglas Golladay ,  William Albert Enichen

IPC: H01J3700

CPC classification number: H01J37/04 ,  H01J2237/04922

Abstract: Variable space charge effects in the imaging portion of a particle beam projection system due to variations in transmitted beam current are compensated with an additional lens appropriately positioned within the imaging system and having a focal length which varies in response to the transmitted beam current.

Abstract translation: 由于透射光束电流的变化，在粒子束投影系统的成像部分中的可变空间电荷效应被适当地定位在成像系统内并具有响应于透射束电流而变化的焦距的附加透镜进行补偿。

公开(公告)号：US06815681B2

公开(公告)日：2004-11-09

申请号：US10465600

申请日：2003-06-20

Applicant: Dong-wook Kim ,  In-kyeong Yoo ,  Chang-wook Moon ,  In-sook Kim

Inventor： Dong-wook Kim ,  In-kyeong Yoo ,  Chang-wook Moon ,  In-sook Kim

IPC: H01J3700

CPC classification number: H01J37/3175 ,  H01J2237/31781

Abstract: An electron beam lithography apparatus, which uses a patterned emitter, includes a pyroelectric plate emitter that emits electrons using a patterned metal thin layer formed on the pyroelectric plate as a mask. When the emitter is heated, electrons are emitted from portions of the emitter covered with a patterned dielectric layer, and not from portions of the emitter covered with a patterned metal thin layer, and a pattern of the emitter is thereby projected onto a substrate. To prevent dispersion of emitted electron beams, the electron beams may be controlled by a permanent magnet, an electro-magnet, or a deflector unit. A one-to-one or x-to-one projection of a desired pattern on the substrate is thereby obtained.

Abstract translation: 使用图案化发射器的电子束光刻设备包括使用形成在热电板上的图案化金属薄层作为掩模发射电子的热电板发射器。 当发射极被加热时，电子从被图案化电介质层覆盖的发射体的部分发射，而不是由图案化的金属薄层覆盖的发射体的部分发射，并且因此将发射极的图案投影到衬底上。 为了防止发射的电子束的分散，电子束可以由永磁体，电磁体或偏转器单元来控制。 从而获得在衬底上所需图案的一对一或一对一投影。

公开(公告)号：US06803584B2

公开(公告)日：2004-10-12

申请号：US10366746

申请日：2003-02-14

Applicant: Shiaki Murai ,  Kazuaki Yamamoto

Inventor： Shiaki Murai ,  Kazuaki Yamamoto

IPC: H01J3700

CPC classification number: H01J37/265 ,  H01J2237/0203 ,  H01J2237/248

Abstract: An electron beam control device controls an electron beam for use, such as an electron beam exposure device and the like, wherein a track of an electron beam is not adversely Influenced by the amount of magnetic variation occurring influences. The electron beam control device which controls an electron beam for use, such as an electron microscope, an electron beam exposure and the like, wherein a magnetometric sensor for measuring an amount of magnetic variation which influences a track of the electron beam, occurring from surrounding influences, is provided.

Abstract translation: 电子束控制装置控制使用的电子束，例如电子束曝光装置等，其中电子束的轨迹不受不利影响的磁性变化的影响。 控制电子束如电子显微镜，电子束曝光等的电子束控制装置，其中，用于测量影响电子束的轨迹的磁性变化量的磁力计传感器， 影响，提供。

公开(公告)号：US06765219B2

公开(公告)日：2004-07-20

申请号：US09990848

申请日：2001-11-21

Applicant: Donald W. Berrian ,  John D. Pollock ,  John W. Vanderpot

Inventor： Donald W. Berrian ,  John D. Pollock ,  John W. Vanderpot

IPC: H01J3700

CPC classification number: H01J37/3171 ,  H01J2237/20207 ,  H01J2237/20228 ,  H01J2237/304

Abstract: An ion implantation system contains, in the ion implantation chamber, a workpiece holder that scans vertically while tilting a wafer at an angle of rotation that is rotated out of a perpendicular orientation with respect to the axis of projection in an ion beam. The implant angle into an implant surface on wafer that is retained by the workpiece holder is adjusted by selective rotation of the workpiece holder about its path of motion. A Faraday cup scans the ion beam along the intended location of the implant surface to form a setup measurement plane. The ion beam quality is adjusted to enhance beam uniformity along the setup plane according to these tilt-angle measurements. A charge neutralizing device, such as a flood gun, is moved in operational alignment with the workpiece.

Abstract translation: 离子注入系统在离子注入室中包含垂直扫描的工件保持器，同时以相对于离子束中的突出轴线的垂直取向旋转的旋转角度倾斜晶片。 通过工件保持器围绕其运动路径的选择性旋转来调节进入工件保持器所保持的晶片上植入物表面的植入角度。 法拉第杯沿着植入物表面的预期位置扫描离子束以形成设置测量平面。 根据这些倾斜角测量，调整离子束质量以提高沿着设置平面的光束均匀性。 电荷中和装置，例如喷枪，与工件运动对准地移动。