公开(公告)号：US5276725A

公开(公告)日：1994-01-04

申请号：US996508

申请日：1992-12-14

申请人： Eigo Kawakami ,  Minoru Yoshii ,  Shunichi Uzawa

发明人： Eigo Kawakami ,  Minoru Yoshii ,  Shunichi Uzawa

IPC分类号： G03F7/20 ,  G21K5/00

CPC分类号： G03F7/702

摘要： An exposure apparatus usable with a mask having a pattern and a wafer having a radiation-sensitive surface layer, for transferring with a radiation energy beam the pattern of the mask to the wafer, is disclosed. The apparatus includes a mask supporting member for supporting the mask; a wafer supporting member for supporting the wafer; a reflective member having a reflection surface and an indication pattern, the reflective member being supported by one of the mask supporting member and the wafer supporting member; an arrangement for projecting a beam, which is thinner than the radiation energy beam and which advances along or about the axis of the radiation energy beam, upon the reflective member; a device for observing a positional relationship between the indication pattern and a spot formed by projection of the thinner beam upon the reflective member; and a device for correcting a relationship between the indication pattern and the spot, on the basis of the observation.

摘要翻译： 公开了一种可用于具有图案的掩模和具有辐射敏感表面层的晶片的曝光装置，用于将辐射能量束将掩模的图案转印到晶片。 该装置包括用于支撑面罩的面罩支撑构件; 用于支撑晶片的晶片支撑构件; 反射构件，其具有反射面和指示图案，所述反射构件由所述面罩支撑构件和所述晶片支撑构件中的一个支撑; 用于投射比辐射能量束更薄并且沿辐射能量束的轴线或围绕辐射能量束的轴线前进的光束的反射构件的布置; 用于观察指示图案与通过将较薄光束投射在反射构件上形成的光斑之间的位置关系的装置; 以及用于基于观察来校正指示图案与斑点之间的关系的装置。

公开(公告)号：US4969168A

公开(公告)日：1990-11-06

申请号：US401654

申请日：1989-08-31

申请人： Eiji Sakamoto ,  Shinichi Hara ,  Isamu Shimoda ,  Shunichi Uzawa

发明人： Eiji Sakamoto ,  Shinichi Hara ,  Isamu Shimoda ,  Shunichi Uzawa

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H01L21/683

CPC分类号： G03F7/707 ,  G03F7/70866 ,  G03F7/70875 ,  H01L21/6833 ,  H01L21/6838

摘要： A wafer chuck usable with a semiconductor exposure apparatus wherein a mask and a semiconductor wafer are placed in a vacuum ambience or a pressure-reduced gas ambience, and wherein the wafer is exposed through the mask to radiation energy such as X-rays contained in a synchrotron radiation beam, by which the pattern of the mask is transferred onto the wafer. The wafer is first attracted on the wafer supporting surface of the chuck by vacuum attraction, and thereafter, the wafer is attracted by the electrostatic attraction force. Thereafter, the vacuum attraction is broken by supplying a gas. When the pattern of the mask is transferred onto the wafer, the wafer is retained on the wafer supporting surface by the electrostatic attraction force only. By this, the sheet-like member (wafer) supporting apparatus can correctly contact the wafer supporting surface to the wafer without being influenced by the undulation of the wafer. In addition, the heat produced in the wafer during exposure can be removed efficiently by temperature controlled water supplied to the wafer supporting apparatus.

公开(公告)号：US06947519B2

公开(公告)日：2005-09-20

申请号：US09951456

申请日：2001-09-14

申请人： Kenji Itoga ,  Shunichi Uzawa ,  Yutaka Watanabe ,  Toyoki Kitayama

发明人： Kenji Itoga ,  Shunichi Uzawa ,  Yutaka Watanabe ,  Toyoki Kitayama

IPC分类号： G03F1/22 ,  G03F7/20 ,  G21K1/06 ,  G21K1/10 ,  G21K5/02 ,  G21K5/04 ,  H01L21/027 ,  H05H13/04 ,  G21K5/00

CPC分类号： G21K1/10 ,  G03F7/70008 ,  G03F7/70191 ,  G03F7/70941 ,  G21K1/06

摘要： An X-ray exposure apparatus extracts exposure X-rays from light called synchrotron radiation from a synchrotron radiation source by an optical path including an X-ray mirror and performs exposure using the extracted X-rays. The X-ray mirror contains a material having an absorption edge in at least one of a wavelength range of less than 0.45 nm and a wavelength range exceeding 0.7 nm, thereby implementing exposure using the X-ray in the range of 0.45 nm to 0.7 nm. The X-ray mirror contains at least one material selected from the group consisting of iron, cobalt, nickel, copper, manganese, chromium, and their alloys, nitrides, carbides, and borides.

