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104 条记录 (耗时 0.031 秒)

    Method and apparatus for specimen fabrication
    33.
    发明授权
    Method and apparatus for specimen fabrication 有权
    用于样品制造的方法和装置

    公开(公告)号：US06828566B2

    公开(公告)日：2004-12-07

    申请号：US10395237

    申请日：2003-03-25

    申请人： Satoshi Tomimatsu ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

    发明人： Satoshi Tomimatsu ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

    IPC分类号： H01J3720

    CPC分类号： G01N1/32 ,  G01N1/28 ,  G01N2001/028 ,  G01N2001/045 ,  G01N2001/282 ,  H01J37/20 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/202 ,  H01J2237/31732 ,  H01J2237/31745 ,  H01J2237/31749

    摘要： A specimen fabrication apparatus including a movable sample stage on which a specimen substrate is mounted, a probe connector for firmly joining a tip of a probe to a portion of the specimen substrate in a vicinity of an area on the specimen substrate to be observed in an observation apparatus, a micro-specimen separator for separating from the specimen substrate a micro-specimen to which the tip of the probe is firmly joined, the micro-specimen including the area on the specimen substrate to be observed and the portion of the specimen substrate to which the tip of the probe is firmly joined, a micro-specimen fixer for fixing the micro-specimen separated from the specimen substrate to a specimen holder of the observation apparatus, and a probe separator for separating the tip of the probe from the micro-specimen fixed to the specimen holder.

    摘要翻译： 一种试样制造装置，包括：安装有试样基板的可动试样台;探针连接器，用于将探针的前端牢固地接合到试样基板的一部分附近，以在待观察的样品基板上的区域 观察装置，用于从试样基板分离与探针的前端牢固接合的微型试样的微量试样分离体，包括待观察的试样基板上的区域的微量试样和试样基板的一部分 探针的尖端牢固地接合到其上的微型试样固定器，用于将从试样基板分离的微量样品固定到观察装置的试样支架上的探针分离器和用于将探针的尖端从微型 固定在样品架上。

    Method of preventing charging, and apparatus for charged particle beam using the same
    35.
    发明授权
    Method of preventing charging, and apparatus for charged particle beam using the same 有权
    防止充电的方法以及使用其的带电粒子束的装置

    公开(公告)号：US06774363B2

    公开(公告)日：2004-08-10

    申请号：US10180536

    申请日：2002-06-27

    申请人： Muneyuki Fukuda ,  Hiroyasu Shichi ,  Satoshi Tomimatsu

    发明人： Muneyuki Fukuda ,  Hiroyasu Shichi ,  Satoshi Tomimatsu

    IPC分类号： G01N2300

    CPC分类号： H01J37/28 ,  G01N23/225 ,  H01J37/026 ,  H01J37/3056

    摘要： An apparatus for a charged particle beam has a charged particle source; a charged particle optical system for focusing and deflecting a charged particle beam emitted from the charged particle source; a detector for detecting secondary particles emitted from a sample irradiated with the charged particle beam; and a sample holder on which the sample is mounted. The apparatus has an electrode for preventing charging which is provided so as to be movable with respect to the surface of the sample holder, and a controller for the electrode for preventing charging, which controls a voltage to be applied to the electrode for preventing charging and the movement. Preventing the charging is performed by generating an induced current or a current between an area irradiated with the charged particle beam in the sample and the electrode for preventing charging.

    摘要翻译： 带电粒子束的装置具有带电粒子源; 用于聚焦和偏转从带电粒子源发射的带电粒子束的带电粒子光学系统; 用于检测从被照射的带电粒子束的样品发射的二次粒子的检测器; 和其上安装有样品的样品架。 该装置具有用于防止充电的电极，其被设置为能够相对于样品保持器的表面移动，以及用于防止充电的电极的控制器，其控制施加到用于防止充电的电极的电压，以及 运动。 通过在样品中用带电粒子束照射的区域和用于防止充电的电极之间产生感应电流或电流来进行充电。

