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    Plasma generator systems and methods of forming plasma
    32.
    发明授权
    Plasma generator systems and methods of forming plasma 有权
    等离子体发生器系统和形成等离子体的方法

    公开(公告)号：US09591738B2

    公开(公告)日：2017-03-07

    申请号：US12062052

    申请日：2008-04-03

    Applicant: Huatan Qiu ,  David Cheung ,  Prashanth Kothnur

    Inventor： Huatan Qiu ,  David Cheung ,  Prashanth Kothnur

    IPC: H01L21/306 ,  C23C16/00 ,  H05H1/46 ,  H01J37/32

    CPC classification number: H05H1/46 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32119 ,  H01J37/32174 ,  H01J37/3244

    Abstract: Systems and methods of forming plasma are provided. In an embodiment, a plasma generator system is provided including a container, a single coil disposed around the container, the single coil being a single member and having a first end, a second end, a first winding, and a second winding, wherein the first winding extends from the first end, and the second winding is integrally formed as part of the first winding and extends to the second end, an energy source electrically coupled directly to the first end of the single member, and a capacitor electrically coupled directly to the second end of the single member.

    Abstract translation: 提供了形成等离子体的系统和方法。 在一个实施例中，提供了一种等离子体发生器系统，其包括容器，围绕容器设置的单个线圈，该单个线圈是单个构件并且具有第一端，第二端，第一绕组和第二绕组，其中， 第一绕组从第一端延伸，并且第二绕组一体地形成为第一绕组的一部分并且延伸到第二端，直接电耦合到单个构件的第一端的能量源，以及直接耦合到 单一成员的第二端。

    Plasma based photoresist removal system for cleaning post ash residue
    33.
    发明授权
    Plasma based photoresist removal system for cleaning post ash residue 有权
    基于等离子体的光致抗蚀剂去除系统，用于清洁后灰渣

    公开(公告)号：US08716143B1

    公开(公告)日：2014-05-06

    申请号：US13370689

    申请日：2012-02-10

    Applicant: David Cheung ,  Kirk J. Ostrowski

    Inventor： David Cheung ,  Kirk J. Ostrowski

    IPC: H01L21/302 ,  H01L21/461 ,  B08B6/00 ,  H01L21/311 ,  H01L21/4763

    CPC classification number: H01L21/311 ,  H01L21/02063 ,  H01L21/302 ,  H01L21/31138 ,  H01L21/4763

    Abstract: A method of cleaning a low dielectric constant film in a lithographic process includes providing a dielectric film having thereover a resist composition, the dielectric film having a dielectric constant no greater than about 4.0, and stripping the resist composition to leave a substantially silicon-containing ash residue on the dielectric film. The method then includes contacting the ash residue with plasma comprising an ionized, essentially pure noble gas such as helium to remove the resist residue without substantially affecting the underlying dielectric film.

    Abstract translation: 在光刻工艺中清洁低介电常数膜的方法包括提供具有抗蚀剂组合物的电介质膜，电介质膜的介电常数不大于约4.0，并剥离抗蚀剂组合物以留下基本上含硅的灰分 电介质膜上的残留物。 该方法然后包括使灰渣与等离子体接触，所述等离子体包含电离的，基本上纯的惰性气体，例如氦，以除去抗蚀剂残留物，而基本上不影响下面的介电膜。

    Monitoring server load balancing
    34.
    发明授权
    Monitoring server load balancing 有权
    监控服务器负载均衡

    公开(公告)号：US08248928B1

    公开(公告)日：2012-08-21

    申请号：US11937285

    申请日：2007-11-08

    Applicant: Bing Wang ,  David Cheung

    Inventor： Bing Wang ,  David Cheung

    IPC: G01R31/08

    CPC classification number: H04L43/0894 ,  H04L43/026 ,  H04L43/12 ,  H04L47/125 ,  H04L63/1408 ,  H04L67/1014

    Abstract: Embodiments described herein discuss an approach to implementing load-balancing across multiple monitoring servers. One such embodiment describes a network monitoring device. The network monitoring device includes an ingress port, for receiving mirrored network packets, and a number of egress ports. The egress ports are associated with a number of monitoring servers, and used to forward the mirrored network packets to the monitoring servers. A packet classifier, coupled to the ingress port, examines the mirrored network packets, and determines which of the monitoring servers should receive the packets.