摘要翻译： X射线曝光装置通过包括X射线反射镜的光路从同步加速器辐射源的称为同步加速器辐射的光提取曝光X射线，并使用所提取的X射线进行曝光。 X射线镜含有在波长范围小于0.45nm，波长范围超过0.7nm的吸收边缘的材料，从而使用在0.45nm〜0.7nm的范围内的X射线进行曝光 。 X射线镜包含选自铁，钴，镍，铜，锰，铬及其合金，氮化物，碳化物和硼化物中的至少一种材料。

公开(公告)号：US06272202B1

公开(公告)日：2001-08-07

申请号：US09426945

申请日：1999-10-26

申请人： Keiko Chiba ,  Shunichi Uzawa ,  Mitsuaki Amemiya ,  Yutaka Watanabe

发明人： Keiko Chiba ,  Shunichi Uzawa ,  Mitsuaki Amemiya ,  Yutaka Watanabe

IPC分类号： G21K500

CPC分类号： G03F7/70325 ,  G03F1/22 ,  G03F1/50 ,  G03F7/001 ,  G03F7/2022 ,  G03F7/7035 ,  G03F7/70466

摘要： An exposure method for printing a pattern onto a workpiece to be exposed, includes a first exposure step for forming, on the workpiece and by exposure, a transferred image of a first absorbing material pattern formed on a mask and having no periodic structure, and a second exposure step for printing, on the workpiece and by exposure, a diffraction pattern to be produced through Fresnel diffraction due to a second absorbing material pattern formed on the mask and having a periodic structure, the diffraction pattern having a period corresponding to 1/n of a period of the transferred image of the periodic structure pattern, where n is an integer not less than 2, and wherein the first and second exposure steps are performed simultaneously.

摘要翻译： 一种用于将图案印刷到要曝光的工件上的曝光方法包括：第一曝光步骤，用于在工件上形成并且通​​过曝光形成在掩模上形成并且不具有周期性结构的第一吸收材料图案的转印图像，以及 第二曝光步骤，用于在工件上和通过曝光印刷由于在掩模上形成的具有周期性结构的第二吸收材料图案而通过菲涅耳衍射产生的衍射图案，衍射图案具有对应于1 / n的周期 其中n是不小于2的整数，并且其中同时执行第一和第二曝光步骤。

公开(公告)号：US5329126A

公开(公告)日：1994-07-12

申请号：US95484

申请日：1993-07-23

申请人： Mitsuaki Amemiya ,  Shunichi Uzawa

发明人： Mitsuaki Amemiya ,  Shunichi Uzawa

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H01L21/683 ,  G01N21/00

CPC分类号： G03F7/70716 ,  G03F7/70783 ,  G03F7/70866 ,  G03F7/70875 ,  Y10T279/11

摘要： Disclosed are an object holding process and and an apparatus therefor in which a process strain of the object can be accurately compensated for. When the exposure operation is started, the bottom surface of the object is held by a holding unit. If the object has a strain, the process strain is calculated. Here, if the process strain is larger than a tolerance, the temperature of the object is set to an object setting temperature in a position other than an exposure position in order to contract or expand the object by a predetermined amount for a magnification correction. The bottom surface of the object is then held by the holding unit again, and the exposure of the object is performed in the exposure position.

