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38 条记录 (耗时 0.022 秒)

    Substrate holding apparatus, substrate holding method, and substrate processing apparatus
    32.
    发明授权
    Substrate holding apparatus, substrate holding method, and substrate processing apparatus 有权
    基板保持装置，基板保持方法和基板处理装置

    公开(公告)号：US08141513B2

    公开(公告)日：2012-03-27

    申请号：US12983474

    申请日：2011-01-03

    申请人： Masahiko Sekimoto ,  Seiji Katsuoka ,  Naoki Dai ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Suzuki ,  Kenichi Kobayashi ,  Yasuyuki Motoshima ,  Ryo Kato

    发明人： Masahiko Sekimoto ,  Seiji Katsuoka ,  Naoki Dai ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Suzuki ,  Kenichi Kobayashi ,  Yasuyuki Motoshima ,  Ryo Kato

    IPC分类号： B05C13/00 ,  B05C3/18

    CPC分类号： H01L21/67086 ,  H01L21/67051 ,  H01L21/687

    摘要： A substrate holding apparatus can meet the request for a smaller-sized compact apparatus while ensuring a sufficient immersion depth of a substrate in a processing liquid. The substrate holding apparatus includes: a substrate holder for supporting a substrate (W) by bringing a peripheral portion of a surface of the substrate (W) into contact with a first sealing member; and a substrate pressing section for lowering relative to the substrate holder so as to press the substrate (W) held by the substrate holder downward, thereby bringing a first sealing member into pressure contact with the substrate (W). The substrate pressing section is provided with a second ring-shaped sealing member which makes pressure contact with an upper surface of a ring-shaped holding section of the substrate holder, thereby sealing the peripheral region of the substrate pressing section.

    摘要翻译： 基板保持装置可以满足对较小尺寸的小型装置的要求，同时确保基板在处理液体中的足够的浸入深度。 基板保持装置包括：基板保持件，用于通过使基板（W）的表面的周边部分与第一密封构件接触来支撑基板（W）; 以及基板按压部，其相对于基板保持件下降，以将由基板保持件保持的基板（W）向下压，从而使第一密封部件与基板（W）压力接触。 基板按压部设置有与基板保持件的环状保持部的上表面压力接触的第二环状密封部件，从而密封基板按压部的周边区域。

    SUBSTRATE HOLDING APPARATUS, SUBSTRATE HOLDING METHOD, AND SUBSTRATE PROCESSING APPARATUS
    33.
    发明申请
    SUBSTRATE HOLDING APPARATUS, SUBSTRATE HOLDING METHOD, AND SUBSTRATE PROCESSING APPARATUS 有权
    基板保持装置，基板保持方法和基板处理装置

    公开(公告)号：US20110094442A1

    公开(公告)日：2011-04-28

    申请号：US12983474

    申请日：2011-01-03

    申请人： Masahiko SEKIMOTO ,  Seiji Katsuoka ,  Naoki Dai ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Suzuki ,  Kenichi Kobayashi ,  Yasuyuki Motoshima ,  Ryo Kato

    发明人： Masahiko SEKIMOTO ,  Seiji Katsuoka ,  Naoki Dai ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Suzuki ,  Kenichi Kobayashi ,  Yasuyuki Motoshima ,  Ryo Kato

    IPC分类号： B05C3/02 ,  B05C13/00

    CPC分类号： H01L21/67086 ,  H01L21/67051 ,  H01L21/687

    摘要： A substrate holding apparatus can meet the request for a smaller-sized compact apparatus while ensuring a sufficient immersion depth of a substrate in a processing liquid. The substrate holding apparatus includes: a substrate holder for supporting a substrate (W) by bringing a peripheral portion of a surface of the substrate (W) into contact with a first sealing member; and a substrate pressing section for lowering relative to the substrate holder so as to press the substrate (W) held by the substrate holder downward, thereby bringing a first sealing member into pressure contact with the substrate (W). The substrate pressing section is provided with a second ring-shaped sealing member which makes pressure contact with an upper surface of a ring-shaped holding section of the substrate holder, thereby sealing the peripheral region of the substrate pressing section.

    摘要翻译： 基板保持装置可以满足对较小尺寸的小型装置的要求，同时确保基板在处理液体中的足够的浸入深度。 基板保持装置包括：基板保持件，用于通过使基板（W）的表面的周边部分与第一密封构件接触来支撑基板（W）; 以及基板按压部，其相对于基板保持件下降，以将由基板保持件保持的基板（W）向下压，从而使第一密封部件与基板（W）压力接触。 基板按压部设置有与基板保持件的环状保持部的上表面压力接触的第二环状密封部件，从而密封基板按压部的周边区域。

    SUBSTRATE PROCESSING UNIT, SUBSTRATE TRANSFER METHOD, SUBSTRATE CLEANSING PROCESS UNIT, AND SUBSTRATE PLATING APPARATUS
    34.
    发明申请
    SUBSTRATE PROCESSING UNIT, SUBSTRATE TRANSFER METHOD, SUBSTRATE CLEANSING PROCESS UNIT, AND SUBSTRATE PLATING APPARATUS 审中-公开
    基板加工单元，基板转印方法，基板清洗工艺单元和基板镀膜装置

    公开(公告)号：US20090092469A1

    公开(公告)日：2009-04-09

    申请号：US11996432

    申请日：2006-08-25

    申请人： Masahiko Sekimoto ,  Toshio Yokoyama ,  Teruyuki Watanabe ,  Kenichi Suzuki ,  Kenichi Kobayashi ,  Ryo Kato

    发明人： Masahiko Sekimoto ,  Toshio Yokoyama ,  Teruyuki Watanabe ,  Kenichi Suzuki ,  Kenichi Kobayashi ,  Ryo Kato

