公开(公告)号：US20110266439A1

公开(公告)日：2011-11-03

申请号：US13096865

申请日：2011-04-28

申请人： Uwe Luecken ,  Alan Frank de Jong ,  Gerrit Cornelis van Hoften ,  Frank Jeroen Pieter Schuurmans

发明人： Uwe Luecken ,  Alan Frank de Jong ,  Gerrit Cornelis van Hoften ,  Frank Jeroen Pieter Schuurmans

IPC分类号： H01J37/295

CPC分类号： H01J37/244 ,  H01J37/256 ,  H01J37/26 ,  H01J37/265 ,  H01J37/2955 ,  H01J2237/05 ,  H01J2237/221 ,  H01J2237/2446

摘要： A method of using a direct electron detector in a TEM, in which an image with a high intensity peak, such as a diffractogram or an EELS spectrum, is imaged on said detector. As known the high intensity peak may damage the detector. To avoid this damage, the centre of the image is moved, as a result of which not one position of the detector is exposed to the high intensity, but the high intensity is smeared over the detector, displacing the high intensity peak before damage results.

摘要翻译： 在TEM中使用直接电子检测器的方法，其中具有高强度峰的图像，例如衍射图或EELS光谱，在所述检测器上成像。 众所周知，高强度峰值可能会损坏检测器。 为了避免这种损伤，图像的中心被移动，结果是检测器的一个位置没有暴露于高强度，但是高强度被污染在检测器上，在损坏结果之前移位高强度峰值。

公开(公告)号：US07852460B2

公开(公告)日：2010-12-14

申请号：US11482147

申请日：2006-07-07

申请人： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Frank Jeroen Pieter Schuurmans ,  Hugo Matthieu Visser

发明人： Levinus Pieter Bakker ,  Jeroen Jonkers ,  Frank Jeroen Pieter Schuurmans ,  Hugo Matthieu Visser

IPC分类号： G03B27/54

CPC分类号： B82Y10/00 ,  G02B17/004 ,  G02B17/006 ,  G02B27/0043 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891 ,  G03F7/70916

摘要： A lithographic projection apparatus includes a reflector assembly, the reflector assembly includes a first and a second reflector extending in a direction of an optical axis, the first and second reflector each having a reflective surface, a backing surface and an entry section at respectively a first and a second distance from the optical axis, the first distance being larger than the second distance, rays deriving from a point on the optical axis being cut off by the entry sections of the first and second reflectors and being reflected on the reflective surface of the first reflector and defining a high radiation intensity zone and a low radiation intensity zone between the reflectors; a radial support member configured to support the reflectors extending in the low radiation intensity zone, wherein the radial support member creates a shade in a downstream direction of the optical axis and a virtual shade in an upstream direction of the optical axis; and a structure placed in the virtual shade.

摘要翻译： 光刻投影设备包括反射器组件，反射器组件包括沿光轴方向延伸的第一和第二反射器，第一和第二反射器各自具有反射表面，背衬表面和入口部分分别为第一 并且与所述光轴的距离为第二距离，所述第一距离大于所述第二距离，从所述光轴上的点导出的光线被所述第一反射器和所述第二反射器的入射部分切断并且在所述光轴的反射表面上被反射 第一反射器并且在反射器之间限定高辐射强度区域和低辐射强度区域; 径向支撑构件，构造成支撑在低辐射强度区域中延伸的反射器，其中径向支撑构件在光轴的下游方向上产生阴影，并在光轴的上游方向上产生虚拟阴影; 以及放置在虚拟阴影中的结构。

公开(公告)号：US07714306B2

公开(公告)日：2010-05-11

申请号：US11512432

申请日：2006-08-30

申请人： Johannes Hubertus Josephina Moors ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

发明人： Johannes Hubertus Josephina Moors ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G21K5/10

CPC分类号： G03F7/70916 ,  G03F7/70983

摘要： A lithographic apparatus includes a radiation source configured to emit radiation to form a radiation beam, the radiation being of a type which can create plasma in a low pressure environment in the apparatus, and an optical component configured to condition the radiation beam, impart the conditioned radiation beam with a pattern in its cross-section to form a patterned radiation beam, project the patterned radiation beam onto a target portion of a substrate, and/or to detect radiation. The optical component is provided with a plasma quenching structure, the plasma quenching structure being configured to provide electron-ion recombination in, on and/or near the optical component.

