公开(公告)号：US20210175132A1

公开(公告)日：2021-06-10

申请号：US17179379

申请日：2021-02-18

Applicant: KLA-Tencor Corporation

Inventor： Barak Bringoltz ,  Evgeni Gurevich ,  Ido Adam ,  Yoel Feler ,  Dror Alumot ,  Yuval Lamhot ,  Noga Sella ,  Yaron De Leeuw ,  Tal Yaziv ,  Eltsafon Ashwal-Island ,  Lilach Saltoun ,  Tom Leviant

IPC: H01L21/66 ,  G06F16/28 ,  G03F9/00 ,  G03F7/20

Abstract: Methods, metrology modules and target designs are provided, which improve the accuracy of metrology measurements. Methods provide flexible handling of multiple measurement recipes and setups and enable relating them to landscape features that indicate their relation to resonance regions and to flat regions. Clustering of recipes, self-consistency tests, common processing of aggregated measurements, noise reduction, cluster analysis, detailed analysis of the landscape and targets with skewed cells are employed separately or in combination to provide cumulative improvements of measurement accuracy.

公开(公告)号：US10126238B2

公开(公告)日：2018-11-13

申请号：US15841219

申请日：2017-12-13

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Andrew Hill ,  Daniel Kandel ,  Ilan Sela ,  Ohad Bachar ,  Barak Bringoltz

IPC: G01N21/55 ,  G01B11/00 ,  G01N21/956 ,  G01N21/95

Abstract: Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a test pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the test pattern and the scanning is carried out optically or mechanically according to a scanning pattern, and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.

公开(公告)号：US09909982B2

公开(公告)日：2018-03-06

申请号：US14244179

申请日：2014-04-03

Applicant: KLA-Tencor Corporation

Inventor： Barak Bringoltz ,  Irina Vakshtein ,  Ofir Aharon ,  Guy Ben Dov ,  Zeev Bomzon

IPC: G01C19/00 ,  G01N21/47 ,  G03F7/20

CPC classification number: G01N21/4785 ,  G03F7/70633

Abstract: Methods and calibrations modules are provided, for calibrating a pupil center in scatterometry overlay measurements. The calibration comprises calculating fluctuations from a first statistical figure of merit such as an average of an overlay signal per pixel at the pupil and significantly reducing, for example minimizing, the fluctuations with respect to a second statistical figure of merit thereof, such as a pupil weighted variance of the fluctuations.

公开(公告)号：US09903711B2

公开(公告)日：2018-02-27

申请号：US15090389

申请日：2016-04-04

Applicant: KLA-Tencor Corporation

Inventor： Ady Levy ,  Daniel Kandel ,  Michael E. Adel ,  Leonid Poslavsky ,  John Robinson ,  Tal Marciano ,  Barak Bringoltz ,  Tzahi Grunzweig ,  Dana Klein ,  Tal Itzkovich ,  Nadav Carmel ,  Nuriel Amir ,  Vidya Ramanathan ,  Janay Camp ,  Mark Wagner

IPC: G01B11/14 ,  G01B11/27 ,  G01N21/95 ,  G03F7/20 ,  G01N21/21 ,  G01N21/31 ,  G01N21/41 ,  G01N21/47 ,  G01N21/64

CPC classification number: G01B11/272 ,  G01N21/211 ,  G01N21/31 ,  G01N21/41 ,  G01N21/4738 ,  G01N21/4788 ,  G01N21/6489 ,  G01N21/9501 ,  G01N2021/213 ,  G03F7/705 ,  G03F7/70525 ,  G03F7/70533 ,  G03F7/70616

Abstract: A metrology performance analysis system includes a metrology tool including one or more detectors and a controller communicatively coupled to the one or more detectors. The controller is configured to receive one or more metrology data sets associated with a metrology target from the metrology tool in which the one or more metrology data sets include one or more measured metrology metrics and the one or more measured metrology metrics indicate deviations from nominal values. The controller is further configured to determine relationships between the deviations from the nominal values and one or more selected semiconductor process variations, and determine one or more root causes of the deviations from the nominal values based on the relationships between values of the one or more metrology metrics and the one or more selected semiconductor process variations.

