公开(公告)号：US20080226708A1

公开(公告)日：2008-09-18

申请号：US12091185

申请日：2006-10-25

Applicant: Shaow Burn Lin ,  James Thompson ,  Joanna Newton ,  Stephanie Postiaux

Inventor： Shaow Burn Lin ,  James Thompson ,  Joanna Newton ,  Stephanie Postiaux

IPC: A61K9/127 ,  A61K8/89 ,  A61Q5/00 ,  A61Q1/00 ,  A61Q3/00 ,  A61K8/18

CPC classification number: A61K8/894 ,  A61K8/14 ,  A61K9/107 ,  A61K9/1075 ,  A61K47/24 ,  A61Q1/02 ,  A61Q1/06 ,  A61Q17/04 ,  A61Q19/00

Abstract: Processes are disclosed for preparing silicone vesicle compositions and emulsions containing silicone vesicles, the compositions prepared therefrom, and formulated personal and healthcare products containing the silicone vesicles and emulsions compositions.

Abstract translation: 公开了制备硅树脂囊泡组合物和含有硅酮囊泡的乳液的方法，由其制备的组合物以及含有硅酮泡沫和乳液组合物的配制的个人和保健产品。

公开(公告)号：US20080054191A1

公开(公告)日：2008-03-06

申请号：US11934512

申请日：2007-11-02

Applicant: Chin-Hsiang Lin ,  Burn Lin ,  Tsai-Sheng Gau

Inventor： Chin-Hsiang Lin ,  Burn Lin ,  Tsai-Sheng Gau

IPC: B05C11/00 ,  G21G5/00 ,  A61N5/00

CPC classification number: G03F7/7065 ,  G03F7/70383 ,  H01L22/22 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A method of wafer repairing comprises identifying locations and patterns of defective regions in a semiconductor wafer; communicating the locations and patterns of defective regions to a direct-writing tool; forming a photoresist layer on the semiconductor wafer; locally exposing the photoresist layer within the defective regions using an energy beam; developing the photoresist layer on the semiconductor wafer; and wafer-processing the semiconductor wafer under the photoresist layer after exposing and developing.

Abstract translation: 晶片修复的方法包括识别半导体晶片中的缺陷区域的位置和图案; 将缺陷区域的位置和图案传送到直写工具; 在半导体晶片上形成光致抗蚀剂层; 使用能量束将缺陷区域内的光致抗蚀剂层局部曝光; 在半导体晶片上显影光致抗蚀剂层; 并在曝光和显影之后将光致抗蚀剂层下方的半导体晶片进行晶片处理。

公开(公告)号：US07153902B2

公开(公告)日：2006-12-26

申请号：US10779962

申请日：2004-02-17

Applicant: Michael Gene Altes ,  Craig Steven Gross ,  Lee Bowen Jensen ,  Shaow Burn Lin ,  Anil Kumar Saxena ,  Todd Matthew Starke ,  Toshio Suzuki ,  Raymond Lee Tabler

Inventor： Michael Gene Altes ,  Craig Steven Gross ,  Lee Bowen Jensen ,  Shaow Burn Lin ,  Anil Kumar Saxena ,  Todd Matthew Starke ,  Toshio Suzuki ,  Raymond Lee Tabler

IPC: C08K3/00

CPC classification number: C08J3/03

Abstract: Water-continuous emulsion of elastomeric polymers are disclosed having a solids content of greater than 75%, an average particle size less than 5 μm, and having sufficient stability to produce a stable lower solids emulsion upon dilution with water comprising; an elastomeric polymer, surfactant, water, optional plasticizer, optional low molecular weight acid, and is essentially free of organic solvents. The water-continuous emulsions of elastomeric polymers can be prepared by; (I) forming a premix that is essentially free of organic solvents comprising an elastomeric polymer and surfactant, and optionally a plasticizer and low molecular weight acid, and (II) adding water to the premix with mixing to form a water continuous emulsion of the elastomeric polymer having a solids content of greater than 75%, an average particle size less than 5 μm, and having sufficient stability to produce a stable lower solids emulsion upon dilution with water.