摘要翻译： 光刻设备包括被配置为发射辐射以形成辐射束的辐射源，该辐射是能够在该设备中的低压环境中产生等离子体的类型，以及被配置为调节辐射束的光学部件， 辐射束在其横截面上具有图案以形成图案化的辐射束，将图案化的辐射束投影到衬底的目标部分上和/或检测辐射。 光学部件设置有等离子体淬火结构，等离子体淬火结构被配置为在光学部件的内部和/或附近提供电子 - 离子复合。

公开(公告)号：US07630060B2

公开(公告)日：2009-12-08

申请号：US10962744

申请日：2004-10-13

申请人： Joost Jeroen Ottens ,  Levinus Pieter Bakker ,  Wilhelmus Josephus Box ,  Jan Van Elp ,  Frank Jeroen Pieter Schuurmans ,  Jan Evert Van Der Werf

发明人： Joost Jeroen Ottens ,  Levinus Pieter Bakker ,  Wilhelmus Josephus Box ,  Jan Van Elp ,  Frank Jeroen Pieter Schuurmans ,  Jan Evert Van Der Werf

IPC分类号： G03B27/32

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70425 ,  G03F7/70433 ,  H01J37/3026 ,  H01J2237/31764

摘要： A device manufacturing method is disclosed. The method includes patterning a beam of radiation, projecting the patterned beam of radiation onto a plurality of outer target portions of a substrate in a sequence in which each subsequent outer target portion is spaced-apart from a preceding outer target portion, and subsequent to projecting the patterned beam of radiation on the plurality of outer target portions, projecting the patterned beam of radiation onto an inner target portion of the substrate.

摘要翻译： 公开了一种器件制造方法。 该方法包括图案化辐射束，将图案化的辐射束投射到基板的多个外部目标部分上，其中每个后续的外部目标部分与先前的外部目标部分间隔开，并且随后突出 所述图案化的辐射束在所述多个外部目标部分上，将所述图案化的辐射束投影到所述衬底的内部目标部分上。

公开(公告)号：US20090284814A1

公开(公告)日：2009-11-19

申请号：US12294258

申请日：2007-03-29

申请人： Frank Jeroen Pieter Schuurmans ,  Levinus Pieter Bakker

发明人： Frank Jeroen Pieter Schuurmans ,  Levinus Pieter Bakker

IPC分类号： G03H1/04

CPC分类号： G11B7/0065 ,  G03H1/16 ,  G03H2210/22 ,  G03H2223/13 ,  G03H2225/55 ,  G11B7/1367

摘要： The present invention relates to a setup for storing data in a holographic storage medium, said setup comprising a spatial light modulator (SLM) (18) and a phase plate (50), the spatial light modulator having a first pixel structure, the phase plate having a second pixel structure, and the first and the second pixel structures being aligned with each other, wherein a pitch of the second pixel structure is an integer multiple of a pitch of the first pixel structure, the integer multiple being strictly greater than 1.

摘要翻译： 本发明涉及用于在全息存储介质中存储数据的设置，所述设置包括空间光调制器（SLM）（18）和相位板（50），所述空间光调制器具有第一像素结构，所述相位板 具有第二像素结构，并且第一和第二像素结构彼此对准，其中第二像素结构的间距是第一像素结构的间距的整数倍，整数倍严格地大于1。

公开(公告)号：US07592610B2

公开(公告)日：2009-09-22

申请号：US10968471

申请日：2004-10-20

申请人： Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

发明人： Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G21K1/06 ,  G02B1/10 ,  G03F7/20

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F7/70166 ,  G03F7/70316 ,  G03F7/70916 ,  G03F7/70958 ,  G21K1/06

摘要： A top layer of a predetermined metal is provided on a mirror for use in a lithographic apparatus having source to provide radiation of a desired wavelength. The source generates a stream of undesired metal particles that are deposited to form smaller and larger nuclei on the mirror. The top layer may interdiffuse in a predetermined temperature range with nuclei of the metal deposition. An additional layer of an alloy of the metal particles and the metal of the top layer is formed that has a higher reflectivity than a layer only comprising the metal particles would have.

摘要翻译： 预定金属的顶层设置在用于具有源以提供期望波长的辐射的光刻设备的反射镜上。 源产生不想要的金属颗粒流，其沉积以在反射镜上形成更小和更大的核。 顶层可以在与金属沉积的核的预定温度范围内相互扩散。 形成金属颗粒和顶层金属的合金的附加层，其具有比仅包含金属颗粒将具有的层更高的反射率。

公开(公告)号：US07485881B2

公开(公告)日：2009-02-03

申请号：US11319199

申请日：2005-12-28

申请人： Arnoud Cornelis Wassink ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

发明人： Arnoud Cornelis Wassink ,  Levinus Pieter Bakker ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G02B5/08 ,  G03B27/54 ,  G21G5/00

