公开(公告)号：US09181413B2

公开(公告)日：2015-11-10

申请号：US14005781

申请日：2012-04-17

Applicant: Takafumi Taguchi ,  Kenichi Uesaka ,  Yoji Imoto ,  Satomi Yamauchi ,  Yoshihiro Kagawa

Inventor： Takafumi Taguchi ,  Kenichi Uesaka ,  Yoji Imoto ,  Satomi Yamauchi ,  Yoshihiro Kagawa

IPC: C08K3/36 ,  C08L9/00 ,  C08L83/04 ,  C08F291/00 ,  B60C1/00 ,  C08C19/44

CPC classification number: C08K3/36 ,  B60C1/0016 ,  C08C19/44 ,  Y02T10/862 ,  C08L15/00

Abstract: The invention provides a rubber composition that can enhance fuel economy, wet-grip performance, abrasion resistance, and handling stability in a balanced manner, and a pneumatic tire using this composition. The invention relates to a rubber composition containing a rubber component, silica (1) having a nitrogen adsorption specific surface area of not more than 100 m2/g, and silica (2) having a nitrogen adsorption specific surface area of at least 180 m2/g, wherein the rubber component contains, based on 100% by mass of the rubber component, at least 5% by mass of a conjugated diene polymer containing a constituent unit based on a conjugated diene and a constituent unit represented by formula (I) below, at least one terminal of the polymer being modified with a specific compound; and a total amount of silica (1) and silica (2) is 30-150 parts by mass per 100 parts by mass of the rubber component,

Abstract translation: 本发明提供了能够以均衡的方式提高燃料经济性，湿抓地性能，耐磨性和操作稳定性的橡胶组合物，以及使用该组合物的充气轮胎。 本发明涉及含有橡胶成分，氮吸附比表面积为100m 2 / g以下的二氧化硅（1）和氮吸附比表面积为180m 2 / g以上的二氧化硅（2）的橡胶组合物， g，其中，橡胶成分以100质量％计含有至少5质量％的含有共轭二烯的构成单元的共轭二烯系聚合物和下述式（I）所示的结构单元 所述聚合物的至少一个末端用特定化合物改性; 相对于100质量份的橡胶成分，二氧化硅（1）和二氧化硅（2）的总量为30〜150质量份，

公开(公告)号：US08997812B2

公开(公告)日：2015-04-07

申请号：US12676293

申请日：2008-08-20

Applicant: Takafumi Taguchi

Inventor： Takafumi Taguchi

IPC: B60C1/00 ,  B60C5/14 ,  C08L23/28 ,  B29D30/06 ,  C08L7/00 ,  C08L23/22

CPC classification number: B60C5/14 ,  B29D30/0681 ,  B29D2030/0682 ,  B60C1/0008 ,  C08L7/00 ,  C08L23/22 ,  C08L23/283 ,  C08L2312/00 ,  Y10S152/16 ,  C08L2666/02

Abstract: The present invention relates to a pneumatic tire having an inner liner formed from a rubber composition that includes a butyl rubber in which the Mooney viscosity measured at 130° C. of an unvulcanized rubber of the rubber composition is at least 45, wherein the average value and standard deviation of the butyl rubber gauge of shoulder portion of a finished tire satisfy: (Standard deviation of butyl rubber gauge)/(Average value of butyl rubber gauge)≦0.060. The rubber gauge of the tire exhibits improved uniformity and is superior in air permeability resistance.

