Imaging Apparatus for Combined Temperature and Luminescence Spatial Imaging of an Object
    31.
    发明申请
    Imaging Apparatus for Combined Temperature and Luminescence Spatial Imaging of an Object 审中-公开
    用于物体的组合温度和发光空间成像的成像装置

    公开(公告)号:US20090194693A1

    公开(公告)日:2009-08-06

    申请号:US12301642

    申请日:2007-05-14

    IPC分类号: G01N21/64 G01N21/76

    摘要: An imaging apparatus is disclosed for combined temperature and luminescence spatial imaging of an object (1), such as a bio-array for detection of biological molecules. Light (5) is separated into a first (10) and a second (20) optical path, where the first optical path (10) guides infrared (IR), and the second optical path (20) guides luminescence light, preferably fluorescence light, from the object (1). Image intensifying means (30) converts infrared light (10a) in the first optical path into intensified light (10b), preferably visible light. Photo detection means (100) are arranged for spatial imaging of the object (1), the photo detection means being arranged for alternately receiving light from the first (10) and the second (20) optical path. Processing means (200) are capable of combining a temperature image (11) with a luminescence image (21) so as to obtain a combined image (25) of the object with a direct spatial correspondence between the two images. For bio-arrays this provides many advantages in relation to combined imaging of an array, whereupon numerous probe molecules are located.

    摘要翻译: 公开了用于物体(1)的组合温度和发光空间成像的成像装置,例如用于检测生物分子的生物阵列。 光(5)被分离为第一光路(10)和第二光路(20),其中第一光路(10)引导红外(IR),第二光路(20)引导发光,优选荧光 ,从对象(1)。 图像增强装置(30)将第一光路中的红外光(10a)转换成强光(10b),优选可见光。 照片检测装置(100)布置成用于物体(1)的空间成像,光检测装置被布置成交替地接收来自第一光(10)和第(20)光路的光。 处理装置(200)能够将温度图像(11)与发光图像(21)组合,从而以两个图像之间的直接空间对应来获得对象的组合图像(25)。 对于生物阵列,这提供了与阵列的组合成像相关的许多优点,因此存在许多探针分子。

    Imprint lithography
    33.
    发明申请
    Imprint lithography 有权
    印刷光刻

    公开(公告)号:US20060180952A1

    公开(公告)日:2006-08-17

    申请号:US11155941

    申请日:2005-02-17

    IPC分类号: B29C59/02 C23F1/00 B28B11/08

    摘要: An imprinting method is disclosed that includes applying an imprinting force to a template to cause the template to contact an imprintable medium on a target region of a first surface of a substrate to form an imprint in the medium, during application of the imprinting force, applying a compensating force to a second surface of the substrate which is opposite to the first surface so as to reduce deformation of the substrate caused by the application of the imprinting force, and separating the template from the imprinted medium.

    摘要翻译: 公开了一种压印方法,其包括对模板施加压印力,以使得模板在施加压印力的同时在介质的第一表面的目标区域上接触可压印的介质以形成印记, 对基板的与第一表面相对的第二表面的补偿力,以减少由施加压印力引起的基板的变形,以及将模板与压印介质分离。

    LENS SYSTEM
    35.
    发明申请
    LENS SYSTEM 审中-公开
    镜头系统

    公开(公告)号:US20090116125A1

    公开(公告)日:2009-05-07

    申请号:US12302049

    申请日:2007-05-25

    IPC分类号: G02B9/00 G02B17/00 G01J5/08

    摘要: The present invention concerns a lens system. More specifically, it concerns a lens system comprising a first lens (3), a deflection element (5) and a second lens (6), wherein the deflection element (5) is arranged between the first lens (3) and the second lens (6). The deflection element comprises at least a first annular zone and a second annular zone, the annular zones being arranged in a concentric fashion and wherein the deflection angle of each annular zone is different from the deflection angle of every other annular zone. Furthermore, the present invention concerns a temperature analysis system comprising a lens system and the use of a temperature analysis system.

    摘要翻译: 本发明涉及一种透镜系统。 更具体地,涉及一种包括第一透镜(3),偏转元件(5)和第二透镜(6)的透镜系统,其中偏转元件(5)布置在第一透镜(3)和第二透镜 (6)。 偏转元件至少包括第一环形区域和第二环形区域,环形区域以同心方式布置,并且其中每个环形区域的偏转角度与每隔一个环形区域的偏转角度不同。 此外,本发明涉及包括透镜系统和使用温度分析系统的温度分析系统。

    Imprint lithography
    38.
    发明申请

    公开(公告)号:US20060230959A1

    公开(公告)日:2006-10-19

    申请号:US11108904

    申请日:2005-04-19

    IPC分类号: B41G7/00

    摘要: An imprint template configured to imprint an imprintable medium by an imprint lithography process is disclosed, the imprint template having a pattern with a pattern density corresponding to a volume of imprintable medium used to substantially fill pattern features per unit area of a contact face of the imprint template, wherein adjacent regions of the pattern on the imprint template contact face, each of which will provide different functionality once imprinted onto a substrate, have substantially the same pattern density, have differences in pattern density which are minimized, or differences in pattern density which are maintained below a maximum.

    Imprint lithography
    39.
    发明申请
    Imprint lithography 审中-公开
    印刷光刻

    公开(公告)号:US20060144814A1

    公开(公告)日:2006-07-06

    申请号:US11025606

    申请日:2004-12-30

    摘要: An imprinting method is disclosed, which in an embodiment, involves contacting an imprintable medium on a substrate with a template to form an imprint in the medium comprising a pattern feature and an area of reduced thickness, separating the template from the imprinted medium, and, after separating the template from the imprinted medium, providing a layer of an etch resistant material on the pattern feature.

    摘要翻译: 公开了一种压印方法,其在一个实施例中涉及使基板上的可压印介质与模板接触以在介质中形成压印,所述压印包括图案特征和厚度减小的区域,将模板与压印介质分离, 在从压印介质分离模板之后,在图案特征上提供耐蚀刻材料层。