公开(公告)号：US07345755B2

公开(公告)日：2008-03-18

申请号：US11248124

申请日：2005-10-13

Applicant: Riki Ogawa ,  Toru Tojo

Inventor： Riki Ogawa ,  Toru Tojo

IPC: G01N21/00

CPC classification number: G03F1/74 ,  G01N21/9501 ,  G01N21/95607

Abstract: In a defect inspecting apparatus, an illumination optical system illuminate a mask having a patterned surface, the optical beam passing through the mask is split into two beam components which is guided in first and second image pickup sensors. The pickup sensors has first and second pickup fields on the patterned surface, which pick up first and second parts of the mask image. The first and second pickup fields are parallel to each other and displaced from each other by (2n+1)×d/2 in the longitudinal direction thereof, where d denotes a longitudinal dimension of each pixel image in the first and second pick up fields and n denotes an integer equal to or larger than 0. The first and second parts of the mask image are merged to form a pattern image, and a defect in the mask is detected on the basis of the pattern image.

Abstract translation: 在缺陷检查装置中，照明光学系统照射具有图案化表面的掩模，通过掩模的光束被分割成在第一和第二图像拾取传感器中被引导的两个光束分量。 拾取传感器在图案化表面上具有第一和第二拾取场，其拾取掩模图像的第一和第二部分。 第一拾取场和第二拾取场彼此平行并且在其纵向彼此相互错位（2n + 1）xd / 2，其中d表示第一和第二拾取场中每个像素图像的纵向尺寸， n表示等于或大于0的整数。掩模图像的第一部分和第二部分被合并以形成图案图像，并且基于图案图像检测掩模中的缺陷。

公开(公告)号：US07304730B2

公开(公告)日：2007-12-04

申请号：US10852434

申请日：2004-05-25

Applicant: Hiromu Inoue ,  Toru Tojo ,  Takehiko Nomura ,  Shinichi Imai

Inventor： Hiromu Inoue ,  Toru Tojo ,  Takehiko Nomura ,  Shinichi Imai

IPC: G01N21/00

CPC classification number: G01N21/956 ,  G01N2021/95676

Abstract: A photolithography mask inspection apparatus has at least two sensors. One sensor is configured to sense light transmitted through an object to be inspected, and the other sensor senses light reflected off the object. A first optical system is arranged to expose a first portion of the object with a first light beam, and a second optical system is arranged to expose a second portion of the object, spaced form the first portion, with a second light beam. A third optical system focuses the transmitted light on to the first sensor, as well as the reflected light on to the second sensor. A defect detecting circuit is also provided to detect a defect of the object, based upon image data associated with the reflected and transmitted light.

Abstract translation: 光刻掩模检查装置具有至少两个传感器。 一个传感器被配置为感测通过待检查对象传播的光，另一个传感器感测从物体反射的光。 第一光学系统布置成用第一光束曝光物体的第一部分，并且第二光学系统布置成用第二光束暴露出与第一部分间隔开的物体的第二部分。 第三光学系统将透射光聚焦到第一传感器，以及将反射光聚焦到第二传感器上。 还提供缺陷检测电路，用于基于与反射和透射光相关联的图像数据来检测物体的缺陷。

公开(公告)号：US20060082782A1

公开(公告)日：2006-04-20

申请号：US11249359

申请日：2005-10-14

Applicant: Riki Ogawa ,  Toru Tojo ,  Munehiro Ogasawara

Inventor： Riki Ogawa ,  Toru Tojo ,  Munehiro Ogasawara

IPC: G01B9/02

CPC classification number: G01N21/95607 ,  G03F1/84

Abstract: In a defect inspecting apparatus, a differential interference optical system forms a differential interference image which is produced from an optical interference of images in a predetermined direction, the images corresponding to inspecting parts of a pattern formed on a mask. A control part varies the predetermined direction so as to cause the differential interference optical system to produce another differential interference image. An image pickup sensor picks up the differential interference images in accordance with the variation of the predetermined direction. A defect detecting unit detects a defect in the pattern formed on the mask from comparing the differential interference images with reference images, respectively.