Abstract translation: 本发明涉及一种充气轮胎，其具有由橡胶组合物形成的内衬，所述橡胶组合物包括丁基橡胶，其中橡胶组合物的未硫化橡胶在130℃下测得的门尼粘度至少为45，其中平均值 成品轮胎的肩部的丁基橡胶规格的标准偏差满足：（丁基橡胶规的标准偏差）/（丁基橡胶规格的平均值）＆nlE; 0.060。 轮胎的橡皮规表现出均匀性的提高，透气性优异。

公开(公告)号：US08857482B2

公开(公告)日：2014-10-14

申请号：US13560090

申请日：2012-07-27

Applicant: Takafumi Taguchi ,  Naoya Ichikawa

Inventor： Takafumi Taguchi ,  Naoya Ichikawa

IPC: B60C1/00 ,  C08K3/04 ,  C08L7/00 ,  C08C1/15 ,  C08C1/04 ,  C08L15/00

CPC classification number: C08C1/04 ,  B60C1/0016 ,  C08C1/15 ,  C08L7/00 ,  C08L15/00 ,  Y02T10/862 ,  Y10T152/10 ,  C08L9/00

Abstract: The present invention provides a rubber composition for a tread which enables improvement in fuel economy, breaking performance, and abrasion resistance in a balanced manner; a method for producing the rubber composition; and a heavy-load tire. The present invention relates to a rubber composition for a tread of a heavy-load tire, including a modified natural rubber having a phosphorus content of 200 ppm or less, and carbon black.

Abstract translation: 本发明提供一种用于胎面的橡胶组合物，其能够以均衡的方式提高燃料经济性，断裂性能和耐磨性; 橡胶组合物的制造方法; 和一个重载轮胎。 本发明涉及一种重载轮胎的胎面用橡胶组合物，其包含磷含量为200ppm以下的改性天然橡胶和炭黑。

公开(公告)号：US08617999B2

公开(公告)日：2013-12-31

申请号：US13397750

申请日：2012-02-16

Applicant: Hiromitsu Mashita ,  Toshiya Kotani ,  Fumiharu Nakajima ,  Takafumi Taguchi ,  Chikaaki Kodama

Inventor： Hiromitsu Mashita ,  Toshiya Kotani ,  Fumiharu Nakajima ,  Takafumi Taguchi ,  Chikaaki Kodama

IPC: H01L21/302

CPC classification number: H01L21/0337

Abstract: A method of manufacturing a semiconductor device, which forms a pattern by performing pattern transformation steps multiple times, comprises setting finished pattern sizes for patterns to be formed in each consecutive two pattern transformation steps among the plurality of pattern transformation steps based on a possible total amount of in-plane size variation of the patterns to be formed in the consecutive two pattern transformation steps.

Abstract translation: 通过多次执行图案变换步骤来形成图案的半导体器件的制造方法包括：在多个图案变换步骤中，基于可能的总量，在每个连续的两个图案变换步骤中设定要形成的图案的完成图案尺寸 在连续的两个图案变换步骤中要形成的图案的平面尺寸变化。

公开(公告)号：US20130310512A1

公开(公告)日：2013-11-21

申请号：US13982160

申请日：2012-03-23

Applicant: Yoji Imoto ,  Kenichi Uesaka ,  Takafumi Taguchi ,  Naoya Omura ,  Tetsuya Kunisawa ,  Satomi Yamauchi

Inventor： Yoji Imoto ,  Kenichi Uesaka ,  Takafumi Taguchi ,  Naoya Omura ,  Tetsuya Kunisawa ,  Satomi Yamauchi

IPC: C08K3/36

CPC classification number: C08K3/36 ,  B60C1/0016 ,  C08C19/44 ,  C08F230/08 ,  C08F236/14 ,  C08K5/16 ,  C08L15/00 ,  Y02T10/862

Abstract: The present invention provides a rubber composition that can enhance the fuel economy, wet-grip performance, abrasion resistance, and processability in a balanced manner, and also provides a pneumatic tire using this rubber composition. The present invention relates to a rubber composition that contains a rubber component, silica, and a compound represented by formula (1) below, wherein the rubber component contains, based on 100% by mass of the rubber component, not less than 5% by mass of a conjugated diene polymer containing a constituent unit based on a conjugated diene and a constituent unit represented by formula (I) below, at least one terminal of the polymer being modified with a specific compound; and an amount of the silica is 5 to 150 parts by mass per 100 parts by mass of the rubber component.

