公开(公告)号：US20130183624A1

公开(公告)日：2013-07-18

申请号：US13789742

申请日：2013-03-08

Applicant: JSR CORPORATION

Inventor： Ken MARUYAMA

IPC: G03F7/033 ,  H01L21/00

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/033 ,  G03F7/0382 ,  G03F7/0388 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  Y10S430/126

Abstract: A radiation-sensitive resin composition includes a compound represented by a formula (1), and a polymer that serves as a base resin. R1 is a monovalent group that includes at least two groups of —CO—, —NH—, —S—, and —SO2—, the at least two groups being each identical or different. A is a divalent hydrocarbon group or a divalent fluorohydrocarbon group having 1 to 5 carbon atoms. R is a fluorine atom or a hydrogen atom. a is an integer from 1 to 4. In a case where a plurality of R are present, each of the plurality of R is either identical or different. M+ is a monovalent cation.

Abstract translation: 辐射敏感性树脂组合物包括由式（1）表示的化合物和用作基础树脂的聚合物。 R1是包含-CO-，-NH-，-S-和-SO2-的至少两个基团的一价基团，所述至少两个基团各自相同或不同。 A为二价烃基或碳原子数为1〜5的二价氟代烃基。 R是氟原子或氢原子。 a是从1到4的整数。在存在多个R的情况下，多个R中的每一个都是相同的或不同的。 M +是一价阳离子。

公开(公告)号：US20130149644A1

公开(公告)日：2013-06-13

申请号：US13759118

申请日：2013-02-05

Applicant: JSR Corporation

Inventor： Ken MARUYAMA

IPC: G03C1/73 ,  C07C309/06

CPC classification number: G03C1/73 ,  C07C25/18 ,  C07C309/06 ,  C07C309/25 ,  C07C381/12 ,  C07C2601/04 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2601/18 ,  C07D307/93 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041

Abstract: A radiation-sensitive composition includes a photoacid generator represented by a general formula (1), and a solvent. Each R0 independently represents a hydrogen atom, a fluorine atom, or a substituted or unsubstituted monovalent organic group. R1 represents a fluorine atom or a substituted or unsubstituted monovalent organic group. R2 represents a fluorine atom or a substituted or unsubstituted monovalent organic group. Rf represents a fluoromethylene group or a divalent fluoroalkylene group. M+ represents a monovalent onium cation. Optionally R1 bonds to Rf or R2 to form a cyclic structure.

Abstract translation: 辐射敏感性组合物包括由通式（1）表示的光酸产生剂和溶剂。 每个R 10独立地表示氢原子，氟原子或取代或未取代的一价有机基团。 R1表示氟原子或取代或未取代的一价有机基团。 R2表示氟原子或取代或未取代的一价有机基团。 Rf表示氟亚甲基或二氟氟代亚烷基。 M +表示单价鎓阳离子。 任选地，R 1与R f或R 2键合形成环状结构。

公开(公告)号：US20240329523A1

公开(公告)日：2024-10-03

申请号：US18618304

申请日：2024-03-27

Applicant: JSR CORPORATION

Inventor： Ken MARUYAMA

IPC: G03F7/004 ,  C08F212/14 ,  C08F220/30 ,  G03F7/038 ,  G03F7/039

CPC classification number: G03F7/0045 ,  C08F212/24 ,  C08F220/301 ,  G03F7/038 ,  G03F7/039

Abstract: A radiation-sensitive composition includes: a polymer comprising a first structural unit represented by formula (1); and a compound comprising an anion and a radiation-sensitive onium cation. At least one of the polymer and the compound has a ring structure having at least one iodine atom bonded to the ring structure. R1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; L1 represents a single bond, —COO—, or —CONH—; Ar1 represents a group obtained by removing two hydrogen atoms from a substituted or unsubstituted aromatic hydrocarbon ring; and R2 represents an acid-labile group.