公开(公告)号：US06346354B1

公开(公告)日：2002-02-12

申请号：US09533265

申请日：2000-03-20

Applicant: Takayuki Abe ,  Hirohito Anze ,  Susumu Oogi ,  Mitsuko Shimizu ,  Hideo Inoue ,  Takashi Saito ,  Toru Tojo ,  Takashi Kamikubo ,  Yoshiaki Hattori ,  Tomohiro Iijima ,  Noriaki Nakayamada

Inventor： Takayuki Abe ,  Hirohito Anze ,  Susumu Oogi ,  Mitsuko Shimizu ,  Hideo Inoue ,  Takashi Saito ,  Toru Tojo ,  Takashi Kamikubo ,  Yoshiaki Hattori ,  Tomohiro Iijima ,  Noriaki Nakayamada

IPC: G03F900

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31764 ,  H01J2237/31796 ,  Y10S430/143

Abstract: A pattern writing method acquires the area of a pattern segment located in each of a plurality of small regions obtained by dividing a region on which a pattern is to be written, small region by small region, and writes a pattern based on an optimum dose calculated based on this area. This method employs a scheme of shifting pattern segments and averaging the accumulated area, so that even when the pitch of repetitive patterns slightly differs from the side length of each small region in the pitch direction, a peculiar error does not occur, thereby ensuring highly-precise proximity effect correction and contributing to improving the precision of writing an LSI pattern.

Abstract translation: 图案写入方法获取位于通过将要写入图案的区域划分为小区域而获得的多个小区域中的每一个中的图案区域的区域，并且基于计算出的最佳剂量来写入图案 基于这一领域。 该方法采用移动图案段并平均累积面积的方案，使得即使当重复图案的间距与俯仰方向上的每个小区域的侧边长度稍微不同时，也不会发生特殊的错误， 精确的邻近效应校正，有助于提高写入LSI图案的精度。

公开(公告)号：US06281510B1

公开(公告)日：2001-08-28

申请号：US09562181

申请日：2000-05-02

Applicant: Shusuke Yoshitake ,  Yoshiaki Tsukumo ,  Ryoichi Hirano ,  Toru Tojo ,  Yoshiaki Tada ,  Makoto Kanda

Inventor： Shusuke Yoshitake ,  Yoshiaki Tsukumo ,  Ryoichi Hirano ,  Toru Tojo ,  Yoshiaki Tada ,  Makoto Kanda

IPC: A61N500

CPC classification number: H01L21/67748 ,  H01L21/67751 ,  Y10S438/949

Abstract: A method of transferring a sample to and from a treating chamber kept in a vacuum atmosphere through a pressure regulatively preparatory chamber. The sample is contained in the sample transfer container, which is kept air-permeable by a dust filtering filter, in a cleaned atmosphere before the sample is transferred to the treating chamber. The sample transfer container is transferred into the preparatory chamber, and the inside of the preparatory chamber is evacuated to a vacuum atmosphere. The sample is then extracted from the sample transfer container in the vacuum atmosphere and is transferred into the treating chamber. Also disclosed is an apparatus for supporting the sample transferring method.

Abstract translation: 将样品转移到保持在真空气氛中的处理室通过压力调节室的方法。 在将样品转移到处理室之前，在清洁的气氛中将样品容纳在样品转移容器中，该容器在灰尘过滤过滤器中保持透气。 将样品转移容器转移到准备室中，并将预备室的内部抽真空至真空环境。 然后将样品在真空气氛中从样品转移容器中提取，并转移到处理室中。 还公开了一种用于支持样品转印方法的装置。

公开(公告)号：US6090176A

公开(公告)日：2000-07-18

申请号：US38037

申请日：1998-03-11

Applicant: Shusuke Yoshitake ,  Yoshiaki Tsukumo ,  Ryoichi Hirano ,  Toru Tojo ,  Yoshiaki Tada ,  Makoto Kanda

Inventor： Shusuke Yoshitake ,  Yoshiaki Tsukumo ,  Ryoichi Hirano ,  Toru Tojo ,  Yoshiaki Tada ,  Makoto Kanda

IPC: B65G49/07 ,  H01L21/677 ,  B65D85/90

CPC classification number: H01L21/67748 ,  H01L21/67751 ,  Y10S438/949

Abstract: A method of transferring a sample to and from a treating chamber kept in a vacuum atmosphere through a pressure regulative preparatory chamber. The sample is contained in the sample transfer container, which is kept air-permeable by a dust filtering filter, in a cleaned atmosphere before the sample is transferred to the treating chamber. The sample transfer container is transferred into the preparatory chamber, and the inside of the preparatory chamber is evacuated to a vacuum atmosphere. The sample is then extracted from the sample transfer container in the vacuum atmosphere and is transferred into the treating chamber. Also disclosed is an apparatus for supporting the sample transferring method.

