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    Organic light-emitting device having homogenous brightness distribution
    34.
    发明授权
    Organic light-emitting device having homogenous brightness distribution 有权
    具有均匀亮度分布的有机发光装置

    公开(公告)号：US08878225B2

    公开(公告)日：2014-11-04

    申请号：US13637013

    申请日：2011-03-09

    Applicant: Andrew Ingle ,  Benjamin Krummacher ,  Erwin Lang

    Inventor： Andrew Ingle ,  Benjamin Krummacher ,  Erwin Lang

    IPC: H01L51/50 ,  H01L51/52

    CPC classification number: H01L51/5203 ,  H01L2251/5361 ,  Y10T428/2495

    Abstract: An organic light-emitting device comprising an active layer for producing radiation having a first side surface and a second side surface adjoining a corner edge. A first contact strip extends along the first side surface for injecting charge carriers of a first type into the active layer. A second contact strip extends along the second side surface for injecting charge carriers of a second type into the active layer. The first side surface has a recessed region adjoining the corner edge, and the injection of charge carriers from the first contact strip is suppressed in the recessed region.

    Abstract translation: 一种有机发光装置，包括用于产生具有第一侧表面的辐射的活性层和邻接拐角边缘的第二侧表面。 第一接触条沿着第一侧表面延伸，用于将第一类型的载流子注入有源层。 第二接触条沿着第二侧表面延伸，用于将第二类型的载流子注入有源层。 第一侧表面具有与拐角边缘相邻的凹陷区域，并且在凹陷区域中抑制了来自第一接触条的电荷载流子的注入。

    PRODUCTION OF SILICON BY REACTING SILICON OXIDE AND SILICON CARBIDE, OPTIONALLY IN THE PRESENCE OF A SECOND CARBON SOURCE
    38.
    发明申请
    PRODUCTION OF SILICON BY REACTING SILICON OXIDE AND SILICON CARBIDE, OPTIONALLY IN THE PRESENCE OF A SECOND CARBON SOURCE 审中-公开
    在第二个碳源存在的情况下，通过反应氧化硅和碳化硅来生产硅

    公开(公告)号：US20110150741A1

    公开(公告)日：2011-06-23

    申请号：US13059692

    申请日：2009-08-04

    Applicant: Juergen Erwin Lang ,  Hartwig Rauleder ,  Ekkehard Mueh

    Inventor： Juergen Erwin Lang ,  Hartwig Rauleder ,  Ekkehard Mueh

    IPC: C01B33/021 ,  C01B31/36

    CPC classification number: C01B33/025

    Abstract: The invention relates to a method for producing silicon by reacting silicon oxide at an elevated temperature, silicon carbide and, optionally, a second carbon source being added to the reaction mixture. The invention further relates to a composition that can be used in the disclosed method. The essential part of the invention is the use of silicon carbide as a reaction initiator and/or reaction accelerator during the production of silicon or, alternatively, in nearly equimolar amounts for the production of silicon.

    Abstract translation: 本发明涉及通过在升高的温度下使氧化硅反应生产硅的方法，碳化硅和任选的第二碳源被加入到反应混合物中。 本发明还涉及可用于所公开的方法中的组合物。 本发明的主要部分是在硅的生产过程中使用碳化硅作为反应引发剂和/或反应促进剂，或者以几乎等摩尔的量用于硅的生产。

    PROCESS FOR PRODUCING HOLLOW SILICON BODIES
    39.
    发明申请
    PROCESS FOR PRODUCING HOLLOW SILICON BODIES 有权
    生产中空硅体的工艺

    公开(公告)号：US20160155871A1

    公开(公告)日：2016-06-02

    申请号：US14950787

    申请日：2015-11-24

    Applicant: Juergen Erwin LANG ,  Hartwig RAULEDER ,  Julia LYUBINA ,  Janaina Pérez

    Inventor： Juergen Erwin LANG ,  Hartwig RAULEDER ,  Julia LYUBINA ,  Janaina Pérez