CPC分类号： G03F7/70916

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统，配置成将辐射束投影到衬底上的投影系统，以及用于将碎屑颗粒从辐射束中过滤的过滤系统。 过滤器系统包括用于捕集碎片颗粒的多个箔，用于保持多个箔的支撑件，以及具有布置成要冷却的表面的冷却系统。 冷却系统和支撑件相对于彼此定位，使得在冷却系统的表面和支撑件之间形成间隙。 冷却系统还被布置成将气体注入到间隙中。

公开(公告)号：US07468521B2

公开(公告)日：2008-12-23

申请号：US11319190

申请日：2005-12-28

申请人： Derk Jan Wilfred Klunder ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Frank Jeroen Pieter Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Johannes Wilhelmus Van Herpen

发明人： Derk Jan Wilfred Klunder ,  Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Frank Jeroen Pieter Schuurmans ,  Dominik Vaudrevange ,  Maarten Marinus Johannes Wilhelmus Van Herpen

IPC分类号： G21G5/00 ,  G01J3/10 ,  G03B27/52

CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70166

摘要： A lithographic apparatus includes a radiation system for providing a beam of radiation. The radiation system includes at least one of a contaminant trap for trapping material emanating from the radiation source and a collector for collecting the beam of radiation. The at least one of the contaminant trap and the collector includes an element arranged in the path of the radiation beam on which the material emanating from the radiation source can deposit during propagation of the radiation beam in the radiation system. At least a part of the element disposed in the path of the radiation beam has a surface that has a highly specular grazing incidence reflectivity to reduce the absorption of the radiation beam in a direction of propagation of the radiation beam substantially non-parallel to the surface of the element, so that a thermal load experienced by the element is reduced.

摘要翻译： 光刻设备包括用于提供辐射束的辐射系统。 辐射系统包括用于捕获从辐射源发出的材料的污染物阱和用于收集辐射束的收集器中的至少一个。 污染物捕集阱和收集器中的至少一个包括布置在辐射束的路径中的元件，在辐射束的辐射束在辐射系统中的传播期间，从辐射源发出的材料可以沉积。 设置在辐射束的路径中的元件的至少一部分具有表面，该表面具有高镜面的掠入射反射率，以减少辐射束在基本上不平行于表面的辐射束的传播方向上的吸收 的元件，使得元件经历的热负荷降低。

公开(公告)号：US08338782B2

公开(公告)日：2012-12-25

申请号：US13217088

申请日：2011-08-24

申请人： Uwe Luecken ,  Remco Schoenmakers ,  Frank Jeroen Pieter Schuurmans

发明人： Uwe Luecken ,  Remco Schoenmakers ,  Frank Jeroen Pieter Schuurmans

IPC分类号： H01J37/26 ,  G01N23/00 ,  G21K7/00

CPC分类号： H01J37/222 ,  H01J37/26 ,  H01J37/265 ,  H01J2237/2446

摘要： In a transmission electron microscope detector system, image data is read out from the pixels and analyzed during an image acquisition period. The image acquisition process is modified depending on the results of the analysis. For example, the analyses may indicate the inclusion in the data of an image artifact, such as charging or bubbling, and data including the artifact may be eliminated form the final image. CMOS detectors provide for selective read out of pixels at high data rates, allowing for real-time adaptive imaging.

摘要翻译： 在透射电子显微镜检测器系统中，从像素读出图像数据，并在图像采集期间进行分析。 图像采集过程根据分析结果进行修改。 例如，分析可以指示在图像伪像的数据中包括例如充电或冒泡，并且可以从最终图像中消除包括伪影的数据。 CMOS检测器提供以高数据速率选择性读出像素，允许实时自适应成像。

公开(公告)号：US20120049061A1

公开(公告)日：2012-03-01

申请号：US13217088

申请日：2011-08-24

申请人： Uwe Luecken ,  Remco Schoenmakers ,  Frank Jeroen Pieter Schuurmans

发明人： Uwe Luecken ,  Remco Schoenmakers ,  Frank Jeroen Pieter Schuurmans

IPC分类号： H01J37/26

CPC分类号： H01J37/222 ,  H01J37/26 ,  H01J37/265 ,  H01J2237/2446

摘要： In a transmission electron microscope detector system, image data is read out from the pixels and analyzed during an image acquisition period. The image acquisition process is modified depending on the results of the analysis. For example, the analyses may indicate the inclusion in the data of an image artifact, such as charging or bubbling, and data including the artifact may be eliminated form the final image. CMOS detectors provide for selective read out of pixels at high data rates, allowing for real-time adaptive imaging.

摘要翻译： 在透射电子显微镜检测器系统中，从像素读出图像数据，并在图像采集期间进行分析。 图像采集过程根据分析结果进行修改。 例如，分析可以指示在图像伪像的数据中包括例如充电或冒泡，并且可以从最终图像中消除包括伪影的数据。 CMOS检测器提供以高数据速率选择性读出像素，允许实时自适应成像。