摘要翻译： 公开了一种物体保持过程及其装置，其中可以精确地补偿物体的过程应变。 当曝光操作开始时，物体的底面由保持单元保持。 如果物体有应变，则计算过程应变。 这里，如果过程应变大于公差，则将物体的温度设定为除曝光位置以外的位置的物体设定温度，以使物体收缩或扩大预定量用于倍率校正。 然后，物体的底面再次被保持单元保持，并且在曝光位置进行物体的曝光。

公开(公告)号：US5063582A

公开(公告)日：1991-11-05

申请号：US658434

申请日：1991-02-20

申请人： Tetsuzo Mori ,  Eiji Sakamoto ,  Shinichi Hara ,  Koji Uda ,  Isamu Shimoda ,  Shunichi Uzawa ,  Kunitaka Ozawa

发明人： Tetsuzo Mori ,  Eiji Sakamoto ,  Shinichi Hara ,  Koji Uda ,  Isamu Shimoda ,  Shunichi Uzawa ,  Kunitaka Ozawa

IPC分类号： G03F7/20

CPC分类号： G03F7/709 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70866 ,  G03F7/70875

摘要： The present invention relates to a temperature control system for a lithographic exposure apparatus wherein a mask and wafer are closely disposed, and predetermined exposure energy is applied to respective shot areas of the wafer through the mask. The exposure energy is a soft-X-ray source, for example. The pattern of the mask is transferred onto the respective shot areas in a step-and-repeat manner. In the apparatus, a temperature control medium liquid is supplied into the wafer chuck which supports the wafer at the exposure position. The flow rate of the temperature control liquid is different during an exposure operation than during a non-exposure-operation. The flow control is determined in consideration of the wafer chuck vibration attributable to the supply of the liquid medium and also, of the heat generation in the wafer by the exposure energy, so that the vibration of the wafer chuck during the exposure operation is suppressed. Simultaneously the temperature rise of the wafer can also be suppressed. The pattern transfer from the mask to the wafer thus be precisely performed.

公开(公告)号：US4965570A

公开(公告)日：1990-10-23

申请号：US388713

申请日：1989-08-02

申请人： Katsunori Hatanaka ,  Shunichi Uzawa ,  Katsumi Nakagawa ,  Toshiyuki Komatsu

发明人： Katsunori Hatanaka ,  Shunichi Uzawa ,  Katsumi Nakagawa ,  Toshiyuki Komatsu

IPC分类号： H04N1/40 ,  H04N3/15

CPC分类号： H04N1/40056 ,  H04N3/1575

摘要： A photoelectric conversion apparatus has a plurallity of photoelectric conversion elements each providing an output signal to a storage capacitor. A matrix wiring unit is arranged opposite the photoelectric conversion elements so as not to cross the signal lines extending from the capacitors. The matrix wiring unit matrix transfers the signals from the capacitors. A switch array unit includes a first switch unit for sequentially transferring the matrix transferred signals, and a first readout device for reading out, as a voltage signal, the signals transferred by the first switch section. The switch array also includes a second switch unit arranged in correspondence with the first switch unit and operated synchronously therewith. The second switch unit receives signals corresponding to noise. A second readout device reads out, as a voltage signal, the output from the second switch unit. A differential amplifier is included for receiving the outputs from the first and second readout devices and outputs a signal corresponding to a difference therebetween.

摘要翻译： 光电转换装置具有多个光电转换元件，每个光电转换元件向存储电容器提供输出信号。 矩阵布线单元布置成与光电转换元件相对，以便不与从电容器延伸的信号线交叉。 矩阵布线单元矩阵传送来自电容器的信号。 开关阵列单元包括用于顺序传送矩阵传送信号的第一开关单元和用于读出由第一开关部分传送的信号作为电压信号的第一读出装置。 开关阵列还包括与第一开关单元对应地布置并与其同步操作的第二开关单元。 第二开关单元接收对应于噪声的信号。 第二读出装置从第二开关单元读出作为电压信号的输出。 包括差分放大器，用于接收来自第一和第二读出装置的输出，并输出对应于它们之间的差值的信号。

公开(公告)号：US4461956A

公开(公告)日：1984-07-24

申请号：US558573

申请日：1983-12-06

申请人： Katsunori Hatanaka ,  Yutaka Hirai ,  Naoki Ayata ,  Shunichi Uzawa

发明人： Katsunori Hatanaka ,  Yutaka Hirai ,  Naoki Ayata ,  Shunichi Uzawa

IPC分类号： H01L27/146 ,  H04N1/193 ,  H01J40/14

CPC分类号： H04N1/1938 ,  H01L27/14665 ,  H04N1/193

摘要： A photoelectric converter in solid-state assembly, comprising the following sections formed on the same substrate: a photoelectric converting section constituted of a number of photoelectric converting elements arranged in an array, each element having a light-receiving surface for input of light-information; and a signal processing circuit section comprising a number of accumulating means, each provided for each of said photoelectric converting elements, for accumulation of signals produced as output from the corresponding photoelectric converting elements, a number of transfer means for transferring the signals accumulated in the corresponding accumulating means to other places, and an array of a number of transistors wired in a two-dimensional matrix to drive a number of the transfer means in time series, said photoelectric converting elements, and the transfer means and the transistors constituting said signal processing circuit section being constituted of thin semi-conductor films.