公开(公告)号：US20180047646A1

公开(公告)日：2018-02-15

申请号：US15540409

申请日：2017-02-23

Applicant: KLA-Tencor Corporation

Inventor： Barak Bringoltz ,  Evgeni Gurevich ,  Ido Adam ,  Yoel Feler ,  Dror Alumot ,  Yuval Lamhot ,  Noga Sella ,  Yaron Deleeuw ,  Tal Yaziv ,  Eltsafon Ashwal ,  Lilach Saltoun ,  Tom Leviant

IPC: H01L21/66 ,  G03F7/20 ,  G06F17/30 ,  G03F9/00

CPC classification number: H01L22/20 ,  G03F7/70633 ,  G03F9/7003 ,  G06F16/285 ,  H01L22/12

Abstract: Methods, metrology modules and target designs are provided, which improve the accuracy of metrology measurements. Methods provide flexible handling of multiple measurement recipes and setups and enable relating them to landscape features that indicate their relation to resonance regions and to flat regions. Clustering of recipes, self-consistency tests, common processing of aggregated measurements, noise reduction, cluster analysis, detailed analysis of the landscape and targets with skewed cells are employed separately or in combination to provide cumulative improvements of measurement accuracy.

公开(公告)号：US09581430B2

公开(公告)日：2017-02-28

申请号：US14057827

申请日：2013-10-18

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Ohad Bachar ,  Daria Negri ,  Boris Golovanevsky ,  Barak Bringoltz ,  Daniel Kandel ,  Yoel Feler ,  Noam Sapiens ,  Paykin Irina ,  Alexander Svizher ,  Meir Aloni ,  Guy Ben Dov ,  Hadar Shalmoni ,  Vladimir Levinski

IPC: G01B9/02 ,  G01N21/45

CPC classification number: G01B9/0209 ,  G01B9/02027 ,  G01B9/02043 ,  G01B9/02087 ,  G01N21/45

Abstract: Systems and methods are provided which derive target characteristics from interferometry images taken at multiple phase differences between target beams and reference beams yielding the interferometry images. The illumination of the target and the reference has a coherence length of less than 30 microns to enable scanning the phase through the coherence length of the illumination. The interferometry images are taken at the pupil plane and/or in the field plane to combine angular and spectroscopic scatterometry data that characterize and correct target topography and enhance the performance of metrology systems.

Abstract translation: 提供了系统和方法，其从在目标光束和参考光束之间的多个相位差处拍摄的产生干涉测量图像的干涉测量图像中导出目标特征。 目标和参考物的照明具有小于30微米的相干长度，以使得能够通过照明的相干长度扫描相位。 在瞳孔平面和/或场平面中拍摄干涉测量图像，以组合表征和校正目标地形的角度和光谱散射数据，并增强计量系统的性能。

公开(公告)号：US20140257734A1

公开(公告)日：2014-09-11

申请号：US14244179

申请日：2014-04-03

Applicant: KLA-Tencor Corporation

Inventor： Barak Bringoltz ,  Irina Vakshtein ,  Ofir Aharon ,  Guy Ben Dov ,  Zeev Bomzon

IPC: G01N21/47 ,  G01B11/00

CPC classification number: G01N21/4785 ,  G03F7/70633

Abstract: Methods and calibrations modules are provided, for calibrating a pupil center in scatterometry overlay measurements. The calibration comprises calculating fluctuations from a first statistical figure of merit such as an average of an overlay signal per pixel at the pupil and significantly reducing, for example minimizing, the fluctuations with respect to a second statistical figure of merit thereof, such as a pupil weighted variance of the fluctuations.

Abstract translation: 提供了方法和校准模块，用于在散射测量叠加测量中校准瞳孔中心。 校准包括从第一统计品质因数计算波动，例如在瞳孔处的每个像素的覆盖信号的平均值，并且显着地减少例如相对于其第二统计品质因数例如瞳孔的波动最小化 波动的加权方差。