Through-the-lens neutralization for charged particle beam system
    21.
    发明授权
    Through-the-lens neutralization for charged particle beam system 有权
    用于带电粒子束系统的透镜中和

    公开(公告)号:US06683320B2

    公开(公告)日:2004-01-27

    申请号:US09859295

    申请日:2001-05-16

    Abstract: An electron source provides electrons that are directed through the final lens of an ion optical column to neutralize at least a portion of the accumulated charge on a sample. The invention can optionally be combined with collection of secondary electrons through the final ion lens. A deflector directs the neutralizing electrons onto the ion beam optical axis and deflects the secondary electrons away from the optical axis for detection. For imaging, a high-pass energy filter separates secondary electrons generated from the neutralizing electron beam from secondary electrons generated by the ion beam.

    Abstract translation: 电子源提供被引导通过离子光学柱的最终透镜的电子,以中和样品上的累积电荷的至少一部分。 本发明可以任选地与通过最终离子透镜收集二次电子组合。 偏转器将中和电子引导到离子束光轴上,并将二次电子偏离光轴以进行检测。 对于成像,高通能量滤波器将由中和电子束产生的二次电子与离子束产生的二次电子分开。

    Apparatus using charged particle beam
    23.
    发明授权
    Apparatus using charged particle beam 有权
    使用带电粒子束的装置

    公开(公告)号:US06667483B2

    公开(公告)日:2003-12-23

    申请号:US09842789

    申请日:2001-04-27

    Abstract: An apparatus using charged particle beam is provided with means for detecting positional difference between a target position on a chip pattern within an observation visual field of a microscope after displacing a sample stage thereof and a predetermined position within the visual field, means for storing the detection result and means for determining a new displacement target position for displacement to the predetermined position in subsequent observation while taking into account of the positional difference stored previously and the displacement target position used at the time of storage. When observing another wafer on which the same patterns with the same alignment as the previous one are printed or another pattern on the same wafer, the previous sample stage displacement target designation position is also modified while taking into account of the previous observation visual field position deviation which is registered to the corresponding observation position, and the stage is displaced according to the designation position. Thereby, quick and correct displacement of the observation position within an observation visual field can be realized.

    Abstract translation: 使用带电粒子束的装置设置有用于检测显微镜的观察视野内的切片图案上的目标位置与移动其取样台之后的位置差异的装置和视野内的预定位置之间的位置差异的装置, 结果和装置,用于在考虑到先前存储的位置差异和在存储时使用的位移目标位置的同时,确定用于随后观察中位移到预定位置的新位移目标位置。 当观察其上印刷与之前相同的相同图案的另一个晶片或在同一晶片上的另一图案时,先前的样品台位移目标指定位置也被修改,同时考虑到先前的观察视野位置偏差 其被登记到相应的观察位置,并且台根据指定位置而移位。 因此,可以实现观察视野内的观察位置的快速且正确的位移。

    Scanning electron microscope
    24.
    发明授权

    公开(公告)号:US06642520B2

    公开(公告)日:2003-11-04

    申请号:US10209718

    申请日:2002-08-01

    CPC classification number: H01J37/244 H01J37/28

    Abstract: A scanning electron microscope comprises: an electron beam source, an electron beam acceleration device for accelerating primary electrons generated by the electron beam source, a deflector 5 for scanning and deflecting the accelerated primary electrons, a magnetic-electrostatic compound objective lens 2, 3 for focusing the scanned and deflected primary electrons onto a specimen 4 mounted on a specimen support, a reflection electron detector 10 for detecting reflection electrons generated from the specimen due to focusing and irradiating the primary electrons onto the specimen 4, a secondary electron detector 20 for detecting secondary electrons generated from the specimen due to focusing and irradiating the primary electrons onto the specimen 4, and an image display device for displaying a specimen image from detection signals from each detector 10, 20. Moreover, there is provided an aperture 17 around an axis for passing an electron beam and secondary electrons around the axis through the reflection electron detector 10. This gives a: scanning electron microscope device which can separate and detect on an electron beam axis, reflection electrons and secondary electrons from a specimen, with a device of a simple construction.