    Abstract translation: 本文描述的实施例讨论了跨多个监控服务器实现负载平衡的方法。 一个这样的实施例描述了网络监视设备。 网络监控设备包括入口端口，用于接收镜像网络报文，以及多个出口端口。 出口端口与多个监控服务器相关联，用于将镜像网络数据包转发到监控服务器。 耦合到入口端口的数据包分类器检查镜像网络数据包，并确定哪些监视服务器应该接收数据包。

    GAS FLOW DISTRIBUTION RECEPTACLES, PLASMA GENERATOR SYSTEMS, AND METHODS FOR PERFORMING PLASMA STRIPPING PROCESSES
    35.
    发明申请
    GAS FLOW DISTRIBUTION RECEPTACLES, PLASMA GENERATOR SYSTEMS, AND METHODS FOR PERFORMING PLASMA STRIPPING PROCESSES 审中-公开
    气体流量分配装置，等离子体发生器系统和执行等离子体剥离方法的方法

    公开(公告)号：US20120097331A1

    公开(公告)日：2012-04-26

    申请号：US13342757

    申请日：2012-01-03

    Applicant: Huatan Qiu ,  Woody Chung ,  Anirban Guha ,  David Cheung

    Inventor： Huatan Qiu ,  Woody Chung ,  Anirban Guha ,  David Cheung

    IPC: H01L21/3065

    CPC classification number: H01J37/3244 ,  C23C16/45519 ,  H01J37/32449 ,  H01L21/31138

    Abstract: Systems, system components, and methods for plasma stripping are provided. In an embodiment, a gas flow distribution receptacle may have a rounded section that includes an inner surface defining a reception cavity, an outer surface forming an enclosed end, and a centerpoint on the outer surface having a longitudinal axis extending therethrough and through the reception cavity. First and second rings of openings provide flow communication with the plasma chamber. The second ring of openings are disposed between the first ring and the centerpoint, and each opening of the second ring of openings extends between the inner and outer surfaces at a second angle relative to the longitudinal axis that is less than the first angle and has a diameter that is substantially identical to a diameter of an adjacent opening and smaller than the diameters of an opening of the first ring of openings.

    Abstract translation: 提供了用于等离子体剥离的系统，系统组件和方法。 在一个实施例中，气流分配容座可以具有圆形部分，该圆形部分包括限定接收腔的内表面，形成封闭端的外表面和外表面上的中心点，其具有延伸穿过其中的纵向轴线并且通过接收腔 。 第一和第二开口环提供与等离子体室的流动连通。 所述第二开口环设置在所述第一环和所述中心点之间，并且所述第二开口环的每个开口在所述内表面和所述外表面之间以相对于所述纵向轴线的第二角度延伸，所述纵向轴线小于所述第一角度并具有 直径基本上与相邻开口的直径相同，并且小于第一开口环的开口的直径。

    Fragrance Emitting Apparatus For Use With USB Port
    37.
    发明申请
    Fragrance Emitting Apparatus For Use With USB Port 有权
    香水发射装置用于USB端口