公开(公告)号：US20240004288A1

公开(公告)日：2024-01-04

申请号：US18025989

申请日：2021-08-03

Applicant: JSR CORPORATION

Inventor： Ken MARUYAMA

IPC: G03F7/004 ,  C08F220/18 ,  C08F220/28 ,  G03F7/039 ,  G03F7/038

CPC classification number: G03F7/0045 ,  C08F220/1807 ,  C08F220/1806 ,  G03F7/038 ,  C08F220/283 ,  C08F220/1802 ,  G03F7/039 ,  C08F220/1809

Abstract: Provided is a radiation-sensitive resin composition capable of exhibiting sensitivity and CDU performance at a sufficient level when a next-generation technology is applied, and a method for forming a pattern. A radiation-sensitive resin composition contains one or two or more onium salts containing an organic acid anion moiety and an onium cation moiety, a compound having a structure in which an alkoxycarbonyl group is bonded to a nitrogen atom, and a solvent, wherein at least part of the organic acid anion moiety in the onium salt contains an iodine-substituted aromatic ring structure, and at least part of the onium cation moiety contains a fluorine-substituted aromatic ring structure.

公开(公告)号：US20230400768A1

公开(公告)日：2023-12-14

申请号：US18266061

申请日：2021-11-15

Applicant: JSR CORPORATION

Inventor： Ken MARUYAMA

IPC: G03F7/039 ,  G03F7/004 ,  C08F220/18 ,  C08F212/14 ,  C08F220/30 ,  G03F7/038

CPC classification number: G03F7/039 ,  G03F7/0045 ,  C08F220/1807 ,  C08F220/1818 ,  C08F212/24 ,  C08F220/301 ,  G03F7/038

Abstract: A radiation-sensitive composition includes: a polymer (A) including a structural unit having a hydroxyl group bonded to an aromatic ring; and an acid-generating compound including a radiation-sensitive onium cation and an organic anion (provided that the polymer (A) is excluded), in which, at least one compound selected from the group consisting of the polymer (A) and the acid-generating compound includes a radiation-sensitive onium cation structure [X] having two or more of at least one substituent β selected from the group consisting of a fluoroalkyl group and a fluoro group (provided that the fluoro group in the fluoroalkyl group is excluded); and an organic anion structure [Y] having an iodo group, in the same compound or different compounds.

公开(公告)号：US20230205082A9

公开(公告)日：2023-06-29

申请号：US17731758

申请日：2022-04-28

Applicant: JSR CORPORATION

Inventor： Ken MARUYAMA

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C08F220/18

CPC classification number: G03F7/0045 ,  G03F7/038 ,  G03F7/039 ,  C08F220/1807 ,  C08F220/1808 ,  C08F220/1812 ,  C08F220/1818 ,  G03F7/162

Abstract: A radiation-sensitive composition includes a polymer including first and second structural units, a first compound that generates a first acid upon irradiation with radioactive ray, and a second compound that generates a second acid upon irradiation with radioactive ray. The first structural unit includes an acid-labile group, the first acid does not substantially dissociate the acid-labile group under 110° C. and a period of 1 min, the second acid dissociates the acid-labile group under 110° C. and a period of 1 min, and the second structural unit includes a monovalent group of formula (X),




where Ar1 is a group obtained by removing (a+b) hydrogen atoms from an unsubstituted aryl group, RXA is a monovalent iodine atom, an iodinated alkyl group or an iodinated alkoxy group, RXB is a monovalent organic group, a is an integer of 1 to 10, and b is an integer of 1 to 10.

公开(公告)号：US20220334481A1

公开(公告)日：2022-10-20

申请号：US17854048

申请日：2022-06-30

Applicant: JSR CORPORATION

Inventor： Takuhiro TANIGUCHI ,  Katsuaki NISHIKORI ,  Hayato NAMAI ,  Kazuya KIRIYAMA ,  Ken MARUYAMA

IPC: G03F7/039 ,  C08G75/20

Abstract: A radiation-sensitive resin composition includes: a polymer including a structural unit including an acid-labile group; and a compound represented by formula (1). R1, R2, and R3 each independently represent a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms; X1, X2, and X3 each independently represent a group represented by formula (2); a sum of d, e, and f is no less than 1; R4 represents a hydrocarbon group having 1 to 20 carbon atoms and R5 represents a hydrocarbon group having 1 to 20 carbon atoms, or R4 and R5 taken together represent a heterocyclic structure having 4 to 20 ring atoms, together with the sulfur atom to which R4 and R5 bond; n is 0 or 1; A− represents a monovalent sulfonic acid anion; and Y represents —COO—, —OCO—, or —N(R7)CO—.