    Magnetic head having track width specified by grooves formed with projection ion beam
    36.
    发明授权
    Magnetic head having track width specified by grooves formed with projection ion beam 失效
    磁头具有由投影离子束形成的槽指定的轨道宽度

    公开(公告)号：US5910871A

    公开(公告)日：1999-06-08

    申请号：US837218

    申请日：1997-04-22

    申请人： Yoshimi Kawanami ,  Hisashi Takano ,  Kaoru Umemura ,  Yuichi Madokoro ,  Satoshi Tomimatsu

    发明人： Yoshimi Kawanami ,  Hisashi Takano ,  Kaoru Umemura ,  Yuichi Madokoro ,  Satoshi Tomimatsu

    IPC分类号： G11B5/187 ,  G11B5/31 ,  G11B5/39 ,  G11B5/40 ,  G11B5/127

    CPC分类号： G11B5/3967 ,  G11B5/1871 ,  G11B5/3106 ,  G11B5/3116 ,  G11B5/3163 ,  G11B5/40 ,  Y10S977/949

    摘要： The track width of a magnetic head is specified by the interval between a pair of grooves in the slider surface that are formed by a projection ion beam. Specifically, the grooves are processed by projecting a mask having the pattern of the pair of grooves with a projection ion beam with reduction to a magnification of 1/10, for example. Although the peripheral strain of the pattern thus formed is large and the current distortion is not uniform when the projection ion beam batch irradiation area is limited, the increase in depth of the grooves formed at the periphery of the grooves does not affect the track narrowing process at the center portion of the projection ion beam since the strain thereof is negligibly small. As a result, a narrow track width is processed with high precision.

    摘要翻译： 磁头的磁道宽度由滑块表面中由突出离子束形成的一对凹槽之间的间隔来确定。 具体地说，例如，通过将具有一对凹槽的图案的掩模用投影离子束投射到+ E，fra 1/10 + EE的放大倍数来进行处理。 虽然如此形成的图案的周边应变大，并且当投影离子束批量照射区域受限时电流变形不均匀，但是形成在凹槽周边的凹槽的深度增加不影响轨道变窄处理 由于其应变可忽略不计，所以在投影离子束的中心部分。 结果，以高精度处理窄轨道宽度。

    CHARGED PARTICLE BEAM DEVICE AND METHOD OF MANUFACTURE OF SAMPLE
    38.
    发明申请
    CHARGED PARTICLE BEAM DEVICE AND METHOD OF MANUFACTURE OF SAMPLE 审中-公开
    充电颗粒束装置及其制备方法

    公开(公告)号：US20130277552A1

    公开(公告)日：2013-10-24

    申请号：US13976183

    申请日：2011-12-08

    申请人： Terutaka Nanri ,  Satoshi Tomimatsu ,  Toshihide Agemura

    发明人： Terutaka Nanri ,  Satoshi Tomimatsu ,  Toshihide Agemura

    IPC分类号： H01J37/304

    CPC分类号： H01J37/304 ,  H01J37/3056 ,  H01J2237/2804 ,  H01J2237/30466 ,  H01J2237/31749

    摘要： A precision of removal of a damaged layer of a sample created by machining with an FIB machining device depends on a skill of an operator. During removal machining of the damaged layer generated by an ion beam, transmitted electrons which are generated by irradiating an electron beam formed in an electron beam optics system onto a sample are detected by a two-dimensional detector, and a moment for finishing the removal machining of the damaged layer is determined based on the amount of blur of a diffraction pattern acquired with the two-dimensional detector.