Abstract translation: 本发明提供了能够以均衡的方式提高燃料经济性，湿抓地性，耐磨性和加工性的橡胶组合物，并且还提供了使用该橡胶组合物的充气轮胎。 本发明涉及含有橡胶成分，二氧化硅和下述式（1）所示的化合物的橡胶组合物，其中，橡胶成分以100质量％计含有5质量％以上的橡胶成分 包含基于共轭二烯的结构单元和由下式（I）表示的构成单元的共轭二烯聚合物的质量，所述聚合物的至少一个末端用特定化合物改性; 相对于100质量份的橡胶成分，二氧化硅的量为5〜150质量份。

公开(公告)号：US20120311511A1

公开(公告)日：2012-12-06

申请号：US13399042

申请日：2012-02-17

Applicant: Takafumi TAGUCHI ,  Toshiya Kotani ,  Chikaaki Kodama ,  Fumiharu Nakajima

Inventor： Takafumi TAGUCHI ,  Toshiya Kotani ,  Chikaaki Kodama ,  Fumiharu Nakajima

IPC: G06F17/50

CPC classification number: G03F1/36 ,  G03F1/70 ,  G06F17/5009

Abstract: A mask inspection method according to the embodiments, original data corresponding to a semiconductor integrated circuit pattern to be formed on a substrate is created. After that, original production simulation which mocks an original production process is performed on the original data to derive information relating to an original pattern shape in the case of forming an original pattern corresponding to the original data on an original. After that, whether or not the information relating to an original pattern shape satisfies a predetermined value decided based on the original production process is determined.

Abstract translation: 根据实施例的掩模检查方法，产生对应于要形成在基板上的半导体集成电路图案的原始数据。 之后，对原始数据执行原始制作过程的原始制作模拟，以在形成与原始数据相对应的原始图案的情况下导出与原始图案形状有关的信息。 之后，确定与原始图案形状相关的信息是否满足基于原始制作处理决定的预定值。

公开(公告)号：US08307310B2

公开(公告)日：2012-11-06

申请号：US12683993

申请日：2010-01-07

Applicant: Toshiya Kotani ,  Hiromitsu Mashita ,  Takafumi Taguchi ,  Ryuji Ogawa

Inventor： Toshiya Kotani ,  Hiromitsu Mashita ,  Takafumi Taguchi ,  Ryuji Ogawa

IPC: G06F17/50 ,  G06F19/00 ,  G06F17/10 ,  G06F7/60 ,  G06K9/00

CPC classification number: G06F17/5081

Abstract: A pattern generating method includes: extracting, from a shape of a pattern generated on a substrate, a contour of the pattern shape; setting evaluation points as verification points for the pattern shape on the contour; calculating curvatures on the contour in the evaluation points; and verifying the pattern shape based on whether the curvatures satisfy a predetermined threshold set in advance.

Abstract translation: 图案生成方法包括：从在基板上产生的图案的形状提取图案形状的轮廓; 将评估点设置为轮廓上图案形状的验证点; 计算评估点轮廓上的曲率; 以及基于曲率是否满足预先设定的预定阈值来验证图案形状。

公开(公告)号：US20120001331A1

公开(公告)日：2012-01-05

申请号：US13051652

申请日：2011-03-18

Applicant: Takayuki Toba ,  Tohru Ozaki ,  Toshiki Hisada ,  Hiromitsu Mashita ,  Takafumi Taguchi

Inventor： Takayuki Toba ,  Tohru Ozaki ,  Toshiki Hisada ,  Hiromitsu Mashita ,  Takafumi Taguchi

IPC: H01L23/485 ,  H01L21/28

CPC classification number: H01L21/76816 ,  H01L27/0207 ,  H01L27/11519 ,  H01L27/11531 ,  H01L2924/0002 ,  H01L2924/00