公开(公告)号：US20220299875A1

公开(公告)日：2022-09-22

申请号：US17677173

申请日：2022-02-22

Applicant: JSR CORPORATION

Inventor： Ken MARUYAMA

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/20 ,  G03F7/32 ,  G03F7/11 ,  G03F7/38 ,  G03F7/40 ,  G03F7/16

Abstract: A radiation-sensitive resin composition includes: a resin including a structural unit represented by formula (1); and a solvent containing propylene glycol monomethyl ether and alkyl lactate. The solvent does not contain propylene glycol monomethyl ether acetate or contains propylene glycol monomethyl ether acetate in a content of 5% by mass or less in the solvent. The radiation-sensitive resin composition further includes a radiation-sensitive acid generator, or the resin further includes a structural unit having a radiation-sensitive acid generating structure. In the formula (1), RT is a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group. RX is a monovalent hydrocarbon group having 1 to 20 carbon atoms. Cy represents an alicyclic structure having 3 to 20 ring members formed together with the carbon atom to which Cy is bonded.

公开(公告)号：US20140154625A9

公开(公告)日：2014-06-05

申请号：US13937048

申请日：2013-07-08

Applicant: JSR CORPORATION

Inventor： Ken MARUYAMA

IPC: G03F7/004

CPC classification number: G03F7/0045 ,  C07C309/06 ,  C07C309/12 ,  C07C381/12 ,  C07D493/08 ,  C08K5/42 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  C08L101/00

Abstract: A radiation-sensitive resin composition includes a compound represented by a formula (1), and a base polymer. In the formula (1), R1 is a group represented by a formula (a1), and M+ represents a radiation-degradable monovalent cation. In the formula (a1), R2 represents a substituted or unsubstituted chain hydrocarbon group having 1 to 30 carbon atoms, or the like. R3 represents a substituted or unsubstituted divalent hydrocarbon group having 1 to 30 carbon atoms, or the like. R41 represents —CO—, or the like. R42 represents —CO—, or the like. m is an integer of 0 to 2. n is an integer of 0 to 1. A site denoted by * is a binding site with —O— in the formula (1).

Abstract translation: 辐射敏感性树脂组合物包含由式（1）表示的化合物和基础聚合物。 式（1）中，R 1表示由式（a1）表示的基团，M +表示放射线降解性一价阳离子。 式（a1）中，R 2表示取代或未取代的碳原子数1〜30的链状烃基等。 R3表示取代或未取代的碳原子数1〜30的二价烃基等。 R 41表示-CO-等。 R 42表示-CO-等。 m为0〜2的整数.n为0〜1的整数。*表示的位置是式（1）中的-O-的结合位点。

公开(公告)号：US20130295505A1

公开(公告)日：2013-11-07

申请号：US13937048

申请日：2013-07-08

Applicant: JSR CORPORATION

Inventor： Ken MARUYAMA

IPC: G03F7/004

CPC classification number: G03F7/0045 ,  C07C309/06 ,  C07C309/12 ,  C07C381/12 ,  C07D493/08 ,  C08K5/42 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  C08L101/00

Abstract: A radiation-sensitive resin composition includes a compound represented by a formula (1), and a base polymer. In the formula (1), R1 is a group represented by a formula (a1), and M+ represents a radiation-degradable monovalent cation. In the formula (a1), R2 represents a substituted or unsubstituted chain hydrocarbon group having 1 to 30 carbon atoms, or the like. R3 represents a substituted or unsubstituted divalent hydrocarbon group having 1 to 30 carbon atoms, or the like. R41 represents —CO—, or the like. R42 represents —CO—, or the like. m is an integer of 0 to 2. n is an integer of 0 to 1. A site denoted by * is a binding site with —O— in the formula (1).

Abstract translation: 辐射敏感性树脂组合物包含由式（1）表示的化合物和基础聚合物。 式（1）中，R 1表示由式（a1）表示的基团，M +表示放射线降解性一价阳离子。 式（a1）中，R 2表示取代或未取代的碳原子数1〜30的链状烃基等。 R3表示取代或未取代的碳原子数1〜30的二价烃基等。 R 41表示-CO-等。 R 42表示-CO-等。 m为0〜2的整数.n为0〜1的整数。*表示的位置是式（1）中的-O-的结合位点。