摘要翻译： 一种固态组件的光电转换器，包括形成在同一衬底上的以下部分：由排列成阵列的多个光电转换元件构成的光电转换部，每个元件具有用于输入光信息的光接收表面 ; 以及信号处理电路部分，包括为每个所述光电转换元件提供的多个累积装置，用于累积作为相应光电转换元件的输出的信号，多个传送装置，用于传送累积在相应的光电转换元件中的信号 累积装置到其他地方，以及以二维矩阵连接的多个晶体管的阵列，以时间序列驱动多个传送装置，所述光电转换元件，以及构成所述信号处理电路的传输装置和晶体管 部分由薄的半导体膜构成。

公开(公告)号：US4459488A

公开(公告)日：1984-07-10

申请号：US296258

申请日：1981-08-26

申请人： Shunichi Uzawa ,  Toshiyuki Komatsu ,  Seishiro Yoshioka ,  Masaki Fukaya ,  Yoshiaki Shirato

发明人： Shunichi Uzawa ,  Toshiyuki Komatsu ,  Seishiro Yoshioka ,  Masaki Fukaya ,  Yoshiaki Shirato

IPC分类号： H01L27/146 ,  H01L31/10 ,  H04N1/028 ,  H04N1/401 ,  H04N5/30 ,  H04N5/335 ,  H04N5/357 ,  H04N5/369

CPC分类号： H04N1/401 ,  H04N5/30 ,  Y10S136/293

摘要： A photoelectric converting apparatus having photoelectric converting elements divided into plural groups and a scanning circuit for dynamically scanning the photoelectric converting elements. There is also further provided a shielded element for each of the groups of the same characteristic as that of the photoelectric converting elements, and a circuit for supplying a bias voltage to the photoelectric converting elements and the shielded element in response to the output of the shielded element.

摘要翻译： 具有被划分为多组的光电转换元件和用于动态扫描光电转换元件的扫描电路的光电转换装置。 还提供了与光电转换元件相同特性的每个组的屏蔽元件，以及用于响应屏蔽的输出向光电转换元件和屏蔽元件提供偏置电压的电路 元件。

公开(公告)号：US4405915A

公开(公告)日：1983-09-20

申请号：US246218

申请日：1981-03-23

申请人： Toshiyuki Komatsu ,  Masaki Fukaya ,  Shunichi Uzawa ,  Seishiro Yoshioka ,  Yoshiaki Shirato

发明人： Toshiyuki Komatsu ,  Masaki Fukaya ,  Shunichi Uzawa ,  Seishiro Yoshioka ,  Yoshiaki Shirato

IPC分类号： H01L27/146 ,  H01L31/09 ,  H01L31/08 ,  H01L27/14

CPC分类号： H01L31/095 ,  H01L27/14665

摘要： A photoelectric transducing element comprising (a) a substrate; (b) first electrode provided on said substrate; (c) first contact layer to form an ohmic contact with said first electrode with respect to electric charge in at least one polarity; (d) a photoconductive layer provided in contact with said first contact layer and composed of an amorphous material containing silicon atom as a matrix and hydrogen atom, or halogen atom, or both, at a ratio of 1 to 30 atomic % with respect to said silicon atom; (e) second contact layer provided in contact with said photoconductive layer; and (f) second electrode to form an ohmic contact with said second contact layer with respect to said charge.

摘要翻译： 一种光电转换元件，包括（a）基底; （b）设置在所述基板上的第一电极; （c）第一接触层，以至少一个极性相对于电荷形成与所述第一电极的欧姆接触; （d）与所述第一接触层接触且由含有硅原子作为基体的无定形材料构成的光电导层和氢原子或卤原子或两者相对于所述第一接触层的比例为1〜30原子％ 硅原子; （e）与所述光电导层接触的第二接触层; 和（f）第二电极，以相对于所述电荷与所述第二接触层形成欧姆接触。