CHANNEL COMMAND WORD PRE-FETCHING APPARATUS
    33.
    发明申请
    CHANNEL COMMAND WORD PRE-FETCHING APPARATUS 审中-公开
    通道命令字预设装置

    公开(公告)号:US20100082948A1

    公开(公告)日:2010-04-01

    申请号:US12493951

    申请日:2009-06-29

    IPC分类号: G06F9/30 G06F3/00

    摘要: In a CCW fetching section, for each input/output device being a control objective, a result prediction table in which prediction values of status values to be returned from an input/output device as execution results of CCW commands, is referred to. Then, based on the prediction values, commands being pre-fetching objectives are pre-fetched from a CCW program stored in a memory, and transmitted to a CCW executing section. On the other hand, in the CCW executing section, the pre-fetched commands are sequentially executed, and the actual status values as the execution results are received from the input/output device. Then, when the received actual status values are not same as the predicted status values, success or failure in prediction is notified to the CCW fetching section, and also, the result prediction table is updated in the CCW fetching section.

    摘要翻译: 在CCW提取部分中,对于作为控制目标的每个输入/输出设备,参考其中将作为CCW命令的执行结果从输入/输出设备返回的状态值的预测值的结果预测表。 然后,基于预测值,从存储在存储器中的CCW程序中取出预取目标的命令,并发送给CCW执行部。 另一方面,在CCW执行部中,依次执行预取命令,并且从输入/输出装置接收作为执行结果的实际状态值。 然后,当接收的实际状态值与预测状态值不相同时,将预测成功或失败通知给CCW取出部,并且在CCW取出部中更新结果预测表。

    Particle-measuring system and particle-measuring method
    36.
    发明授权
    Particle-measuring system and particle-measuring method 有权
    粒子测量系统和粒子测量方法

    公开(公告)号:US07515264B2

    公开(公告)日:2009-04-07

    申请号:US10321646

    申请日:2002-12-18

    IPC分类号: G01N21/00

    摘要: The present invention provides a particle measuring system which is provided in a processing system 40 which generates an atmosphere obtained by exhausting air or a gas in a processing chamber 48 by a vacuum pump 98 and applies a process concerning semiconductor manufacture to a wafer W in the atmosphere, attached to an exhaust pipe 90 which connects an exhaust opening 86 of the processing chamber 48 with the vacuum pump 98, and measures the number of the particles in the exhaust gas, and a measuring method thereof, the system and method providing a processing system and a cleaning method which terminate etching process by determining an end point based on the number of the particles in the exhaust gas and perform cleaning of unnecessary films.

    摘要翻译: 本发明提供一种粒子测量系统,其设置在处理系统40中,该处理系统40产生通过真空泵98排出处理室48中的空气或气体而获得的气氛,并将与半导体制造有关的工艺应用于晶片W 附着在排气管90上,排气管90将处理室48的排气口86与真空泵98连接,并测量废气中的颗粒数量及其测量方法,该系统和方法提供处理 系统和清洁方法,其通过基于废气中的颗粒数量确定终点并执行不需要的膜的清洁来终止蚀刻工艺。

    Baggage management gate
    37.
    发明申请
    Baggage management gate 有权
    行李管理门

    公开(公告)号:US20090072969A1

    公开(公告)日:2009-03-19

    申请号:US12073784

    申请日:2008-03-10

    IPC分类号: G08B21/00

    CPC分类号: G01R33/04 G01R33/02

    摘要: A baggage management gate including an exciting coil, a detecting coil and signal processing unit. The exciting coil forms an alternating magnetic field in a passage to an area from which manages objects to be carried in or carried out. The detecting coil detects a variation in the alternating magnetic field when magnetization of a magnetic material showing a large Barkhausen effect is reversed in the alternating magnetic field. The signal processing unit determines as to whether the magnetization reversal occurs in the alternating magnetic field due to the large Barkhausen effect or not, based on a signal detected by the detecting coil. The signal processing unit includes amplifier that amplifies the signal detected by the detecting coil with plural different amplification factors and output the amplified signals with each of the plural different amplification factors.

    摘要翻译: 包括励磁线圈,检测线圈和信号处理单元的行李管理门。 励磁线圈在通过管道运送或执行物体的区域中形成交变磁场。 当在交变磁场中表现出大的巴克豪森效应的磁性材料的磁化反转时,检测线圈检测交变磁场的变化。 信号处理单元基于由检测线圈检测到的信号,确定由于大的巴克豪森效应而导致的交变磁场中的磁化反转是否发生。 信号处理单元包括放大器,其放大由多个不同放大系数由检测线圈检测的信号,并以多个不同放大系数中的每一个输出放大的信号。

    Method for cleaning substrate processing chamber
    38.
    发明授权
    Method for cleaning substrate processing chamber 失效
    清洗基板处理室的方法

    公开(公告)号:US07456109B2

    公开(公告)日:2008-11-25

    申请号:US10536322

    申请日:2003-11-14

    IPC分类号: H01L21/302

    摘要: A cleaning method of a substrate processor that reduces damage to a member in a substrate processing container. The method of cleaning the substrate processing container of the substrate processor that processes a target substrate according to the present invention includes: introducing gas into a remote plasma generating unit of the substrate processor; exciting the gas by the remote plasma generating unit, and generating reactive species; and supplying the reactive species to the processing container from the remote plasma generating unit, and pressurizing the processing container at 1333 Pa or greater.

    摘要翻译: 一种基板处理器的清洁方法,其减少对基板处理容器中的部件的损坏。 根据本发明的清理处理目标衬底的衬底处理器的衬底处理容器的方法包括:将气体引入到衬底处理器的远程等离子体产生单元中; 通过远程等离子体发生单元激发气体,并产生反应物种; 并从远程等离子体发生单元向处理容器提供反应物质,并且在1333Pa或更大压力下加压处理容器。