    IPC分类号： H01L21/677 ,  B08B7/00 ,  C25D17/06

    CPC分类号： H01L21/68707 ,  H01L21/6723 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/68728

    摘要： To provide a substrate processing unit, a substrate transfer method, a substrate cleansing process unit, and a substrate plating apparatus that make it possible for a substrate carry-in mechanism such as a robot arm to quickly release hold on the substrate after carrying in the substrate so as to shorten the time for holding the substrate and improve throughput. The substrate processing unit 10 includes a substrate holding mechanism 10 for holding the substrate 11 in a specified holding position, and a processing mechanism 32 for applying a specified process to the substrate held with the substrate holding mechanism in which a substrate guide mechanism 20 is provided with a guide pin 15 for guiding the substrate to vicinity of a holding position. The substrate holding mechanism has a plural number of rollers 14 on an outer periphery of the holding position of the substrate, with the plural number of rollers adapted to hold the substrate by supporting the periphery of the substrate from sides thereof in the vicinity of the holding position, and the roller has an integral structure made up of a large diameter portion and a small diameter portion formed above the large diameter portion, with an upper portion of the large diameter portion having a shoulder portion for the substrate in transfer to be temporarily placed on, and with the shoulder portion formed with a sloped surface sloping down toward its periphery.

    摘要翻译： 为了提供一种基板处理单元，基板转印方法，基板清洁处理单元和基板电镀设备，其使得诸如机器人臂之类的基板输入机构可以在携带该基板处理单元之后快速地释放保持在基板上 以缩短保持基板的时间并提高生产量。 基板处理单元10包括用于将基板11保持在指定的保持位置的基板保持机构10和用于对被设置有基板引导机构20的基板保持机构保持的基板进行规定处理的处理机构32 具有用于将基板引导到保持位置附近的引导销15。 基板保持机构在基板的保持位置的外周具有多个辊14，多个辊适于通过从保持基板附近的侧面支撑基板的周边来保持基板 并且所述辊具有由形成在所述大直径部分上方的大直径部分和小直径部分构成的整体结构，所述大直径部分的上部具有用于传送的基板的肩部临时放置 并且肩部形成有朝向其周边倾斜的倾斜表面。

    Method of recycling laminated molding
    36.
    发明申请
    Method of recycling laminated molding 失效
    层压成型方法

    公开(公告)号：US20070095957A1

    公开(公告)日：2007-05-03

    申请号：US10579560

    申请日：2004-11-11

    申请人： Kazuyuki Yamane ,  Ryo Kato ,  Akiko Wakamatsu

    发明人： Kazuyuki Yamane ,  Ryo Kato ,  Akiko Wakamatsu

    IPC分类号： B02C17/02

    CPC分类号： C08J11/06 ,  C08J11/04 ,  C08J2367/02 ,  C08J2467/04 ,  Y02P20/143 ,  Y02P20/582 ,  Y02W30/70 ,  Y02W30/701 ,  Y10T428/1352

    摘要： A method of recycling a laminate shaped product, including the steps of: breaking a shaped product having a laminate structure including at least one layer of aliphatic polyester resin in addition to a principal resin layer, storing resultant broken pieces in a moisturizing environment to adjust a moisture content of the aliphatic polyester resin (layer) to at least 0.5 wt. %, and then washing the broken pieces with alkaline water to remove the aliphatic polyester resin layer, thereby recovering the principal resin. As a result, it becomes possible to shorten an induction period in the alkaline water washing step that is a principal process step, thereby rationalizing the entire process.

    摘要翻译： 一种回收层压成形产品的方法，包括以下步骤：除了主树脂层之外，将具有包括至少一层脂肪族聚酯树脂的叠层结构的成形产品破碎，将保存在保湿环境中的破碎片调节 脂肪族聚酯树脂（层）的水分含量至少为0.5重量％ ％，然后用碱性水洗涤破碎片以除去脂族聚酯树脂层，从而回收主要树脂。 结果，可以缩短作为主要处理步骤的碱性水洗涤步骤中的诱导期，从而使整个过程合理化。

    Method of manufacturing a packaged soybean curd
    38.
    发明授权
    Method of manufacturing a packaged soybean curd 失效
    包装大豆凝乳的制造方法

    公开(公告)号：US4303678A

    公开(公告)日：1981-12-01

    申请号：US174439

    申请日：1980-08-01

    申请人： Katsuhiro Ogasa ,  Morio Kuboyama ,  Kunisuke Kuwahara ,  Ryo Kato ,  Hiroshi Shimada

    发明人： Katsuhiro Ogasa ,  Morio Kuboyama ,  Kunisuke Kuwahara ,  Ryo Kato ,  Hiroshi Shimada

    IPC分类号： A23C20/02 ,  A23L11/00 ,  A23L1/20 ,  A23J3/00

    CPC分类号： A23C20/025 ,  A23L11/09

    摘要： A method of manufacturing a packaged soybean curd with a long shelf life without the inclusion of any artificial additives such as coagulating agents, germicides and the like; wherein soybean juice is subjected to lactic acid fermentation until its pH is reached to a value equal to or less than a value which is determined from the percentage of the solids content (5-16 wt. %) of soybean juice and then is subjected to heating (60.degree.-95.degree. C., 10-100 minutes) to adjust the curd tension to above 20 g.

    摘要翻译： 一种制造长寿命的包装大豆凝乳的方法，而不包括任何人造添加剂如凝结剂，杀菌剂等; 其中大豆汁进行乳酸发酵，直到其pH达到等于或小于由大豆汁的固体含量（5-16重量％）的百分比确定的值，然后进行 加热（60°-95℃，10-100分钟），将凝乳张力调节至20g以上。