Abstract translation: 将样品转移到保持在真空气氛中的处理室通过压力调节准备室的方法。 在将样品转移到处理室之前，在清洁的气氛中将样品容纳在样品转移容器中，该容器在灰尘过滤过滤器中保持透气。 将样品转移容器转移到准备室中，并将预备室的内部抽真空至真空环境。 然后将样品在真空气氛中从样品转移容器中提取，并转移到处理室中。 还公开了一种用于支持样品转印方法的装置。

公开(公告)号：US6084716A

公开(公告)日：2000-07-04

申请号：US112641

申请日：1998-07-09

Applicant: Yasushi Sanada ,  Toru Tojo ,  Mitsuo Tabata ,  Kyoji Yamashita ,  Hideo Nagai ,  Noboru Kobayashi ,  Hisakazu Yoshino ,  Makoto Taya ,  Akemi Miwa

Inventor： Yasushi Sanada ,  Toru Tojo ,  Mitsuo Tabata ,  Kyoji Yamashita ,  Hideo Nagai ,  Noboru Kobayashi ,  Hisakazu Yoshino ,  Makoto Taya ,  Akemi Miwa

IPC: G01B11/30 ,  G01N21/84 ,  G01N21/88 ,  G01N21/94 ,  G01N21/956 ,  G03F1/84 ,  G03F7/20 ,  H01L21/027 ,  H01L21/66 ,  G02B27/10 ,  G02B27/14

CPC classification number: G03F1/84 ,  G01N21/95607 ,  G03F7/70616

Abstract: A single light emitted from a laser source is split into multiple beams. The multiple beams are illuminated by a multi-beam scanner to scan a substrate of interest. An optical system is provided for focusing the multiple beams independently on the substrate and directing a reflected light or a transmitted light of the multiple beams on the substrate. Aperture regulating members are disposed at equal intervals corresponding to the interval between the multiple beams for controlling the multiple beams directed from the substrate by the optical system. The multiple beams passed through their respective aperture regulating members are received by an optical detector assembly which detect a change in the amount of the multiple beams. The substrate is continuously moved by a movable table on a plane substantially vertical to the multiple beams and in a direction arranged at substantially a right angle to the scanning direction of the multiple beams. Then, a scanned image is produced by an image processor from a signal output of the detector assembly and data of the coordinate location of the movable table and compared by a comparator with a corresponding reference image.

Abstract translation: 从激光源发射的单个光被分成多个光束。 多光束被多光束扫描仪照射以扫描感兴趣的衬底。 提供了一种光学系统，用于将多个光束独立地聚焦在衬底上并且将多个光束的反射光或透射光引导到衬底上。 光圈调节构件以与多个光束之间的间隔相等的间隔设置，用于通过光学系统控制从衬底引导的多个光束。 通过其各自的孔径调节构件的多个光束被检测多个光束的量的变化的光学检测器组件接收。 基板在与多个光束大致垂直的平面上并且在与多个光束的扫描方向大致成直角的方向上由可移动台连续移动。 然后，扫描图像由图像处理器从检测器组件的信号输出和可移动表的坐标位置的数据产生，并由具有相应参考图像的比较器进行比较。

公开(公告)号：US5602645A

公开(公告)日：1997-02-11

申请号：US527633

申请日：1995-09-13

Applicant: Mitsuo Tabata ,  Toru Tojo ,  Kiminobu Akeno ,  Toshiyuki Watanabe ,  Tomohide Watanabe ,  Eiji Yamanaka ,  Chikara Itoh ,  Makoto Taya

Inventor： Mitsuo Tabata ,  Toru Tojo ,  Kiminobu Akeno ,  Toshiyuki Watanabe ,  Tomohide Watanabe ,  Eiji Yamanaka ,  Chikara Itoh ,  Makoto Taya

IPC: G01N21/956 ,  G03F1/84 ,  H01L21/027 ,  G01B11/00

CPC classification number: G03F1/84 ,  G01N21/95607 ,  G03F1/62

Abstract: The present invention provides a pattern evaluating device including light irradiating means for irradiating the rays of light from a light source upon an object, an objective lens through which the light having penetrated through the object passes, an aperture member stopping the diameter of a light beam which has passed the objective lens, a photo receiving element receiving the light beam which has had the diameter stopped by the aperture member, and judging means for evaluating the pattern, following the information of the light received by the photo receiving element and which corresponds to the pattern, wherein the aperture member is capable of changing the numerical aperture, depending whether or not the sample is provided with a pericle.