    Combined electron microscope
    25.
    发明授权

    公开(公告)号:US06573502B2

    公开(公告)日:2003-06-03

    申请号:US10095305

    申请日:2002-03-11

    Applicant: Yukihito Kondo

    Inventor: Yukihito Kondo

    CPC classification number: H01J37/28 H01J2237/2802

    Abstract: A combined electron microscope capable of making SEM/STEM images and TEM image correspond to each other precisely. Angles of rotation of SEM/STEM images for matching TEM images to the angles of rotation of the SEM/STEM images, magnifications in TEM, and current values to be supplied into the imaging lenses are stored in a first memory. The magnifications of TEM images and angles of rotation for matching SEM/STEM images to the angles of rotation of TEM images are stored in the second memory. The image or images corrected by the computer are displayed on the display device.

    Coordinate transforming method in position setting means of observation device and observation device equipped with coordinate transforming means
    26.
    发明授权
    Coordinate transforming method in position setting means of observation device and observation device equipped with coordinate transforming means 失效
    具有坐标变换装置的观察装置和观察装置的位置设定装置的坐标变换方法

    公开(公告)号:US06489625B1

    公开(公告)日:2002-12-03

    申请号:US09700721

    申请日:2000-11-28

    CPC classification number: G01B9/04 G01B11/002 G02B21/26

    Abstract: The present invention allows a rapid and easy transformation of coordinates for position designation between first and second observation apparatus having means for designating positions in a sample. The present invention includes the steps of setting at least three observation points in random positions in the sample, setting the sample marked for determining the relative positions of the sample and a sample base on the first and second observation apparatus so as to read the coordinates of the above-mentioned observation points, and determining coordinate transformation formulas by calculating a, b, c, and d of below-described formulas (1) by letting one of the above-mentioned three observation points serve as temporary origins, correcting the coordinates of the other two based on the above-mentioned temporary origins, and substituting the corrected coordinates into the formulas (1). Xn=aXn+bYn, yn=cXn+dYn  (1)

    Abstract translation: 本发明允许在具有用于指定样品中的位置的装置的第一和第二观察装置之间快速且容易地转换用于位置指定的坐标。 本发明包括以下步骤:在样本中设置随机位置中的至少三个观察点,设置标记的样本,以确定第一和第二观察装置上的样本和样本基的相对位置,以便读取坐标 上述观测点,并且通过使上述三个观测点中的一个作为临时起点,通过计算下述公式(1)的a,b,c和d来确定坐标变换公式,校正坐标变换公式 基于上述临时起点的另外两个,并将校正的坐标代入公式(1)。

    Sample distortion removing method in thin piece forming
    27.
    发明授权
    Sample distortion removing method in thin piece forming 失效
    薄片成型中的样品失真去除方法

    公开(公告)号:US06417512B1

    公开(公告)日:2002-07-09

    申请号:US09356014

    申请日:1999-07-16

    Inventor: Hidekazu Suzuki

    CPC classification number: G01N1/32 H01J2237/3174 H01J2237/31745

    Abstract: A method of removing warp distortions of a thin-piece sample for use in an electron microscope during the formation of the sample. The sample is cut to form a fissure in a stress concentration portion of the sample using an ion beam until the warp distortions disappear. The stress concentration often occurs at a device region having material anisotropy in the sample, and the distortion is removed by forming a fissure in a depth direction of the sample.

    Abstract translation: 在形成样品期间去除用于电子显微镜的薄片样品的翘曲变形的方法。 切割样品以在样品的应力集中部分中使用离子束形成裂缝,直到翘曲变形消失。 应力集中通常发生在样品中具有材料各向异性的器件区域,并且通过在样品的深度方向形成裂缝来去除变形。

    Using a crystallographic etched silicon sample to measure and control the electron beam width of a SEM
    28.
    发明授权
    Using a crystallographic etched silicon sample to measure and control the electron beam width of a SEM 失效
    使用晶体蚀刻硅样品来测量和控制SEM的电子束宽度

    公开(公告)号:US06396059B1

    公开(公告)日:2002-05-28

    申请号:US09612807

    申请日:2000-07-10

    CPC classification number: H01J37/263

    Abstract: A system and method is provided for measuring and determining the resolution of a SEM imaging system employing a crystallographic etched sample with a re-entrant cross-sectional profile. A re-entrant or negative profile is employed because the top-down view seen by the SEM is very sharp due to the fact the edge of the profile has zero width. Therefore, any apparent width seen in the signal is a function of the electron beam width alone. Scanning the beam across the profile provides a signal that moves from a first state to a second state. The time period or sloping portion of the signal from the first state to the second state provides a direct correlation to the electron beam width. Thus, scanning across the sample allows for a calculation of the electron beam width. By scanning across features of different orientations, the shape of the electron beam can be determined. Alternatively, by rotating the electron beam and scanning across the same feature, the shape of the electron beam can be determined. A system can utilize this information to adjust the resolution of the SEM or a display displaying the image.