公开(公告)号：US08541011B2

公开(公告)日：2013-09-24

申请号：US13489024

申请日：2012-06-05

Applicant: Shaow Burn Lin ,  Lori Ann Stark-Kasley

Inventor： Shaow Burn Lin ,  Lori Ann Stark-Kasley

IPC: A61K8/02

CPC classification number: C08L83/12 ,  A61K8/042 ,  A61K8/894 ,  A61Q1/02 ,  A61Q1/06 ,  A61Q5/02 ,  A61Q5/06 ,  A61Q5/12 ,  A61Q15/00 ,  A61Q17/04 ,  A61Q19/007 ,  A61Q19/08 ,  A61Q19/10

Abstract: Gel compositions are disclosed comprising a silicone elastomer from the reaction of an SiH containing organopolysiloxane resin and an organic compound having at least two aliphatic unsaturated groups in its molecule.

Abstract translation: 公开了由含SiH的有机聚硅氧烷树脂与其分子中具有至少两个脂肪族不饱和基团的有机化合物反应的含硅弹性体的凝胶组合物。

公开(公告)号：US20100303743A1

公开(公告)日：2010-12-02

申请号：US12680246

申请日：2008-09-25

Applicant: John Joseph Kennan ,  Shaow Burn Lin ,  Kathryn Elizabeth Messner ,  Isabelle Van Reeth ,  Jean-Luc Garaud ,  Roxanne Haller ,  Erin D. Lacher

Inventor： John Joseph Kennan ,  Shaow Burn Lin ,  Kathryn Elizabeth Messner ,  Isabelle Van Reeth ,  Jean-Luc Garaud ,  Roxanne Haller ,  Erin D. Lacher

IPC: A61K47/30 ,  A61K8/72 ,  A61K36/00 ,  A61P31/10 ,  A61P31/00 ,  A61Q17/04 ,  A61Q1/06 ,  A61Q1/02 ,  A61Q5/12 ,  A61Q5/00 ,  A61Q5/02 ,  A61Q19/00 ,  A61Q15/00

CPC classification number: A61Q19/007 ,  A61K8/585 ,  A61K8/891 ,  A61K8/894 ,  A61Q1/02 ,  A61Q1/06 ,  A61Q5/02 ,  A61Q15/00 ,  A61Q19/10

Abstract: Personal care or healthcare compositions are disclosed comprising a hydrophobic silicone organic elastomer gel blend having viscosity of at least 50 Pa-s. The hydrophobic silicone organic elastomer gel blend contains a silicone organic elastomer and a carrier fluid. The gel blend may be prepared by shearing a silicone organic elastomer or silicone organic elastomer gel with the carrier fluid.

Abstract translation: 公开了个人护理或保健组合物，其包含具有至少50Pa·s的粘度的疏水硅氧烷有机弹性体凝胶共混物。 疏水硅氧烷有机弹性体凝胶共混物含有有机硅弹性体和载体流体。 凝胶共混物可以通过用载体流体剪切有机硅弹性体或硅酮有机弹性体凝胶来制备。

公开(公告)号：US07816479B2

公开(公告)日：2010-10-19

申请号：US11795186

申请日：2006-01-19

Applicant: Tina Marie Leaym ,  Shaow Burn Lin

Inventor： Tina Marie Leaym ,  Shaow Burn Lin

IPC: B01F3/08

CPC classification number: A61K8/894 ,  A61K8/14 ,  A61K2800/413 ,  A61Q19/00 ,  B82Y5/00 ,  C08G77/46 ,  Y10T428/2989

Abstract: Siloxane resins containing both polyoxyalkylene M siloxy units and alkyl functional M and T siloxy units and aqueous compositions thereof are disclosed. The aqueous compositions contain dispersed particles stabilized by the siloxane resin, and are useful for the entrapment and delivery of various personal, household, and medical care actives.