    公开(公告)号：US20090196587A1

    公开(公告)日：2009-08-06

    申请号：US12358216

    申请日：2009-01-22

    Applicant: David Cheung

    Inventor： David Cheung

    IPC: A61L9/03

    CPC classification number: A61L9/03 ,  A61L9/037 ,  A61L9/14

    Abstract: A fragrance emitting apparatus for connection to a USB port. In one embodiment, the fragrance emitting apparatus comprises a casing having an interior and at least one vent in communication with the interior, a cover removably attached to the casing to provide access to the interior, and a fragrance bottle removably disposed within the interior of the casing and having therein a liquid that provides a desired fragrance. The fragrance bottle further comprises a fragrance member having a first portion within fragrance bottle and a second portion extending from the fragrance bottle. The fragrance member is configured to absorb liquid in the fragrance bottle. The apparatus further comprises a micro-pump device positioned within the interior of the casing and adjacent to the second portion of the fragrance member. The micro-pump device has an oscillating member that contacts the second portion of the fragrance member. The apparatus further includes a control circuit to control the micro-pump device the control circuit generating an electrical wave signal having a predetermined frequency that causes the oscillating member to vibrate so as to diffuse fragrance liquid that contacts the oscillating member. A USB connector is connected to the casing and electrically connected to the control circuit. The diffusion of the fragrance liquid produces a fragrance that exits the casing through the vent. Other embodiments of the apparatus of the present invention are disclosed herein.

    Abstract translation: 一种用于连接到USB端口的香味发射装置。 在一个实施例中，香味发射装置包括具有内部和与内部连通的至少一个通气口的外壳，可移除地附接到壳体以提供对内部通路的盖子，以及可拆卸地设置在内部的内部的香味瓶 并且在其中具有提供期望香味的液体。 香味瓶还包括香料构件，其具有在香料瓶内的第一部分和从香料瓶延伸的第二部分。 香味构件被配置成吸收香料瓶中的液体。 该装置还包括定位在壳体内部并且邻近香料构件的第二部分的微型泵装置。 微型泵装置具有与香料构件的第二部分接触的摆动构件。 该装置还包括控制电路，用于控制微泵装置，该控制电路产生具有预定频率的电波信号，该预定频率使振荡部件振动，从而扩散与振荡部件接触的香味液体。 USB连接器连接到壳体并电连接到控制电路。 香味液体的扩散产生通过排气口离开套管的香料。 本文公开了本发明的装置的其它实施例。

    METHODS UTILIZING ORGANOSILICON COMPOUNDS FOR MANUFACTURING PRE-SEASONED COMPONENTS AND PLASMA REACTION APPARATUSES HAVING PRE-SEASONED COMPONENTS
    38.
    发明申请
    METHODS UTILIZING ORGANOSILICON COMPOUNDS FOR MANUFACTURING PRE-SEASONED COMPONENTS AND PLASMA REACTION APPARATUSES HAVING PRE-SEASONED COMPONENTS 审中-公开
    方法利用有机原料化合物制备预先组合的组分和具有预先组分的等离子体反应装置

    公开(公告)号：US20080216302A1

    公开(公告)日：2008-09-11

    申请号：US11868780

    申请日：2007-10-08

    Applicant: David CHEUNG ,  Anirban GUHA

    Inventor： David CHEUNG ,  Anirban GUHA

    IPC: B23P19/04 ,  H01L21/311

    CPC classification number: C23C18/1279 ,  C23C18/1212 ,  C23C18/1225 ,  H01J37/32477 ,  Y10T29/49885

    Abstract: Methods for pre-seasoning a component of a plasma reaction apparatus and method for fabricating plasma reaction apparatuses are provided. In an embodiment, a method for seasoning a component of a plasma reaction apparatus comprises providing an organosilicon compound, applying the organosilicon compound to the component, removing carbon atoms from the organosilicon compound, and forming a continuous, substantially uniform protective layer on the component, wherein the protective layer comprises silicon from the organosilicon compound.

    Abstract translation: 提供了对等离子体反应装置的部件进行预处理的方法和等离子体反应装置的制造方法。 在一个实施方案中，调节等离子体反应装置的组分的方法包括提供有机硅化合物，将有机硅化合物施加到组分中，从有机硅化合物中除去碳原子，以及在组分上形成连续的基本均匀的保护层， 其中所述保护层包含来自所述有机硅化合物的硅。

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