    Abstract translation: 提供了一种系统和方法,用于测量和确定使用具有重新插入截面轮廓的晶体蚀刻样品的SEM成像系统的分辨率。 采用重入或负曲线,因为SEM所看到的自上而下的观点非常尖锐,这是因为轮廓的边缘具有零宽度。 因此,信号中看到的任何视在宽度都是单独的电子束宽度的函数。 在横截面上扫描光束提供从第一状态移动到第二状态的信号。 从第一状态到第二状态的信号的时间段或倾斜部分提供与电子束宽度的直接相关。 因此,扫描样本允许计算电子束宽度。 通过扫描不同取向的特征,可以确定电子束的形状。 或者,通过旋转电子束并扫过相同的特征,可以确定电子束的形状。 系统可以利用该信息来调整SEM的分辨率或显示图像的显示。

    Highly charged ion based time of flight emission microscope
    29.
    发明授权
    Highly charged ion based time of flight emission microscope 失效
    高电荷离子型飞行时间发射显微镜

    公开(公告)号:US06288394B1

    公开(公告)日:2001-09-11

    申请号:US09257768

    申请日:1999-03-02

    CPC classification number: H01J37/285 H01J49/40

    Abstract: A highly charged ion based time-of-flight emission microscope has been designed, which improves the surface sensitivity of static SIMS measurements because of the higher ionization probability of highly charged ions. Slow, highly charged ions are produced in an electron beam ion trap and are directed to the sample surface. The sputtered secondary ions and electrons pass through a specially designed objective lens to a microchannel plate detector. This new instrument permits high surface sensitivity (1010 atoms/cm2), high spatial resolution (100 nm), and chemical structural information due to the high molecular ion yields. The high secondary ion yield permits coincidence counting, which can be used to enhance determination of chemical and topological structure and to correlate specific molecular species.

    Abstract translation: 已经设计了高度带电离子的时间飞行发射显微镜,由于高电荷离子的电离概率较高,因此改善了静电SIMS测量的表面灵敏度。 在电子束离子阱中产生慢,高电荷的离子并且被引导到样品表面。 溅射的二次离子和电子通过特殊设计的物镜通过微通道板检测器。 这种新仪器由于高分子离子产率而允许高表面灵敏度(1010原子/ cm 2),高空间分辨率(100nm)和化学结构信息。 高二次离子产率允许重合计数,其可用于增强化学和拓扑结构的测定并且使特定的分子种类相关联。

    Scanning probe microscope suitable for observing the sidewalls of steps in a specimen and measuring the tilt angle of the sidewalls
    30.
    发明授权
    Scanning probe microscope suitable for observing the sidewalls of steps in a specimen and measuring the tilt angle of the sidewalls 失效
    扫描探针显微镜适用于观察样品中台阶的侧壁并测量侧壁的倾斜角度

    公开(公告)号:US06246054B1

    公开(公告)日:2001-06-12

    申请号:US09092285

    申请日:1998-06-05

    Abstract: A probe chip suitable for observing the vertical walls of steps in a specimen includes a cantilever-like elastic member section extending from a support section, and a probe section at the free end of the elastic member section. The probe section is in the form of a triangular flat plate. Three ridges are terminated at two vertexes at the tip of the probe section. The direction normal to the plane of the probe section section is parallel to the ridge connecting the two points at the tip. These two terminal points at the tip of the probe section act as a virtual probe and interact with the surface of the specimen. The direction normal to the plane of the elastic member section is nonparallel to the direction normal to the plane of the probe section.

    Abstract translation: 适于观察试样中的台阶的垂直壁的探针芯片包括从支撑部分延伸的悬臂状弹性构件部分和在弹性构件部分的自由端处的探针部分。 探头部分是三角形平板的形式。 三个脊在探针部分的尖端处的两个顶点处终止。 与探头部分的平面垂直的方向平行于连接尖端两点的脊。 探头部分尖端的这两个端点用作虚拟探针,并与试样的表面相互作用。 与弹性构件部分的平面垂直的方向与垂直于探针部分平面的方向不平行。

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