    IPC: H01L31/0352 ,  H01M4/38 ,  C01B33/029 ,  H01L31/028

    CPC classification number: H01L31/035281 ,  C01B33/027 ,  C01B33/029 ,  C01B33/03 ,  C01P2004/04 ,  C01P2004/34 ,  C01P2004/64 ,  H01L31/0284 ,  H01M4/386

    Abstract: Hollow bodies having a silicon-comprising shell, are produced by, in a gas comprising at least one silane of the general formula SinH2n+2−mXm with n=1 to 4, m=0 to 2n+2 and X=halogen, (a) generating a non-thermal plasma by an AC voltage of frequency f, or operating a light arc, or introducing electromagnetic energy in the infrared region into the gas, giving a resulting phase which (b) is dispersed in a wetting agent and distilled, and then (c) the distillate is contacted at least once with a mixture of at least two of the substances hydrofluoric acid, nitric acid, water, giving a solid residue comprising hollow bodies having a silicon-comprising shell after the conversion reaction of the distillate with the mixture has abated or ended.

    Abstract translation: 具有含硅壳体的空心体通过包含至少一种通式SinH 2 + 2-m X m的硅烷，n = 1〜4，m = 0〜2n + 2，X =卤素的气体，（ a）通过频率f的交流电压产生非热等离子体，或者操作光弧，或者将红外区域的电磁能引入气体中，得到（b）分散在润湿剂中并蒸馏出的相 ，然后（c）馏出物与氢氟酸，硝酸，水中的至少两种物质的混合物至少接触一次，得到包含中空体的固体残余物，所述固体残余物在具有含硅壳体的转化反应之后 馏出物与混合物已经减少或结束。

    USE OF SILICON-CONTAINING PARTICLES FOR PROTECTION OF INDUSTRIAL MATERIALS FROM UV RADIATION
    40.
    发明申请
    USE OF SILICON-CONTAINING PARTICLES FOR PROTECTION OF INDUSTRIAL MATERIALS FROM UV RADIATION 审中-公开
    使用含硅颗粒保护紫外线辐射下的工业材料

    公开(公告)号：US20160152836A1

    公开(公告)日：2016-06-02

    申请号：US14950493

    申请日：2015-11-24

    Applicant: Juergen Erwin Lang ,  Michael Kroell ,  Goswin Uehlenbruck

    Inventor： Juergen Erwin Lang ,  Michael Kroell ,  Goswin Uehlenbruck

    IPC: C09D5/03 ,  C08K3/34 ,  C08K3/36

    CPC classification number: C09D5/03 ,  A61K8/25 ,  C01B33/029 ,  C08K3/34 ,  C08K3/36

    Abstract: Silicon-containing particles are used for protection of industrial materials, such as electrooptical layers or electrooptical components, from electromagnetic radiation in the UV range and optionally in the visible as far as the IR range, wherein the particles take the form of primary particles having a particle size in the range from 1 to 100 nm and may optionally take the form of clusters of the primary particles. A particular advantage is the possibility of matching the absorption of the electromagnetic radiation to the wavelength region to be absorbed that is of interest in a defined manner via the particle size and the particle size distribution. The silicon-containing particles can be used as biocompatible and biodegradable UV protection in industrial applications and compositions for industrial applications as formulations, such as preferably in coating compositions, such as paint.

    Abstract translation: 含硅颗粒用于保护工业材料，例如电光层或电光元件，来自UV范围内的电磁辐射，并且任选地在可见的范围内至少为IR范围，其中颗粒采用具有 粒度在1至100nm的范围内，并且可以任选地采取初级颗粒的簇的形式。 特别的优点是可以通过粒度和粒度分布将电磁辐射的吸收与所规定的感兴趣的待吸收波长区域进行匹配。 含硅颗粒可用作工业应用中的生物相容性和可生物降解的UV保护，以及用于工业应用的组合物作为制剂，例如优选在涂料组合物中，例如涂料。

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