Abstract: According to one embodiment, a semiconductor device includes a plurality of first interconnects, a second interconnect, a third interconnect, and a plurality of conductive members. The plurality of first interconnects are arranged periodically to extend in one direction. The second interconnect is disposed outside a group of the plurality of first interconnects to extend in the one direction. The third interconnect is provided between the group and the second interconnect. The plurality of conductive members are disposed on a side opposite to the group as viewed from the second interconnect. A shortest distance between the first interconnect and the third interconnect, a shortest distance between the third interconnect and the second interconnect, and a shortest distance between the first interconnects are equal. A shortest distance between the second interconnect and the conductive member is longer than the shortest distance between the first interconnects.

Abstract translation: 根据一个实施例，半导体器件包括多个第一互连，第二互连，第三互连和多个导电构件。 多个第一互连周期性地布置成在一个方向上延伸。 第二互连设置在多个第一互连的一组之外，以在一个方向上延伸。 第三互连设置在组和第二互连之间。 多个导电构件设置在从第二互连件观察的与组相反的一侧上。 第一互连和第三互连之间的最短距离，第三互连和第二互连之间的最短距离以及第一互连之间的最短距离相等。 第二互连和导电构件之间的最短距离比第一互连之间的最短距离长。

公开(公告)号：US20110307845A1

公开(公告)日：2011-12-15

申请号：US13050864

申请日：2011-03-17

Applicant: Takafumi TAGUCHI ,  Toshiya KOTANI ,  Hiromitsu MASHITA ,  Fumiharu NAKAJIMA ,  Ryota ABURADA ,  Chikaaki KODAMA

Inventor： Takafumi TAGUCHI ,  Toshiya KOTANI ,  Hiromitsu MASHITA ,  Fumiharu NAKAJIMA ,  Ryota ABURADA ,  Chikaaki KODAMA

IPC: G06F17/50

CPC classification number: G06F17/5068

Abstract: A pattern dimension calculation method according to one embodiment calculates a taper shape of a mask member used as a mask when a circuit pattern is processed in an upper layer of the circuit pattern formed on a substrate. The method calculates an opening angle facing the mask member from a shape prediction position on the circuit pattern on the basis of the taper shape. The method calculates a dimension of the circuit pattern according to the opening angle formed at the shape prediction position.

Abstract translation: 根据一个实施例的图案尺寸计算方法计算当在形成在基板上的电路图案的上层中处理电路图案时用作掩模的掩模构件的锥形形状。 该方法基于锥形形状从电路图案上的形状预测位置计算面向掩模构件的打开角度。 该方法根据在形状预测位置处形成的打开角度来计算电路图案的尺寸。

公开(公告)号：US20100266960A1

公开(公告)日：2010-10-21

申请号：US12721310

申请日：2010-03-10

Applicant: Hiromitsu MASHITA ,  Toshiya KOTANI ,  Michiya TAKIMOTO ,  Hidefumi MUKAI ,  Takafumi TAGUCHI ,  Kazuya FUKUHARA

Inventor： Hiromitsu MASHITA ,  Toshiya KOTANI ,  Michiya TAKIMOTO ,  Hidefumi MUKAI ,  Takafumi TAGUCHI ,  Kazuya FUKUHARA

IPC: G03F7/20 ,  G03B27/42

CPC classification number: G03B27/42 ,  G03F7/70525 ,  G03F7/70625

Abstract: A method of manufacturing a semiconductor device according to an embodiment includes determining a second exposure parameter including exposure parameters except for an exposure amount from a dimension distribution information so that a resist pattern of a first resist pattern formed based on a second pattern has a desired dimension in a plurality of regions to be shot within a surface of a wafer.

Abstract translation: 根据实施例的制造半导体器件的方法包括从尺寸分布信息确定包括曝光量除外的曝光参数的第二曝光参数，使得基于第二图案形成的第一抗蚀剂图案的抗蚀剂图案具有期望的尺寸 在要在晶片表面内拍摄的多个区域中。