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123 条记录 (耗时 0.042 秒)

    Displacement device, lithographic apparatus and positioning method
    31.
    发明授权
    Displacement device, lithographic apparatus and positioning method 有权
    位移装置，光刻设备和定位方法

    公开(公告)号：US09052613B2

    公开(公告)日：2015-06-09

    申请号：US13105748

    申请日：2011-05-11

    申请人： Johannes Hubertus Antonius Van de Rijdt ,  Joost Jeroen Ottens ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Erik Johannes Antonius Manders

    发明人： Johannes Hubertus Antonius Van de Rijdt ,  Joost Jeroen Ottens ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Erik Johannes Antonius Manders

    IPC分类号： G03B27/58 ,  G03F7/20 ,  H02K41/03

    CPC分类号： G03F7/70758 ,  H02K41/03

    摘要： A displacement device with a first and second part which are displaceable relative to one another, the first part being provided with a system of magnets, the second part being provided with a set of coil block units including: at least three first coil block units having current conductors oriented parallel to a second direction, at least two second coil block units having current conductors oriented parallel to a first direction, wherein the displacement device includes a controller configured to control the position of the second part relative to the first part, and wherein when the second part mainly moves in the second direction the controller is configured to levitate the second part from the first part in the third direction by using first coil block units only.

    摘要翻译： 一种具有第一和第二部分的位移装置，其相对于彼此可移动，所述第一部分设置有磁体系统，所述第二部分设置有一组线圈块单元，所述一组线圈块单元包括：至少三个第一线圈块单元， 电流导体平行于第二方向定向，至少两个第二线圈块单元，其具有平行于第一方向定向的电流导体，其中所述位移装置包括被配置为控制所述第二部分相对于所述第一部分的位置的控制器，并且其中 当第二部分主要在第二方向上移动时，控制器被配置为仅通过使用第一线圈块单元从第一部分沿第三方向悬浮第二部分。

    Temperature stabilization system to stabilize a temperature of an article
    32.
    发明授权
    Temperature stabilization system to stabilize a temperature of an article 有权
    温度稳定系统，以稳定物品的温度

    公开(公告)号：US08994917B2

    公开(公告)日：2015-03-31

    申请号：US12999512

    申请日：2009-07-22

    申请人： Joost Jeroen Ottens ,  Johannes Henricus Wilhelmus Jacobs

    发明人： Joost Jeroen Ottens ,  Johannes Henricus Wilhelmus Jacobs

    IPC分类号： G03B27/52 ,  G03B27/58 ,  G03B27/32 ,  G03F7/20 ,  H01L21/67

    CPC分类号： G03F7/70875 ,  H01L21/67109 ,  H01L21/67248

    摘要： An article support is constructed to support an article. The article support includes a back fill structure constructed to supply and extract a thermal buffering fluid to and from the article support. The back fill structure is connected to an extraction duct that is constructed and arranged to extract at least a gas phase of the thermal buffering fluid from the back fill structure. The back fill structure is connected to a supply duct, constructed and arranged to supply a liquid phase of the thermal buffering fluid to the back fill structure. The back fill structure is arranged to have the thermal buffering fluid brought in a combined liquid and gas phase to thermally connect with the article.

    摘要翻译： 文章支持被构造来支持文章。 物品支撑件包括构造成向物品支撑件提供热提取流体并从其提取热缓冲流体的后填充结构。 背部填充结构连接到提取管道，其被构造和布置成从后部填充结构提取至少一个热缓冲流体的气相。 后填充结构连接到供应管道，构造和布置成将热缓冲流体的液相供应到后填充结构。 背部填充结构被布置成使热缓冲流体进入组合的液体和气相以与制品热连接。

    Lithographic apparatus and device manufacturing method
    38.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    光刻设备和器件制造方法

    公开(公告)号：US07864292B2

    公开(公告)日：2011-01-04

    申请号：US11404091

    申请日：2006-04-14

    申请人： Martinus Hendrikus Antonius Leenders ,  Nicolaas Rudolf Kemper ,  Joost Jeroen Ottens

    发明人： Martinus Hendrikus Antonius Leenders ,  Nicolaas Rudolf Kemper ,  Joost Jeroen Ottens

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70866 ,  G03F7/70341

    摘要： An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.

    摘要翻译： 公开了一种浸没式光刻设备，其中液体供应系统（其在投影系统和基板之间提供液体）的至少一部分可在扫描期间在基本上平行于基板的顶表面的平面中移动。 移动部件以减小该部件与基板之间的相对速度，使得可以相对于投影系统移动基板的速度。

    Lithographic apparatus and device manufacturing method
    40.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20080278697A1

    公开(公告)日：2008-11-13

    申请号：US12216441

    申请日：2008-07-03

    申请人： Joost Jeroen Ottens ,  Noud Jan Gilissen ,  Martinus Hendrikus Antonius Leenders

    发明人： Joost Jeroen Ottens ,  Noud Jan Gilissen ,  Martinus Hendrikus Antonius Leenders

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70725 ,  G03F7/70341 ,  G03F7/7075 ,  G03F9/7046

    摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.

    摘要翻译： 光刻设备可以包括至少部分由诸如气体轴承的轴承支撑的光学元件，例如浸没式流体储存器。 为了使基板的边缘的光刻设备进行照明，提供围绕基板的周围结构。 衬底的等级参数，例如衬底的厚度，通过诸如厚度传感器的传感器来测量。 通过致动器，其上放置或将保持衬底的衬底台相对于周围结构定位，使得衬底的表面将处于与周围结构的表面基本相同的高度，因此 使得光学元件能够从衬底的表面转移到周围结构的表面，反之亦然。