Abstract translation: 公开了含有聚氧化烯M甲硅烷氧基单元和烷基官能M和T甲硅烷氧基单元及其含水组合物的硅氧烷树脂。 含水组合物含有由硅氧烷树脂稳定的分散颗粒，并且可用于各种个人，家庭和医疗保健活性物质的捕获和递送。

公开(公告)号：US20080175912A1

公开(公告)日：2008-07-24

申请号：US11795186

申请日：2006-01-19

Applicant: Tina Marie Leaym ,  Shaow Burn Lin

Inventor： Tina Marie Leaym ,  Shaow Burn Lin

IPC: A61K8/04 ,  C08F220/04 ,  C08F230/08 ,  A61K9/14 ,  C08K9/06 ,  B32B5/16

CPC classification number: A61K8/894 ,  A61K8/14 ,  A61K2800/413 ,  A61Q19/00 ,  B82Y5/00 ,  C08G77/46 ,  Y10T428/2989

Abstract: Siloxane resins containing both polyoxyalkylene M siloxy units and alkyl functional M and T siloxy units and aqueous compositions thereof are disclosed. The aqueous compositions contain dispersed particles stabilized by the siloxane resin, and are useful for the entrapment and delivery of various personal, household, and medical care actives.

Abstract translation: 公开了含有聚氧化烯M甲硅烷氧基单元和烷基官能M和T甲硅烷氧基单元及其含水组合物的硅氧烷树脂。 含水组合物含有由硅氧烷树脂稳定的分散颗粒，并且可用于各种个人，家庭和医疗保健活性物质的捕获和递送。

公开(公告)号：US20060172520A1

公开(公告)日：2006-08-03

申请号：US11050312

申请日：2005-02-03

Applicant: Ching-Yu Chang ,  Chin-Hsiang Lin ,  Burn Lin

Inventor： Ching-Yu Chang ,  Chin-Hsiang Lin ,  Burn Lin

IPC: H01L21/4763 ,  H01L21/3205

CPC classification number: H01L21/76802 ,  H01L21/31144

Abstract: A method for forming a semiconductor device includes forming a photoresist layer over a substrate and patterning the photoresist layer to form photoresist portions. A second layer is formed over the substrate in areas not covered by the photoresist portions and the photoresist portions are removed. After removing the photoresist portions, the second layer is used to modify the substrate to create at least a portion of the semiconductor device.

Abstract translation: 一种用于形成半导体器件的方法包括在衬底上形成光致抗蚀剂层并图案化光致抗蚀剂层以形成光致抗蚀剂部分。 在不被光致抗蚀剂部分覆盖的区域中的衬底上形成第二层，并去除光致抗蚀剂部分。 在去除光致抗蚀剂部分之后，第二层用于修改基板以产生半导体器件的至少一部分。

公开(公告)号：US20050286033A1

公开(公告)日：2005-12-29

申请号：US10874982

申请日：2004-06-23

Applicant: Burn Lin ,  Tsai-Sheng Gau ,  Chun-Kung Chen ,  Ru-Gun Liu ,  Shing Yu ,  Jen Shih

Inventor： Burn Lin ,  Tsai-Sheng Gau ,  Chun-Kung Chen ,  Ru-Gun Liu ,  Shing Yu ,  Jen Shih

IPC: G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341

Abstract: An immersion lithography system is disclosed to comprise a fluid containing feature for providing an immersion fluid for performing immersion lithography on a wafer, and a seal ring covering a predetermined portion of a wafer edge for preventing the immersion fluid from leaking through the covered portion of the wafer edge while the fluid is used for the immersion lithography.

Abstract translation: 公开了一种浸没式光刻系统，其包括用于提供用于在晶片上进行浸没式光刻的浸没流体的流体容纳特征，以及覆盖晶片边缘的预定部分的密封环，用于防止浸没流体泄漏通过 晶片边缘，同时流体用于浸没光刻。

公开(公告)号：US20050189499A1

公开(公告)日：2005-09-01

申请号：US11119061

申请日：2005-04-28

Applicant: Burn Lin

Inventor： Burn Lin

IPC: G03F7/20 ,  G21G5/00 ,  A61N5/00

CPC classification number: G03F7/7065 ,  G03F7/2051 ,  G03F7/70383 ,  G03F7/70675

Abstract: A method and an apparatus for repairing resist latent image on a wafer are disclosed. In the method, an image scanner equipped with a first and a second wafer carrier, and a primary imaging column and a secondary imaging column is utilized to conduct the processes of imaging a resist latent image on a first wafer and repairing a defect in a resist latent image on a second wafer positioned on a second wafer carrier simultaneously. The primary imaging column and the secondary imaging column may be situated in the same vacuum chamber to facilitate operation.