    摘要翻译： 通过FIB加工装置加工产生的样品的损坏层的去除精度取决于操作者的技能。 在由离子束产生的损伤层的去除加工期间，通过二维检测器检测通过将形成在电子束光学系统中的电子束照射到样品上而产生的透射电子，并且用于完成去除加工的力矩 基于用二维检测器获取的衍射图案的模糊量来确定损坏层。

    Gas field ion source, charged particle microscope, and apparatus
    39.
    发明授权
    Gas field ion source, charged particle microscope, and apparatus 有权
    气体离子源，带电粒子显微镜和装置

    公开(公告)号：US08115184B2

    公开(公告)日：2012-02-14

    申请号：US12318583

    申请日：2008-12-31

    申请人： Hiroyasu Shichi ,  Shinichi Matsubara ,  Takashi Ohshima ,  Satoshi Tomimatsu ,  Tomihiro Hashizume ,  Tohru Ishitani

    发明人： Hiroyasu Shichi ,  Shinichi Matsubara ,  Takashi Ohshima ,  Satoshi Tomimatsu ,  Tomihiro Hashizume ,  Tohru Ishitani

    IPC分类号： H01J49/00

    CPC分类号： H01J27/26 ,  H01J37/08 ,  H01J2237/0805 ,  H01J2237/0807 ,  H01J2237/182

    摘要： A gas field ion source that can simultaneously increase a conductance during rough vacuuming and reduce an extraction electrode aperture diameter from the viewpoint of the increase of ion current. The gas field ion source has a mechanism to change a conductance in vacuuming a gas molecule ionization chamber. That is, the conductance in vacuuming a gas molecule ionization chamber is changed in accordance with whether or not an ion beam is extracted from the gas molecule ionization chamber. By forming lids as parts of the members constituting the mechanism to change the conductance with a bimetal alloy, the conductance can be changed in accordance with the temperature of the gas molecule ionization chamber, for example the conductance is changed to a relatively small conductance at a relatively low temperature and to a relatively large conductance at a relatively high temperature.

    摘要翻译： 一种气体离子源，其可以在粗吸真空中同时增加电导，并且从离子电流的增加的角度降低提取电极的孔直径。 气体离子源具有改变真空气体分子离子化室中的电导的机理。 也就是说，根据是否从气体分子离子化室抽出离子束，改变对气体分子离子化室进行抽真空的电导。 通过将盖子形成为构成用双金属合金改变电导的机构的部件的部分，可以根据气体分子离子化室的温度来改变电导率，例如，电导率变为相对较小的电导率 相对较低的温度和相对高的温度下的相对较大的电导率。

    Method and apparatus for specimen fabrication
    40.
    发明授权
    Method and apparatus for specimen fabrication 有权
    用于样品制造的方法和装置

    公开(公告)号：US07999240B2

    公开(公告)日：2011-08-16

    申请号：US12168232

    申请日：2008-07-07

    申请人： Satoshi Tomimatsu ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

    发明人： Satoshi Tomimatsu ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

    IPC分类号： H01J37/20

    CPC分类号： G01N1/32 ,  G01N1/28 ,  G01N2001/028 ,  G01N2001/045 ,  G01N2001/282 ,  H01J37/20 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/202 ,  H01J2237/31732 ,  H01J2237/31745 ,  H01J2237/31749

    摘要： A system for analyzing a semiconductor device, including: a first ion beam apparatus including: a sample stage to mount a sample substrate; a vacuum chamber in which the sample stage is placed; an ion beam irradiating optical system to irradiate the sample substrate; a specimen holder that accommodates a plurality of specimens separated from the sample substrate by the irradiation of the ion beam; and a probe to extract the separated specimen from the sample substrate, and to transfer the separated specimen to the specimen holder; a second ion beam apparatus that carries out a finishing process to the specimen; and an analyzer to analyze the finished specimen, wherein the first ion beam apparatus separates the specimen and the probe in a vacuum condition.

    摘要翻译： 一种用于分析半导体器件的系统，包括：第一离子束装置，包括：样品台，用于安装样品基板; 其中放置样品台的真空室; 离子束照射光学系统照射样品基板; 样本保持器，其容纳通过离子束的照射与样品基板分离的多个样本; 以及从所述样品基材中提取分离出的试样并将分离的试样转移到所述试样保持器的探针。 对样品进行精加工的第二离子束装置; 以及用于分析成品样品的分析器，其中所述第一离子束装置在真空条件下分离所述样品和所述探针。