Abstract translation: 本发明提供了一种图案评估装置，其包括用于将来自光源的光线照射到物体上的光照射装置，穿过物体的光穿过的物镜通过阻止光束直径的孔径构件 已经通过物镜的光接收元件，接收由孔部件阻挡直径的光束的光接收元件，以及用于评估图案的判断装置，遵循由光接收元件接收的光的信息，并且对应于 所述图案，其中所述孔径构件能够根据样品是否设置有微孔而能够改变数值孔径。

公开(公告)号：US4984890A

公开(公告)日：1991-01-15

申请号：US453856

申请日：1989-12-20

Applicant: Toru Tojo ,  Osamu Kuwabara ,  Masashi Kamiya ,  Hisakazu Yoshino

Inventor： Toru Tojo ,  Osamu Kuwabara ,  Masashi Kamiya ,  Hisakazu Yoshino

IPC: G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68

CPC classification number: G03F9/7049

Abstract: A distance between a mask and a wafer is set such that exposure light beams emerged from the mask are converged by the projection lens to be focused on the wafer. Two light beams with same wavelength of the alignment light beam emerge from a first point (b) which is located far away from the mask, and are focused on the wafer or neighborhood of it by the projection lens. Two mask marks of diffraction gratings are formed on the mask and spaced at a predetermined distance from each other. When the alignment light beams are applied to the mask marks, two diffracted light beams of predetermined order emerge individually from the mask marks in such a manner that the respective optical axes of the two diffracted light beams, which are directed oppositely to of the diffracted light beams, intersect each other on the first point. Thus, the diffracted light beams advance as if the diffracted light beams were the two light beams emerging from the first point. Therefore, the two diffracted light beams can be focused on the wafer or neighborhood of it or can be incident on a wafer mark which is a diffraction grating. Thus, rediffracted light beams emerge from the wafer mark and are detected, so that the mask and the wafer are aligned with each other. Accordingly, the alignment can be performed, despite a great diffraction between the wave-lengths of the exposure light beam and the alignment light beam.

公开(公告)号：US4578607A

公开(公告)日：1986-03-25

申请号：US664964

申请日：1984-10-26

Applicant: Toru Tojo ,  Kazuyoshi Sugihara

Inventor： Toru Tojo ,  Kazuyoshi Sugihara

IPC: H02N2/00 ,  H01L41/09 ,  H02N2/10 ,  H01L41/08

CPC classification number: H02N2/101

Abstract: In a precise rotation mechanism for slightly rotating an object, a drive disk is placed on a flat and smooth surface of a base and rotating disk is mounted on the disk surface of the drive disk and rotatably supported by a pivot bearing on a coupling section of the drive disk. Fixed sections of the drive disk are fixed on the base and movable sections of the drive disk are tiltably coupled to the fixed sections through the coupling section by elastic hinges and also coupled to the fixed sections by driving members made of piezoelectric elements, which are elongated/contracted upon application of a voltage to slightly move the movable sections. Fixing members made of the piezoelectric elements are respectively fixed to the movable sections. When one of the fixing members is contracted, the rotating disk is urged by one of the fixing members against the movable sections and is movable together with the movable sections.

Abstract translation: 在用于稍微旋转物体的精确旋转机构中，驱动盘被放置在基座的平坦且平滑的表面上，并且旋转盘安装在驱动盘的盘表面上并且由枢转轴承可旋转地支撑在联接部分 驱动盘。 驱动盘的固定部分固定在基座上，驱动盘的可移动部分通过弹性铰链通过联接部分可转动地连接到固定部分，并且还通过由压电元件制成的驱动部件连接到固定部分 施加电压以稍微移动可动部分时收缩。 由压电元件制成的固定件分别固定在可动部分上。 当固定构件中的一个收缩时，旋转盘被固定构件中的一个推压到可动部分上，并且与可动部分一起移动。